
John L. Leguyader
Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )
| Most Active Art Unit | 1805 |
| Art Unit(s) | 1804, 1633, 1621, 1805, 1809, 1635, 2899 |
| Total Applications | 501 |
| Issued Applications | 292 |
| Pending Applications | 54 |
| Abandoned Applications | 155 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
| 09/614916 | Process for patterning non-photoimagable ceramic tape | Jul 11, 2000 | Abandoned |
Array
(
[id] => 1413780
[patent_doc_number] => 06517999
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-11
[patent_title] => 'Method of removing photoresist film'
[patent_app_type] => B1
[patent_app_number] => 09/614258
[patent_app_country] => US
[patent_app_date] => 2000-07-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 9
[patent_no_of_words] => 7244
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 203
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/517/06517999.pdf
[firstpage_image] =>[orig_patent_app_number] => 09614258
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/614258 | Method of removing photoresist film | Jul 11, 2000 | Issued |
Array
(
[id] => 1413769
[patent_doc_number] => 06517998
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-02-11
[patent_title] => 'Method for removing photoresist film and apparatus used therefor'
[patent_app_type] => B1
[patent_app_number] => 09/614252
[patent_app_country] => US
[patent_app_date] => 2000-07-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 9
[patent_no_of_words] => 6696
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 72
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/517/06517998.pdf
[firstpage_image] =>[orig_patent_app_number] => 09614252
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/614252 | Method for removing photoresist film and apparatus used therefor | Jul 11, 2000 | Issued |
Array
(
[id] => 1511856
[patent_doc_number] => 06472127
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-10-29
[patent_title] => 'Method of forming a photoresist pattern'
[patent_app_type] => B1
[patent_app_number] => 09/615055
[patent_app_country] => US
[patent_app_date] => 2000-07-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 12
[patent_no_of_words] => 4950
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 126
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/472/06472127.pdf
[firstpage_image] =>[orig_patent_app_number] => 09615055
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/615055 | Method of forming a photoresist pattern | Jul 11, 2000 | Issued |
Array
(
[id] => 1569958
[patent_doc_number] => 06497993
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-24
[patent_title] => 'In situ dry etching procedure to form a borderless contact hole'
[patent_app_type] => B1
[patent_app_number] => 09/614010
[patent_app_country] => US
[patent_app_date] => 2000-07-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 5
[patent_no_of_words] => 2027
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 257
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/497/06497993.pdf
[firstpage_image] =>[orig_patent_app_number] => 09614010
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/614010 | In situ dry etching procedure to form a borderless contact hole | Jul 10, 2000 | Issued |
Array
(
[id] => 1569962
[patent_doc_number] => 06497994
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-12-24
[patent_title] => 'Photolithographic process for the formation of a one-piece needle'
[patent_app_type] => B1
[patent_app_number] => 09/608672
[patent_app_country] => US
[patent_app_date] => 2000-06-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 26
[patent_figures_cnt] => 29
[patent_no_of_words] => 4733
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/497/06497994.pdf
[firstpage_image] =>[orig_patent_app_number] => 09608672
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/608672 | Photolithographic process for the formation of a one-piece needle | Jun 28, 2000 | Issued |
Array
(
[id] => 1469404
[patent_doc_number] => 06406834
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-06-18
[patent_title] => 'Lithographic projection method'
[patent_app_type] => B1
[patent_app_number] => 09/588783
[patent_app_country] => US
[patent_app_date] => 2000-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 3502
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 207
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/406/06406834.pdf
[firstpage_image] =>[orig_patent_app_number] => 09588783
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/588783 | Lithographic projection method | Jun 6, 2000 | Issued |
Array
(
[id] => 1339916
[patent_doc_number] => 06586163
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-07-01
[patent_title] => 'Method of forming fine pattern'
[patent_app_type] => B1
[patent_app_number] => 09/587359
[patent_app_country] => US
[patent_app_date] => 2000-06-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 30
[patent_no_of_words] => 10677
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 187
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/586/06586163.pdf
[firstpage_image] =>[orig_patent_app_number] => 09587359
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/587359 | Method of forming fine pattern | Jun 1, 2000 | Issued |
Array
(
[id] => 1477410
[patent_doc_number] => 06451512
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-09-17
[patent_title] => 'UV-enhanced silylation process to increase etch resistance of ultra thin resists'
[patent_app_type] => B1
[patent_app_number] => 09/565691
[patent_app_country] => US
[patent_app_date] => 2000-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 6022
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 99
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/451/06451512.pdf
[firstpage_image] =>[orig_patent_app_number] => 09565691
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/565691 | UV-enhanced silylation process to increase etch resistance of ultra thin resists | Apr 30, 2000 | Issued |
Array
(
[id] => 1440781
[patent_doc_number] => 06335146
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-01
[patent_title] => 'Exposure apparatus and method'
[patent_app_type] => B1
[patent_app_number] => 09/542071
[patent_app_country] => US
[patent_app_date] => 2000-04-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 26
[patent_figures_cnt] => 72
[patent_no_of_words] => 14601
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 51
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/335/06335146.pdf
[firstpage_image] =>[orig_patent_app_number] => 09542071
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/542071 | Exposure apparatus and method | Apr 2, 2000 | Issued |
Array
(
[id] => 1580668
[patent_doc_number] => 06423479
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-23
[patent_title] => 'Cleaning carbon contamination on mask using gaseous phase'
[patent_app_type] => B1
[patent_app_number] => 09/495165
[patent_app_country] => US
[patent_app_date] => 2000-01-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3409
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 65
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/423/06423479.pdf
[firstpage_image] =>[orig_patent_app_number] => 09495165
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/495165 | Cleaning carbon contamination on mask using gaseous phase | Jan 30, 2000 | Issued |
Array
(
[id] => 5888347
[patent_doc_number] => 20020012884
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2002-01-31
[patent_title] => 'METHOD FOR PATTERNING A RADIATION SENSITIVE LAYER'
[patent_app_type] => new
[patent_app_number] => 09/482193
[patent_app_country] => US
[patent_app_date] => 2000-01-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 3527
[patent_no_of_claims] => 39
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 29
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0012/20020012884.pdf
[firstpage_image] =>[orig_patent_app_number] => 09482193
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/482193 | Solventless, resistless direct dielectric patterning | Jan 11, 2000 | Issued |
Array
(
[id] => 1514192
[patent_doc_number] => 06420095
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-07-16
[patent_title] => 'Manufacture of semiconductor device using A-C anti-reflection coating'
[patent_app_type] => B1
[patent_app_number] => 09/466830
[patent_app_country] => US
[patent_app_date] => 1999-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 19
[patent_no_of_words] => 5759
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 72
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/420/06420095.pdf
[firstpage_image] =>[orig_patent_app_number] => 09466830
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/466830 | Manufacture of semiconductor device using A-C anti-reflection coating | Dec 19, 1999 | Issued |
Array
(
[id] => 1541861
[patent_doc_number] => 06372389
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-04-16
[patent_title] => 'Method and apparatus for forming resist pattern'
[patent_app_type] => B1
[patent_app_number] => 09/443500
[patent_app_country] => US
[patent_app_date] => 1999-11-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 16
[patent_no_of_words] => 1854
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/372/06372389.pdf
[firstpage_image] =>[orig_patent_app_number] => 09443500
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/443500 | Method and apparatus for forming resist pattern | Nov 18, 1999 | Issued |
Array
(
[id] => 4268945
[patent_doc_number] => 06322954
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-11-27
[patent_title] => 'Wet inorganic ammonia etch of organically masked silicon-containing material'
[patent_app_type] => 1
[patent_app_number] => 9/431812
[patent_app_country] => US
[patent_app_date] => 1999-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 3155
[patent_no_of_claims] => 36
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/322/06322954.pdf
[firstpage_image] =>[orig_patent_app_number] => 431812
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/431812 | Wet inorganic ammonia etch of organically masked silicon-containing material | Nov 1, 1999 | Issued |
Array
(
[id] => 1535732
[patent_doc_number] => 06337174
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-08
[patent_title] => 'Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide'
[patent_app_type] => B1
[patent_app_number] => 09/428917
[patent_app_country] => US
[patent_app_date] => 1999-10-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 3252
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/337/06337174.pdf
[firstpage_image] =>[orig_patent_app_number] => 09428917
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/428917 | Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide | Oct 27, 1999 | Issued |
Array
(
[id] => 1462082
[patent_doc_number] => 06350559
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-02-26
[patent_title] => 'Method for creating thinner resist coating that also has fewer pinholes'
[patent_app_type] => B1
[patent_app_number] => 09/398642
[patent_app_country] => US
[patent_app_date] => 1999-09-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 3216
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/350/06350559.pdf
[firstpage_image] =>[orig_patent_app_number] => 09398642
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/398642 | Method for creating thinner resist coating that also has fewer pinholes | Sep 16, 1999 | Issued |
Array
(
[id] => 1584780
[patent_doc_number] => 06358673
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-03-19
[patent_title] => 'Pattern formation method and apparatus'
[patent_app_type] => B1
[patent_app_number] => 09/390522
[patent_app_country] => US
[patent_app_date] => 1999-09-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 24
[patent_no_of_words] => 12093
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 109
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/358/06358673.pdf
[firstpage_image] =>[orig_patent_app_number] => 09390522
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/390522 | Pattern formation method and apparatus | Sep 2, 1999 | Issued |
Array
(
[id] => 1415076
[patent_doc_number] => 06509141
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2003-01-21
[patent_title] => 'Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process'
[patent_app_type] => B2
[patent_app_number] => 09/389788
[patent_app_country] => US
[patent_app_date] => 1999-09-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 1186
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/509/06509141.pdf
[firstpage_image] =>[orig_patent_app_number] => 09389788
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/389788 | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process | Sep 2, 1999 | Issued |
Array
(
[id] => 4345547
[patent_doc_number] => 06214525
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-04-10
[patent_title] => 'Printed circuit board with circuitized cavity and methods of producing same'
[patent_app_type] => 1
[patent_app_number] => 9/379774
[patent_app_country] => US
[patent_app_date] => 1999-08-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 25
[patent_no_of_words] => 6510
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 123
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/214/06214525.pdf
[firstpage_image] =>[orig_patent_app_number] => 379774
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/379774 | Printed circuit board with circuitized cavity and methods of producing same | Aug 23, 1999 | Issued |