
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4379030
[patent_doc_number] => 06294295
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-09-25
[patent_title] => 'Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masks'
[patent_app_type] => 1
[patent_app_number] => 9/519612
[patent_app_country] => US
[patent_app_date] => 2000-03-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 26
[patent_no_of_words] => 4795
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[patent_words_short_claim] => 225
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/294/06294295.pdf
[firstpage_image] =>[orig_patent_app_number] => 519612
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/519612 | Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masks | Mar 5, 2000 | Issued |
Array
(
[id] => 4272392
[patent_doc_number] => 06280887
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-28
[patent_title] => 'Complementary and exchange mask design methodology for optical proximity correction in microlithography'
[patent_app_type] => 1
[patent_app_number] => 9/518069
[patent_app_country] => US
[patent_app_date] => 2000-03-02
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 9742
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/280/06280887.pdf
[firstpage_image] =>[orig_patent_app_number] => 518069
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/518069 | Complementary and exchange mask design methodology for optical proximity correction in microlithography | Mar 1, 2000 | Issued |
Array
(
[id] => 4268619
[patent_doc_number] => 06322935
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-27
[patent_title] => 'Method and apparatus for repairing an alternating phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 9/514823
[patent_app_country] => US
[patent_app_date] => 2000-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[pdf_file] => patents/06/322/06322935.pdf
[firstpage_image] =>[orig_patent_app_number] => 514823
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/514823 | Method and apparatus for repairing an alternating phase shift mask | Feb 27, 2000 | Issued |
Array
(
[id] => 1549138
[patent_doc_number] => 06346352
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-02-12
[patent_title] => 'Quartz defect removal utilizing gallium staining and femtosecond ablation'
[patent_app_type] => B1
[patent_app_number] => 09/512951
[patent_app_country] => US
[patent_app_date] => 2000-02-25
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/346/06346352.pdf
[firstpage_image] =>[orig_patent_app_number] => 09512951
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/512951 | Quartz defect removal utilizing gallium staining and femtosecond ablation | Feb 24, 2000 | Issued |
Array
(
[id] => 1559121
[patent_doc_number] => 06436585
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-20
[patent_title] => 'Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs'
[patent_app_type] => B1
[patent_app_number] => 09/512923
[patent_app_country] => US
[patent_app_date] => 2000-02-25
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/436/06436585.pdf
[firstpage_image] =>[orig_patent_app_number] => 09512923
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/512923 | Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs | Feb 24, 2000 | Issued |
Array
(
[id] => 4283998
[patent_doc_number] => 06268090
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-31
[patent_title] => 'Process for manufacturing semiconductor device and exposure mask'
[patent_app_type] => 1
[patent_app_number] => 9/512352
[patent_app_country] => US
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[pdf_file] => patents/06/268/06268090.pdf
[firstpage_image] =>[orig_patent_app_number] => 512352
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/512352 | Process for manufacturing semiconductor device and exposure mask | Feb 23, 2000 | Issued |
Array
(
[id] => 1564775
[patent_doc_number] => 06376130
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-23
[patent_title] => 'Chromeless alternating reticle for producing semiconductor device features'
[patent_app_type] => B1
[patent_app_number] => 09/510359
[patent_app_country] => US
[patent_app_date] => 2000-02-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 3448
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[pdf_file] => patents/06/376/06376130.pdf
[firstpage_image] =>[orig_patent_app_number] => 09510359
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/510359 | Chromeless alternating reticle for producing semiconductor device features | Feb 21, 2000 | Issued |
Array
(
[id] => 4153467
[patent_doc_number] => 06156461
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-05
[patent_title] => 'Method for repair of photomasks'
[patent_app_type] => 1
[patent_app_number] => 9/504031
[patent_app_country] => US
[patent_app_date] => 2000-02-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/06/156/06156461.pdf
[firstpage_image] =>[orig_patent_app_number] => 504031
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/504031 | Method for repair of photomasks | Feb 13, 2000 | Issued |
Array
(
[id] => 4301239
[patent_doc_number] => 06326107
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-12-04
[patent_title] => 'Phase shift mask and process for manufacturing the same'
[patent_app_type] => 1
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[patent_app_country] => US
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[pdf_file] => patents/06/326/06326107.pdf
[firstpage_image] =>[orig_patent_app_number] => 501572
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/501572 | Phase shift mask and process for manufacturing the same | Feb 9, 2000 | Issued |
Array
(
[id] => 1506637
[patent_doc_number] => 06440615
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-27
[patent_title] => 'Method of repairing a mask with high electron scattering and low electron absorption properties'
[patent_app_type] => B1
[patent_app_number] => 09/500560
[patent_app_country] => US
[patent_app_date] => 2000-02-09
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Array
(
[id] => 1527745
[patent_doc_number] => 06479194
[patent_country] => US
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[patent_issue_date] => 2002-11-12
[patent_title] => 'Transparent phase shift mask for fabrication of small feature sizes'
[patent_app_type] => B1
[patent_app_number] => 09/499244
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/499244 | Transparent phase shift mask for fabrication of small feature sizes | Feb 6, 2000 | Issued |
Array
(
[id] => 1462028
[patent_doc_number] => 06350547
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[patent_title] => 'Oxide structure having a finely calibrated thickness'
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Array
(
[id] => 1446260
[patent_doc_number] => 06368755
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[patent_kind] => B1
[patent_issue_date] => 2002-04-09
[patent_title] => 'Masks for use in optical lithography below 180 nm'
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Array
(
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Array
(
[id] => 4324545
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[patent_issue_date] => 2001-11-20
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Array
(
[id] => 4272378
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[patent_title] => 'Clean-enclosure window to protect photolithographic mask'
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Array
(
[id] => 4264127
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[patent_issue_date] => 2001-10-23
[patent_title] => 'Method for manufacturing EAPSM-type masks used to produce integrated circuits'
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Array
(
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/484149 | Attenuating phase shift photomasks | Jan 17, 2000 | Issued |