Search

Hung Nhat Ngo

Examiner (ID: 2310)

Most Active Art Unit
2501
Art Unit(s)
2874, 3621, 2501, 2633
Total Applications
1627
Issued Applications
1441
Pending Applications
92
Abandoned Applications
94

Applications

Application numberTitle of the applicationFiling DateStatus
09/592653 Optical proximity correction method utilizing serifs having variable dimensions Jun 12, 2000 Abandoned
Array ( [id] => 7640478 [patent_doc_number] => 06395434 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-28 [patent_title] => 'Phase shift mask and phase shift mask blank' [patent_app_type] => B1 [patent_app_number] => 09/591120 [patent_app_country] => US [patent_app_date] => 2000-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 13132 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/395/06395434.pdf [firstpage_image] =>[orig_patent_app_number] => 09591120 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/591120
Phase shift mask and phase shift mask blank Jun 8, 2000 Issued
Array ( [id] => 1523412 [patent_doc_number] => 06352803 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-05 [patent_title] => 'Coatings on reflective mask substrates' [patent_app_type] => B1 [patent_app_number] => 09/587836 [patent_app_country] => US [patent_app_date] => 2000-06-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 3120 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 47 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/352/06352803.pdf [firstpage_image] =>[orig_patent_app_number] => 09587836 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/587836
Coatings on reflective mask substrates Jun 5, 2000 Issued
Array ( [id] => 1541862 [patent_doc_number] => 06372390 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-16 [patent_title] => 'Photo mask with an ESD protective function' [patent_app_type] => B1 [patent_app_number] => 09/584698 [patent_app_country] => US [patent_app_date] => 2000-06-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2059 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/372/06372390.pdf [firstpage_image] =>[orig_patent_app_number] => 09584698 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/584698
Photo mask with an ESD protective function May 31, 2000 Issued
Array ( [id] => 1580570 [patent_doc_number] => 06423455 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-23 [patent_title] => 'Method for fabricating a multiple masking layer photomask' [patent_app_type] => B1 [patent_app_number] => 09/585189 [patent_app_country] => US [patent_app_date] => 2000-06-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 5693 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 234 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/423/06423455.pdf [firstpage_image] =>[orig_patent_app_number] => 09585189 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/585189
Method for fabricating a multiple masking layer photomask May 31, 2000 Issued
Array ( [id] => 1514136 [patent_doc_number] => 06420073 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-16 [patent_title] => 'Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask' [patent_app_type] => B1 [patent_app_number] => 09/584095 [patent_app_country] => US [patent_app_date] => 2000-05-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 4885 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/420/06420073.pdf [firstpage_image] =>[orig_patent_app_number] => 09584095 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/584095
Fabricating optical elements using a photoresist formed from proximity printing of a gray level mask May 30, 2000 Issued
Array ( [id] => 1523411 [patent_doc_number] => 06352802 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-05 [patent_title] => 'Mask for electron beam exposure and method of manufacturing semiconductor device using the same' [patent_app_type] => B1 [patent_app_number] => 09/578476 [patent_app_country] => US [patent_app_date] => 2000-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 10 [patent_no_of_words] => 8571 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/352/06352802.pdf [firstpage_image] =>[orig_patent_app_number] => 09578476 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/578476
Mask for electron beam exposure and method of manufacturing semiconductor device using the same May 25, 2000 Issued
Array ( [id] => 4334739 [patent_doc_number] => 06333130 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-25 [patent_title] => 'Method and apparatus for correcting defects in photomask' [patent_app_type] => 1 [patent_app_number] => 9/577348 [patent_app_country] => US [patent_app_date] => 2000-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 3338 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/333/06333130.pdf [firstpage_image] =>[orig_patent_app_number] => 577348 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/577348
Method and apparatus for correcting defects in photomask May 23, 2000 Issued
Array ( [id] => 4256481 [patent_doc_number] => 06258513 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-10 [patent_title] => 'Photomask and pattern forming method employing the same' [patent_app_type] => 1 [patent_app_number] => 9/577367 [patent_app_country] => US [patent_app_date] => 2000-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 13 [patent_no_of_words] => 4020 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/258/06258513.pdf [firstpage_image] =>[orig_patent_app_number] => 577367 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/577367
Photomask and pattern forming method employing the same May 22, 2000 Issued
Array ( [id] => 1520356 [patent_doc_number] => 06413682 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-02 [patent_title] => 'Synthetic quartz glass substrate for photomask and making method' [patent_app_type] => B1 [patent_app_number] => 09/576006 [patent_app_country] => US [patent_app_date] => 2000-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 3650 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/413/06413682.pdf [firstpage_image] =>[orig_patent_app_number] => 09576006 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/576006
Synthetic quartz glass substrate for photomask and making method May 21, 2000 Issued
Array ( [id] => 1523409 [patent_doc_number] => 06352801 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-05 [patent_title] => 'Phase shift mask and making process' [patent_app_type] => B1 [patent_app_number] => 09/573560 [patent_app_country] => US [patent_app_date] => 2000-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 3169 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 36 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/352/06352801.pdf [firstpage_image] =>[orig_patent_app_number] => 09573560 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/573560
Phase shift mask and making process May 18, 2000 Issued
Array ( [id] => 1435742 [patent_doc_number] => 06355385 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-12 [patent_title] => 'Methods for making reticle blanks, and for making reticles therefrom, for charged-particle-beam microlithography' [patent_app_type] => B1 [patent_app_number] => 09/574279 [patent_app_country] => US [patent_app_date] => 2000-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 31 [patent_no_of_words] => 4014 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/355/06355385.pdf [firstpage_image] =>[orig_patent_app_number] => 09574279 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/574279
Methods for making reticle blanks, and for making reticles therefrom, for charged-particle-beam microlithography May 18, 2000 Issued
Array ( [id] => 1577358 [patent_doc_number] => 06447959 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-10 [patent_title] => 'Amplitude mask for writing long-period gratings' [patent_app_type] => B1 [patent_app_number] => 09/572520 [patent_app_country] => US [patent_app_date] => 2000-05-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 13 [patent_no_of_words] => 4336 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/447/06447959.pdf [firstpage_image] =>[orig_patent_app_number] => 09572520 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/572520
Amplitude mask for writing long-period gratings May 16, 2000 Issued
Array ( [id] => 1487342 [patent_doc_number] => 06428937 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-06 [patent_title] => 'Methods for fabricating reticle blanks for use in making charged-particle-beam microlithography reticles, and reticle blanks and reticles formed using such methods' [patent_app_type] => B1 [patent_app_number] => 09/572723 [patent_app_country] => US [patent_app_date] => 2000-05-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 18 [patent_no_of_words] => 3275 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 172 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/428/06428937.pdf [firstpage_image] =>[orig_patent_app_number] => 09572723 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/572723
Methods for fabricating reticle blanks for use in making charged-particle-beam microlithography reticles, and reticle blanks and reticles formed using such methods May 15, 2000 Issued
Array ( [id] => 1564601 [patent_doc_number] => 06338923 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-15 [patent_title] => 'Photolithography mask having monitoring marks and manufacturing method thereof' [patent_app_type] => B1 [patent_app_number] => 09/568536 [patent_app_country] => US [patent_app_date] => 2000-05-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 14 [patent_no_of_words] => 7208 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/338/06338923.pdf [firstpage_image] =>[orig_patent_app_number] => 09568536 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/568536
Photolithography mask having monitoring marks and manufacturing method thereof May 10, 2000 Issued
Array ( [id] => 1564596 [patent_doc_number] => 06338922 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-15 [patent_title] => 'Optimized alternating phase shifted mask design' [patent_app_type] => B1 [patent_app_number] => 09/566885 [patent_app_country] => US [patent_app_date] => 2000-05-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 3916 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/338/06338922.pdf [firstpage_image] =>[orig_patent_app_number] => 09566885 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/566885
Optimized alternating phase shifted mask design May 7, 2000 Issued
Array ( [id] => 1305523 [patent_doc_number] => 06617080 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-09-09 [patent_title] => 'Photomask, semiconductor device, and method for exposing through photomask' [patent_app_type] => B1 [patent_app_number] => 09/563953 [patent_app_country] => US [patent_app_date] => 2000-05-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 20 [patent_no_of_words] => 6542 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/617/06617080.pdf [firstpage_image] =>[orig_patent_app_number] => 09563953 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/563953
Photomask, semiconductor device, and method for exposing through photomask May 1, 2000 Issued
Array ( [id] => 1440747 [patent_doc_number] => 06335130 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-01 [patent_title] => 'System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features' [patent_app_type] => B1 [patent_app_number] => 09/562445 [patent_app_country] => US [patent_app_date] => 2000-05-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 33 [patent_figures_cnt] => 75 [patent_no_of_words] => 10730 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/335/06335130.pdf [firstpage_image] =>[orig_patent_app_number] => 09562445 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/562445
System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features Apr 30, 2000 Issued
09/562443 Hybrid phase shift mask providing improved optical proximity correction capabilities and a method of forming the same Apr 30, 2000 Abandoned
Array ( [id] => 4355174 [patent_doc_number] => 06190836 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-20 [patent_title] => 'Methods for repair of photomasks' [patent_app_type] => 1 [patent_app_number] => 9/561560 [patent_app_country] => US [patent_app_date] => 2000-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 26 [patent_no_of_words] => 6445 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 168 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/190/06190836.pdf [firstpage_image] =>[orig_patent_app_number] => 561560 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/561560
Methods for repair of photomasks Apr 27, 2000 Issued
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