Search

Hung Nhat Ngo

Examiner (ID: 2310)

Most Active Art Unit
2501
Art Unit(s)
2874, 3621, 2501, 2633
Total Applications
1627
Issued Applications
1441
Pending Applications
92
Abandoned Applications
94

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1564780 [patent_doc_number] => 06376132 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/560336 [patent_app_country] => US [patent_app_date] => 2000-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 15 [patent_no_of_words] => 4156 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376132.pdf [firstpage_image] =>[orig_patent_app_number] => 09560336 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/560336
Mask for electron beam exposure, manufacturing method for the same, and manufacturing method for semiconductor device Apr 27, 2000 Issued
Array ( [id] => 1489659 [patent_doc_number] => 06416907 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-09 [patent_title] => 'Method for designing photolithographic reticle layout, reticle, and photolithographic process' [patent_app_type] => B1 [patent_app_number] => 09/559262 [patent_app_country] => US [patent_app_date] => 2000-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 28 [patent_no_of_words] => 11706 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/416/06416907.pdf [firstpage_image] =>[orig_patent_app_number] => 09559262 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/559262
Method for designing photolithographic reticle layout, reticle, and photolithographic process Apr 26, 2000 Issued
Array ( [id] => 4326802 [patent_doc_number] => 06312857 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Photomask material and method of processing thereof' [patent_app_type] => 1 [patent_app_number] => 9/559254 [patent_app_country] => US [patent_app_date] => 2000-04-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17455 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/312/06312857.pdf [firstpage_image] =>[orig_patent_app_number] => 559254 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/559254
Photomask material and method of processing thereof Apr 26, 2000 Issued
Array ( [id] => 1433253 [patent_doc_number] => 06340543 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-22 [patent_title] => 'Photomask, manufacturing method thereof, and semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/557326 [patent_app_country] => US [patent_app_date] => 2000-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 23 [patent_figures_cnt] => 35 [patent_no_of_words] => 15968 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/340/06340543.pdf [firstpage_image] =>[orig_patent_app_number] => 09557326 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/557326
Photomask, manufacturing method thereof, and semiconductor device Apr 24, 2000 Issued
Array ( [id] => 1484460 [patent_doc_number] => 06365303 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-02 [patent_title] => 'Electrostatic discharge damage prevention method on masks' [patent_app_type] => B1 [patent_app_number] => 09/557397 [patent_app_country] => US [patent_app_date] => 2000-04-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 13 [patent_no_of_words] => 2567 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/365/06365303.pdf [firstpage_image] =>[orig_patent_app_number] => 09557397 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/557397
Electrostatic discharge damage prevention method on masks Apr 23, 2000 Issued
Array ( [id] => 4082043 [patent_doc_number] => 06162568 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-19 [patent_title] => 'Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light' [patent_app_type] => 1 [patent_app_number] => 9/550765 [patent_app_country] => US [patent_app_date] => 2000-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1676 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/162/06162568.pdf [firstpage_image] =>[orig_patent_app_number] => 550765 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/550765
Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light Apr 16, 2000 Issued
Array ( [id] => 1553047 [patent_doc_number] => 06348288 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-19 [patent_title] => 'Resolution enhancement method for deep quarter micron technology' [patent_app_type] => B1 [patent_app_number] => 09/550266 [patent_app_country] => US [patent_app_date] => 2000-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 13 [patent_no_of_words] => 1500 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/348/06348288.pdf [firstpage_image] =>[orig_patent_app_number] => 09550266 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/550266
Resolution enhancement method for deep quarter micron technology Apr 16, 2000 Issued
Array ( [id] => 1523408 [patent_doc_number] => 06352800 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-05 [patent_title] => 'Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device' [patent_app_type] => B1 [patent_app_number] => 09/549931 [patent_app_country] => US [patent_app_date] => 2000-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 10 [patent_no_of_words] => 3930 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/352/06352800.pdf [firstpage_image] =>[orig_patent_app_number] => 09549931 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/549931
Reticle for use in exposing semiconductor, method of producing the reticle, and semiconductor device Apr 13, 2000 Issued
Array ( [id] => 1449402 [patent_doc_number] => 06455203 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-24 [patent_title] => 'Mask structure and method of manufacturing the same' [patent_app_type] => B1 [patent_app_number] => 09/545464 [patent_app_country] => US [patent_app_date] => 2000-04-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 31 [patent_no_of_words] => 6856 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/455/06455203.pdf [firstpage_image] =>[orig_patent_app_number] => 09545464 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/545464
Mask structure and method of manufacturing the same Apr 6, 2000 Issued
Array ( [id] => 1383818 [patent_doc_number] => RE037996 [patent_country] => US [patent_kind] => E1 [patent_issue_date] => 2003-02-18 [patent_title] => 'Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor' [patent_app_type] => E1 [patent_app_number] => 09/544634 [patent_app_country] => US [patent_app_date] => 2000-04-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 47 [patent_figures_cnt] => 90 [patent_no_of_words] => 14105 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/RE/037/RE037996.pdf [firstpage_image] =>[orig_patent_app_number] => 09544634 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/544634
Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor Apr 5, 2000 Issued
Array ( [id] => 1564779 [patent_doc_number] => 06376131 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Methods and structures for protecting reticles from ESD failure' [patent_app_type] => B1 [patent_app_number] => 09/542127 [patent_app_country] => US [patent_app_date] => 2000-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 12 [patent_no_of_words] => 4625 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376131.pdf [firstpage_image] =>[orig_patent_app_number] => 09542127 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/542127
Methods and structures for protecting reticles from ESD failure Apr 3, 2000 Issued
Array ( [id] => 1494172 [patent_doc_number] => 06403268 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-11 [patent_title] => 'Reticles for charged-particle beam microlithography' [patent_app_type] => B1 [patent_app_number] => 09/542026 [patent_app_country] => US [patent_app_date] => 2000-04-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 2984 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/403/06403268.pdf [firstpage_image] =>[orig_patent_app_number] => 09542026 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/542026
Reticles for charged-particle beam microlithography Apr 2, 2000 Issued
Array ( [id] => 4356128 [patent_doc_number] => 06255024 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-03 [patent_title] => 'Use of attenuating phase-shifting mask for improved printability of clear-field patterns' [patent_app_type] => 1 [patent_app_number] => 9/539084 [patent_app_country] => US [patent_app_date] => 2000-03-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 14 [patent_no_of_words] => 3743 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/255/06255024.pdf [firstpage_image] =>[orig_patent_app_number] => 539084 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/539084
Use of attenuating phase-shifting mask for improved printability of clear-field patterns Mar 29, 2000 Issued
Array ( [id] => 5828138 [patent_doc_number] => 20020068226 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-06-06 [patent_title] => 'Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof' [patent_app_type] => new [patent_app_number] => 09/538064 [patent_app_country] => US [patent_app_date] => 2000-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 1803 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0068/20020068226.pdf [firstpage_image] =>[orig_patent_app_number] => 09538064 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/538064
Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof Mar 28, 2000 Abandoned
Array ( [id] => 4284013 [patent_doc_number] => 06268091 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-31 [patent_title] => 'Subresolution grating for attenuated phase shifting mask fabrication' [patent_app_type] => 1 [patent_app_number] => 9/536947 [patent_app_country] => US [patent_app_date] => 2000-03-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 1889 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 28 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/268/06268091.pdf [firstpage_image] =>[orig_patent_app_number] => 536947 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/536947
Subresolution grating for attenuated phase shifting mask fabrication Mar 27, 2000 Issued
Array ( [id] => 4244079 [patent_doc_number] => 06221540 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-24 [patent_title] => 'Photomask and projection exposure apparatus' [patent_app_type] => 1 [patent_app_number] => 9/527036 [patent_app_country] => US [patent_app_date] => 2000-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 33 [patent_no_of_words] => 10907 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/221/06221540.pdf [firstpage_image] =>[orig_patent_app_number] => 527036 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/527036
Photomask and projection exposure apparatus Mar 15, 2000 Issued
Array ( [id] => 4374469 [patent_doc_number] => 06303253 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-16 [patent_title] => 'Hierarchy and domain-balancing method and algorithm for serif mask design in microlithography' [patent_app_type] => 1 [patent_app_number] => 9/526856 [patent_app_country] => US [patent_app_date] => 2000-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 29 [patent_figures_cnt] => 55 [patent_no_of_words] => 13588 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/303/06303253.pdf [firstpage_image] =>[orig_patent_app_number] => 526856 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/526856
Hierarchy and domain-balancing method and algorithm for serif mask design in microlithography Mar 15, 2000 Issued
Array ( [id] => 4322414 [patent_doc_number] => 06329107 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-11 [patent_title] => 'Method of characterizing partial coherent light illumination and its application to serif mask design' [patent_app_type] => 1 [patent_app_number] => 9/526424 [patent_app_country] => US [patent_app_date] => 2000-03-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 16 [patent_no_of_words] => 5977 [patent_no_of_claims] => 43 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/329/06329107.pdf [firstpage_image] =>[orig_patent_app_number] => 526424 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/526424
Method of characterizing partial coherent light illumination and its application to serif mask design Mar 14, 2000 Issued
Array ( [id] => 1440745 [patent_doc_number] => 06335129 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-01 [patent_title] => 'Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo mask' [patent_app_type] => B1 [patent_app_number] => 09/524963 [patent_app_country] => US [patent_app_date] => 2000-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 41 [patent_no_of_words] => 11362 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/335/06335129.pdf [firstpage_image] =>[orig_patent_app_number] => 09524963 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/524963
Method for repairing pattern defect, photo mask using the method, and semiconductor device manufacturing method employing the photo mask Mar 13, 2000 Issued
Array ( [id] => 1435741 [patent_doc_number] => 06355384 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-12 [patent_title] => 'Mask, its method of formation, and a semiconductor device made thereby' [patent_app_type] => B1 [patent_app_number] => 09/519739 [patent_app_country] => US [patent_app_date] => 2000-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 11 [patent_no_of_words] => 4318 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/355/06355384.pdf [firstpage_image] =>[orig_patent_app_number] => 09519739 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/519739
Mask, its method of formation, and a semiconductor device made thereby Mar 5, 2000 Issued
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