Jennifer M. Kim

Array ( [id] => 6692460 [patent_doc_number] => 20030039892 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-02-27 [patent_title] => 'Method of optical proximity correction' [patent_app_type] => new [patent_app_number] => 09/930305 [patent_app_country] => US [patent_app_date] => 2001-08-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 1742 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 62 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0039/20030039892.pdf [firstpage_image] =>[orig_patent_app_number] => 09930305 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1082735 [patent_doc_number] => 06833234 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-12-21 [patent_title] => 'Stereolithographic patterning with variable size exposure areas' [patent_app_type] => B1 [patent_app_number] => 09/922973 [patent_app_country] => US [patent_app_date] => 2001-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 36 [patent_no_of_words] => 19517 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/833/06833234.pdf [firstpage_image] =>[orig_patent_app_number] => 09922973 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1140748 [patent_doc_number] => 06777170 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-08-17 [patent_title] => 'Stereolithographic patterning by variable dose light delivery' [patent_app_type] => B1 [patent_app_number] => 09/922974 [patent_app_country] => US [patent_app_date] => 2001-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 36 [patent_no_of_words] => 19543 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/777/06777170.pdf [firstpage_image] =>[orig_patent_app_number] => 09922974 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1317342 [patent_doc_number] => 06605396 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-08-12 [patent_title] => 'Resolution enhancement for alternating phase shift masks' [patent_app_type] => B2 [patent_app_number] => 09/923527 [patent_app_country] => US [patent_app_date] => 2001-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 12 [patent_no_of_words] => 3926 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/605/06605396.pdf [firstpage_image] =>[orig_patent_app_number] => 09923527 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1199840 [patent_doc_number] => 06723476 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-04-20 [patent_title] => 'Methods of patterning materials; and photomasks' [patent_app_type] => B2 [patent_app_number] => 09/920971 [patent_app_country] => US [patent_app_date] => 2001-08-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 4494 [patent_no_of_claims] => 55 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/723/06723476.pdf [firstpage_image] =>[orig_patent_app_number] => 09920971 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1199879 [patent_doc_number] => 06723494 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-04-20 [patent_title] => 'Conductor pattern and electronic component having the same' [patent_app_type] => B2 [patent_app_number] => 09/903792 [patent_app_country] => US [patent_app_date] => 2001-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 17 [patent_no_of_words] => 3080 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/723/06723494.pdf [firstpage_image] =>[orig_patent_app_number] => 09903792 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1296491 [patent_doc_number] => 06627361 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-09-30 [patent_title] => 'Assist features for contact hole mask patterns' [patent_app_type] => B2 [patent_app_number] => 09/901241 [patent_app_country] => US [patent_app_date] => 2001-07-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 3618 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 46 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/627/06627361.pdf [firstpage_image] =>[orig_patent_app_number] => 09901241 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1220075 [patent_doc_number] => 06703168 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-03-09 [patent_title] => 'Photomask' [patent_app_type] => B1 [patent_app_number] => 09/869848 [patent_app_country] => US [patent_app_date] => 2001-07-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 32 [patent_figures_cnt] => 190 [patent_no_of_words] => 30166 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 141 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/703/06703168.pdf [firstpage_image] =>[orig_patent_app_number] => 09869848 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6755625 [patent_doc_number] => 20030003402 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-01-02 [patent_title] => 'Method and apparatus to prevent pattern collapse of photoresist layer due to capillary forces' [patent_app_type] => new [patent_app_number] => 09/895394 [patent_app_country] => US [patent_app_date] => 2001-07-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 3608 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20030003402.pdf [firstpage_image] =>[orig_patent_app_number] => 09895394 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1305535 [patent_doc_number] => 06617082 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-09-09 [patent_title] => 'Microelectromechanical system mask' [patent_app_type] => B2 [patent_app_number] => 09/895696 [patent_app_country] => US [patent_app_date] => 2001-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 1939 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/617/06617082.pdf [firstpage_image] =>[orig_patent_app_number] => 09895696 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1239259 [patent_doc_number] => 06686130 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-02-03 [patent_title] => 'Pattern forming method using photolithography' [patent_app_type] => B2 [patent_app_number] => 09/893485 [patent_app_country] => US [patent_app_date] => 2001-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 26 [patent_no_of_words] => 9289 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/686/06686130.pdf [firstpage_image] =>[orig_patent_app_number] => 09893485 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 790452 [patent_doc_number] => 06984472 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-01-10 [patent_title] => 'Exposure method and apparatus' [patent_app_type] => utility [patent_app_number] => 09/891213 [patent_app_country] => US [patent_app_date] => 2001-06-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4556 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/984/06984472.pdf [firstpage_image] =>[orig_patent_app_number] => 09891213 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1112622 [patent_doc_number] => 06803178 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-10-12 [patent_title] => 'Two mask photoresist exposure pattern for dense and isolated regions' [patent_app_type] => B1 [patent_app_number] => 09/887035 [patent_app_country] => US [patent_app_date] => 2001-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 16 [patent_no_of_words] => 3800 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/803/06803178.pdf [firstpage_image] =>[orig_patent_app_number] => 09887035 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6141446 [patent_doc_number] => 20020001764 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-03 [patent_title] => 'Method and device for analyzing structures of a photomask' [patent_app_type] => new [patent_app_number] => 09/891189 [patent_app_country] => US [patent_app_date] => 2001-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 2687 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0001/20020001764.pdf [firstpage_image] =>[orig_patent_app_number] => 09891189 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1150813 [patent_doc_number] => 06767672 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-07-27 [patent_title] => 'Method for forming a phase-shifting mask for semiconductor device manufacture' [patent_app_type] => B2 [patent_app_number] => 09/886984 [patent_app_country] => US [patent_app_date] => 2001-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 16 [patent_no_of_words] => 2017 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/767/06767672.pdf [firstpage_image] =>[orig_patent_app_number] => 09886984 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1196120 [patent_doc_number] => 06727025 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2004-04-27 [patent_title] => 'Photomask and exposure method' [patent_app_type] => B1 [patent_app_number] => 09/806593 [patent_app_country] => US [patent_app_date] => 2001-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 8506 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/727/06727025.pdf [firstpage_image] =>[orig_patent_app_number] => 09806593 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 6325694 [patent_doc_number] => 20020197565 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-12-26 [patent_title] => 'Method of transferring photomask patterns' [patent_app_type] => new [patent_app_number] => 09/885037 [patent_app_country] => US [patent_app_date] => 2001-06-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 2037 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0197/20020197565.pdf [firstpage_image] =>[orig_patent_app_number] => 09885037 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1180202 [patent_doc_number] => 06737222 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-05-18 [patent_title] => 'Dual damascene process utilizing a bi-layer imaging layer' [patent_app_type] => B2 [patent_app_number] => 09/884834 [patent_app_country] => US [patent_app_date] => 2001-06-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 17 [patent_no_of_words] => 4840 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 140 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/737/06737222.pdf [firstpage_image] =>[orig_patent_app_number] => 09884834 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1266161 [patent_doc_number] => 06656644 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-12-02 [patent_title] => 'Manufacturing method of photomask and photomask' [patent_app_type] => B2 [patent_app_number] => 09/881701 [patent_app_country] => US [patent_app_date] => 2001-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 73 [patent_figures_cnt] => 167 [patent_no_of_words] => 33893 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/656/06656644.pdf [firstpage_image] =>[orig_patent_app_number] => 09881701 [rel_patent_id] =>[rel_patent_doc_number] =>)