Jason R. Holloway

Array ( [id] => 12935626 [patent_doc_number] => 09831097 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-11-28 [patent_title] => Methods for selective etching of a silicon material using HF gas without nitrogen etchants [patent_app_type] => utility [patent_app_number] => 15/043955 [patent_app_country] => US [patent_app_date] => 2016-02-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 5825 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15043955 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12151695 [patent_doc_number] => 20180022959 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2018-01-25 [patent_title] => 'POLISHING COMPOSITION' [patent_app_type] => utility [patent_app_number] => 15/549503 [patent_app_country] => US [patent_app_date] => 2016-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5330 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15549503 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12436278 [patent_doc_number] => 09978609 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-05-22 [patent_title] => Low dishing copper chemical mechanical planarization [patent_app_type] => utility [patent_app_number] => 15/001846 [patent_app_country] => US [patent_app_date] => 2016-01-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 4690 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 192 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15001846 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11007031 [patent_doc_number] => 20160203983 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-07-14 [patent_title] => 'METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES' [patent_app_type] => utility [patent_app_number] => 14/993141 [patent_app_country] => US [patent_app_date] => 2016-01-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 24 [patent_no_of_words] => 9908 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14993141 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11732718 [patent_doc_number] => 20170194161 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-07-06 [patent_title] => 'HIGH ASPECT RATIO PATTERNING OF HARD MASK MATERIALS BY ORGANIC SOFT MASKS' [patent_app_type] => utility [patent_app_number] => 14/985951 [patent_app_country] => US [patent_app_date] => 2015-12-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2818 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14985951 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 13194745 [patent_doc_number] => 10112278 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-10-30 [patent_title] => Polishing a ceramic component using a formulated slurry [patent_app_type] => utility [patent_app_number] => 14/984275 [patent_app_country] => US [patent_app_date] => 2015-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 6 [patent_no_of_words] => 6985 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14984275 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11357504 [patent_doc_number] => 09534148 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2017-01-03 [patent_title] => 'Method of polishing semiconductor substrate' [patent_app_type] => utility [patent_app_number] => 14/976066 [patent_app_country] => US [patent_app_date] => 2015-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4127 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14976066 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11710418 [patent_doc_number] => 20170178918 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-06-22 [patent_title] => 'POST-POLISH WAFER CLEANING' [patent_app_type] => utility [patent_app_number] => 14/974309 [patent_app_country] => US [patent_app_date] => 2015-12-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3949 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14974309 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 14706937 [patent_doc_number] => 10381227 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2019-08-13 [patent_title] => Methods of atomic layer etching (ALE) using sequential, self-limiting thermal reactions [patent_app_type] => utility [patent_app_number] => 15/534215 [patent_app_country] => US [patent_app_date] => 2015-12-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 43 [patent_no_of_words] => 19350 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 209 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15534215 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12058795 [patent_doc_number] => 20170335139 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-11-23 [patent_title] => 'CMP SLURRY COMPOSITION FOR POLISHING COPPER AND POLISHING METHOD USING THE SAME' [patent_app_type] => utility [patent_app_number] => 15/525321 [patent_app_country] => US [patent_app_date] => 2015-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3802 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15525321 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 13717577 [patent_doc_number] => 20170369743 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-12-28 [patent_title] => CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE POLISHING OF SUBSTRATES COMPRISING GERMANIUM [patent_app_type] => utility [patent_app_number] => 15/536447 [patent_app_country] => US [patent_app_date] => 2015-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12177 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -16 [patent_words_short_claim] => 273 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15536447 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10817264 [patent_doc_number] => 20160163426 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-06-09 [patent_title] => 'METHOD FOR MANUFACTURING CONDUCTIVE FILM' [patent_app_type] => utility [patent_app_number] => 14/957316 [patent_app_country] => US [patent_app_date] => 2015-12-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3083 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14957316 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12019639 [patent_doc_number] => 09812349 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-11-07 [patent_title] => 'Control of the incidence angle of an ion beam on a substrate' [patent_app_type] => utility [patent_app_number] => 14/956154 [patent_app_country] => US [patent_app_date] => 2015-12-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 14 [patent_no_of_words] => 7270 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 283 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14956154 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10718050 [patent_doc_number] => 20160064197 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-03-03 [patent_title] => 'METHODS AND APPARATUS FOR CONTROLLING PHOTORESIST LINE WIDTH ROUGHNESS WITH ENHANCED ELECTRON SPIN CONTROL' [patent_app_type] => utility [patent_app_number] => 14/939787 [patent_app_country] => US [patent_app_date] => 2015-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 6205 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14939787 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11225475 [patent_doc_number] => 09453190 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2016-09-27 [patent_title] => 'Surface treatment of textured silicon' [patent_app_type] => utility [patent_app_number] => 14/938961 [patent_app_country] => US [patent_app_date] => 2015-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 8 [patent_no_of_words] => 4412 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14938961 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11959311 [patent_doc_number] => 20170263463 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-09-14 [patent_title] => 'METHOD FOR ETCHING SILICON SUBSTRATE USING PLASMA GAS' [patent_app_type] => utility [patent_app_number] => 15/529298 [patent_app_country] => US [patent_app_date] => 2015-11-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3765 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15529298 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12553881 [patent_doc_number] => 10014183 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2018-07-03 [patent_title] => Method for patterning a thin film [patent_app_type] => utility [patent_app_number] => 15/523742 [patent_app_country] => US [patent_app_date] => 2015-11-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 33 [patent_no_of_words] => 6251 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 228 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15523742 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11740131 [patent_doc_number] => 09704723 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-07-11 [patent_title] => 'Processing systems and methods for halide scavenging' [patent_app_type] => utility [patent_app_number] => 14/936448 [patent_app_country] => US [patent_app_date] => 2015-11-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 25 [patent_no_of_words] => 31378 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 155 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14936448 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 12030088 [patent_doc_number] => 20170320187 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2017-11-09 [patent_title] => 'Polishing Method and Polishing Composition' [patent_app_type] => utility [patent_app_number] => 15/525017 [patent_app_country] => US [patent_app_date] => 2015-10-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 24295 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15525017 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10772100 [patent_doc_number] => 20160118256 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-04-28 [patent_title] => 'METHOD FOR SELECTIVITY ENHANCEMENT DURING DRY PLASMA ETCHING' [patent_app_type] => utility [patent_app_number] => 14/920414 [patent_app_country] => US [patent_app_date] => 2015-10-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 10058 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14920414 [rel_patent_id] =>[rel_patent_doc_number] =>)