
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6896237
[patent_doc_number] => 20010027027
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-10-04
[patent_title] => 'Ferroelectric random access memory device and method for manufacture thereof'
[patent_app_type] => new
[patent_app_number] => 09/740926
[patent_app_country] => US
[patent_app_date] => 2000-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 1558
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0027/20010027027.pdf
[firstpage_image] =>[orig_patent_app_number] => 09740926
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/740926 | Method for manufacturing phase shift mask | Dec 20, 2000 | Issued |
Array
(
[id] => 1296457
[patent_doc_number] => 06627355
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-09-30
[patent_title] => 'Method of and system for improving stability of photomasks'
[patent_app_type] => B2
[patent_app_number] => 09/742970
[patent_app_country] => US
[patent_app_date] => 2000-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 3280
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/627/06627355.pdf
[firstpage_image] =>[orig_patent_app_number] => 09742970
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/742970 | Method of and system for improving stability of photomasks | Dec 19, 2000 | Issued |
Array
(
[id] => 1269339
[patent_doc_number] => 06653026
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-11-25
[patent_title] => 'Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask'
[patent_app_type] => B2
[patent_app_number] => 09/746369
[patent_app_country] => US
[patent_app_date] => 2000-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 5544
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/653/06653026.pdf
[firstpage_image] =>[orig_patent_app_number] => 09746369
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/746369 | Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask | Dec 19, 2000 | Issued |
Array
(
[id] => 1466514
[patent_doc_number] => 06458496
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-10-01
[patent_title] => 'Blank for halftone phase shift photomask and halftone phase shift photomask'
[patent_app_type] => B2
[patent_app_number] => 09/736805
[patent_app_country] => US
[patent_app_date] => 2000-12-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 32
[patent_no_of_words] => 11836
[patent_no_of_claims] => 34
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/458/06458496.pdf
[firstpage_image] =>[orig_patent_app_number] => 09736805
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/736805 | Blank for halftone phase shift photomask and halftone phase shift photomask | Dec 13, 2000 | Issued |
Array
(
[id] => 7118383
[patent_doc_number] => 20010001693
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-05-24
[patent_title] => 'Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light'
[patent_app_type] => new-utility
[patent_app_number] => 09/732816
[patent_app_country] => US
[patent_app_date] => 2000-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_no_of_words] => 1703
[patent_no_of_claims] => 24
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0001/20010001693.pdf
[firstpage_image] =>[orig_patent_app_number] => 09732816
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/732816 | Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light | Dec 7, 2000 | Issued |
Array
(
[id] => 1559132
[patent_doc_number] => 06436589
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Reticle having an interleave kerf'
[patent_app_type] => B1
[patent_app_number] => 09/731801
[patent_app_country] => US
[patent_app_date] => 2000-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 2241
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/436/06436589.pdf
[firstpage_image] =>[orig_patent_app_number] => 09731801
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/731801 | Reticle having an interleave kerf | Dec 7, 2000 | Issued |
Array
(
[id] => 6875121
[patent_doc_number] => 20010000240
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-04-12
[patent_title] => 'Phase shifting circuit manufacture method and apparatus'
[patent_app_type] => new-utility
[patent_app_number] => 09/732407
[patent_app_country] => US
[patent_app_date] => 2000-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 5751
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0000/20010000240.pdf
[firstpage_image] =>[orig_patent_app_number] => 09732407
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/732407 | Phase shifting circuit manufacture method and apparatus | Dec 6, 2000 | Issued |
Array
(
[id] => 1588167
[patent_doc_number] => 06482554
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-11-19
[patent_title] => 'Method for manufacturing a semiconductor device, photolithography mask and method for manufacturing the same'
[patent_app_type] => B2
[patent_app_number] => 09/730604
[patent_app_country] => US
[patent_app_date] => 2000-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 52
[patent_no_of_words] => 7820
[patent_no_of_claims] => 9
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/482/06482554.pdf
[firstpage_image] =>[orig_patent_app_number] => 09730604
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/730604 | Method for manufacturing a semiconductor device, photolithography mask and method for manufacturing the same | Dec 6, 2000 | Issued |
Array
(
[id] => 6015455
[patent_doc_number] => 20020102468
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-08-01
[patent_title] => 'Method of forming an improved attenuated phase-shifting photomask'
[patent_app_type] => new
[patent_app_number] => 09/729155
[patent_app_country] => US
[patent_app_date] => 2000-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 3553
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[pdf_file] => publications/A1/0102/20020102468.pdf
[firstpage_image] =>[orig_patent_app_number] => 09729155
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/729155 | Method of forming an improved attenuated phase-shifting photomask | Dec 3, 2000 | Issued |
Array
(
[id] => 5828139
[patent_doc_number] => 20020068227
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-06
[patent_title] => 'Method and apparatus for making an integrated circuit using polarization properties of light'
[patent_app_type] => new
[patent_app_number] => 09/727666
[patent_app_country] => US
[patent_app_date] => 2000-12-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 5348
[patent_no_of_claims] => 54
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[pdf_file] => publications/A1/0068/20020068227.pdf
[firstpage_image] =>[orig_patent_app_number] => 09727666
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/727666 | Method and apparatus for making an integrated circuit using polarization properties of light | Nov 30, 2000 | Issued |
Array
(
[id] => 6614925
[patent_doc_number] => 20020064713
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-05-30
[patent_title] => 'Strong phase shift mask substrates'
[patent_app_type] => new
[patent_app_number] => 09/725380
[patent_app_country] => US
[patent_app_date] => 2000-11-29
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 4885
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[pdf_file] => publications/A1/0064/20020064713.pdf
[firstpage_image] =>[orig_patent_app_number] => 09725380
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/725380 | Strong phase shift mask substrates | Nov 28, 2000 | Abandoned |
Array
(
[id] => 1559130
[patent_doc_number] => 06436588
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Method and system for varying the transmission of an attenuated phase shift mask'
[patent_app_type] => B1
[patent_app_number] => 09/711120
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[pdf_file] => patents/06/436/06436588.pdf
[firstpage_image] =>[orig_patent_app_number] => 09711120
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/711120 | Method and system for varying the transmission of an attenuated phase shift mask | Nov 8, 2000 | Issued |
Array
(
[id] => 1477305
[patent_doc_number] => 06451490
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-17
[patent_title] => 'Method to overcome image shortening by use of sub-resolution reticle features'
[patent_app_type] => B1
[patent_app_number] => 09/709091
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[patent_app_date] => 2000-11-08
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[firstpage_image] =>[orig_patent_app_number] => 09709091
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/709091 | Method to overcome image shortening by use of sub-resolution reticle features | Nov 7, 2000 | Issued |
Array
(
[id] => 1406472
[patent_doc_number] => 06528215
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-03-04
[patent_title] => 'Substrate for diamond stencil mask and method for forming'
[patent_app_type] => B1
[patent_app_number] => 09/707356
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[patent_app_date] => 2000-11-07
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[firstpage_image] =>[orig_patent_app_number] => 09707356
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/707356 | Substrate for diamond stencil mask and method for forming | Nov 6, 2000 | Issued |
Array
(
[id] => 1414828
[patent_doc_number] => 06509124
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-21
[patent_title] => 'Method of producing diamond film for lithography'
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[patent_app_number] => 09/705709
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 09705709
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/705709 | Method of producing diamond film for lithography | Nov 5, 2000 | Issued |
Array
(
[id] => 1359172
[patent_doc_number] => 06569577
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-27
[patent_title] => 'Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devices'
[patent_app_type] => B1
[patent_app_number] => 09/704697
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 09704697
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/704697 | Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devices | Nov 2, 2000 | Issued |
| 09/704964 | PHASE TRANSITION DESIGN TO MAINTAIN CONSTANT LINE LENGTH THROUGH FOCUS | Nov 1, 2000 | Abandoned |
Array
(
[id] => 1473764
[patent_doc_number] => 06387574
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[patent_issue_date] => 2002-05-14
[patent_title] => 'Substrate for transfer mask and method for manufacturing transfer mask by use of substrate'
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[patent_app_number] => 09/705020
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Array
(
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[patent_title] => 'Method for fabricating mask'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/697424 | Method for fabricating mask | Oct 26, 2000 | Issued |
Array
(
[id] => 7636806
[patent_doc_number] => 06379849
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[patent_issue_date] => 2002-04-30
[patent_title] => 'Method for forming binary intensity masks'
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[patent_app_number] => 09/696081
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[firstpage_image] =>[orig_patent_app_number] => 09696081
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/696081 | Method for forming binary intensity masks | Oct 25, 2000 | Issued |