Application number | Title of the application | Filing Date | Status |
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09/401111 | RADIATION SENSITIVE COPOLYMERS, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEMS THEREOF | Sep 21, 1999 | Abandoned |
Array
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09/392280 | OXIMESULFONIC ACID ESTERS AND THE USE THEREOF AS LATENT SULFONIC ACIDS | Sep 8, 1999 | Abandoned |
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