
Jeffrie Robert Lund
Examiner (ID: 16128, Phone: (571)272-1437 , Office: P/1716 )
| Most Active Art Unit | 1716 |
| Art Unit(s) | 1763, 1716, 1792, 1109 |
| Total Applications | 1792 |
| Issued Applications | 1147 |
| Pending Applications | 176 |
| Abandoned Applications | 491 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1023836
[patent_doc_number] => 06884295
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-04-26
[patent_title] => 'Method of forming oxynitride film or the like and system for carrying out the same'
[patent_app_type] => utility
[patent_app_number] => 09/864374
[patent_app_country] => US
[patent_app_date] => 2001-05-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 21
[patent_no_of_words] => 16968
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[patent_words_short_claim] => 149
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/884/06884295.pdf
[firstpage_image] =>[orig_patent_app_number] => 09864374
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/864374 | Method of forming oxynitride film or the like and system for carrying out the same | May 24, 2001 | Issued |
Array
(
[id] => 6470662
[patent_doc_number] => 20020023715
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-02-28
[patent_title] => 'Substrate polishing apparatus and substrate polishing mehod'
[patent_app_type] => new
[patent_app_number] => 09/864208
[patent_app_country] => US
[patent_app_date] => 2001-05-25
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0023/20020023715.pdf
[firstpage_image] =>[orig_patent_app_number] => 09864208
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/864208 | Substrate polishing apparatus and substrate polishing mehod | May 24, 2001 | Abandoned |
Array
(
[id] => 7014543
[patent_doc_number] => 20010051403
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-12-13
[patent_title] => 'Method and apparatus for deposition of porous silica dielectrics'
[patent_app_type] => new
[patent_app_number] => 09/863979
[patent_app_country] => US
[patent_app_date] => 2001-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => publications/A1/0051/20010051403.pdf
[firstpage_image] =>[orig_patent_app_number] => 09863979
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/863979 | Method and apparatus for deposition of porous silica dielectrics | May 22, 2001 | Abandoned |
Array
(
[id] => 7285493
[patent_doc_number] => 20040108068
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-10
[patent_title] => 'Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism'
[patent_app_type] => new
[patent_app_number] => 10/276671
[patent_app_country] => US
[patent_app_date] => 2002-11-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[firstpage_image] =>[orig_patent_app_number] => 10276671
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/276671 | Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanism | May 15, 2001 | Issued |
Array
(
[id] => 5801657
[patent_doc_number] => 20020009868
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[patent_issue_date] => 2002-01-24
[patent_title] => 'Method of growing a thin film in gaseous phase and apparatus for growing a thin film in gaseous phase for use in said method'
[patent_app_type] => new
[patent_app_number] => 09/854672
[patent_app_country] => US
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[pdf_file] => publications/A1/0009/20020009868.pdf
[firstpage_image] =>[orig_patent_app_number] => 09854672
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/854672 | Method of growing a thin film in gaseous phase and apparatus for growing a thin film in gaseous phase for use in said method | May 14, 2001 | Abandoned |
Array
(
[id] => 7062841
[patent_doc_number] => 20010042511
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[patent_issue_date] => 2001-11-22
[patent_title] => 'Reduction of plasma edge effect on plasma enhanced CVD processes'
[patent_app_type] => new
[patent_app_number] => 09/853397
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[firstpage_image] =>[orig_patent_app_number] => 09853397
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/853397 | Reduction of plasma edge effect on plasma enhanced CVD processes | May 10, 2001 | Issued |
Array
(
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[patent_doc_number] => 06524428
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-02-25
[patent_title] => 'Method of holding substrate and substrate holding system'
[patent_app_type] => B2
[patent_app_number] => 09/849405
[patent_app_country] => US
[patent_app_date] => 2001-05-07
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[pdf_file] => patents/06/524/06524428.pdf
[firstpage_image] =>[orig_patent_app_number] => 09849405
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/849405 | Method of holding substrate and substrate holding system | May 6, 2001 | Issued |
Array
(
[id] => 1342747
[patent_doc_number] => 06579372
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-06-17
[patent_title] => 'Apparatus and method for depositing thin film on wafer using atomic layer deposition'
[patent_app_type] => B2
[patent_app_number] => 09/848579
[patent_app_country] => US
[patent_app_date] => 2001-05-03
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[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 7011
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[pdf_file] => patents/06/579/06579372.pdf
[firstpage_image] =>[orig_patent_app_number] => 09848579
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/848579 | Apparatus and method for depositing thin film on wafer using atomic layer deposition | May 2, 2001 | Issued |
Array
(
[id] => 6469968
[patent_doc_number] => 20020151186
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[patent_kind] => A1
[patent_issue_date] => 2002-10-17
[patent_title] => 'Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment'
[patent_app_type] => new
[patent_app_number] => 09/833437
[patent_app_country] => US
[patent_app_date] => 2001-04-11
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[pdf_file] => publications/A1/0151/20020151186.pdf
[firstpage_image] =>[orig_patent_app_number] => 09833437
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/833437 | Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment | Apr 10, 2001 | Issued |
Array
(
[id] => 5888095
[patent_doc_number] => 20020012749
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-31
[patent_title] => 'Method and apparatus for coating and/or treating substrates'
[patent_app_type] => new
[patent_app_number] => 09/821763
[patent_app_country] => US
[patent_app_date] => 2001-03-30
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/821763 | Method and apparatus for coating and/or treating substrates | Mar 29, 2001 | Abandoned |
Array
(
[id] => 6539854
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[patent_title] => 'Emissivity-change-free pumping plate kit in a single wafer chamber'
[patent_app_type] => new
[patent_app_number] => 09/798424
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Array
(
[id] => 5858666
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Array
(
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[patent_title] => 'Process tube having slit type process gas injection portion and hole type waste gas exhaust portion, and apparatus for fabricating semiconductor device'
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Array
(
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[patent_title] => 'Molecular contamination control system'
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Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/779549 | Substrate processing apparatus | Feb 8, 2001 | Abandoned |
Array
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Array
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Array
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Array
(
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