
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1341147
[patent_doc_number] => RE038126
[patent_country] => US
[patent_kind] => E1
[patent_issue_date] => 2003-05-27
[patent_title] => 'Large die photolithography'
[patent_app_type] => E1
[patent_app_number] => 09/478938
[patent_app_country] => US
[patent_app_date] => 2000-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 2147
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/RE/038/RE038126.pdf
[firstpage_image] =>[orig_patent_app_number] => 09478938
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/478938 | Large die photolithography | Jan 5, 2000 | Issued |
Array
(
[id] => 4405359
[patent_doc_number] => 06238826
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-29
[patent_title] => 'Apparatus for transferring structures'
[patent_app_type] => 1
[patent_app_number] => 9/477445
[patent_app_country] => US
[patent_app_date] => 2000-01-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 6
[patent_no_of_words] => 4635
[patent_no_of_claims] => 23
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/238/06238826.pdf
[firstpage_image] =>[orig_patent_app_number] => 477445
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/477445 | Apparatus for transferring structures | Jan 3, 2000 | Issued |
Array
(
[id] => 4264113
[patent_doc_number] => 06306548
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-23
[patent_title] => 'Micro devices manufacturing method and apparatus therefor'
[patent_app_type] => 1
[patent_app_number] => 9/476208
[patent_app_country] => US
[patent_app_date] => 1999-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 23
[patent_no_of_words] => 9901
[patent_no_of_claims] => 14
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/306/06306548.pdf
[firstpage_image] =>[orig_patent_app_number] => 476208
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/476208 | Micro devices manufacturing method and apparatus therefor | Dec 29, 1999 | Issued |
Array
(
[id] => 1531636
[patent_doc_number] => 06410193
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-25
[patent_title] => 'Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength'
[patent_app_type] => B1
[patent_app_number] => 09/474857
[patent_app_country] => US
[patent_app_date] => 1999-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 14
[patent_no_of_words] => 4329
[patent_no_of_claims] => 48
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[patent_words_short_claim] => 103
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/410/06410193.pdf
[firstpage_image] =>[orig_patent_app_number] => 09474857
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/474857 | Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength | Dec 29, 1999 | Issued |
Array
(
[id] => 1435739
[patent_doc_number] => 06355382
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-12
[patent_title] => 'Photomask and exposure method using a photomask'
[patent_app_type] => B1
[patent_app_number] => 09/473994
[patent_app_country] => US
[patent_app_date] => 1999-12-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 26
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[patent_no_of_words] => 12317
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/355/06355382.pdf
[firstpage_image] =>[orig_patent_app_number] => 09473994
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/473994 | Photomask and exposure method using a photomask | Dec 28, 1999 | Issued |
Array
(
[id] => 4378393
[patent_doc_number] => 06261727
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-17
[patent_title] => 'DOF for both dense and isolated contact holes'
[patent_app_type] => 1
[patent_app_number] => 9/473030
[patent_app_country] => US
[patent_app_date] => 1999-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2739
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[pdf_file] => patents/06/261/06261727.pdf
[firstpage_image] =>[orig_patent_app_number] => 473030
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/473030 | DOF for both dense and isolated contact holes | Dec 27, 1999 | Issued |
Array
(
[id] => 4363677
[patent_doc_number] => 06274281
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-14
[patent_title] => 'Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity'
[patent_app_type] => 1
[patent_app_number] => 9/473027
[patent_app_country] => US
[patent_app_date] => 1999-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 3179
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/274/06274281.pdf
[firstpage_image] =>[orig_patent_app_number] => 473027
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/473027 | Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity | Dec 27, 1999 | Issued |
Array
(
[id] => 4374455
[patent_doc_number] => 06303252
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-16
[patent_title] => 'Reticle having assist feature between semi-dense lines'
[patent_app_type] => 1
[patent_app_number] => 9/470635
[patent_app_country] => US
[patent_app_date] => 1999-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 1724
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/303/06303252.pdf
[firstpage_image] =>[orig_patent_app_number] => 470635
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/470635 | Reticle having assist feature between semi-dense lines | Dec 26, 1999 | Issued |
Array
(
[id] => 4324531
[patent_doc_number] => 06319636
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Cell projection mask'
[patent_app_type] => 1
[patent_app_number] => 9/471972
[patent_app_country] => US
[patent_app_date] => 1999-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/06/319/06319636.pdf
[firstpage_image] =>[orig_patent_app_number] => 471972
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/471972 | Cell projection mask | Dec 22, 1999 | Issued |
Array
(
[id] => 4392912
[patent_doc_number] => 06296991
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-02
[patent_title] => 'Bi-focus exposure process'
[patent_app_type] => 1
[patent_app_number] => 9/471078
[patent_app_country] => US
[patent_app_date] => 1999-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 1797
[patent_no_of_claims] => 12
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/296/06296991.pdf
[firstpage_image] =>[orig_patent_app_number] => 471078
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/471078 | Bi-focus exposure process | Dec 21, 1999 | Issued |
Array
(
[id] => 1469359
[patent_doc_number] => 06406819
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-18
[patent_title] => 'Method for selective PSM with assist OPC'
[patent_app_type] => B1
[patent_app_number] => 09/469009
[patent_app_country] => US
[patent_app_date] => 1999-12-21
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/406/06406819.pdf
[firstpage_image] =>[orig_patent_app_number] => 09469009
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/469009 | Method for selective PSM with assist OPC | Dec 20, 1999 | Issued |
Array
(
[id] => 1487337
[patent_doc_number] => 06428936
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-08-06
[patent_title] => 'Method and apparatus that compensates for phase shift mask manufacturing defects'
[patent_app_type] => B1
[patent_app_number] => 09/465520
[patent_app_country] => US
[patent_app_date] => 1999-12-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/428/06428936.pdf
[firstpage_image] =>[orig_patent_app_number] => 09465520
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/465520 | Method and apparatus that compensates for phase shift mask manufacturing defects | Dec 15, 1999 | Issued |
Array
(
[id] => 4406306
[patent_doc_number] => 06309781
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-30
[patent_title] => 'Photomask provided with an ESD-precluding envelope'
[patent_app_type] => 1
[patent_app_number] => 9/460934
[patent_app_country] => US
[patent_app_date] => 1999-12-14
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/309/06309781.pdf
[firstpage_image] =>[orig_patent_app_number] => 460934
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/460934 | Photomask provided with an ESD-precluding envelope | Dec 13, 1999 | Issued |
Array
(
[id] => 4323533
[patent_doc_number] => 06319568
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-20
[patent_title] => 'Formation of silicon nitride film for a phase shift mask at 193 nm'
[patent_app_type] => 1
[patent_app_number] => 9/459729
[patent_app_country] => US
[patent_app_date] => 1999-12-13
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/319/06319568.pdf
[firstpage_image] =>[orig_patent_app_number] => 459729
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/459729 | Formation of silicon nitride film for a phase shift mask at 193 nm | Dec 12, 1999 | Issued |
Array
(
[id] => 4363665
[patent_doc_number] => 06274280
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-14
[patent_title] => 'Multilayer attenuating phase-shift masks'
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[patent_app_number] => 9/459777
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[firstpage_image] =>[orig_patent_app_number] => 459777
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/459777 | Multilayer attenuating phase-shift masks | Dec 12, 1999 | Issued |
Array
(
[id] => 1593572
[patent_doc_number] => 06383689
[patent_country] => US
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[patent_issue_date] => 2002-05-07
[patent_title] => 'Attenuated phase-shift mask and method of manufacturing the same'
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Array
(
[id] => 1531629
[patent_doc_number] => 06410192
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-25
[patent_title] => 'Photolithography method, photolithography mask blanks, and method of making'
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Array
(
[id] => 4264100
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Array
(
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[patent_title] => 'Half-tone phase shift mask for fabrication of poly line'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455720 | Half-tone phase shift mask for fabrication of poly line | Dec 6, 1999 | Issued |
Array
(
[id] => 4324514
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[pdf_file] => patents/06/319/06319635.pdf
[firstpage_image] =>[orig_patent_app_number] => 454715
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/454715 | Mitigation of substrate defects in reticles using multilayer buffer layers | Dec 5, 1999 | Issued |