Jennifer A Rivard
Examiner (ID: 8673, Phone: (571)272-2609 , Office: P/2911 )
Most Active Art Unit | 2911 |
Art Unit(s) | 2911, 2900, 2901 |
Total Applications | 6992 |
Issued Applications | 6938 |
Pending Applications | 3 |
Abandoned Applications | 50 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 1112590
[patent_doc_number] => 06803168
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2004-10-12
[patent_title] => 'Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition'
[patent_app_type] => B1
[patent_app_number] => 09/237125
[patent_app_country] => US
[patent_app_date] => 1999-01-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
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[pdf_file] => patents/06/803/06803168.pdf
[firstpage_image] =>[orig_patent_app_number] => 09237125
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/237125 | Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition | Jan 25, 1999 | Issued |
Array
(
[id] => 4104791
[patent_doc_number] => 06022666
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-08
[patent_title] => 'Chemical-sensitization photoresist composition'
[patent_app_type] => 1
[patent_app_number] => 9/236567
[patent_app_country] => US
[patent_app_date] => 1999-01-26
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/022/06022666.pdf
[firstpage_image] =>[orig_patent_app_number] => 236567
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/236567 | Chemical-sensitization photoresist composition | Jan 25, 1999 | Issued |
Array
(
[id] => 4232539
[patent_doc_number] => 06165680
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-26
[patent_title] => 'Dissolution inhibitor of chemically amplified photoresist and chemically amplified photoresist composition containing the same'
[patent_app_type] => 1
[patent_app_number] => 9/234516
[patent_app_country] => US
[patent_app_date] => 1999-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 6975
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[pdf_file] => patents/06/165/06165680.pdf
[firstpage_image] =>[orig_patent_app_number] => 234516
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/234516 | Dissolution inhibitor of chemically amplified photoresist and chemically amplified photoresist composition containing the same | Jan 20, 1999 | Issued |
Array
(
[id] => 4152229
[patent_doc_number] => 06103449
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-15
[patent_title] => 'Negative working photoresist composition'
[patent_app_type] => 1
[patent_app_number] => 9/229684
[patent_app_country] => US
[patent_app_date] => 1999-01-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 8630
[patent_no_of_claims] => 2
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[pdf_file] => patents/06/103/06103449.pdf
[firstpage_image] =>[orig_patent_app_number] => 229684
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/229684 | Negative working photoresist composition | Jan 12, 1999 | Issued |
Array
(
[id] => 7636795
[patent_doc_number] => 06379860
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-30
[patent_title] => 'Positive photosensitive composition'
[patent_app_type] => B1
[patent_app_number] => 09/220682
[patent_app_country] => US
[patent_app_date] => 1998-12-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14135
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[pdf_file] => patents/06/379/06379860.pdf
[firstpage_image] =>[orig_patent_app_number] => 09220682
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/220682 | Positive photosensitive composition | Dec 22, 1998 | Issued |
Array
(
[id] => 4403798
[patent_doc_number] => 06171756
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-09
[patent_title] => 'Photoactive materials applicable to imaging systems'
[patent_app_type] => 1
[patent_app_number] => 9/218079
[patent_app_country] => US
[patent_app_date] => 1998-12-22
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 6082
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[pdf_file] => patents/06/171/06171756.pdf
[firstpage_image] =>[orig_patent_app_number] => 218079
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/218079 | Photoactive materials applicable to imaging systems | Dec 21, 1998 | Issued |
Array
(
[id] => 4195238
[patent_doc_number] => 06013415
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-11
[patent_title] => 'Radiation sensitive composition'
[patent_app_type] => 1
[patent_app_number] => 9/210794
[patent_app_country] => US
[patent_app_date] => 1998-12-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 11801
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[patent_words_short_claim] => 91
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/013/06013415.pdf
[firstpage_image] =>[orig_patent_app_number] => 210794
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/210794 | Radiation sensitive composition | Dec 14, 1998 | Issued |
Array
(
[id] => 4150833
[patent_doc_number] => 06106994
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-22
[patent_title] => 'Production process of polyphenol diesters, and positive photosensitive compositions'
[patent_app_type] => 1
[patent_app_number] => 9/210716
[patent_app_country] => US
[patent_app_date] => 1998-12-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6256
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 148
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/106/06106994.pdf
[firstpage_image] =>[orig_patent_app_number] => 210716
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/210716 | Production process of polyphenol diesters, and positive photosensitive compositions | Dec 13, 1998 | Issued |
Array
(
[id] => 4112158
[patent_doc_number] => 06045973
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-04
[patent_title] => 'Photoimageable compositions having improved chemical resistance and stripping ability'
[patent_app_type] => 1
[patent_app_number] => 9/209724
[patent_app_country] => US
[patent_app_date] => 1998-12-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 4202
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[pdf_file] => patents/06/045/06045973.pdf
[firstpage_image] =>[orig_patent_app_number] => 209724
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/209724 | Photoimageable compositions having improved chemical resistance and stripping ability | Dec 10, 1998 | Issued |
Array
(
[id] => 4406546
[patent_doc_number] => 06265133
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-07-24
[patent_title] => 'Radiation curable resin composition'
[patent_app_type] => 1
[patent_app_number] => 9/209418
[patent_app_country] => US
[patent_app_date] => 1998-12-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5800
[patent_no_of_claims] => 20
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[pdf_file] => patents/06/265/06265133.pdf
[firstpage_image] =>[orig_patent_app_number] => 209418
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/209418 | Radiation curable resin composition | Dec 10, 1998 | Issued |
Array
(
[id] => 4203125
[patent_doc_number] => 06077644
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-20
[patent_title] => 'Positive-working resist composition'
[patent_app_type] => 1
[patent_app_number] => 9/207202
[patent_app_country] => US
[patent_app_date] => 1998-12-08
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[pdf_file] => patents/06/077/06077644.pdf
[firstpage_image] =>[orig_patent_app_number] => 207202
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/207202 | Positive-working resist composition | Dec 7, 1998 | Issued |
Array
(
[id] => 4403786
[patent_doc_number] => 06171755
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-09
[patent_title] => 'Chemically amplified resist'
[patent_app_type] => 1
[patent_app_number] => 9/201728
[patent_app_country] => US
[patent_app_date] => 1998-11-30
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[pdf_file] => patents/06/171/06171755.pdf
[firstpage_image] =>[orig_patent_app_number] => 201728
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/201728 | Chemically amplified resist | Nov 29, 1998 | Issued |
Array
(
[id] => 4153249
[patent_doc_number] => 06114085
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-09-05
[patent_title] => 'Antireflective composition for a deep ultraviolet photoresist'
[patent_app_type] => 1
[patent_app_number] => 9/195057
[patent_app_country] => US
[patent_app_date] => 1998-11-18
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[pdf_file] => patents/06/114/06114085.pdf
[firstpage_image] =>[orig_patent_app_number] => 195057
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/195057 | Antireflective composition for a deep ultraviolet photoresist | Nov 17, 1998 | Issued |
Array
(
[id] => 4096288
[patent_doc_number] => 06048671
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-11
[patent_title] => 'Ultra-fine microfabrication method using an energy beam'
[patent_app_type] => 1
[patent_app_number] => 9/195255
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[pdf_file] => patents/06/048/06048671.pdf
[firstpage_image] =>[orig_patent_app_number] => 195255
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/195255 | Ultra-fine microfabrication method using an energy beam | Nov 17, 1998 | Issued |
Array
(
[id] => 4392843
[patent_doc_number] => 06296986
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-02
[patent_title] => 'Photoinitiator'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/068288 | Photoinitiator | Nov 9, 1998 | Issued |
Array
(
[id] => 4153730
[patent_doc_number] => 06156478
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[patent_issue_date] => 2000-12-05
[patent_title] => 'Photocurable and photopatternable hydrogel matrix based on azlactone copolymers'
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[patent_app_number] => 9/183197
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[firstpage_image] =>[orig_patent_app_number] => 183197
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/183197 | Photocurable and photopatternable hydrogel matrix based on azlactone copolymers | Oct 29, 1998 | Issued |
Array
(
[id] => 4203170
[patent_doc_number] => 06077647
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-20
[patent_title] => 'Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same'
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[patent_app_number] => 9/173008
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[firstpage_image] =>[orig_patent_app_number] => 173008
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/173008 | Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same | Oct 14, 1998 | Issued |
Array
(
[id] => 4084293
[patent_doc_number] => 06132929
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[patent_issue_date] => 2000-10-17
[patent_title] => 'Positive type photosensitive composition for infrared lasers'
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Array
(
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[patent_title] => 'Chemical-amplification-type negative resist composition'
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Array
(
[id] => 4082174
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[patent_issue_date] => 2000-12-19
[patent_title] => 'Method for extreme ultraviolet lithography'
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[pdf_file] => patents/06/162/06162577.pdf
[firstpage_image] =>[orig_patent_app_number] => 158943
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/158943 | Method for extreme ultraviolet lithography | Sep 20, 1998 | Issued |