Search

Hung Nhat Ngo

Examiner (ID: 2310)

Most Active Art Unit
2501
Art Unit(s)
2874, 3621, 2501, 2633
Total Applications
1627
Issued Applications
1441
Pending Applications
92
Abandoned Applications
94

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1341147 [patent_doc_number] => RE038126 [patent_country] => US [patent_kind] => E1 [patent_issue_date] => 2003-05-27 [patent_title] => 'Large die photolithography' [patent_app_type] => E1 [patent_app_number] => 09/478938 [patent_app_country] => US [patent_app_date] => 2000-01-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 2147 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/RE/038/RE038126.pdf [firstpage_image] =>[orig_patent_app_number] => 09478938 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/478938
Large die photolithography Jan 5, 2000 Issued
Array ( [id] => 4405359 [patent_doc_number] => 06238826 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-29 [patent_title] => 'Apparatus for transferring structures' [patent_app_type] => 1 [patent_app_number] => 9/477445 [patent_app_country] => US [patent_app_date] => 2000-01-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 6 [patent_no_of_words] => 4635 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/238/06238826.pdf [firstpage_image] =>[orig_patent_app_number] => 477445 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/477445
Apparatus for transferring structures Jan 3, 2000 Issued
Array ( [id] => 4264113 [patent_doc_number] => 06306548 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-23 [patent_title] => 'Micro devices manufacturing method and apparatus therefor' [patent_app_type] => 1 [patent_app_number] => 9/476208 [patent_app_country] => US [patent_app_date] => 1999-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 23 [patent_no_of_words] => 9901 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/306/06306548.pdf [firstpage_image] =>[orig_patent_app_number] => 476208 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/476208
Micro devices manufacturing method and apparatus therefor Dec 29, 1999 Issued
Array ( [id] => 1531636 [patent_doc_number] => 06410193 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-25 [patent_title] => 'Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength' [patent_app_type] => B1 [patent_app_number] => 09/474857 [patent_app_country] => US [patent_app_date] => 1999-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 14 [patent_no_of_words] => 4329 [patent_no_of_claims] => 48 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/410/06410193.pdf [firstpage_image] =>[orig_patent_app_number] => 09474857 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/474857
Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength Dec 29, 1999 Issued
Array ( [id] => 1435739 [patent_doc_number] => 06355382 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-12 [patent_title] => 'Photomask and exposure method using a photomask' [patent_app_type] => B1 [patent_app_number] => 09/473994 [patent_app_country] => US [patent_app_date] => 1999-12-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 26 [patent_figures_cnt] => 52 [patent_no_of_words] => 12317 [patent_no_of_claims] => 39 [patent_no_of_ind_claims] => 12 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/355/06355382.pdf [firstpage_image] =>[orig_patent_app_number] => 09473994 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/473994
Photomask and exposure method using a photomask Dec 28, 1999 Issued
Array ( [id] => 4378393 [patent_doc_number] => 06261727 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-17 [patent_title] => 'DOF for both dense and isolated contact holes' [patent_app_type] => 1 [patent_app_number] => 9/473030 [patent_app_country] => US [patent_app_date] => 1999-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 2739 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/261/06261727.pdf [firstpage_image] =>[orig_patent_app_number] => 473030 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/473030
DOF for both dense and isolated contact holes Dec 27, 1999 Issued
Array ( [id] => 4363677 [patent_doc_number] => 06274281 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-14 [patent_title] => 'Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity' [patent_app_type] => 1 [patent_app_number] => 9/473027 [patent_app_country] => US [patent_app_date] => 1999-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 13 [patent_no_of_words] => 3179 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 160 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/274/06274281.pdf [firstpage_image] =>[orig_patent_app_number] => 473027 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/473027
Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity Dec 27, 1999 Issued
Array ( [id] => 4374455 [patent_doc_number] => 06303252 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-16 [patent_title] => 'Reticle having assist feature between semi-dense lines' [patent_app_type] => 1 [patent_app_number] => 9/470635 [patent_app_country] => US [patent_app_date] => 1999-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 1724 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/303/06303252.pdf [firstpage_image] =>[orig_patent_app_number] => 470635 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/470635
Reticle having assist feature between semi-dense lines Dec 26, 1999 Issued
Array ( [id] => 4324531 [patent_doc_number] => 06319636 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Cell projection mask' [patent_app_type] => 1 [patent_app_number] => 9/471972 [patent_app_country] => US [patent_app_date] => 1999-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1940 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319636.pdf [firstpage_image] =>[orig_patent_app_number] => 471972 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/471972
Cell projection mask Dec 22, 1999 Issued
Array ( [id] => 4392912 [patent_doc_number] => 06296991 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-02 [patent_title] => 'Bi-focus exposure process' [patent_app_type] => 1 [patent_app_number] => 9/471078 [patent_app_country] => US [patent_app_date] => 1999-12-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 1797 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 162 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/296/06296991.pdf [firstpage_image] =>[orig_patent_app_number] => 471078 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/471078
Bi-focus exposure process Dec 21, 1999 Issued
Array ( [id] => 1469359 [patent_doc_number] => 06406819 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-18 [patent_title] => 'Method for selective PSM with assist OPC' [patent_app_type] => B1 [patent_app_number] => 09/469009 [patent_app_country] => US [patent_app_date] => 1999-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 2623 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/406/06406819.pdf [firstpage_image] =>[orig_patent_app_number] => 09469009 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/469009
Method for selective PSM with assist OPC Dec 20, 1999 Issued
Array ( [id] => 1487337 [patent_doc_number] => 06428936 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-06 [patent_title] => 'Method and apparatus that compensates for phase shift mask manufacturing defects' [patent_app_type] => B1 [patent_app_number] => 09/465520 [patent_app_country] => US [patent_app_date] => 1999-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 17 [patent_no_of_words] => 3667 [patent_no_of_claims] => 42 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/428/06428936.pdf [firstpage_image] =>[orig_patent_app_number] => 09465520 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/465520
Method and apparatus that compensates for phase shift mask manufacturing defects Dec 15, 1999 Issued
Array ( [id] => 4406306 [patent_doc_number] => 06309781 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-30 [patent_title] => 'Photomask provided with an ESD-precluding envelope' [patent_app_type] => 1 [patent_app_number] => 9/460934 [patent_app_country] => US [patent_app_date] => 1999-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 1726 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/309/06309781.pdf [firstpage_image] =>[orig_patent_app_number] => 460934 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/460934
Photomask provided with an ESD-precluding envelope Dec 13, 1999 Issued
Array ( [id] => 4323533 [patent_doc_number] => 06319568 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Formation of silicon nitride film for a phase shift mask at 193 nm' [patent_app_type] => 1 [patent_app_number] => 9/459729 [patent_app_country] => US [patent_app_date] => 1999-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 2175 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319568.pdf [firstpage_image] =>[orig_patent_app_number] => 459729 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/459729
Formation of silicon nitride film for a phase shift mask at 193 nm Dec 12, 1999 Issued
Array ( [id] => 4363665 [patent_doc_number] => 06274280 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-14 [patent_title] => 'Multilayer attenuating phase-shift masks' [patent_app_type] => 1 [patent_app_number] => 9/459777 [patent_app_country] => US [patent_app_date] => 1999-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 3960 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/274/06274280.pdf [firstpage_image] =>[orig_patent_app_number] => 459777 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/459777
Multilayer attenuating phase-shift masks Dec 12, 1999 Issued
Array ( [id] => 1593572 [patent_doc_number] => 06383689 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-07 [patent_title] => 'Attenuated phase-shift mask and method of manufacturing the same' [patent_app_type] => B1 [patent_app_number] => 09/457475 [patent_app_country] => US [patent_app_date] => 1999-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 28 [patent_no_of_words] => 5298 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/383/06383689.pdf [firstpage_image] =>[orig_patent_app_number] => 09457475 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/457475
Attenuated phase-shift mask and method of manufacturing the same Dec 8, 1999 Issued
Array ( [id] => 1531629 [patent_doc_number] => 06410192 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-25 [patent_title] => 'Photolithography method, photolithography mask blanks, and method of making' [patent_app_type] => B1 [patent_app_number] => 09/458254 [patent_app_country] => US [patent_app_date] => 1999-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 18 [patent_no_of_words] => 8218 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/410/06410192.pdf [firstpage_image] =>[orig_patent_app_number] => 09458254 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/458254
Photolithography method, photolithography mask blanks, and method of making Dec 8, 1999 Issued
Array ( [id] => 4264100 [patent_doc_number] => 06306547 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-23 [patent_title] => 'Photomask and manufacturing method thereof, and exposure method using the photomask' [patent_app_type] => 1 [patent_app_number] => 9/457531 [patent_app_country] => US [patent_app_date] => 1999-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 41 [patent_no_of_words] => 10024 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/306/06306547.pdf [firstpage_image] =>[orig_patent_app_number] => 457531 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/457531
Photomask and manufacturing method thereof, and exposure method using the photomask Dec 8, 1999 Issued
Array ( [id] => 4326787 [patent_doc_number] => 06312856 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Half-tone phase shift mask for fabrication of poly line' [patent_app_type] => 1 [patent_app_number] => 9/455720 [patent_app_country] => US [patent_app_date] => 1999-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1671 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/312/06312856.pdf [firstpage_image] =>[orig_patent_app_number] => 455720 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/455720
Half-tone phase shift mask for fabrication of poly line Dec 6, 1999 Issued
Array ( [id] => 4324514 [patent_doc_number] => 06319635 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Mitigation of substrate defects in reticles using multilayer buffer layers' [patent_app_type] => 1 [patent_app_number] => 9/454715 [patent_app_country] => US [patent_app_date] => 1999-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 4543 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319635.pdf [firstpage_image] =>[orig_patent_app_number] => 454715 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/454715
Mitigation of substrate defects in reticles using multilayer buffer layers Dec 5, 1999 Issued
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