
John L. Leguyader
Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )
| Most Active Art Unit | 1805 |
| Art Unit(s) | 1804, 1633, 1621, 1805, 1809, 1635, 2899 |
| Total Applications | 501 |
| Issued Applications | 292 |
| Pending Applications | 54 |
| Abandoned Applications | 155 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6889314
[patent_doc_number] => 20010024769
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-09-27
[patent_title] => 'Method for removing photoresist and residues from semiconductor device surfaces'
[patent_app_type] => new
[patent_app_number] => 09/780873
[patent_app_country] => US
[patent_app_date] => 2001-02-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_no_of_words] => 3917
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[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0024/20010024769.pdf
[firstpage_image] =>[orig_patent_app_number] => 09780873
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/780873 | Method for removing photoresist and residues from semiconductor device surfaces | Feb 7, 2001 | Abandoned |
Array
(
[id] => 1477366
[patent_doc_number] => 06451504
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2002-09-17
[patent_title] => 'Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride'
[patent_app_type] => B2
[patent_app_number] => 09/773462
[patent_app_country] => US
[patent_app_date] => 2001-01-31
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 09773462
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/773462 | Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride | Jan 30, 2001 | Issued |
Array
(
[id] => 7027976
[patent_doc_number] => 20010014431
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-16
[patent_title] => 'Method for decreasing surface defects of patterned resist layer'
[patent_app_type] => new
[patent_app_number] => 09/771563
[patent_app_country] => US
[patent_app_date] => 2001-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => publications/A1/0014/20010014431.pdf
[firstpage_image] =>[orig_patent_app_number] => 09771563
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/771563 | Method for decreasing surface defects of patterned resist layer | Jan 29, 2001 | Issued |
Array
(
[id] => 1364659
[patent_doc_number] => 06566041
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-05-20
[patent_title] => 'Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process'
[patent_app_type] => B2
[patent_app_number] => 09/757841
[patent_app_country] => US
[patent_app_date] => 2001-01-10
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/757841 | Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process | Jan 9, 2001 | Issued |
Array
(
[id] => 1534200
[patent_doc_number] => 06489085
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[patent_kind] => B2
[patent_issue_date] => 2002-12-03
[patent_title] => 'Thermal reflow photolithographic process'
[patent_app_type] => B2
[patent_app_number] => 09/742960
[patent_app_country] => US
[patent_app_date] => 2000-12-20
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/742960 | Thermal reflow photolithographic process | Dec 19, 2000 | Issued |
Array
(
[id] => 6838683
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[patent_issue_date] => 2003-02-20
[patent_title] => 'Supercritical fluid(SCF) silylation process'
[patent_app_type] => new
[patent_app_number] => 09/735404
[patent_app_country] => US
[patent_app_date] => 2000-12-12
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/735404 | Supercritical fluid(SCF) silylation process | Dec 11, 2000 | Issued |
Array
(
[id] => 6892003
[patent_doc_number] => 20010018165
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2001-08-30
[patent_title] => 'Simple Photo development step to form tisix gate in DRAM process'
[patent_app_type] => new
[patent_app_number] => 09/729624
[patent_app_country] => US
[patent_app_date] => 2000-12-01
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 09729624
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/729624 | Simple photo development step to form TiSix gate in DRAM process | Nov 30, 2000 | Issued |
Array
(
[id] => 6729977
[patent_doc_number] => 20030186167
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-02
[patent_title] => 'Fabrication of nanometer size gaps on an electrode'
[patent_app_type] => new
[patent_app_number] => 10/148303
[patent_app_country] => US
[patent_app_date] => 2003-01-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 3554
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[pdf_file] => publications/A1/0186/20030186167.pdf
[firstpage_image] =>[orig_patent_app_number] => 10148303
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/148303 | Fabrication of nanometer size gaps on an electrode | Nov 28, 2000 | Issued |
Array
(
[id] => 1390914
[patent_doc_number] => 06541187
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-04-01
[patent_title] => 'Process for producing an article with a microstructure'
[patent_app_type] => B1
[patent_app_number] => 09/711258
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[firstpage_image] =>[orig_patent_app_number] => 09711258
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/711258 | Process for producing an article with a microstructure | Nov 12, 2000 | Issued |
Array
(
[id] => 1516855
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[patent_kind] => B1
[patent_issue_date] => 2002-12-31
[patent_title] => 'Removal of photoresist and residue from substrate using supercritical carbon dioxide process'
[patent_app_type] => B1
[patent_app_number] => 09/697227
[patent_app_country] => US
[patent_app_date] => 2000-10-25
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/697227 | Removal of photoresist and residue from substrate using supercritical carbon dioxide process | Oct 24, 2000 | Issued |
Array
(
[id] => 1502913
[patent_doc_number] => 06465158
[patent_country] => US
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[patent_issue_date] => 2002-10-15
[patent_title] => 'Semiconductor wafer dividing method'
[patent_app_type] => B1
[patent_app_number] => 09/691208
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[firstpage_image] =>[orig_patent_app_number] => 09691208
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/691208 | Semiconductor wafer dividing method | Oct 18, 2000 | Issued |
Array
(
[id] => 7636781
[patent_doc_number] => 06379874
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[patent_issue_date] => 2002-04-30
[patent_title] => 'Using block copolymers as supercritical fluid developable photoresists'
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Array
(
[id] => 1544655
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[patent_title] => 'Method of improving photoresist profile'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/688606 | Method of improving photoresist profile | Oct 13, 2000 | Issued |
| 09/680937 | Exposure method | Oct 9, 2000 | Abandoned |
Array
(
[id] => 1535727
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[patent_title] => 'Method for reducing photolithographic steps in a semiconductor interconnect process'
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Array
(
[id] => 1413954
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Array
(
[id] => 1602442
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[patent_title] => 'Edge rinse apparatus and edge rinse method'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/640303 | Edge rinse apparatus and edge rinse method | Aug 15, 2000 | Issued |
Array
(
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[patent_title] => 'Method for forming the air bearing surface of a slider'
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/624712 | Method for an improved developing process in wafer photolithography | Jul 24, 2000 | Issued |
Array
(
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