Jennifer A Rivard
Examiner (ID: 8673, Phone: (571)272-2609 , Office: P/2911 )
Most Active Art Unit | 2911 |
Art Unit(s) | 2911, 2900, 2901 |
Total Applications | 6992 |
Issued Applications | 6938 |
Pending Applications | 3 |
Abandoned Applications | 50 |
Applications
Application number | Title of the application | Filing Date | Status |
---|---|---|---|
Array
(
[id] => 3997288
[patent_doc_number] => 05858617
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-12
[patent_title] => 'Photopolymerizable composition and presensitized planographic printing plate employing the same'
[patent_app_type] => 1
[patent_app_number] => 8/812030
[patent_app_country] => US
[patent_app_date] => 1997-03-06
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[pdf_file] => patents/05/858/05858617.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/812030 | Photopolymerizable composition and presensitized planographic printing plate employing the same | Mar 5, 1997 | Issued |
Array
(
[id] => 1223338
[patent_doc_number] => 06699645
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2004-03-02
[patent_title] => 'Method for the formation of resist patterns'
[patent_app_type] => B2
[patent_app_number] => 08/810773
[patent_app_country] => US
[patent_app_date] => 1997-03-05
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[firstpage_image] =>[orig_patent_app_number] => 08810773
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/810773 | Method for the formation of resist patterns | Mar 4, 1997 | Issued |
Array
(
[id] => 3867252
[patent_doc_number] => 05763142
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-09
[patent_title] => 'Method for forming resist pattern'
[patent_app_type] => 1
[patent_app_number] => 8/807180
[patent_app_country] => US
[patent_app_date] => 1997-02-27
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[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/05/763/05763142.pdf
[firstpage_image] =>[orig_patent_app_number] => 807180
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/807180 | Method for forming resist pattern | Feb 26, 1997 | Issued |
Array
(
[id] => 3864831
[patent_doc_number] => 05837423
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-17
[patent_title] => 'Semiconductor IC device fabricating method'
[patent_app_type] => 1
[patent_app_number] => 8/804922
[patent_app_country] => US
[patent_app_date] => 1997-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
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[patent_no_of_words] => 19967
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[pdf_file] => patents/05/837/05837423.pdf
[firstpage_image] =>[orig_patent_app_number] => 804922
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/804922 | Semiconductor IC device fabricating method | Feb 23, 1997 | Issued |
Array
(
[id] => 4055176
[patent_doc_number] => 05863705
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-26
[patent_title] => 'Photolithographic pattern generation'
[patent_app_type] => 1
[patent_app_number] => 8/793546
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[patent_app_date] => 1997-02-21
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[pdf_file] => patents/05/863/05863705.pdf
[firstpage_image] =>[orig_patent_app_number] => 793546
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/793546 | Photolithographic pattern generation | Feb 20, 1997 | Issued |
Array
(
[id] => 3756536
[patent_doc_number] => 05843624
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[patent_kind] => NA
[patent_issue_date] => 1998-12-01
[patent_title] => 'Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material'
[patent_app_type] => 1
[patent_app_number] => 8/803703
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[pdf_file] => patents/05/843/05843624.pdf
[firstpage_image] =>[orig_patent_app_number] => 803703
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/803703 | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | Feb 20, 1997 | Issued |
Array
(
[id] => 3867594
[patent_doc_number] => 05837586
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-17
[patent_title] => '4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition'
[patent_app_type] => 1
[patent_app_number] => 8/801735
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[patent_app_date] => 1997-02-14
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/837/05837586.pdf
[firstpage_image] =>[orig_patent_app_number] => 801735
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/801735 | 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition | Feb 13, 1997 | Issued |
Array
(
[id] => 4055209
[patent_doc_number] => 05863707
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-26
[patent_title] => 'Method for producing ultra-fine interconnection features'
[patent_app_type] => 1
[patent_app_number] => 8/798992
[patent_app_country] => US
[patent_app_date] => 1997-02-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 5434
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[pdf_file] => patents/05/863/05863707.pdf
[firstpage_image] =>[orig_patent_app_number] => 798992
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/798992 | Method for producing ultra-fine interconnection features | Feb 10, 1997 | Issued |
Array
(
[id] => 3824034
[patent_doc_number] => 05759751
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-02
[patent_title] => 'Method of peeling photo-resist layer without damage to metal wiring'
[patent_app_type] => 1
[patent_app_number] => 8/795631
[patent_app_country] => US
[patent_app_date] => 1997-02-06
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/759/05759751.pdf
[firstpage_image] =>[orig_patent_app_number] => 795631
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/795631 | Method of peeling photo-resist layer without damage to metal wiring | Feb 5, 1997 | Issued |
Array
(
[id] => 4082630
[patent_doc_number] => 06025112
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-15
[patent_title] => 'Photocurable composition and photosensitive capsules'
[patent_app_type] => 1
[patent_app_number] => 8/796389
[patent_app_country] => US
[patent_app_date] => 1997-02-04
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/025/06025112.pdf
[firstpage_image] =>[orig_patent_app_number] => 796389
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/796389 | Photocurable composition and photosensitive capsules | Feb 3, 1997 | Issued |
Array
(
[id] => 3789421
[patent_doc_number] => 05780204
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-14
[patent_title] => 'Backside wafer polishing for improved photolithography'
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[patent_app_number] => 8/790886
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[pdf_file] => patents/05/780/05780204.pdf
[firstpage_image] =>[orig_patent_app_number] => 790886
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/790886 | Backside wafer polishing for improved photolithography | Feb 2, 1997 | Issued |
Array
(
[id] => 3770008
[patent_doc_number] => 05807660
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-09-15
[patent_title] => 'Avoid photoresist lifting by post-oxide-dep plasma treatment'
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[pdf_file] => patents/05/807/05807660.pdf
[firstpage_image] =>[orig_patent_app_number] => 794599
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/794599 | Avoid photoresist lifting by post-oxide-dep plasma treatment | Feb 2, 1997 | Issued |
Array
(
[id] => 3766511
[patent_doc_number] => 05849467
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-12-15
[patent_title] => 'Method for the pre-treatment of a photoresist layer on a substrate surface'
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[firstpage_image] =>[orig_patent_app_number] => 788442
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/788442 | Method for the pre-treatment of a photoresist layer on a substrate surface | Jan 27, 1997 | Issued |
Array
(
[id] => 3997331
[patent_doc_number] => 05858620
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-12
[patent_title] => 'Semiconductor device and method for manufacturing the same'
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[pdf_file] => patents/05/858/05858620.pdf
[firstpage_image] =>[orig_patent_app_number] => 785846
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/785846 | Semiconductor device and method for manufacturing the same | Jan 23, 1997 | Issued |
Array
(
[id] => 3997345
[patent_doc_number] => 05858621
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-12
[patent_title] => 'Bi-layer silylation process using anti-reflective-coatings (ARC) for making distortion-free submicrometer photoresist patterns'
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Array
(
[id] => 3923628
[patent_doc_number] => 05876904
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[patent_issue_date] => 1999-03-02
[patent_title] => 'Method of providing a positive resist pattern'
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[firstpage_image] =>[orig_patent_app_number] => 782642
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/782642 | Method of providing a positive resist pattern | Jan 13, 1997 | Issued |
Array
(
[id] => 3830514
[patent_doc_number] => 05814431
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[patent_title] => 'Photosensitive composition and lithographic printing plate'
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Array
(
[id] => 4060305
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/768539 | Fractionated novolak resin and photoresist composition therefrom | Dec 17, 1996 | Issued |
Array
(
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[firstpage_image] =>[orig_patent_app_number] => 766139
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/766139 | Method for producing micro-optic elements with gray scale mask | Dec 16, 1996 | Issued |