
John L. Leguyader
Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )
| Most Active Art Unit | 1805 |
| Art Unit(s) | 1804, 1633, 1621, 1805, 1809, 1635, 2899 |
| Total Applications | 501 |
| Issued Applications | 292 |
| Pending Applications | 54 |
| Abandoned Applications | 155 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5575348
[patent_doc_number] => 20090142710
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[patent_kind] => A1
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[patent_title] => 'METHOD FOR PATTERNING A PHOTORESIST LAYER'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/106837 | METHOD FOR PATTERNING A PHOTORESIST LAYER | Apr 20, 2008 | Abandoned |
Array
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[patent_issue_date] => 2009-10-08
[patent_title] => 'Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step'
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Array
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[patent_title] => 'DI water rinse of photoresists with insoluble dye content'
[patent_app_type] => utility
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[patent_app_date] => 2008-03-28
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Array
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[patent_issue_date] => 2008-07-17
[patent_title] => 'Methods for Providing a Confined Liquid for Immersion Lithography'
[patent_app_type] => utility
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[patent_app_date] => 2008-03-25
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Array
(
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Array
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[patent_title] => 'Double Patterning Strategy For Contact Hole and Trench in Photolithography'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/047086 | Double patterning strategy for contact hole and trench in photolithography | Mar 11, 2008 | Issued |
Array
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Array
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[patent_issue_date] => 2009-09-10
[patent_title] => 'METHOD OF REDUCING PHOTORESIST DEFECTS DURING FABRICATION OF A SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/045373
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/045373 | Method of reducing photoresist defects during fabrication of a semiconductor device | Mar 9, 2008 | Issued |
Array
(
[id] => 4698195
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/042374 | PATTERN FORMING METHOD AND PATTERN FORMATION APPARATUS | Mar 4, 2008 | Abandoned |
Array
(
[id] => 4698191
[patent_doc_number] => 20080220375
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[patent_issue_date] => 2008-09-11
[patent_title] => 'Methods of reworking a semiconductor substrate and methods of forming a pattern in a semiconductor device'
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[patent_app_number] => 12/074430
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Array
(
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[patent_title] => 'Method for fabricating electrical circuitry on ultra-thin plastic films'
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Array
(
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/037144 | Method of forming micro pattern of semiconductor device | Feb 25, 2008 | Issued |
Array
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[patent_title] => 'Photoresist compositions and methods related to near field masks'
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/034000 | Process sequence for formation of patterned hard mask film (RFP) without need for photoresist or dry etch | Feb 19, 2008 | Issued |
Array
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/972809 | Integrated circuit system employing multiple exposure dummy patterning technology | Jan 10, 2008 | Issued |
Array
(
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