
John D. Lee
Examiner (ID: 17114)
| Most Active Art Unit | 2501 |
| Art Unit(s) | 2874, 2606, 2507, 2501, 2504, 3621 |
| Total Applications | 2783 |
| Issued Applications | 2467 |
| Pending Applications | 118 |
| Abandoned Applications | 198 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 1009377
[patent_doc_number] => 06900139
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[patent_title] => 'Method for photoresist trim endpoint detection'
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[pdf_file] => patents/06/900/06900139.pdf
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Array
(
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[patent_title] => 'METHOD FOR FORMING SILICON CONTAINING LAYERS ON A SUBSTRATE'
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Array
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Array
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[patent_title] => 'Device transferring method, and device arraying method and image display unit fabricating method using the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/297872 | Device transferring method, and device arraying method and image display unit fabricating method using the same | Apr 8, 2002 | Issued |
Array
(
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[patent_title] => 'Wiring layer dry etching method and semiconductor device manufacturing method'
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Array
(
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Array
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[patent_title] => 'Method of fabricating a self-aligned via contact for a magnetic memory element'
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Array
(
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[patent_title] => 'Method of fabricating a dual damascene structure on a semiconductor substrate'
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[patent_app_date] => 2002-03-05
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/087776 | Method of fabricating a dual damascene structure on a semiconductor substrate | Mar 4, 2002 | Abandoned |
Array
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[patent_title] => 'Method of manufacturing a barrier metal layer using atomic layer deposition'
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Array
(
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[patent_title] => 'Semiconductor device having interconnection implemented by refractory metal nitride layer and refractory metal silicide layer and process of fabrication thereof'
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[patent_app_number] => 10/074936
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Array
(
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[patent_title] => 'Semiconductor processing method using photoresist and an antireflective coating'
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Array
(
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Array
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Array
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Array
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Array
(
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Array
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Array
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Array
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