
John L. Leguyader
Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )
| Most Active Art Unit | 1805 |
| Art Unit(s) | 1804, 1633, 1621, 1805, 1809, 1635, 2899 |
| Total Applications | 501 |
| Issued Applications | 292 |
| Pending Applications | 54 |
| Abandoned Applications | 155 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 121108
[patent_doc_number] => 07709186
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-05-04
[patent_title] => 'Method for exposing photoresist film of semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/879134
[patent_app_country] => US
[patent_app_date] => 2004-06-30
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/07/709/07709186.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/879134 | Method for exposing photoresist film of semiconductor device | Jun 29, 2004 | Issued |
Array
(
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[patent_issue_date] => 2007-06-12
[patent_title] => 'Lithographic semiconductor manufacturing using a multi-layered process'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/710023 | Lithographic semiconductor manufacturing using a multi-layered process | Jun 13, 2004 | Issued |
Array
(
[id] => 480068
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[patent_issue_date] => 2007-05-29
[patent_title] => 'Method and apparatus for producing rectangular contact holes utilizing side lobe formation'
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[patent_app_date] => 2004-06-08
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Array
(
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[patent_issue_date] => 2008-04-29
[patent_title] => 'Wet developable hard mask in conjunction with thin photoresist for micro photolithography'
[patent_app_type] => utility
[patent_app_number] => 10/864787
[patent_app_country] => US
[patent_app_date] => 2004-06-08
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Array
(
[id] => 532846
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[patent_title] => 'Method for fabricating a thin film magnetic head'
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[patent_app_date] => 2004-05-13
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/844400 | Method for fabricating a thin film magnetic head | May 12, 2004 | Issued |
Array
(
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[patent_issue_date] => 2006-10-26
[patent_title] => 'Exposure method, mask, semiconductor device manufacturing method, and semiconductor device'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/555461 | Exposure method, mask, semiconductor device manufacturing method, and semiconductor device | May 12, 2004 | Abandoned |
Array
(
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[patent_title] => 'Microfabrication methods and devices'
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[patent_app_number] => 10/835249
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[firstpage_image] =>[orig_patent_app_number] => 10835249
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/835249 | Microfabrication methods and devices | Apr 27, 2004 | Issued |
Array
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[patent_title] => 'Voltage tunable photodefinable dielectric and method of manufacture therefore'
[patent_app_type] => new
[patent_app_number] => 10/822326
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/822326 | Voltage tunable photodefinable dielectric and method of manufacture therefore | Apr 11, 2004 | Abandoned |
Array
(
[id] => 555408
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/708983 | Method of fabricating a semiconductor device | Apr 4, 2004 | Issued |
Array
(
[id] => 6958304
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[patent_title] => 'Positive-working photoimageable bottom antireflective coating'
[patent_app_type] => utility
[patent_app_number] => 10/808884
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Array
(
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[patent_title] => 'Resist pattern forming method and semiconductor device fabrication method'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/804179 | Resist pattern forming method and semiconductor device fabrication method | Mar 18, 2004 | Issued |
Array
(
[id] => 7110979
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[patent_title] => 'Method and system for treating a hard mask to improve etch characteristics'
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Array
(
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Array
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Array
(
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Array
(
[id] => 6944658
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Array
(
[id] => 418657
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/791259 | Lithography mask utilizing asymmetric light source | Mar 1, 2004 | Issued |
Array
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Array
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/773272 | Method for removing patterned layer from lower layer through reflow | Feb 8, 2004 | Issued |