
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3823679
[patent_doc_number] => 05783337
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-21
[patent_title] => 'Process to fabricate a double layer attenuated phase shift mask (APSM) with chrome border'
[patent_app_type] => 1
[patent_app_number] => 8/856786
[patent_app_country] => US
[patent_app_date] => 1997-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 12
[patent_no_of_words] => 1960
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/783/05783337.pdf
[firstpage_image] =>[orig_patent_app_number] => 856786
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/856786 | Process to fabricate a double layer attenuated phase shift mask (APSM) with chrome border | May 14, 1997 | Issued |
Array
(
[id] => 3772256
[patent_doc_number] => 05817439
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-06
[patent_title] => 'Method of blind border pattern layout for attenuated phase shifting masks'
[patent_app_type] => 1
[patent_app_number] => 8/857166
[patent_app_country] => US
[patent_app_date] => 1997-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 12
[patent_no_of_words] => 2155
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 921
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/817/05817439.pdf
[firstpage_image] =>[orig_patent_app_number] => 857166
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/857166 | Method of blind border pattern layout for attenuated phase shifting masks | May 14, 1997 | Issued |
Array
(
[id] => 3757390
[patent_doc_number] => 05851708
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-22
[patent_title] => 'Method for fabricating phase shifting mask and a phase shifting mask'
[patent_app_type] => 1
[patent_app_number] => 8/856194
[patent_app_country] => US
[patent_app_date] => 1997-05-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 22
[patent_no_of_words] => 2980
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 50
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/851/05851708.pdf
[firstpage_image] =>[orig_patent_app_number] => 856194
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/856194 | Method for fabricating phase shifting mask and a phase shifting mask | May 13, 1997 | Issued |
| 08/853050 | TRANSPARENT, ELASTOMERIC, CONTACT-MODE PHOTOLITHOGRAPHY MASK, SENSOR, AND WAVEFRONT ENGINEERING ELEMENT | May 7, 1997 | Abandoned |
| 08/852508 | METHOD AND SYSTEM FOR IMPROVED OPTICAL IMAGING IN MICROLITHOGRAPHY | May 6, 1997 | Abandoned |
Array
(
[id] => 3880234
[patent_doc_number] => 05798192
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-25
[patent_title] => 'Structure of a mask for use in a lithography process of a semiconductor fabrication'
[patent_app_type] => 1
[patent_app_number] => 8/834330
[patent_app_country] => US
[patent_app_date] => 1997-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 1426
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/798/05798192.pdf
[firstpage_image] =>[orig_patent_app_number] => 834330
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/834330 | Structure of a mask for use in a lithography process of a semiconductor fabrication | Apr 14, 1997 | Issued |
Array
(
[id] => 3864551
[patent_doc_number] => 05837403
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-17
[patent_title] => 'Photomask for removing the notching phenomenon'
[patent_app_type] => 1
[patent_app_number] => 8/832348
[patent_app_country] => US
[patent_app_date] => 1997-04-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 960
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/837/05837403.pdf
[firstpage_image] =>[orig_patent_app_number] => 832348
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/832348 | Photomask for removing the notching phenomenon | Apr 1, 1997 | Issued |
Array
(
[id] => 3757281
[patent_doc_number] => 05851701
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-22
[patent_title] => 'Atom lithographic mask having diffraction grating and attenuated phase shifters'
[patent_app_type] => 1
[patent_app_number] => 8/831066
[patent_app_country] => US
[patent_app_date] => 1997-04-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 15
[patent_no_of_words] => 4373
[patent_no_of_claims] => 37
[patent_no_of_ind_claims] => 8
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/851/05851701.pdf
[firstpage_image] =>[orig_patent_app_number] => 831066
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/831066 | Atom lithographic mask having diffraction grating and attenuated phase shifters | Mar 31, 1997 | Issued |
Array
(
[id] => 3962750
[patent_doc_number] => 05885735
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-23
[patent_title] => 'Mask having a phase shifter and method of manufacturing same'
[patent_app_type] => 1
[patent_app_number] => 8/834542
[patent_app_country] => US
[patent_app_date] => 1997-03-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 72
[patent_no_of_words] => 18058
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/885/05885735.pdf
[firstpage_image] =>[orig_patent_app_number] => 834542
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/834542 | Mask having a phase shifter and method of manufacturing same | Mar 30, 1997 | Issued |
Array
(
[id] => 3823642
[patent_doc_number] => 05759724
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-02
[patent_title] => 'Method for making multi-phase, phase shifting masks'
[patent_app_type] => 1
[patent_app_number] => 8/829403
[patent_app_country] => US
[patent_app_date] => 1997-03-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 19
[patent_no_of_words] => 4704
[patent_no_of_claims] => 40
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 72
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/759/05759724.pdf
[firstpage_image] =>[orig_patent_app_number] => 829403
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/829403 | Method for making multi-phase, phase shifting masks | Mar 30, 1997 | Issued |
Array
(
[id] => 4031807
[patent_doc_number] => 05942356
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-24
[patent_title] => 'Phase shift mask and phase shift mask blank'
[patent_app_type] => 1
[patent_app_number] => 8/825068
[patent_app_country] => US
[patent_app_date] => 1997-03-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 13
[patent_no_of_words] => 7234
[patent_no_of_claims] => 32
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/942/05942356.pdf
[firstpage_image] =>[orig_patent_app_number] => 825068
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/825068 | Phase shift mask and phase shift mask blank | Mar 26, 1997 | Issued |
Array
(
[id] => 4026492
[patent_doc_number] => 05994001
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-30
[patent_title] => 'Phase shift mask and its manufacturing method and semiconductor device and its manufacturing method using the phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/824551
[patent_app_country] => US
[patent_app_date] => 1997-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 44
[patent_no_of_words] => 7938
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/994/05994001.pdf
[firstpage_image] =>[orig_patent_app_number] => 824551
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/824551 | Phase shift mask and its manufacturing method and semiconductor device and its manufacturing method using the phase shift mask | Mar 24, 1997 | Issued |
Array
(
[id] => 3946045
[patent_doc_number] => 05955223
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-21
[patent_title] => 'Phase-shift mask blank and process for the production thereof comprising a semi transparent film with silicon and nitrogen'
[patent_app_type] => 1
[patent_app_number] => 8/816942
[patent_app_country] => US
[patent_app_date] => 1997-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 10581
[patent_no_of_claims] => 11
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/955/05955223.pdf
[firstpage_image] =>[orig_patent_app_number] => 816942
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/816942 | Phase-shift mask blank and process for the production thereof comprising a semi transparent film with silicon and nitrogen | Mar 13, 1997 | Issued |
Array
(
[id] => 3930230
[patent_doc_number] => 05928814
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-27
[patent_title] => 'Photomask controlling transmissivity by using an impurity-containing film formed on a transparent substrate'
[patent_app_type] => 1
[patent_app_number] => 8/819560
[patent_app_country] => US
[patent_app_date] => 1997-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/928/05928814.pdf
[firstpage_image] =>[orig_patent_app_number] => 819560
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/819560 | Photomask controlling transmissivity by using an impurity-containing film formed on a transparent substrate | Mar 13, 1997 | Issued |
Array
(
[id] => 3941202
[patent_doc_number] => 05998069
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-07
[patent_title] => 'Electrically programmable photolithography mask'
[patent_app_type] => 1
[patent_app_number] => 9/031939
[patent_app_country] => US
[patent_app_date] => 1997-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[pdf_file] => patents/05/998/05998069.pdf
[firstpage_image] =>[orig_patent_app_number] => 031939
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/031939 | Electrically programmable photolithography mask | Feb 26, 1997 | Issued |
Array
(
[id] => 3789171
[patent_doc_number] => 05780187
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-14
[patent_title] => 'Repair of reflective photomask used in semiconductor process'
[patent_app_type] => 1
[patent_app_number] => 8/806191
[patent_app_country] => US
[patent_app_date] => 1997-02-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 13
[patent_no_of_words] => 2864
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/780/05780187.pdf
[firstpage_image] =>[orig_patent_app_number] => 806191
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/806191 | Repair of reflective photomask used in semiconductor process | Feb 25, 1997 | Issued |
Array
(
[id] => 3738479
[patent_doc_number] => 05786116
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-28
[patent_title] => 'Atom lithographic mask having diffraction grating aligned with primary mask pattern'
[patent_app_type] => 1
[patent_app_number] => 8/799166
[patent_app_country] => US
[patent_app_date] => 1997-02-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/05/786/05786116.pdf
[firstpage_image] =>[orig_patent_app_number] => 799166
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/799166 | Atom lithographic mask having diffraction grating aligned with primary mask pattern | Feb 13, 1997 | Issued |
Array
(
[id] => 3905838
[patent_doc_number] => 05897977
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-04-27
[patent_title] => 'Attenuating embedded phase shift photomask blanks'
[patent_app_type] => 1
[patent_app_number] => 8/797443
[patent_app_country] => US
[patent_app_date] => 1997-02-10
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[pdf_file] => patents/05/897/05897977.pdf
[firstpage_image] =>[orig_patent_app_number] => 797443
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/797443 | Attenuating embedded phase shift photomask blanks | Feb 9, 1997 | Issued |
Array
(
[id] => 3905824
[patent_doc_number] => 05897976
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-04-27
[patent_title] => 'Attenuating embedded phase shift photomask blanks'
[patent_app_type] => 1
[patent_app_number] => 8/797442
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[firstpage_image] =>[orig_patent_app_number] => 797442
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/797442 | Attenuating embedded phase shift photomask blanks | Feb 9, 1997 | Issued |
Array
(
[id] => 3738465
[patent_doc_number] => 05786115
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-28
[patent_title] => 'Mask producing method'
[patent_app_type] => 1
[patent_app_number] => 8/792070
[patent_app_country] => US
[patent_app_date] => 1997-02-03
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[pdf_file] => patents/05/786/05786115.pdf
[firstpage_image] =>[orig_patent_app_number] => 792070
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/792070 | Mask producing method | Feb 2, 1997 | Issued |