
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1564780
[patent_doc_number] => 06376132
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-23
[patent_title] => 'Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/560336
[patent_app_country] => US
[patent_app_date] => 2000-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 15
[patent_no_of_words] => 4156
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/376/06376132.pdf
[firstpage_image] =>[orig_patent_app_number] => 09560336
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/560336 | Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device | Apr 27, 2000 | Issued |
Array
(
[id] => 1489659
[patent_doc_number] => 06416907
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-09
[patent_title] => 'Method for designing photolithographic reticle layout, reticle, and photolithographic process'
[patent_app_type] => B1
[patent_app_number] => 09/559262
[patent_app_country] => US
[patent_app_date] => 2000-04-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 24
[patent_figures_cnt] => 28
[patent_no_of_words] => 11706
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 112
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/416/06416907.pdf
[firstpage_image] =>[orig_patent_app_number] => 09559262
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/559262 | Method for designing photolithographic reticle layout, reticle, and photolithographic process | Apr 26, 2000 | Issued |
Array
(
[id] => 4326802
[patent_doc_number] => 06312857
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-06
[patent_title] => 'Photomask material and method of processing thereof'
[patent_app_type] => 1
[patent_app_number] => 9/559254
[patent_app_country] => US
[patent_app_date] => 2000-04-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17455
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 85
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/312/06312857.pdf
[firstpage_image] =>[orig_patent_app_number] => 559254
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/559254 | Photomask material and method of processing thereof | Apr 26, 2000 | Issued |
Array
(
[id] => 1433253
[patent_doc_number] => 06340543
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-22
[patent_title] => 'Photomask, manufacturing method thereof, and semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/557326
[patent_app_country] => US
[patent_app_date] => 2000-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 35
[patent_no_of_words] => 15968
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 54
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/340/06340543.pdf
[firstpage_image] =>[orig_patent_app_number] => 09557326
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/557326 | Photomask, manufacturing method thereof, and semiconductor device | Apr 24, 2000 | Issued |
Array
(
[id] => 1484460
[patent_doc_number] => 06365303
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-02
[patent_title] => 'Electrostatic discharge damage prevention method on masks'
[patent_app_type] => B1
[patent_app_number] => 09/557397
[patent_app_country] => US
[patent_app_date] => 2000-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 13
[patent_no_of_words] => 2567
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 150
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/365/06365303.pdf
[firstpage_image] =>[orig_patent_app_number] => 09557397
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/557397 | Electrostatic discharge damage prevention method on masks | Apr 23, 2000 | Issued |
Array
(
[id] => 4082043
[patent_doc_number] => 06162568
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-19
[patent_title] => 'Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light'
[patent_app_type] => 1
[patent_app_number] => 9/550765
[patent_app_country] => US
[patent_app_date] => 2000-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 1676
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/162/06162568.pdf
[firstpage_image] =>[orig_patent_app_number] => 550765
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/550765 | Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light | Apr 16, 2000 | Issued |
Array
(
[id] => 1553047
[patent_doc_number] => 06348288
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-02-19
[patent_title] => 'Resolution enhancement method for deep quarter micron technology'
[patent_app_type] => B1
[patent_app_number] => 09/550266
[patent_app_country] => US
[patent_app_date] => 2000-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 13
[patent_no_of_words] => 1500
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/348/06348288.pdf
[firstpage_image] =>[orig_patent_app_number] => 09550266
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/550266 | Resolution enhancement method for deep quarter micron technology | Apr 16, 2000 | Issued |
Array
(
[id] => 1523408
[patent_doc_number] => 06352800
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-05
[patent_title] => 'Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device'
[patent_app_type] => B1
[patent_app_number] => 09/549931
[patent_app_country] => US
[patent_app_date] => 2000-04-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 10
[patent_no_of_words] => 3930
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/352/06352800.pdf
[firstpage_image] =>[orig_patent_app_number] => 09549931
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/549931 | Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device | Apr 13, 2000 | Issued |
Array
(
[id] => 1449402
[patent_doc_number] => 06455203
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-24
[patent_title] => 'Mask structure and method of manufacturing the same'
[patent_app_type] => B1
[patent_app_number] => 09/545464
[patent_app_country] => US
[patent_app_date] => 2000-04-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 31
[patent_no_of_words] => 6856
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/455/06455203.pdf
[firstpage_image] =>[orig_patent_app_number] => 09545464
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/545464 | Mask structure and method of manufacturing the same | Apr 6, 2000 | Issued |
Array
(
[id] => 1383818
[patent_doc_number] => RE037996
[patent_country] => US
[patent_kind] => E1
[patent_issue_date] => 2003-02-18
[patent_title] => 'Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor'
[patent_app_type] => E1
[patent_app_number] => 09/544634
[patent_app_country] => US
[patent_app_date] => 2000-04-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 47
[patent_figures_cnt] => 90
[patent_no_of_words] => 14105
[patent_no_of_claims] => 34
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/RE/037/RE037996.pdf
[firstpage_image] =>[orig_patent_app_number] => 09544634
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/544634 | Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor | Apr 5, 2000 | Issued |
Array
(
[id] => 1564779
[patent_doc_number] => 06376131
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-23
[patent_title] => 'Methods and structures for protecting reticles from ESD failure'
[patent_app_type] => B1
[patent_app_number] => 09/542127
[patent_app_country] => US
[patent_app_date] => 2000-04-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 12
[patent_no_of_words] => 4625
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/376/06376131.pdf
[firstpage_image] =>[orig_patent_app_number] => 09542127
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/542127 | Methods and structures for protecting reticles from ESD failure | Apr 3, 2000 | Issued |
Array
(
[id] => 1494172
[patent_doc_number] => 06403268
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-11
[patent_title] => 'Reticles for charged-particle beam microlithography'
[patent_app_type] => B1
[patent_app_number] => 09/542026
[patent_app_country] => US
[patent_app_date] => 2000-04-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 2984
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 99
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/403/06403268.pdf
[firstpage_image] =>[orig_patent_app_number] => 09542026
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/542026 | Reticles for charged-particle beam microlithography | Apr 2, 2000 | Issued |
Array
(
[id] => 4356128
[patent_doc_number] => 06255024
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-03
[patent_title] => 'Use of attenuating phase-shifting mask for improved printability of clear-field patterns'
[patent_app_type] => 1
[patent_app_number] => 9/539084
[patent_app_country] => US
[patent_app_date] => 2000-03-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 14
[patent_no_of_words] => 3743
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 56
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/255/06255024.pdf
[firstpage_image] =>[orig_patent_app_number] => 539084
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/539084 | Use of attenuating phase-shifting mask for improved printability of clear-field patterns | Mar 29, 2000 | Issued |
Array
(
[id] => 5828138
[patent_doc_number] => 20020068226
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-06-06
[patent_title] => 'Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof'
[patent_app_type] => new
[patent_app_number] => 09/538064
[patent_app_country] => US
[patent_app_date] => 2000-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 1803
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0068/20020068226.pdf
[firstpage_image] =>[orig_patent_app_number] => 09538064
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/538064 | Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof | Mar 28, 2000 | Abandoned |
Array
(
[id] => 4284013
[patent_doc_number] => 06268091
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-31
[patent_title] => 'Subresolution grating for attenuated phase shifting mask fabrication'
[patent_app_type] => 1
[patent_app_number] => 9/536947
[patent_app_country] => US
[patent_app_date] => 2000-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 1889
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 28
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/268/06268091.pdf
[firstpage_image] =>[orig_patent_app_number] => 536947
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/536947 | Subresolution grating for attenuated phase shifting mask fabrication | Mar 27, 2000 | Issued |
Array
(
[id] => 4244079
[patent_doc_number] => 06221540
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-24
[patent_title] => 'Photomask and projection exposure apparatus'
[patent_app_type] => 1
[patent_app_number] => 9/527036
[patent_app_country] => US
[patent_app_date] => 2000-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 33
[patent_no_of_words] => 10907
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/221/06221540.pdf
[firstpage_image] =>[orig_patent_app_number] => 527036
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/527036 | Photomask and projection exposure apparatus | Mar 15, 2000 | Issued |
Array
(
[id] => 4374469
[patent_doc_number] => 06303253
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-16
[patent_title] => 'Hierarchy and domain-balancing method and algorithm for serif mask design in microlithography'
[patent_app_type] => 1
[patent_app_number] => 9/526856
[patent_app_country] => US
[patent_app_date] => 2000-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 29
[patent_figures_cnt] => 55
[patent_no_of_words] => 13588
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 105
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/303/06303253.pdf
[firstpage_image] =>[orig_patent_app_number] => 526856
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/526856 | Hierarchy and domain-balancing method and algorithm for serif mask design in microlithography | Mar 15, 2000 | Issued |
Array
(
[id] => 4322414
[patent_doc_number] => 06329107
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-11
[patent_title] => 'Method of characterizing partial coherent light illumination and its application to serif mask design'
[patent_app_type] => 1
[patent_app_number] => 9/526424
[patent_app_country] => US
[patent_app_date] => 2000-03-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 16
[patent_no_of_words] => 5977
[patent_no_of_claims] => 43
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/329/06329107.pdf
[firstpage_image] =>[orig_patent_app_number] => 526424
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/526424 | Method of characterizing partial coherent light illumination and its application to serif mask design | Mar 14, 2000 | Issued |
Array
(
[id] => 1440745
[patent_doc_number] => 06335129
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-01
[patent_title] => 'Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo mask'
[patent_app_type] => B1
[patent_app_number] => 09/524963
[patent_app_country] => US
[patent_app_date] => 2000-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 41
[patent_no_of_words] => 11362
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 105
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/335/06335129.pdf
[firstpage_image] =>[orig_patent_app_number] => 09524963
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/524963 | Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo mask | Mar 13, 2000 | Issued |
Array
(
[id] => 1435741
[patent_doc_number] => 06355384
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-12
[patent_title] => 'Mask, its method of formation, and a semiconductor device made thereby'
[patent_app_type] => B1
[patent_app_number] => 09/519739
[patent_app_country] => US
[patent_app_date] => 2000-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 11
[patent_no_of_words] => 4318
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 66
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/355/06355384.pdf
[firstpage_image] =>[orig_patent_app_number] => 09519739
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/519739 | Mask, its method of formation, and a semiconductor device made thereby | Mar 5, 2000 | Issued |