
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1398829
[patent_doc_number] => 06534225
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-03-18
[patent_title] => 'Tapered ion implantation with femtosecond laser ablation to remove printable alternating phase shift features'
[patent_app_type] => B2
[patent_app_number] => 09/892957
[patent_app_country] => US
[patent_app_date] => 2001-06-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 17
[patent_no_of_words] => 4058
[patent_no_of_claims] => 49
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 120
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/534/06534225.pdf
[firstpage_image] =>[orig_patent_app_number] => 09892957
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/892957 | Tapered ion implantation with femtosecond laser ablation to remove printable alternating phase shift features | Jun 26, 2001 | Issued |
Array
(
[id] => 6884793
[patent_doc_number] => 20010038954
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-08
[patent_title] => 'Method and apparatus for repairing an alternating phase shift mask'
[patent_app_type] => new
[patent_app_number] => 09/893151
[patent_app_country] => US
[patent_app_date] => 2001-06-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 5139
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0038/20010038954.pdf
[firstpage_image] =>[orig_patent_app_number] => 09893151
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/893151 | Method and apparatus for repairing a photomask | Jun 25, 2001 | Issued |
Array
(
[id] => 6325552
[patent_doc_number] => 20020197541
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-26
[patent_title] => 'Method and apparatus for forming a pattern on an integrated circuit using differing exposure characteristics'
[patent_app_type] => new
[patent_app_number] => 09/885575
[patent_app_country] => US
[patent_app_date] => 2001-06-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3808
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 79
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0197/20020197541.pdf
[firstpage_image] =>[orig_patent_app_number] => 09885575
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/885575 | Method and apparatus for forming a pattern on an integrated circuit using differing exposure characteristics | Jun 19, 2001 | Issued |
Array
(
[id] => 1334467
[patent_doc_number] => 06593039
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-15
[patent_title] => 'Photoresist mask that combines attenuated and alternating phase shifting masks'
[patent_app_type] => B1
[patent_app_number] => 09/884840
[patent_app_country] => US
[patent_app_date] => 2001-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 11
[patent_no_of_words] => 3419
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/593/06593039.pdf
[firstpage_image] =>[orig_patent_app_number] => 09884840
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/884840 | Photoresist mask that combines attenuated and alternating phase shifting masks | Jun 18, 2001 | Issued |
Array
(
[id] => 5999606
[patent_doc_number] => 20020028393
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-03-07
[patent_title] => 'Optical proximity correction method utilizing serifs having variable dimensions'
[patent_app_type] => new
[patent_app_number] => 09/877231
[patent_app_country] => US
[patent_app_date] => 2001-06-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 8718
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 162
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0028/20020028393.pdf
[firstpage_image] =>[orig_patent_app_number] => 09877231
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/877231 | Optical proximity correction method utilizing serifs having variable dimensions | Jun 10, 2001 | Issued |
Array
(
[id] => 6557621
[patent_doc_number] => 20020164533
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-11-07
[patent_title] => 'Method and apparatus for reducing color conflicts during trim generation for phase shifters'
[patent_app_type] => new
[patent_app_number] => 09/876307
[patent_app_country] => US
[patent_app_date] => 2001-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 4114
[patent_no_of_claims] => 33
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0164/20020164533.pdf
[firstpage_image] =>[orig_patent_app_number] => 09876307
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/876307 | Method and apparatus for reducing color conflicts during trim generation for phase shifters | Jun 5, 2001 | Issued |
Array
(
[id] => 1359268
[patent_doc_number] => 06569583
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-27
[patent_title] => 'Method and apparatus for using phase shifter cutbacks to resolve phase shifter conflicts'
[patent_app_type] => B2
[patent_app_number] => 09/876306
[patent_app_country] => US
[patent_app_date] => 2001-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 20
[patent_no_of_words] => 4064
[patent_no_of_claims] => 24
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/569/06569583.pdf
[firstpage_image] =>[orig_patent_app_number] => 09876306
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/876306 | Method and apparatus for using phase shifter cutbacks to resolve phase shifter conflicts | Jun 5, 2001 | Issued |
Array
(
[id] => 6896235
[patent_doc_number] => 20010027025
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-04
[patent_title] => 'Projection lithography photomask blanks, preforms and method of making'
[patent_app_type] => new
[patent_app_number] => 09/876194
[patent_app_country] => US
[patent_app_date] => 2001-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 8235
[patent_no_of_claims] => 81
[patent_no_of_ind_claims] => 12
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0027/20010027025.pdf
[firstpage_image] =>[orig_patent_app_number] => 09876194
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/876194 | Projection lithography photomask blanks, preforms and method of making | Jun 5, 2001 | Issued |
Array
(
[id] => 1286473
[patent_doc_number] => 06635394
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-10-21
[patent_title] => 'Three dimensional mask'
[patent_app_type] => B2
[patent_app_number] => 09/871073
[patent_app_country] => US
[patent_app_date] => 2001-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/06/635/06635394.pdf
[firstpage_image] =>[orig_patent_app_number] => 09871073
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/871073 | Three dimensional mask | May 30, 2001 | Issued |
Array
(
[id] => 1296482
[patent_doc_number] => 06627359
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-30
[patent_title] => 'Phase-shift photomask manufacturing method and phase-shift photomask'
[patent_app_type] => B2
[patent_app_number] => 09/859552
[patent_app_country] => US
[patent_app_date] => 2001-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 5490
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[pdf_file] => patents/06/627/06627359.pdf
[firstpage_image] =>[orig_patent_app_number] => 09859552
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/859552 | Phase-shift photomask manufacturing method and phase-shift photomask | May 16, 2001 | Issued |
Array
(
[id] => 6524427
[patent_doc_number] => 20020192569
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-19
[patent_title] => 'Devices and methods for exposure of photoreactive compositions with light emitting diodes'
[patent_app_type] => new
[patent_app_number] => 09/858272
[patent_app_country] => US
[patent_app_date] => 2001-05-15
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 4034
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0192/20020192569.pdf
[firstpage_image] =>[orig_patent_app_number] => 09858272
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/858272 | Devices and methods for exposure of photoreactive compositions with light emitting diodes | May 14, 2001 | Abandoned |
Array
(
[id] => 6901460
[patent_doc_number] => 20010023043
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-20
[patent_title] => 'Optical proximity correction methods, and methods of forming radiation-patterning tools'
[patent_app_type] => new
[patent_app_number] => 09/858834
[patent_app_country] => US
[patent_app_date] => 2001-05-15
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[pdf_file] => publications/A1/0023/20010023043.pdf
[firstpage_image] =>[orig_patent_app_number] => 09858834
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/858834 | Optical proximity correction methods, and methods forming radiation-patterning tools | May 14, 2001 | Issued |
Array
(
[id] => 6404780
[patent_doc_number] => 20020182514
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-12-05
[patent_title] => 'Organic bottom antireflective coating for high performance mask making using optical imaging'
[patent_app_type] => new
[patent_app_number] => 09/848859
[patent_app_country] => US
[patent_app_date] => 2001-05-03
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[firstpage_image] =>[orig_patent_app_number] => 09848859
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/848859 | Organic bottom antireflective coating for high performance mask making using optical imaging | May 2, 2001 | Issued |
Array
(
[id] => 1317321
[patent_doc_number] => 06605393
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-08-12
[patent_title] => 'Alternative PSM with new phase conflict canceling method'
[patent_app_type] => B2
[patent_app_number] => 09/847485
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[firstpage_image] =>[orig_patent_app_number] => 09847485
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/847485 | Alternative PSM with new phase conflict canceling method | May 1, 2001 | Issued |
Array
(
[id] => 1334448
[patent_doc_number] => 06593037
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-15
[patent_title] => 'EUV mask or reticle having reduced reflections'
[patent_app_type] => B1
[patent_app_number] => 09/847803
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[firstpage_image] =>[orig_patent_app_number] => 09847803
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/847803 | EUV mask or reticle having reduced reflections | May 1, 2001 | Issued |
Array
(
[id] => 1369307
[patent_doc_number] => 06562525
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-13
[patent_title] => 'Photo mask to be used for photolithography, method of inspecting pattern defect, and method of manufacturing semiconductor device through use of the mask'
[patent_app_type] => B2
[patent_app_number] => 09/843693
[patent_app_country] => US
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[pdf_file] => patents/06/562/06562525.pdf
[firstpage_image] =>[orig_patent_app_number] => 09843693
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/843693 | Photo mask to be used for photolithography, method of inspecting pattern defect, and method of manufacturing semiconductor device through use of the mask | Apr 29, 2001 | Issued |
Array
(
[id] => 1154612
[patent_doc_number] => 06764792
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[patent_issue_date] => 2004-07-20
[patent_title] => 'Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it'
[patent_app_type] => B1
[patent_app_number] => 09/830598
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Array
(
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Array
(
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[patent_title] => 'Reflection-type mask for use in pattern exposure, manufacturing method therefor, exposure apparatus, and method of manufacturing a device'
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[firstpage_image] =>[orig_patent_app_number] => 09842056
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/842056 | Reflection-type mask for use in pattern exposure, manufacturing method therefor, exposure apparatus, and method of manufacturing a device | Apr 25, 2001 | Issued |
Array
(
[id] => 5814568
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[patent_issue_date] => 2002-04-04
[patent_title] => 'Halftone phase shift photomask and blank for halftone phase shift photomask'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/843309 | Halftone phase shift photomask and blank for halftone phase shift photomask | Apr 25, 2001 | Issued |