James R Greece
Examiner (ID: 6808, Phone: (571)272-3711 , Office: P/2872 )
Most Active Art Unit | 2872 |
Art Unit(s) | 2809, 2873, 2872 |
Total Applications | 1328 |
Issued Applications | 1099 |
Pending Applications | 75 |
Abandoned Applications | 154 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 5456882
[patent_doc_number] => 20090257034
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[patent_kind] => A1
[patent_issue_date] => 2009-10-15
[patent_title] => 'LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/407360
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[pdf_file] => publications/A1/0257/20090257034.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/407360 | Lithographic apparatus and device manufacturing method | Mar 18, 2009 | Issued |
Array
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[patent_doc_number] => 09063406
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[patent_kind] => B2
[patent_issue_date] => 2015-06-23
[patent_title] => 'Exposure apparatus and a method of manufacturing a device that conduct exposure using a set light source shape'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/407310 | Exposure apparatus and a method of manufacturing a device that conduct exposure using a set light source shape | Mar 18, 2009 | Issued |
Array
(
[id] => 6457039
[patent_doc_number] => 20100039628
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-02-18
[patent_title] => 'Cleaning tool, cleaning method, and device fabricating method'
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Array
(
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[patent_title] => 'Method for wafer alignment'
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Array
(
[id] => 8422911
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[patent_title] => 'Super-resolution lithography apparatus and method based on multi light exposure method'
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Array
(
[id] => 5556602
[patent_doc_number] => 20090268179
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-10-29
[patent_title] => 'METHOD OF ALIGNING AN EXPOSURE APPARATUS, METHOD OF EXPOSING A PHOTORESIST FILM USING THE SAME AND EXPOSURE APPARATUS FOR PERFORMING THE METHOD OF EXPOSING A PHOTORESIST FILM'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/402416 | Method of aligning an exposure apparatus, method of exposing a photoresist film using the same and exposure apparatus for performing the method of exposing a photoresist film | Mar 10, 2009 | Issued |
Array
(
[id] => 5384047
[patent_doc_number] => 20090225291
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[patent_issue_date] => 2009-09-10
[patent_title] => 'EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD'
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Array
(
[id] => 6218468
[patent_doc_number] => 20100053577
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[patent_kind] => A1
[patent_issue_date] => 2010-03-04
[patent_title] => 'ROLL-TO-ROLL TYPE APPARATUS FOR FORMING THIN FILM PATTERN'
[patent_app_type] => utility
[patent_app_number] => 12/401442
[patent_app_country] => US
[patent_app_date] => 2009-03-10
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Array
(
[id] => 5531780
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[patent_issue_date] => 2009-09-17
[patent_title] => 'METHOD OF MEASURING WAVEFRONT ERROR, METHOD OF CORRECTING WAVEFRONT ERROR, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/400701 | METHOD OF MEASURING WAVEFRONT ERROR, METHOD OF CORRECTING WAVEFRONT ERROR, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE | Mar 8, 2009 | Abandoned |
Array
(
[id] => 10883761
[patent_doc_number] => 08908146
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[patent_issue_date] => 2014-12-09
[patent_title] => 'Actuator system, lithographic apparatus, and device manufacturing method'
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Array
(
[id] => 5525683
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[patent_title] => 'Lithographic Apparatus, Method and Device Manufacturing Method'
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Array
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Array
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Array
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Array
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Array
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Array
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Array
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Array
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