James R Greece
Examiner (ID: 6808, Phone: (571)272-3711 , Office: P/2872 )
Most Active Art Unit | 2872 |
Art Unit(s) | 2809, 2873, 2872 |
Total Applications | 1328 |
Issued Applications | 1099 |
Pending Applications | 75 |
Abandoned Applications | 154 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 6053530
[patent_doc_number] => 20110109890
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[patent_issue_date] => 2011-05-12
[patent_title] => 'LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/900956
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[pdf_file] => publications/A1/0109/20110109890.pdf
[firstpage_image] =>[orig_patent_app_number] => 12900956
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/900956 | LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Oct 7, 2010 | Abandoned |
Array
(
[id] => 6147208
[patent_doc_number] => 20110019170
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[patent_kind] => A1
[patent_issue_date] => 2011-01-27
[patent_title] => 'PROJECTION EXPOSURE APPARATUS AND STAGE UNIT, AND EXPOSURE METHOD'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/896580 | PROJECTION EXPOSURE APPARATUS AND STAGE UNIT, AND EXPOSURE METHOD | Sep 30, 2010 | Abandoned |
Array
(
[id] => 7585287
[patent_doc_number] => 20110279797
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-11-17
[patent_title] => 'APPARATUS AND METHOD FOR CALIBRATING LITHOGRAPHY PROCESS'
[patent_app_type] => utility
[patent_app_number] => 12/891738
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[patent_app_date] => 2010-09-27
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[pdf_file] => publications/A1/0279/20110279797.pdf
[firstpage_image] =>[orig_patent_app_number] => 12891738
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/891738 | Apparatus and method for calibrating lithography process | Sep 26, 2010 | Issued |
Array
(
[id] => 9470435
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[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-05-13
[patent_title] => 'Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice'
[patent_app_type] => utility
[patent_app_number] => 12/923282
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/923282 | Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice | Sep 12, 2010 | Issued |
Array
(
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[patent_kind] => A1
[patent_issue_date] => 2012-02-16
[patent_title] => 'LENS HEATING COMPENSATION IN PHOTOLITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 12/857316
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/857316 | Lens heating compensation in photolithography | Aug 15, 2010 | Issued |
Array
(
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[patent_title] => 'Detection apparatus, exposure apparatus, and device fabrication method'
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Array
(
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[patent_title] => 'EXPOSURE APPARATUS, SYSTEM, UPDATING METHOD, AND DEVICE MANUFACTURING METHOD'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/853585 | EXPOSURE APPARATUS, SYSTEM, UPDATING METHOD, AND DEVICE MANUFACTURING METHOD | Aug 9, 2010 | Abandoned |
Array
(
[id] => 10871603
[patent_doc_number] => 08896811
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-11-25
[patent_title] => 'Positioning system and a method for positioning a substage with respect to a frame'
[patent_app_type] => utility
[patent_app_number] => 12/853916
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Array
(
[id] => 9313085
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[patent_issue_date] => 2014-02-18
[patent_title] => 'Exposure method, exposure apparatus, photomask and method for manufacturing photomask'
[patent_app_type] => utility
[patent_app_number] => 12/848748
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Array
(
[id] => 11179249
[patent_doc_number] => 09411241
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[patent_kind] => B2
[patent_issue_date] => 2016-08-09
[patent_title] => 'Facet mirror for use in a projection exposure apparatus for microlithography'
[patent_app_type] => utility
[patent_app_number] => 12/848603
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Array
(
[id] => 6147210
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[patent_title] => 'ILLUMINATION OPTICS AND PROJECTION EXPOSURE APPARATUS'
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Array
(
[id] => 6568382
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Array
(
[id] => 8996292
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Array
(
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Array
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Array
(
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Array
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Array
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/797188 | Illumination system for a microlithographic projection exposure apparatus | Jun 8, 2010 | Issued |