
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1511807
[patent_doc_number] => 06472108
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-29
[patent_title] => 'Optical proximity correction method'
[patent_app_type] => B1
[patent_app_number] => 09/686433
[patent_app_country] => US
[patent_app_date] => 2000-10-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2256
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/472/06472108.pdf
[firstpage_image] =>[orig_patent_app_number] => 09686433
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/686433 | Optical proximity correction method | Oct 9, 2000 | Issued |
Array
(
[id] => 1506646
[patent_doc_number] => 06440617
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Photomask structure'
[patent_app_type] => B1
[patent_app_number] => 09/680781
[patent_app_country] => US
[patent_app_date] => 2000-10-06
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/440/06440617.pdf
[firstpage_image] =>[orig_patent_app_number] => 09680781
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/680781 | Photomask structure | Oct 5, 2000 | Issued |
Array
(
[id] => 1458502
[patent_doc_number] => 06391500
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-05-21
[patent_title] => 'Photomask for obtaining a graded pattern profile on a photoresist'
[patent_app_type] => B1
[patent_app_number] => 09/684062
[patent_app_country] => US
[patent_app_date] => 2000-10-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/06/391/06391500.pdf
[firstpage_image] =>[orig_patent_app_number] => 09684062
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/684062 | Photomask for obtaining a graded pattern profile on a photoresist | Oct 5, 2000 | Issued |
Array
(
[id] => 1499710
[patent_doc_number] => 06485871
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-11-26
[patent_title] => 'Method of producing phase masks in an automated layout generation for integrated circuits'
[patent_app_type] => B1
[patent_app_number] => 09/677546
[patent_app_country] => US
[patent_app_date] => 2000-10-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 1468
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/485/06485871.pdf
[firstpage_image] =>[orig_patent_app_number] => 09677546
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/677546 | Method of producing phase masks in an automated layout generation for integrated circuits | Oct 1, 2000 | Issued |
Array
(
[id] => 1489753
[patent_doc_number] => 06416936
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-09
[patent_title] => 'Top surface imaging technique for top pole tip width control in magnetoresistive read/write head processing'
[patent_app_type] => B1
[patent_app_number] => 09/672533
[patent_app_country] => US
[patent_app_date] => 2000-09-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/416/06416936.pdf
[firstpage_image] =>[orig_patent_app_number] => 09672533
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/672533 | Top surface imaging technique for top pole tip width control in magnetoresistive read/write head processing | Sep 27, 2000 | Issued |
Array
(
[id] => 1506645
[patent_doc_number] => 06440616
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Mask and method for focus monitoring'
[patent_app_type] => B1
[patent_app_number] => 09/671501
[patent_app_country] => US
[patent_app_date] => 2000-09-27
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[pdf_file] => patents/06/440/06440616.pdf
[firstpage_image] =>[orig_patent_app_number] => 09671501
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/671501 | Mask and method for focus monitoring | Sep 26, 2000 | Issued |
Array
(
[id] => 1095409
[patent_doc_number] => 06821682
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-11-23
[patent_title] => 'Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography'
[patent_app_type] => B1
[patent_app_number] => 09/669390
[patent_app_country] => US
[patent_app_date] => 2000-09-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/06/821/06821682.pdf
[firstpage_image] =>[orig_patent_app_number] => 09669390
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/669390 | Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography | Sep 25, 2000 | Issued |
Array
(
[id] => 1409210
[patent_doc_number] => 06524752
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-25
[patent_title] => 'Phase shift masking for intersecting lines'
[patent_app_type] => B1
[patent_app_number] => 09/669368
[patent_app_country] => US
[patent_app_date] => 2000-09-26
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/524/06524752.pdf
[firstpage_image] =>[orig_patent_app_number] => 09669368
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/669368 | Phase shift masking for intersecting lines | Sep 25, 2000 | Issued |
Array
(
[id] => 1422646
[patent_doc_number] => 06503666
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-07
[patent_title] => 'Phase shift masking for complex patterns'
[patent_app_type] => B1
[patent_app_number] => 09/669359
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/669359 | Phase shift masking for complex patterns | Sep 25, 2000 | Issued |
Array
(
[id] => 1390424
[patent_doc_number] => 06541165
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-01
[patent_title] => 'Phase shift mask sub-resolution assist features'
[patent_app_type] => B1
[patent_app_number] => 09/669367
[patent_app_country] => US
[patent_app_date] => 2000-09-26
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/541/06541165.pdf
[firstpage_image] =>[orig_patent_app_number] => 09669367
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/669367 | Phase shift mask sub-resolution assist features | Sep 25, 2000 | Issued |
Array
(
[id] => 1413708
[patent_doc_number] => 06511777
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-01-28
[patent_title] => 'Method for manufacturing a phase shift photomask'
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[pdf_file] => patents/06/511/06511777.pdf
[firstpage_image] =>[orig_patent_app_number] => 09666933
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/666933 | Method for manufacturing a phase shift photomask | Sep 20, 2000 | Issued |
Array
(
[id] => 1499708
[patent_doc_number] => 06485870
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[patent_kind] => B1
[patent_issue_date] => 2002-11-26
[patent_title] => 'Charged-particle-beam microlithography masks and methods for manufacturing same'
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[patent_app_number] => 09/666730
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/666730 | Charged-particle-beam microlithography masks and methods for manufacturing same | Sep 19, 2000 | Issued |
Array
(
[id] => 1477301
[patent_doc_number] => 06451489
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[patent_issue_date] => 2002-09-17
[patent_title] => 'Phase shift photomask'
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[firstpage_image] =>[orig_patent_app_number] => 09666907
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Array
(
[id] => 1449406
[patent_doc_number] => 06455204
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[patent_title] => 'X-ray mask and method of fabricating the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/664746 | X-ray mask and method of fabricating the same | Sep 18, 2000 | Issued |
Array
(
[id] => 1559128
[patent_doc_number] => 06436587
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[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Method of making a multi-level reticle using bi-level photoresist, including a phase-shifted multi-level reticle'
[patent_app_type] => B1
[patent_app_number] => 09/665236
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Array
(
[id] => 1527746
[patent_doc_number] => 06479195
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[patent_title] => 'Mask absorber for extreme ultraviolet lithography'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/662055 | Mask absorber for extreme ultraviolet lithography | Sep 14, 2000 | Issued |
Array
(
[id] => 1112571
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Array
(
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Array
(
[id] => 4341156
[patent_doc_number] => 06284417
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[patent_kind] => NA
[patent_issue_date] => 2001-09-04
[patent_title] => 'Reticle cleaning without damaging pellicle'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/651392 | Reticle cleaning without damaging pellicle | Aug 28, 2000 | Issued |
| 09/639381 | Scan butting error reduction in a raster scan pattern generation system | Aug 13, 2000 | Abandoned |