Search

Hung Nhat Ngo

Examiner (ID: 2310)

Most Active Art Unit
2501
Art Unit(s)
2874, 3621, 2501, 2633
Total Applications
1627
Issued Applications
1441
Pending Applications
92
Abandoned Applications
94

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4379030 [patent_doc_number] => 06294295 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-25 [patent_title] => 'Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masks' [patent_app_type] => 1 [patent_app_number] => 9/519612 [patent_app_country] => US [patent_app_date] => 2000-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 26 [patent_no_of_words] => 4795 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 225 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/294/06294295.pdf [firstpage_image] =>[orig_patent_app_number] => 519612 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/519612
Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masks Mar 5, 2000 Issued
Array ( [id] => 4272392 [patent_doc_number] => 06280887 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-28 [patent_title] => 'Complementary and exchange mask design methodology for optical proximity correction in microlithography' [patent_app_type] => 1 [patent_app_number] => 9/518069 [patent_app_country] => US [patent_app_date] => 2000-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 37 [patent_no_of_words] => 9742 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/280/06280887.pdf [firstpage_image] =>[orig_patent_app_number] => 518069 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/518069
Complementary and exchange mask design methodology for optical proximity correction in microlithography Mar 1, 2000 Issued
Array ( [id] => 4268619 [patent_doc_number] => 06322935 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-27 [patent_title] => 'Method and apparatus for repairing an alternating phase shift mask' [patent_app_type] => 1 [patent_app_number] => 9/514823 [patent_app_country] => US [patent_app_date] => 2000-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 21 [patent_no_of_words] => 5043 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/322/06322935.pdf [firstpage_image] =>[orig_patent_app_number] => 514823 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/514823
Method and apparatus for repairing an alternating phase shift mask Feb 27, 2000 Issued
Array ( [id] => 1549138 [patent_doc_number] => 06346352 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-12 [patent_title] => 'Quartz defect removal utilizing gallium staining and femtosecond ablation' [patent_app_type] => B1 [patent_app_number] => 09/512951 [patent_app_country] => US [patent_app_date] => 2000-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 10 [patent_no_of_words] => 4463 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/346/06346352.pdf [firstpage_image] =>[orig_patent_app_number] => 09512951 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/512951
Quartz defect removal utilizing gallium staining and femtosecond ablation Feb 24, 2000 Issued
Array ( [id] => 1559121 [patent_doc_number] => 06436585 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-20 [patent_title] => 'Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs' [patent_app_type] => B1 [patent_app_number] => 09/512923 [patent_app_country] => US [patent_app_date] => 2000-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 5336 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 126 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/436/06436585.pdf [firstpage_image] =>[orig_patent_app_number] => 09512923 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/512923
Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs Feb 24, 2000 Issued
Array ( [id] => 4283998 [patent_doc_number] => 06268090 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-31 [patent_title] => 'Process for manufacturing semiconductor device and exposure mask' [patent_app_type] => 1 [patent_app_number] => 9/512352 [patent_app_country] => US [patent_app_date] => 2000-02-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 16 [patent_no_of_words] => 2463 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/268/06268090.pdf [firstpage_image] =>[orig_patent_app_number] => 512352 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/512352
Process for manufacturing semiconductor device and exposure mask Feb 23, 2000 Issued
Array ( [id] => 1564775 [patent_doc_number] => 06376130 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Chromeless alternating reticle for producing semiconductor device features' [patent_app_type] => B1 [patent_app_number] => 09/510359 [patent_app_country] => US [patent_app_date] => 2000-02-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 11 [patent_no_of_words] => 3448 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376130.pdf [firstpage_image] =>[orig_patent_app_number] => 09510359 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/510359
Chromeless alternating reticle for producing semiconductor device features Feb 21, 2000 Issued
Array ( [id] => 4153467 [patent_doc_number] => 06156461 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-05 [patent_title] => 'Method for repair of photomasks' [patent_app_type] => 1 [patent_app_number] => 9/504031 [patent_app_country] => US [patent_app_date] => 2000-02-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 26 [patent_no_of_words] => 6443 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 143 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/156/06156461.pdf [firstpage_image] =>[orig_patent_app_number] => 504031 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/504031
Method for repair of photomasks Feb 13, 2000 Issued
Array ( [id] => 4301239 [patent_doc_number] => 06326107 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-04 [patent_title] => 'Phase shift mask and process for manufacturing the same' [patent_app_type] => 1 [patent_app_number] => 9/501572 [patent_app_country] => US [patent_app_date] => 2000-02-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 22 [patent_no_of_words] => 3664 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 157 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/326/06326107.pdf [firstpage_image] =>[orig_patent_app_number] => 501572 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/501572
Phase shift mask and process for manufacturing the same Feb 9, 2000 Issued
Array ( [id] => 1506637 [patent_doc_number] => 06440615 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-27 [patent_title] => 'Method of repairing a mask with high electron scattering and low electron absorption properties' [patent_app_type] => B1 [patent_app_number] => 09/500560 [patent_app_country] => US [patent_app_date] => 2000-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 10 [patent_no_of_words] => 11506 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/440/06440615.pdf [firstpage_image] =>[orig_patent_app_number] => 09500560 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/500560
Method of repairing a mask with high electron scattering and low electron absorption properties Feb 8, 2000 Issued
Array ( [id] => 1527745 [patent_doc_number] => 06479194 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-11-12 [patent_title] => 'Transparent phase shift mask for fabrication of small feature sizes' [patent_app_type] => B1 [patent_app_number] => 09/499244 [patent_app_country] => US [patent_app_date] => 2000-02-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 12 [patent_no_of_words] => 7493 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 133 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/479/06479194.pdf [firstpage_image] =>[orig_patent_app_number] => 09499244 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/499244
Transparent phase shift mask for fabrication of small feature sizes Feb 6, 2000 Issued
Array ( [id] => 1462028 [patent_doc_number] => 06350547 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-26 [patent_title] => 'Oxide structure having a finely calibrated thickness' [patent_app_type] => B1 [patent_app_number] => 09/498552 [patent_app_country] => US [patent_app_date] => 2000-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 3759 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/350/06350547.pdf [firstpage_image] =>[orig_patent_app_number] => 09498552 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/498552
Oxide structure having a finely calibrated thickness Feb 3, 2000 Issued
Array ( [id] => 1446260 [patent_doc_number] => 06368755 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-09 [patent_title] => 'Masks for use in optical lithography below 180 nm' [patent_app_type] => B1 [patent_app_number] => 09/498775 [patent_app_country] => US [patent_app_date] => 2000-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 10 [patent_no_of_words] => 2530 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/368/06368755.pdf [firstpage_image] =>[orig_patent_app_number] => 09498775 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/498775
Masks for use in optical lithography below 180 nm Feb 3, 2000 Issued
Array ( [id] => 1553043 [patent_doc_number] => 06348287 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-19 [patent_title] => 'Multiphase phase shifting mask' [patent_app_type] => B1 [patent_app_number] => 09/495247 [patent_app_country] => US [patent_app_date] => 2000-01-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 8 [patent_no_of_words] => 1636 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 143 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/348/06348287.pdf [firstpage_image] =>[orig_patent_app_number] => 09495247 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/495247
Multiphase phase shifting mask Jan 30, 2000 Issued
Array ( [id] => 4324545 [patent_doc_number] => 06319637 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Method for forming pattern' [patent_app_type] => 1 [patent_app_number] => 9/492788 [patent_app_country] => US [patent_app_date] => 2000-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 25 [patent_no_of_words] => 5344 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319637.pdf [firstpage_image] =>[orig_patent_app_number] => 492788 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/492788
Method for forming pattern Jan 27, 2000 Issued
Array ( [id] => 4272378 [patent_doc_number] => 06280886 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-28 [patent_title] => 'Clean-enclosure window to protect photolithographic mask' [patent_app_type] => 1 [patent_app_number] => 9/491559 [patent_app_country] => US [patent_app_date] => 2000-01-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 13 [patent_no_of_words] => 3230 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/280/06280886.pdf [firstpage_image] =>[orig_patent_app_number] => 491559 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/491559
Clean-enclosure window to protect photolithographic mask Jan 25, 2000 Issued
Array ( [id] => 4264127 [patent_doc_number] => 06306549 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-23 [patent_title] => 'Method for manufacturing EAPSM-type masks used to produce integrated circuits' [patent_app_type] => 1 [patent_app_number] => 9/490193 [patent_app_country] => US [patent_app_date] => 2000-01-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1784 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 121 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/306/06306549.pdf [firstpage_image] =>[orig_patent_app_number] => 490193 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/490193
Method for manufacturing EAPSM-type masks used to produce integrated circuits Jan 23, 2000 Issued
Array ( [id] => 4378468 [patent_doc_number] => 06277528 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-21 [patent_title] => 'Method to change transmittance of attenuated phase-shifting masks' [patent_app_type] => 1 [patent_app_number] => 9/489499 [patent_app_country] => US [patent_app_date] => 2000-01-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 3071 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 154 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/277/06277528.pdf [firstpage_image] =>[orig_patent_app_number] => 489499 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/489499
Method to change transmittance of attenuated phase-shifting masks Jan 20, 2000 Issued
Array ( [id] => 1494168 [patent_doc_number] => 06403267 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-11 [patent_title] => 'Method for high transmittance attenuated phase-shifting mask fabrication' [patent_app_type] => B1 [patent_app_number] => 09/489500 [patent_app_country] => US [patent_app_date] => 2000-01-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 11 [patent_no_of_words] => 3757 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 146 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/403/06403267.pdf [firstpage_image] =>[orig_patent_app_number] => 09489500 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/489500
Method for high transmittance attenuated phase-shifting mask fabrication Jan 20, 2000 Issued
Array ( [id] => 4354821 [patent_doc_number] => 06174631 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-16 [patent_title] => 'Attenuating phase shift photomasks' [patent_app_type] => 1 [patent_app_number] => 9/484149 [patent_app_country] => US [patent_app_date] => 2000-01-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 14 [patent_no_of_words] => 6426 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/174/06174631.pdf [firstpage_image] =>[orig_patent_app_number] => 484149 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/484149
Attenuating phase shift photomasks Jan 17, 2000 Issued
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