
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4378378
[patent_doc_number] => 06261726
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-17
[patent_title] => 'Projection electron-beam lithography masks using advanced materials and membrane size'
[patent_app_type] => 1
[patent_app_number] => 9/455570
[patent_app_country] => US
[patent_app_date] => 1999-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/261/06261726.pdf
[firstpage_image] =>[orig_patent_app_number] => 455570
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455570 | Projection electron-beam lithography masks using advanced materials and membrane size | Dec 5, 1999 | Issued |
Array
(
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[patent_doc_number] => 06340542
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-22
[patent_title] => 'Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask'
[patent_app_type] => B1
[patent_app_number] => 09/455320
[patent_app_country] => US
[patent_app_date] => 1999-12-06
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[firstpage_image] =>[orig_patent_app_number] => 09455320
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/455320 | Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask | Dec 5, 1999 | Issued |
Array
(
[id] => 1549466
[patent_doc_number] => 06399256
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-04
[patent_title] => 'Reticle having accessory pattern divided into sub-patterns'
[patent_app_type] => B1
[patent_app_number] => 09/453709
[patent_app_country] => US
[patent_app_date] => 1999-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[pdf_file] => patents/06/399/06399256.pdf
[firstpage_image] =>[orig_patent_app_number] => 09453709
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/453709 | Reticle having accessory pattern divided into sub-patterns | Dec 2, 1999 | Issued |
Array
(
[id] => 1520355
[patent_doc_number] => 06413681
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-02
[patent_title] => 'Diamond film for x-ray lithography and making method'
[patent_app_type] => B1
[patent_app_number] => 09/448295
[patent_app_country] => US
[patent_app_date] => 1999-11-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/06/413/06413681.pdf
[firstpage_image] =>[orig_patent_app_number] => 09448295
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/448295 | Diamond film for x-ray lithography and making method | Nov 23, 1999 | Issued |
Array
(
[id] => 4283254
[patent_doc_number] => 06210843
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-03
[patent_title] => 'Modulation of peripheral critical dimension on photomask with differential electron beam dose'
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[patent_app_date] => 1999-11-22
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[pdf_file] => patents/06/210/06210843.pdf
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Array
(
[id] => 4326773
[patent_doc_number] => 06312855
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-06
[patent_title] => 'Three-phase phase shift mask'
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Array
(
[id] => 4405348
[patent_doc_number] => 06238825
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-29
[patent_title] => 'Mask with alternating scattering bars'
[patent_app_type] => 1
[patent_app_number] => 9/442839
[patent_app_country] => US
[patent_app_date] => 1999-11-18
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/442839 | Mask with alternating scattering bars | Nov 17, 1999 | Issued |
Array
(
[id] => 4307576
[patent_doc_number] => 06316151
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-13
[patent_title] => 'Stencil mask'
[patent_app_type] => 1
[patent_app_number] => 9/442983
[patent_app_country] => US
[patent_app_date] => 1999-11-18
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 442983
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/442983 | Stencil mask | Nov 17, 1999 | Issued |
Array
(
[id] => 1446258
[patent_doc_number] => 06368754
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-09
[patent_title] => 'Reticle used for fabrication of semiconductor device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/442251 | Reticle used for fabrication of semiconductor device | Nov 14, 1999 | Issued |
Array
(
[id] => 4322495
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[patent_issue_date] => 2001-12-11
[patent_title] => 'Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens'
[patent_app_type] => 1
[patent_app_number] => 9/438481
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Array
(
[id] => 4356114
[patent_doc_number] => 06255023
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[patent_title] => 'Method of manufacturing binary phase shift mask'
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Array
(
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[patent_title] => 'Method for the measurement of aberration of optical projection system'
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Array
(
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Array
(
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Array
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Array
(
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Array
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Array
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Array
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Array
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