Search

John L. Leguyader

Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )

Most Active Art Unit
1805
Art Unit(s)
1804, 1633, 1621, 1805, 1809, 1635, 2899
Total Applications
501
Issued Applications
292
Pending Applications
54
Abandoned Applications
155

Applications

Application numberTitle of the applicationFiling DateStatus
09/614916 Process for patterning non-photoimagable ceramic tape Jul 11, 2000 Abandoned
Array ( [id] => 1413780 [patent_doc_number] => 06517999 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-11 [patent_title] => 'Method of removing photoresist film' [patent_app_type] => B1 [patent_app_number] => 09/614258 [patent_app_country] => US [patent_app_date] => 2000-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 7244 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 203 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/517/06517999.pdf [firstpage_image] =>[orig_patent_app_number] => 09614258 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/614258
Method of removing photoresist film Jul 11, 2000 Issued
Array ( [id] => 1413769 [patent_doc_number] => 06517998 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-02-11 [patent_title] => 'Method for removing photoresist film and apparatus used therefor' [patent_app_type] => B1 [patent_app_number] => 09/614252 [patent_app_country] => US [patent_app_date] => 2000-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 6696 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/517/06517998.pdf [firstpage_image] =>[orig_patent_app_number] => 09614252 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/614252
Method for removing photoresist film and apparatus used therefor Jul 11, 2000 Issued
Array ( [id] => 1511856 [patent_doc_number] => 06472127 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-10-29 [patent_title] => 'Method of forming a photoresist pattern' [patent_app_type] => B1 [patent_app_number] => 09/615055 [patent_app_country] => US [patent_app_date] => 2000-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 12 [patent_no_of_words] => 4950 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 126 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/472/06472127.pdf [firstpage_image] =>[orig_patent_app_number] => 09615055 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/615055
Method of forming a photoresist pattern Jul 11, 2000 Issued
Array ( [id] => 1569958 [patent_doc_number] => 06497993 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-24 [patent_title] => 'In situ dry etching procedure to form a borderless contact hole' [patent_app_type] => B1 [patent_app_number] => 09/614010 [patent_app_country] => US [patent_app_date] => 2000-07-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 2027 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 257 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/497/06497993.pdf [firstpage_image] =>[orig_patent_app_number] => 09614010 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/614010
In situ dry etching procedure to form a borderless contact hole Jul 10, 2000 Issued
Array ( [id] => 1569962 [patent_doc_number] => 06497994 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-24 [patent_title] => 'Photolithographic process for the formation of a one-piece needle' [patent_app_type] => B1 [patent_app_number] => 09/608672 [patent_app_country] => US [patent_app_date] => 2000-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 26 [patent_figures_cnt] => 29 [patent_no_of_words] => 4733 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/497/06497994.pdf [firstpage_image] =>[orig_patent_app_number] => 09608672 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/608672
Photolithographic process for the formation of a one-piece needle Jun 28, 2000 Issued
Array ( [id] => 1469404 [patent_doc_number] => 06406834 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-18 [patent_title] => 'Lithographic projection method' [patent_app_type] => B1 [patent_app_number] => 09/588783 [patent_app_country] => US [patent_app_date] => 2000-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 3502 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 207 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/406/06406834.pdf [firstpage_image] =>[orig_patent_app_number] => 09588783 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/588783
Lithographic projection method Jun 6, 2000 Issued
Array ( [id] => 1339916 [patent_doc_number] => 06586163 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-07-01 [patent_title] => 'Method of forming fine pattern' [patent_app_type] => B1 [patent_app_number] => 09/587359 [patent_app_country] => US [patent_app_date] => 2000-06-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 30 [patent_no_of_words] => 10677 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 187 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/586/06586163.pdf [firstpage_image] =>[orig_patent_app_number] => 09587359 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/587359
Method of forming fine pattern Jun 1, 2000 Issued
Array ( [id] => 1477410 [patent_doc_number] => 06451512 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-17 [patent_title] => 'UV-enhanced silylation process to increase etch resistance of ultra thin resists' [patent_app_type] => B1 [patent_app_number] => 09/565691 [patent_app_country] => US [patent_app_date] => 2000-05-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 6022 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/451/06451512.pdf [firstpage_image] =>[orig_patent_app_number] => 09565691 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/565691
UV-enhanced silylation process to increase etch resistance of ultra thin resists Apr 30, 2000 Issued
Array ( [id] => 1440781 [patent_doc_number] => 06335146 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-01 [patent_title] => 'Exposure apparatus and method' [patent_app_type] => B1 [patent_app_number] => 09/542071 [patent_app_country] => US [patent_app_date] => 2000-04-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 26 [patent_figures_cnt] => 72 [patent_no_of_words] => 14601 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/335/06335146.pdf [firstpage_image] =>[orig_patent_app_number] => 09542071 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/542071
Exposure apparatus and method Apr 2, 2000 Issued
Array ( [id] => 1580668 [patent_doc_number] => 06423479 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-23 [patent_title] => 'Cleaning carbon contamination on mask using gaseous phase' [patent_app_type] => B1 [patent_app_number] => 09/495165 [patent_app_country] => US [patent_app_date] => 2000-01-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3409 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/423/06423479.pdf [firstpage_image] =>[orig_patent_app_number] => 09495165 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/495165
Cleaning carbon contamination on mask using gaseous phase Jan 30, 2000 Issued
Array ( [id] => 5888347 [patent_doc_number] => 20020012884 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2002-01-31 [patent_title] => 'METHOD FOR PATTERNING A RADIATION SENSITIVE LAYER' [patent_app_type] => new [patent_app_number] => 09/482193 [patent_app_country] => US [patent_app_date] => 2000-01-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3527 [patent_no_of_claims] => 39 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0012/20020012884.pdf [firstpage_image] =>[orig_patent_app_number] => 09482193 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/482193
Solventless, resistless direct dielectric patterning Jan 11, 2000 Issued
Array ( [id] => 1514192 [patent_doc_number] => 06420095 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-16 [patent_title] => 'Manufacture of semiconductor device using A-C anti-reflection coating' [patent_app_type] => B1 [patent_app_number] => 09/466830 [patent_app_country] => US [patent_app_date] => 1999-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 19 [patent_no_of_words] => 5759 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/420/06420095.pdf [firstpage_image] =>[orig_patent_app_number] => 09466830 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/466830
Manufacture of semiconductor device using A-C anti-reflection coating Dec 19, 1999 Issued
Array ( [id] => 1541861 [patent_doc_number] => 06372389 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-16 [patent_title] => 'Method and apparatus for forming resist pattern' [patent_app_type] => B1 [patent_app_number] => 09/443500 [patent_app_country] => US [patent_app_date] => 1999-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 16 [patent_no_of_words] => 1854 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/372/06372389.pdf [firstpage_image] =>[orig_patent_app_number] => 09443500 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/443500
Method and apparatus for forming resist pattern Nov 18, 1999 Issued
Array ( [id] => 4268945 [patent_doc_number] => 06322954 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-27 [patent_title] => 'Wet inorganic ammonia etch of organically masked silicon-containing material' [patent_app_type] => 1 [patent_app_number] => 9/431812 [patent_app_country] => US [patent_app_date] => 1999-11-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 3155 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/322/06322954.pdf [firstpage_image] =>[orig_patent_app_number] => 431812 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/431812
Wet inorganic ammonia etch of organically masked silicon-containing material Nov 1, 1999 Issued
Array ( [id] => 1535732 [patent_doc_number] => 06337174 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-08 [patent_title] => 'Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide' [patent_app_type] => B1 [patent_app_number] => 09/428917 [patent_app_country] => US [patent_app_date] => 1999-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 3252 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/337/06337174.pdf [firstpage_image] =>[orig_patent_app_number] => 09428917 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/428917
Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide Oct 27, 1999 Issued
Array ( [id] => 1462082 [patent_doc_number] => 06350559 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-26 [patent_title] => 'Method for creating thinner resist coating that also has fewer pinholes' [patent_app_type] => B1 [patent_app_number] => 09/398642 [patent_app_country] => US [patent_app_date] => 1999-09-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 3216 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/350/06350559.pdf [firstpage_image] =>[orig_patent_app_number] => 09398642 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/398642
Method for creating thinner resist coating that also has fewer pinholes Sep 16, 1999 Issued
Array ( [id] => 1584780 [patent_doc_number] => 06358673 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-19 [patent_title] => 'Pattern formation method and apparatus' [patent_app_type] => B1 [patent_app_number] => 09/390522 [patent_app_country] => US [patent_app_date] => 1999-09-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 24 [patent_no_of_words] => 12093 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 109 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/358/06358673.pdf [firstpage_image] =>[orig_patent_app_number] => 09390522 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/390522
Pattern formation method and apparatus Sep 2, 1999 Issued
Array ( [id] => 1415076 [patent_doc_number] => 06509141 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2003-01-21 [patent_title] => 'Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process' [patent_app_type] => B2 [patent_app_number] => 09/389788 [patent_app_country] => US [patent_app_date] => 1999-09-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1186 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/509/06509141.pdf [firstpage_image] =>[orig_patent_app_number] => 09389788 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/389788
Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process Sep 2, 1999 Issued
Array ( [id] => 4345547 [patent_doc_number] => 06214525 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-10 [patent_title] => 'Printed circuit board with circuitized cavity and methods of producing same' [patent_app_type] => 1 [patent_app_number] => 9/379774 [patent_app_country] => US [patent_app_date] => 1999-08-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 25 [patent_no_of_words] => 6510 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/214/06214525.pdf [firstpage_image] =>[orig_patent_app_number] => 379774 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/379774
Printed circuit board with circuitized cavity and methods of producing same Aug 23, 1999 Issued
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