
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3772244
[patent_doc_number] => 05817438
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-06
[patent_title] => 'Masking technology for etching contacts'
[patent_app_type] => 1
[patent_app_number] => 8/736416
[patent_app_country] => US
[patent_app_date] => 1996-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 1489
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/817/05817438.pdf
[firstpage_image] =>[orig_patent_app_number] => 736416
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/736416 | Masking technology for etching contacts | Oct 23, 1996 | Issued |
Array
(
[id] => 3826762
[patent_doc_number] => 05738959
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-14
[patent_title] => 'Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer'
[patent_app_type] => 1
[patent_app_number] => 8/722439
[patent_app_country] => US
[patent_app_date] => 1996-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 34
[patent_no_of_words] => 10670
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 15
[patent_words_short_claim] => 36
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/738/05738959.pdf
[firstpage_image] =>[orig_patent_app_number] => 722439
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/722439 | Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer | Oct 16, 1996 | Issued |
Array
(
[id] => 3875039
[patent_doc_number] => 05728494
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-17
[patent_title] => 'Exposure mask and method and apparatus for manufacturing the same'
[patent_app_type] => 1
[patent_app_number] => 8/730017
[patent_app_country] => US
[patent_app_date] => 1996-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 41
[patent_figures_cnt] => 99
[patent_no_of_words] => 25378
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/728/05728494.pdf
[firstpage_image] =>[orig_patent_app_number] => 730017
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/730017 | Exposure mask and method and apparatus for manufacturing the same | Oct 10, 1996 | Issued |
Array
(
[id] => 3823663
[patent_doc_number] => 05783336
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-21
[patent_title] => 'Mask for exposure'
[patent_app_type] => 1
[patent_app_number] => 8/729281
[patent_app_country] => US
[patent_app_date] => 1996-10-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 41
[patent_no_of_words] => 7688
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 143
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/783/05783336.pdf
[firstpage_image] =>[orig_patent_app_number] => 729281
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/729281 | Mask for exposure | Oct 9, 1996 | Issued |
Array
(
[id] => 3875020
[patent_doc_number] => 05728493
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-17
[patent_title] => 'Antireflection mask for contact hole opening'
[patent_app_type] => 1
[patent_app_number] => 8/725809
[patent_app_country] => US
[patent_app_date] => 1996-10-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 1836
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/728/05728493.pdf
[firstpage_image] =>[orig_patent_app_number] => 725809
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/725809 | Antireflection mask for contact hole opening | Oct 3, 1996 | Issued |
Array
(
[id] => 3830119
[patent_doc_number] => 05712063
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-01-27
[patent_title] => 'Phase shift mask comprising light shielding regions having a multiple box structure'
[patent_app_type] => 1
[patent_app_number] => 8/729675
[patent_app_country] => US
[patent_app_date] => 1996-10-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3220
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 197
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/712/05712063.pdf
[firstpage_image] =>[orig_patent_app_number] => 729675
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/729675 | Phase shift mask comprising light shielding regions having a multiple box structure | Oct 2, 1996 | Issued |
Array
(
[id] => 3772230
[patent_doc_number] => 05817437
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-06
[patent_title] => 'Method for detecting phase error of a phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/725162
[patent_app_country] => US
[patent_app_date] => 1996-10-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 1529
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 157
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/817/05817437.pdf
[firstpage_image] =>[orig_patent_app_number] => 725162
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/725162 | Method for detecting phase error of a phase shift mask | Oct 2, 1996 | Issued |
Array
(
[id] => 3725077
[patent_doc_number] => 05702849
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-30
[patent_title] => 'Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same'
[patent_app_type] => 1
[patent_app_number] => 8/721076
[patent_app_country] => US
[patent_app_date] => 1996-09-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 21
[patent_no_of_words] => 5666
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 95
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/702/05702849.pdf
[firstpage_image] =>[orig_patent_app_number] => 721076
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/721076 | Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same | Sep 25, 1996 | Issued |
Array
(
[id] => 3833794
[patent_doc_number] => 05846676
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-08
[patent_title] => 'Mask structure and exposure method and apparatus using the same'
[patent_app_type] => 1
[patent_app_number] => 8/710979
[patent_app_country] => US
[patent_app_date] => 1996-09-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 35
[patent_no_of_words] => 6164
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 38
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/846/05846676.pdf
[firstpage_image] =>[orig_patent_app_number] => 710979
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/710979 | Mask structure and exposure method and apparatus using the same | Sep 24, 1996 | Issued |
| 08/718678 | PHASE-SHIFTING MASK AND A MANUFACTURING METHOD THEREOF COMPRISING PHASE SHIFTERS WITH FLAT TOP AND ROUNDED SIDES | Sep 23, 1996 | Abandoned |
Array
(
[id] => 4059930
[patent_doc_number] => 05866280
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-02-02
[patent_title] => 'Exposure mask and manufacturing method thereof'
[patent_app_type] => 1
[patent_app_number] => 8/710408
[patent_app_country] => US
[patent_app_date] => 1996-09-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 7
[patent_no_of_words] => 13632
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/866/05866280.pdf
[firstpage_image] =>[orig_patent_app_number] => 710408
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/710408 | Exposure mask and manufacturing method thereof | Sep 16, 1996 | Issued |
Array
(
[id] => 3758623
[patent_doc_number] => 05741613
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-21
[patent_title] => 'Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering'
[patent_app_type] => 1
[patent_app_number] => 8/713953
[patent_app_country] => US
[patent_app_date] => 1996-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 20
[patent_no_of_words] => 2346
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 140
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/741/05741613.pdf
[firstpage_image] =>[orig_patent_app_number] => 713953
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/713953 | Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering | Sep 12, 1996 | Issued |
Array
(
[id] => 3846289
[patent_doc_number] => 05766805
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-16
[patent_title] => 'Method for fabricating phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/710234
[patent_app_country] => US
[patent_app_date] => 1996-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 48
[patent_no_of_words] => 2803
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 59
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/766/05766805.pdf
[firstpage_image] =>[orig_patent_app_number] => 710234
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/710234 | Method for fabricating phase shift mask | Sep 12, 1996 | Issued |
Array
(
[id] => 3846305
[patent_doc_number] => 05766806
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-16
[patent_title] => 'Method of optical lithography using phase shift masking'
[patent_app_type] => 1
[patent_app_number] => 8/711112
[patent_app_country] => US
[patent_app_date] => 1996-09-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 38
[patent_no_of_words] => 5628
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/766/05766806.pdf
[firstpage_image] =>[orig_patent_app_number] => 711112
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/711112 | Method of optical lithography using phase shift masking | Sep 8, 1996 | Issued |
Array
(
[id] => 4031793
[patent_doc_number] => 05942355
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-08-24
[patent_title] => 'Method of fabricating a phase-shifting semiconductor photomask'
[patent_app_type] => 1
[patent_app_number] => 8/706474
[patent_app_country] => US
[patent_app_date] => 1996-09-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 17
[patent_no_of_words] => 3712
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 84
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/942/05942355.pdf
[firstpage_image] =>[orig_patent_app_number] => 706474
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/706474 | Method of fabricating a phase-shifting semiconductor photomask | Sep 3, 1996 | Issued |
Array
(
[id] => 3846363
[patent_doc_number] => 05718996
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-02-17
[patent_title] => 'Electrostatic information recording medium and electrostatic information recording and reproducing method'
[patent_app_type] => 1
[patent_app_number] => 8/703653
[patent_app_country] => US
[patent_app_date] => 1996-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 28
[patent_figures_cnt] => 75
[patent_no_of_words] => 28294
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 9
[patent_words_short_claim] => 18
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/718/05718996.pdf
[firstpage_image] =>[orig_patent_app_number] => 703653
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/703653 | Electrostatic information recording medium and electrostatic information recording and reproducing method | Aug 26, 1996 | Issued |
Array
(
[id] => 3801813
[patent_doc_number] => 05830605
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-03
[patent_title] => 'Gradation mask method of producing the same and method of forming special surface profile on material using gradation mask'
[patent_app_type] => 1
[patent_app_number] => 8/703539
[patent_app_country] => US
[patent_app_date] => 1996-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 35
[patent_no_of_words] => 13940
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/830/05830605.pdf
[firstpage_image] =>[orig_patent_app_number] => 703539
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/703539 | Gradation mask method of producing the same and method of forming special surface profile on material using gradation mask | Aug 26, 1996 | Issued |
Array
(
[id] => 3725064
[patent_doc_number] => 05702848
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-30
[patent_title] => 'Mask for optical lithography using phase shift masking and integrated circuit produced therefrom'
[patent_app_type] => 1
[patent_app_number] => 8/702058
[patent_app_country] => US
[patent_app_date] => 1996-08-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 25
[patent_no_of_words] => 4283
[patent_no_of_claims] => 31
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/702/05702848.pdf
[firstpage_image] =>[orig_patent_app_number] => 702058
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/702058 | Mask for optical lithography using phase shift masking and integrated circuit produced therefrom | Aug 22, 1996 | Issued |
Array
(
[id] => 3846276
[patent_doc_number] => 05766804
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-16
[patent_title] => 'Method of optical lithography using phase shift masking'
[patent_app_type] => 1
[patent_app_number] => 8/702057
[patent_app_country] => US
[patent_app_date] => 1996-08-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[patent_no_of_words] => 4303
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/766/05766804.pdf
[firstpage_image] =>[orig_patent_app_number] => 702057
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/702057 | Method of optical lithography using phase shift masking | Aug 22, 1996 | Issued |
Array
(
[id] => 3658448
[patent_doc_number] => 05656400
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-08-12
[patent_title] => 'Photomask and pattern forming method employing the same'
[patent_app_type] => 1
[patent_app_number] => 8/699732
[patent_app_country] => US
[patent_app_date] => 1996-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/656/05656400.pdf
[firstpage_image] =>[orig_patent_app_number] => 699732
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/699732 | Photomask and pattern forming method employing the same | Aug 19, 1996 | Issued |