| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 3875093
[patent_doc_number] => 05804336
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-08
[patent_title] => 'Method of forming opaque border on semiconductor photomask'
[patent_app_type] => 1
[patent_app_number] => 8/696173
[patent_app_country] => US
[patent_app_date] => 1996-08-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 3751
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/804/05804336.pdf
[firstpage_image] =>[orig_patent_app_number] => 696173
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/696173 | Method of forming opaque border on semiconductor photomask | Aug 12, 1996 | Issued |
Array
(
[id] => 3732781
[patent_doc_number] => 05698350
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-16
[patent_title] => 'Light exposure method for the fabrication of semiconductor devices'
[patent_app_type] => 1
[patent_app_number] => 8/695297
[patent_app_country] => US
[patent_app_date] => 1996-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_claims] => 14
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[patent_words_short_claim] => 140
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/698/05698350.pdf
[firstpage_image] =>[orig_patent_app_number] => 695297
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/695297 | Light exposure method for the fabrication of semiconductor devices | Aug 8, 1996 | Issued |
Array
(
[id] => 4021700
[patent_doc_number] => 05882825
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-16
[patent_title] => 'Production method of a phase shift photomask having a phase shift layer comprising SOG'
[patent_app_type] => 1
[patent_app_number] => 8/695024
[patent_app_country] => US
[patent_app_date] => 1996-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 3
[patent_no_of_words] => 4586
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 123
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/882/05882825.pdf
[firstpage_image] =>[orig_patent_app_number] => 695024
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/695024 | Production method of a phase shift photomask having a phase shift layer comprising SOG | Aug 8, 1996 | Issued |
Array
(
[id] => 3872543
[patent_doc_number] => 05747196
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-05
[patent_title] => 'Method of fabricating a phase-shift photomask'
[patent_app_type] => 1
[patent_app_number] => 8/695300
[patent_app_country] => US
[patent_app_date] => 1996-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 2473
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[patent_words_short_claim] => 150
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/747/05747196.pdf
[firstpage_image] =>[orig_patent_app_number] => 695300
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/695300 | Method of fabricating a phase-shift photomask | Aug 8, 1996 | Issued |
Array
(
[id] => 3783818
[patent_doc_number] => 05736300
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-07
[patent_title] => 'Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor'
[patent_app_type] => 1
[patent_app_number] => 8/694263
[patent_app_country] => US
[patent_app_date] => 1996-08-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 47
[patent_figures_cnt] => 90
[patent_no_of_words] => 13971
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 375
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/736/05736300.pdf
[firstpage_image] =>[orig_patent_app_number] => 694263
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/694263 | Manufacturing method or an exposing method for a semiconductor device or a semiconductor integrated circuit device and a mask used therefor | Aug 7, 1996 | Issued |
| 08/692543 | PHOTO MASK AND EXPOSURE METHOD USING THE SAME | Aug 4, 1996 | Abandoned |
Array
(
[id] => 3806089
[patent_doc_number] => 05811208
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-22
[patent_title] => 'Phase shift mask and method of producing the same'
[patent_app_type] => 1
[patent_app_number] => 8/691369
[patent_app_country] => US
[patent_app_date] => 1996-08-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
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[pdf_file] => patents/05/811/05811208.pdf
[firstpage_image] =>[orig_patent_app_number] => 691369
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/691369 | Phase shift mask and method of producing the same | Aug 1, 1996 | Issued |
Array
(
[id] => 3870948
[patent_doc_number] => 05824437
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-20
[patent_title] => 'Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device'
[patent_app_type] => 1
[patent_app_number] => 8/685958
[patent_app_country] => US
[patent_app_date] => 1996-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 21
[patent_no_of_words] => 10561
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 7
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/824/05824437.pdf
[firstpage_image] =>[orig_patent_app_number] => 685958
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/685958 | Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device | Jul 21, 1996 | Issued |
| 08/250898 | ATTENUATED PHASE SHIFT MASK | Jul 18, 1996 | Abandoned |
Array
(
[id] => 3930217
[patent_doc_number] => 05928813
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-07-27
[patent_title] => 'Attenuated phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/684506
[patent_app_country] => US
[patent_app_date] => 1996-07-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2474
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/928/05928813.pdf
[firstpage_image] =>[orig_patent_app_number] => 684506
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/684506 | Attenuated phase shift mask | Jul 18, 1996 | Issued |
Array
(
[id] => 3661572
[patent_doc_number] => 05667919
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-16
[patent_title] => 'Attenuated phase shift mask and method of manufacture thereof'
[patent_app_type] => 1
[patent_app_number] => 8/682458
[patent_app_country] => US
[patent_app_date] => 1996-07-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/05/667/05667919.pdf
[firstpage_image] =>[orig_patent_app_number] => 682458
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/682458 | Attenuated phase shift mask and method of manufacture thereof | Jul 16, 1996 | Issued |
Array
(
[id] => 4021714
[patent_doc_number] => 05882826
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-16
[patent_title] => 'Membrane and mask, and exposure apparatus using the mask, and device producing method using the mask'
[patent_app_type] => 1
[patent_app_number] => 8/680796
[patent_app_country] => US
[patent_app_date] => 1996-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 3603
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[pdf_file] => patents/05/882/05882826.pdf
[firstpage_image] =>[orig_patent_app_number] => 680796
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/680796 | Membrane and mask, and exposure apparatus using the mask, and device producing method using the mask | Jul 15, 1996 | Issued |
| 08/680887 | SIDELOBE SUPPRESSING APSM | Jul 15, 1996 | Abandoned |
Array
(
[id] => 3923214
[patent_doc_number] => 05876878
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-02
[patent_title] => 'Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light'
[patent_app_type] => 1
[patent_app_number] => 8/679835
[patent_app_country] => US
[patent_app_date] => 1996-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/05/876/05876878.pdf
[firstpage_image] =>[orig_patent_app_number] => 679835
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/679835 | Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light | Jul 14, 1996 | Issued |
Array
(
[id] => 4003805
[patent_doc_number] => 05888674
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-30
[patent_title] => 'Method of manufacturing a halftone phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/679141
[patent_app_country] => US
[patent_app_date] => 1996-07-12
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[firstpage_image] =>[orig_patent_app_number] => 679141
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/679141 | Method of manufacturing a halftone phase shift mask | Jul 11, 1996 | Issued |
Array
(
[id] => 3769773
[patent_doc_number] => 05807647
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-15
[patent_title] => 'Method for determining phase variance and shifter stability of phase shift masks'
[patent_app_type] => 1
[patent_app_number] => 8/674805
[patent_app_country] => US
[patent_app_date] => 1996-07-03
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/807/05807647.pdf
[firstpage_image] =>[orig_patent_app_number] => 674805
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/674805 | Method for determining phase variance and shifter stability of phase shift masks | Jul 2, 1996 | Issued |
Array
(
[id] => 3789960
[patent_doc_number] => 05725975
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-10
[patent_title] => 'Gradation mask and process for producing the same'
[patent_app_type] => 1
[patent_app_number] => 8/675372
[patent_app_country] => US
[patent_app_date] => 1996-07-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[pdf_file] => patents/05/725/05725975.pdf
[firstpage_image] =>[orig_patent_app_number] => 675372
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/675372 | Gradation mask and process for producing the same | Jul 1, 1996 | Issued |
Array
(
[id] => 3766059
[patent_doc_number] => 05849438
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-15
[patent_title] => 'Phase shift mask and method for fabricating the same'
[patent_app_type] => 1
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[patent_app_country] => US
[patent_app_date] => 1996-06-28
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[pdf_file] => patents/05/849/05849438.pdf
[firstpage_image] =>[orig_patent_app_number] => 670841
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/670841 | Phase shift mask and method for fabricating the same | Jun 27, 1996 | Issued |
Array
(
[id] => 3823630
[patent_doc_number] => 05759723
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-02
[patent_title] => 'Light exposure mask for semiconductor devices and method for forming the same'
[patent_app_type] => 1
[patent_app_number] => 8/671509
[patent_app_country] => US
[patent_app_date] => 1996-06-27
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 671509
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/671509 | Light exposure mask for semiconductor devices and method for forming the same | Jun 26, 1996 | Issued |
Array
(
[id] => 3938366
[patent_doc_number] => 05989753
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-11-23
[patent_title] => 'Method, apparatus, and mask for pattern projection using a beam of charged particles'
[patent_app_type] => 1
[patent_app_number] => 8/670436
[patent_app_country] => US
[patent_app_date] => 1996-06-26
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[firstpage_image] =>[orig_patent_app_number] => 670436
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/670436 | Method, apparatus, and mask for pattern projection using a beam of charged particles | Jun 25, 1996 | Issued |