
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5905503
[patent_doc_number] => 20020142232
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-03
[patent_title] => 'Using double exposure effects during phase shifting to control line end shortening'
[patent_app_type] => new
[patent_app_number] => 09/843498
[patent_app_country] => US
[patent_app_date] => 2001-04-25
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0142/20020142232.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/843498 | Using double exposure effects during phase shifting to control line end shortening | Apr 24, 2001 | Issued |
Array
(
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[patent_doc_number] => 20020142231
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-10-03
[patent_title] => 'Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator'
[patent_app_type] => new
[patent_app_number] => 09/843487
[patent_app_country] => US
[patent_app_date] => 2001-04-25
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/843487 | Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator | Apr 24, 2001 | Issued |
Array
(
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[patent_doc_number] => 20020015899
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[patent_kind] => A1
[patent_issue_date] => 2002-02-07
[patent_title] => 'Hybrid phase-shift mask'
[patent_app_type] => new
[patent_app_number] => 09/840291
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/840291 | Hybrid phase-shift mask | Apr 23, 2001 | Issued |
Array
(
[id] => 7064768
[patent_doc_number] => 20010044054
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-11-22
[patent_title] => 'Photomask blank and photomask'
[patent_app_type] => new
[patent_app_number] => 09/840097
[patent_app_country] => US
[patent_app_date] => 2001-04-24
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[firstpage_image] =>[orig_patent_app_number] => 09840097
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/840097 | Photomask blank and photomask | Apr 23, 2001 | Issued |
Array
(
[id] => 6032616
[patent_doc_number] => 20020018942
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-14
[patent_title] => 'Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks'
[patent_app_type] => new
[patent_app_number] => 09/841517
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/841517 | Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks | Apr 23, 2001 | Issued |
Array
(
[id] => 6141435
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[patent_issue_date] => 2002-01-03
[patent_title] => 'Optical proximity correction'
[patent_app_type] => new
[patent_app_number] => 09/840307
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Array
(
[id] => 1296477
[patent_doc_number] => 06627358
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[patent_issue_date] => 2003-09-30
[patent_title] => 'Mask repair in resist image'
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[patent_app_number] => 09/838514
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[patent_app_date] => 2001-04-20
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[pdf_file] => patents/06/627/06627358.pdf
[firstpage_image] =>[orig_patent_app_number] => 09838514
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/838514 | Mask repair in resist image | Apr 19, 2001 | Issued |
Array
(
[id] => 1559136
[patent_doc_number] => 06436590
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[patent_issue_date] => 2002-08-20
[patent_title] => 'Phase shifting circuit manufacture method and apparatus'
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[pdf_file] => patents/06/436/06436590.pdf
[firstpage_image] =>[orig_patent_app_number] => 09839672
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/839672 | Phase shifting circuit manufacture method and apparatus | Apr 19, 2001 | Issued |
Array
(
[id] => 1220073
[patent_doc_number] => 06703167
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[patent_issue_date] => 2004-03-09
[patent_title] => 'Prioritizing the application of resolution enhancement techniques'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/837889 | Prioritizing the application of resolution enhancement techniques | Apr 17, 2001 | Issued |
Array
(
[id] => 1212295
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[patent_issue_date] => 2004-03-23
[patent_title] => 'Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this'
[patent_app_type] => B1
[patent_app_number] => 09/807276
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Array
(
[id] => 6586321
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[patent_issue_date] => 2002-02-07
[patent_title] => 'Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask'
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Array
(
[id] => 1311116
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[patent_issue_date] => 2003-08-26
[patent_title] => 'Extreme ultraviolet mask with improved absorber'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/823641 | Extreme ultraviolet mask with improved absorber | Mar 29, 2001 | Issued |
Array
(
[id] => 6886534
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[patent_title] => 'Mitigation of substrate defects in reflective reticles using sequential coating and annealing'
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Array
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[patent_title] => 'Blank for alternating PSM photomask with charge dissipation layer'
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Array
(
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Array
(
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Array
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Array
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Array
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