Search

Hung Nhat Ngo

Examiner (ID: 2310)

Most Active Art Unit
2501
Art Unit(s)
2874, 3621, 2501, 2633
Total Applications
1627
Issued Applications
1441
Pending Applications
92
Abandoned Applications
94

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5786786 [patent_doc_number] => 20020160274 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-10-31 [patent_title] => 'Method of reshaping a patterned organic photoresist surface' [patent_app_type] => new [patent_app_number] => 09/811186 [patent_app_country] => US [patent_app_date] => 2001-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5776 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0160/20020160274.pdf [firstpage_image] =>[orig_patent_app_number] => 09811186 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/811186
Method of reshaping a patterned organic photoresist surface Mar 15, 2001 Issued
Array ( [id] => 1352432 [patent_doc_number] => 06576379 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-06-10 [patent_title] => 'Phaseshift mask and manufacturing the same' [patent_app_type] => B2 [patent_app_number] => 09/809094 [patent_app_country] => US [patent_app_date] => 2001-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 24 [patent_no_of_words] => 7349 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/576/06576379.pdf [firstpage_image] =>[orig_patent_app_number] => 09809094 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/809094
Phaseshift mask and manufacturing the same Mar 15, 2001 Issued
Array ( [id] => 1325997 [patent_doc_number] => 06599666 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-07-29 [patent_title] => 'Multi-layer, attenuated phase-shifting mask' [patent_app_type] => B2 [patent_app_number] => 09/809720 [patent_app_country] => US [patent_app_date] => 2001-03-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 19 [patent_no_of_words] => 6500 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/599/06599666.pdf [firstpage_image] =>[orig_patent_app_number] => 09809720 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/809720
Multi-layer, attenuated phase-shifting mask Mar 14, 2001 Issued
Array ( [id] => 6891992 [patent_doc_number] => 20010018154 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-08-30 [patent_title] => 'Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank' [patent_app_type] => new [patent_app_number] => 09/805902 [patent_app_country] => US [patent_app_date] => 2001-03-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 13792 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0018/20010018154.pdf [firstpage_image] =>[orig_patent_app_number] => 09805902 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/805902
Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank Mar 14, 2001 Issued
Array ( [id] => 6592047 [patent_doc_number] => 20020042005 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-04-11 [patent_title] => 'Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique' [patent_app_type] => new [patent_app_number] => 09/805211 [patent_app_country] => US [patent_app_date] => 2001-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3944 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 204 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20020042005.pdf [firstpage_image] =>[orig_patent_app_number] => 09805211 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/805211
Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique Mar 13, 2001 Issued
Array ( [id] => 1359205 [patent_doc_number] => 06569580 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-05-27 [patent_title] => 'Binary and phase-shift photomasks' [patent_app_type] => B2 [patent_app_number] => 09/809733 [patent_app_country] => US [patent_app_date] => 2001-03-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 20 [patent_no_of_words] => 7193 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 42 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/569/06569580.pdf [firstpage_image] =>[orig_patent_app_number] => 09809733 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/809733
Binary and phase-shift photomasks Mar 12, 2001 Issued
Array ( [id] => 671939 [patent_doc_number] => 07090947 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-08-15 [patent_title] => 'Phase shifter film and process for the same' [patent_app_type] => utility [patent_app_number] => 09/804158 [patent_app_country] => US [patent_app_date] => 2001-03-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 26 [patent_no_of_words] => 10652 [patent_no_of_claims] => 54 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/090/07090947.pdf [firstpage_image] =>[orig_patent_app_number] => 09804158 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/804158
Phase shifter film and process for the same Mar 12, 2001 Issued
Array ( [id] => 1276799 [patent_doc_number] => 06645679 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-11-11 [patent_title] => 'Attenuated phase shift mask for use in EUV lithography and a method of making such a mask' [patent_app_type] => B1 [patent_app_number] => 09/803853 [patent_app_country] => US [patent_app_date] => 2001-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 3873 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/645/06645679.pdf [firstpage_image] =>[orig_patent_app_number] => 09803853 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/803853
Attenuated phase shift mask for use in EUV lithography and a method of making such a mask Mar 11, 2001 Issued
Array ( [id] => 1409257 [patent_doc_number] => 06524755 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-02-25 [patent_title] => 'Phase-shift masks and methods of fabrication' [patent_app_type] => B2 [patent_app_number] => 09/804590 [patent_app_country] => US [patent_app_date] => 2001-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 93 [patent_no_of_words] => 8951 [patent_no_of_claims] => 53 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/524/06524755.pdf [firstpage_image] =>[orig_patent_app_number] => 09804590 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/804590
Phase-shift masks and methods of fabrication Mar 11, 2001 Issued
Array ( [id] => 6632052 [patent_doc_number] => 20030211401 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-11-13 [patent_title] => 'Alternating phase shift masking for multiple levels of masking resolution' [patent_app_type] => new [patent_app_number] => 10/240006 [patent_app_country] => US [patent_app_date] => 2002-09-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4738 [patent_no_of_claims] => 50 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 120 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0211/20030211401.pdf [firstpage_image] =>[orig_patent_app_number] => 10240006 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/240006
Alternating phase shift masking for multiple levels of masking resolution Mar 7, 2001 Issued
Array ( [id] => 1373168 [patent_doc_number] => 06558855 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-05-06 [patent_title] => 'Phase shift mask and manufacturing the same' [patent_app_type] => B2 [patent_app_number] => 09/800501 [patent_app_country] => US [patent_app_date] => 2001-03-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 24 [patent_no_of_words] => 7332 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/558/06558855.pdf [firstpage_image] =>[orig_patent_app_number] => 09800501 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/800501
Phase shift mask and manufacturing the same Mar 7, 2001 Issued
Array ( [id] => 1594627 [patent_doc_number] => 06492072 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2002-12-10 [patent_title] => 'Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass' [patent_app_type] => B2 [patent_app_number] => 09/799987 [patent_app_country] => US [patent_app_date] => 2001-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 8789 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/492/06492072.pdf [firstpage_image] =>[orig_patent_app_number] => 09799987 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/799987
Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass Mar 5, 2001 Issued
Array ( [id] => 6517459 [patent_doc_number] => 20020135875 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-09-26 [patent_title] => 'Grating test patterns and methods for overlay metrology' [patent_app_type] => new [patent_app_number] => 09/794686 [patent_app_country] => US [patent_app_date] => 2001-02-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 2983 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 32 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0135/20020135875.pdf [firstpage_image] =>[orig_patent_app_number] => 09794686 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/794686
Grating test patterns and methods for overlay metrology Feb 26, 2001 Issued
Array ( [id] => 1415567 [patent_doc_number] => 06514642 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-02-04 [patent_title] => 'Phase shift mask and method of manufacture' [patent_app_type] => B2 [patent_app_number] => 09/790886 [patent_app_country] => US [patent_app_date] => 2001-02-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 4625 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/514/06514642.pdf [firstpage_image] =>[orig_patent_app_number] => 09790886 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/790886
Phase shift mask and method of manufacture Feb 22, 2001 Issued
Array ( [id] => 5921465 [patent_doc_number] => 20020115001 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-22 [patent_title] => 'Electrostatic discharge effect free mask' [patent_app_type] => new [patent_app_number] => 09/792380 [patent_app_country] => US [patent_app_date] => 2001-02-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 1081 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 32 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0115/20020115001.pdf [firstpage_image] =>[orig_patent_app_number] => 09792380 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/792380
Electrostatic discharge effect free mask Feb 20, 2001 Abandoned
Array ( [id] => 5921464 [patent_doc_number] => 20020115000 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-08-22 [patent_title] => 'Method of extreme ultraviolet mask engineering' [patent_app_type] => new [patent_app_number] => 09/785116 [patent_app_country] => US [patent_app_date] => 2001-02-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1864 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0115/20020115000.pdf [firstpage_image] =>[orig_patent_app_number] => 09785116 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/785116
Method of extreme ultraviolet mask engineering Feb 19, 2001 Issued
Array ( [id] => 1352423 [patent_doc_number] => 06576378 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-06-10 [patent_title] => 'Photomask and exposure method for large scaled LCD device' [patent_app_type] => B2 [patent_app_number] => 09/784092 [patent_app_country] => US [patent_app_date] => 2001-02-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 12 [patent_no_of_words] => 3429 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/576/06576378.pdf [firstpage_image] =>[orig_patent_app_number] => 09784092 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/784092
Photomask and exposure method for large scaled LCD device Feb 15, 2001 Issued
Array ( [id] => 1352403 [patent_doc_number] => 06576377 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-06-10 [patent_title] => 'Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method' [patent_app_type] => B2 [patent_app_number] => 09/783973 [patent_app_country] => US [patent_app_date] => 2001-02-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 16 [patent_no_of_words] => 6468 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 201 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/576/06576377.pdf [firstpage_image] =>[orig_patent_app_number] => 09783973 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/783973
Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method Feb 15, 2001 Issued
Array ( [id] => 6886532 [patent_doc_number] => 20010019801 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-09-06 [patent_title] => 'Photomask blank, photomask and method of manufacture' [patent_app_type] => new [patent_app_number] => 09/783322 [patent_app_country] => US [patent_app_date] => 2001-02-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3659 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0019/20010019801.pdf [firstpage_image] =>[orig_patent_app_number] => 09783322 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/783322
Photomask blank, photomask and method of manufacture Feb 14, 2001 Issued
Array ( [id] => 6947856 [patent_doc_number] => 20010021490 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-09-13 [patent_title] => 'Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same' [patent_app_type] => new [patent_app_number] => 09/783064 [patent_app_country] => US [patent_app_date] => 2001-02-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3240 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0021/20010021490.pdf [firstpage_image] =>[orig_patent_app_number] => 09783064 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/783064
Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same Feb 13, 2001 Issued
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