
Hung Nhat Ngo
Examiner (ID: 2310)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 3621, 2501, 2633 |
| Total Applications | 1627 |
| Issued Applications | 1441 |
| Pending Applications | 92 |
| Abandoned Applications | 94 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3732767
[patent_doc_number] => 05698349
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-16
[patent_title] => 'Sub-resolution phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/670271
[patent_app_country] => US
[patent_app_date] => 1996-06-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 10
[patent_no_of_words] => 1698
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/698/05698349.pdf
[firstpage_image] =>[orig_patent_app_number] => 670271
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/670271 | Sub-resolution phase shift mask | Jun 20, 1996 | Issued |
Array
(
[id] => 3783449
[patent_doc_number] => 05840446
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-24
[patent_title] => 'Mask for monitoring defect'
[patent_app_type] => 1
[patent_app_number] => 8/666885
[patent_app_country] => US
[patent_app_date] => 1996-06-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 1861
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/840/05840446.pdf
[firstpage_image] =>[orig_patent_app_number] => 666885
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/666885 | Mask for monitoring defect | Jun 18, 1996 | Issued |
Array
(
[id] => 3738423
[patent_doc_number] => 05786112
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-28
[patent_title] => 'Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask'
[patent_app_type] => 1
[patent_app_number] => 8/664865
[patent_app_country] => US
[patent_app_date] => 1996-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 26
[patent_figures_cnt] => 45
[patent_no_of_words] => 22384
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 152
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/786/05786112.pdf
[firstpage_image] =>[orig_patent_app_number] => 664865
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/664865 | Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask | Jun 16, 1996 | Issued |
Array
(
[id] => 3724985
[patent_doc_number] => 05670281
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-23
[patent_title] => 'Masks and methods of forming masks which avoid phase conflict problems in phase shifting masks'
[patent_app_type] => 1
[patent_app_number] => 8/665327
[patent_app_country] => US
[patent_app_date] => 1996-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 18
[patent_no_of_words] => 3026
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 133
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/670/05670281.pdf
[firstpage_image] =>[orig_patent_app_number] => 665327
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/665327 | Masks and methods of forming masks which avoid phase conflict problems in phase shifting masks | Jun 16, 1996 | Issued |
Array
(
[id] => 3767515
[patent_doc_number] => 05756234
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-26
[patent_title] => 'High accuracy fabrication of X-ray masks with optical and E-beam lithography'
[patent_app_type] => 1
[patent_app_number] => 8/663826
[patent_app_country] => US
[patent_app_date] => 1996-06-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 2330
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/756/05756234.pdf
[firstpage_image] =>[orig_patent_app_number] => 663826
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/663826 | High accuracy fabrication of X-ray masks with optical and E-beam lithography | Jun 13, 1996 | Issued |
Array
(
[id] => 3822638
[patent_doc_number] => 05731109
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-24
[patent_title] => 'Pattern structure of photomask comprising a sawtooth pattern'
[patent_app_type] => 1
[patent_app_number] => 8/661372
[patent_app_country] => US
[patent_app_date] => 1996-06-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 1250
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/731/05731109.pdf
[firstpage_image] =>[orig_patent_app_number] => 661372
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/661372 | Pattern structure of photomask comprising a sawtooth pattern | Jun 10, 1996 | Issued |
Array
(
[id] => 3737277
[patent_doc_number] => 05753417
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-19
[patent_title] => 'Multiple exposure masking system for forming multi-level resist profiles'
[patent_app_type] => 1
[patent_app_number] => 8/665013
[patent_app_country] => US
[patent_app_date] => 1996-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 6754
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 172
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/753/05753417.pdf
[firstpage_image] =>[orig_patent_app_number] => 665013
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/665013 | Multiple exposure masking system for forming multi-level resist profiles | Jun 9, 1996 | Issued |
Array
(
[id] => 3742990
[patent_doc_number] => 05716738
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-02-10
[patent_title] => 'Dark rims for attenuated phase shift mask'
[patent_app_type] => 1
[patent_app_number] => 8/660294
[patent_app_country] => US
[patent_app_date] => 1996-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 7
[patent_no_of_words] => 2024
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 35
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/716/05716738.pdf
[firstpage_image] =>[orig_patent_app_number] => 660294
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/660294 | Dark rims for attenuated phase shift mask | Jun 6, 1996 | Issued |
Array
(
[id] => 3846262
[patent_doc_number] => 05766803
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-16
[patent_title] => 'Mask generation technique for producing an integrated circuit with optimal metal interconnect layout for achieving global planarization'
[patent_app_type] => 1
[patent_app_number] => 8/659165
[patent_app_country] => US
[patent_app_date] => 1996-06-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 14
[patent_no_of_words] => 4508
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 167
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/766/05766803.pdf
[firstpage_image] =>[orig_patent_app_number] => 659165
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/659165 | Mask generation technique for producing an integrated circuit with optimal metal interconnect layout for achieving global planarization | Jun 4, 1996 | Issued |
Array
(
[id] => 3783430
[patent_doc_number] => 05736276
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-07
[patent_title] => 'Method for fabricating phase inverted mask'
[patent_app_type] => 1
[patent_app_number] => 8/657610
[patent_app_country] => US
[patent_app_date] => 1996-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 9
[patent_no_of_words] => 1038
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 37
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/736/05736276.pdf
[firstpage_image] =>[orig_patent_app_number] => 657610
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/657610 | Method for fabricating phase inverted mask | May 30, 1996 | Issued |
Array
(
[id] => 3724973
[patent_doc_number] => 05670280
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-23
[patent_title] => 'Optically controlled imaging phase mask element'
[patent_app_type] => 1
[patent_app_number] => 8/656886
[patent_app_country] => US
[patent_app_date] => 1996-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 3431
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 58
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/670/05670280.pdf
[firstpage_image] =>[orig_patent_app_number] => 656886
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/656886 | Optically controlled imaging phase mask element | May 29, 1996 | Issued |
Array
(
[id] => 3684569
[patent_doc_number] => 05663018
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-02
[patent_title] => 'Pattern writing method during X-ray mask fabrication'
[patent_app_type] => 1
[patent_app_number] => 8/654457
[patent_app_country] => US
[patent_app_date] => 1996-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 2900
[patent_no_of_claims] => 16
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/663/05663018.pdf
[firstpage_image] =>[orig_patent_app_number] => 654457
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/654457 | Pattern writing method during X-ray mask fabrication | May 27, 1996 | Issued |
Array
(
[id] => 3883295
[patent_doc_number] => 05723236
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-03
[patent_title] => 'Photomasks and a manufacturing method thereof'
[patent_app_type] => 1
[patent_app_number] => 8/654432
[patent_app_country] => US
[patent_app_date] => 1996-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 16
[patent_no_of_words] => 6156
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 4
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/723/05723236.pdf
[firstpage_image] =>[orig_patent_app_number] => 654432
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/654432 | Photomasks and a manufacturing method thereof | May 27, 1996 | Issued |
Array
(
[id] => 3839464
[patent_doc_number] => 05707765
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-01-13
[patent_title] => 'Photolithography mask using serifs and method thereof'
[patent_app_type] => 1
[patent_app_number] => 8/654459
[patent_app_country] => US
[patent_app_date] => 1996-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 3772
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/707/05707765.pdf
[firstpage_image] =>[orig_patent_app_number] => 654459
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/654459 | Photolithography mask using serifs and method thereof | May 27, 1996 | Issued |
Array
(
[id] => 4061559
[patent_doc_number] => 06007948
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-28
[patent_title] => 'Method of fabricating X-ray masks with reduced errors'
[patent_app_type] => 1
[patent_app_number] => 8/654456
[patent_app_country] => US
[patent_app_date] => 1996-05-28
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/007/06007948.pdf
[firstpage_image] =>[orig_patent_app_number] => 654456
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/654456 | Method of fabricating X-ray masks with reduced errors | May 27, 1996 | Issued |
Array
(
[id] => 3875012
[patent_doc_number] => 05728492
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-17
[patent_title] => 'Mask for projection system using charged particle beam'
[patent_app_type] => 1
[patent_app_number] => 8/649489
[patent_app_country] => US
[patent_app_date] => 1996-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 5313
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/728/05728492.pdf
[firstpage_image] =>[orig_patent_app_number] => 649489
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/649489 | Mask for projection system using charged particle beam | May 16, 1996 | Issued |
Array
(
[id] => 3883282
[patent_doc_number] => 05723235
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-03
[patent_title] => 'Method of producing photomask and exposing'
[patent_app_type] => 1
[patent_app_number] => 8/648665
[patent_app_country] => US
[patent_app_date] => 1996-05-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/723/05723235.pdf
[firstpage_image] =>[orig_patent_app_number] => 648665
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/648665 | Method of producing photomask and exposing | May 15, 1996 | Issued |
Array
(
[id] => 3692945
[patent_doc_number] => 05660957
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-08-26
[patent_title] => 'Electron-beam treatment procedure for patterned mask layers'
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[patent_app_number] => 8/649999
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[pdf_file] => patents/05/660/05660957.pdf
[firstpage_image] =>[orig_patent_app_number] => 649999
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/649999 | Electron-beam treatment procedure for patterned mask layers | May 15, 1996 | Issued |
Array
(
[id] => 3738409
[patent_doc_number] => 05786111
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-28
[patent_title] => 'Phase shift mask and fabricating method thereof'
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[patent_app_number] => 8/647739
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[pdf_file] => patents/05/786/05786111.pdf
[firstpage_image] =>[orig_patent_app_number] => 647739
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/647739 | Phase shift mask and fabricating method thereof | May 14, 1996 | Issued |
Array
(
[id] => 3743052
[patent_doc_number] => 05716742
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-02-10
[patent_title] => 'Real time alignment system for a projection electron beam lithographic system'
[patent_app_type] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/716/05716742.pdf
[firstpage_image] =>[orig_patent_app_number] => 647838
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/647838 | Real time alignment system for a projection electron beam lithographic system | May 14, 1996 | Issued |