Search

John L. Leguyader

Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )

Most Active Art Unit
1805
Art Unit(s)
1804, 1633, 1621, 1805, 1809, 1635, 2899
Total Applications
501
Issued Applications
292
Pending Applications
54
Abandoned Applications
155

Applications

Application numberTitle of the applicationFiling DateStatus
09/378677 PRINTED CIRCUIT SUBSTRATE WITH PHOTOIMAGEABLE COVERCOAT LAYER Aug 19, 1999 Abandoned
Array ( [id] => 4244390 [patent_doc_number] => 06221561 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-24 [patent_title] => 'Diffusion plate and method for manufacturing master die thereof' [patent_app_type] => 1 [patent_app_number] => 9/369831 [patent_app_country] => US [patent_app_date] => 1999-08-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 106 [patent_figures_cnt] => 114 [patent_no_of_words] => 9987 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/221/06221561.pdf [firstpage_image] =>[orig_patent_app_number] => 369831 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/369831
Diffusion plate and method for manufacturing master die thereof Aug 8, 1999 Issued
Array ( [id] => 1449494 [patent_doc_number] => 06455233 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-24 [patent_title] => 'Micromachining using high energy light ions' [patent_app_type] => B1 [patent_app_number] => 09/297577 [patent_app_country] => US [patent_app_date] => 1999-07-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3620 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 62 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/455/06455233.pdf [firstpage_image] =>[orig_patent_app_number] => 09297577 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/297577
Micromachining using high energy light ions Jul 5, 1999 Issued
Array ( [id] => 4307848 [patent_doc_number] => 06316166 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-13 [patent_title] => 'Method of forming micro pattern of semiconductor device' [patent_app_type] => 1 [patent_app_number] => 9/342901 [patent_app_country] => US [patent_app_date] => 1999-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 2098 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/316/06316166.pdf [firstpage_image] =>[orig_patent_app_number] => 342901 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/342901
Method of forming micro pattern of semiconductor device Jun 29, 1999 Issued
Array ( [id] => 1559211 [patent_doc_number] => 06436615 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-20 [patent_title] => 'Methods and materials for selective modification of photopatterned polymer films' [patent_app_type] => B1 [patent_app_number] => 09/339917 [patent_app_country] => US [patent_app_date] => 1999-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 19981 [patent_no_of_claims] => 48 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/436/06436615.pdf [firstpage_image] =>[orig_patent_app_number] => 09339917 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/339917
Methods and materials for selective modification of photopatterned polymer films Jun 24, 1999 Issued
Array ( [id] => 1549625 [patent_doc_number] => 06399283 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-04 [patent_title] => 'Exposure method and aligner' [patent_app_type] => B1 [patent_app_number] => 09/336779 [patent_app_country] => US [patent_app_date] => 1999-06-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 3611 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/399/06399283.pdf [firstpage_image] =>[orig_patent_app_number] => 09336779 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/336779
Exposure method and aligner Jun 20, 1999 Issued
Array ( [id] => 1549631 [patent_doc_number] => 06399284 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-04 [patent_title] => 'Sub-lithographic contacts and vias through pattern, CVD and etch back processing' [patent_app_type] => B1 [patent_app_number] => 09/336619 [patent_app_country] => US [patent_app_date] => 1999-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 3424 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 137 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/399/06399284.pdf [firstpage_image] =>[orig_patent_app_number] => 09336619 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/336619
Sub-lithographic contacts and vias through pattern, CVD and etch back processing Jun 17, 1999 Issued
Array ( [id] => 4357537 [patent_doc_number] => 06168910 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-02 [patent_title] => 'Method for removing residue and method for production of printed board having hole' [patent_app_type] => 1 [patent_app_number] => 9/334643 [patent_app_country] => US [patent_app_date] => 1999-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 23 [patent_no_of_words] => 6541 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/168/06168910.pdf [firstpage_image] =>[orig_patent_app_number] => 334643 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/334643
Method for removing residue and method for production of printed board having hole Jun 16, 1999 Issued
Array ( [id] => 4324804 [patent_doc_number] => 06319655 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Modification of 193 nm sensitive photoresist materials by electron beam exposure' [patent_app_type] => 1 [patent_app_number] => 9/330710 [patent_app_country] => US [patent_app_date] => 1999-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 6363 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 211 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319655.pdf [firstpage_image] =>[orig_patent_app_number] => 330710 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/330710
Modification of 193 nm sensitive photoresist materials by electron beam exposure Jun 10, 1999 Issued
Array ( [id] => 7636784 [patent_doc_number] => 06379871 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-30 [patent_title] => 'Method for fabricating a mask for a LIGA process' [patent_app_type] => B1 [patent_app_number] => 09/329907 [patent_app_country] => US [patent_app_date] => 1999-06-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 3180 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 12 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/379/06379871.pdf [firstpage_image] =>[orig_patent_app_number] => 09329907 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/329907
Method for fabricating a mask for a LIGA process Jun 9, 1999 Issued
Array ( [id] => 4406558 [patent_doc_number] => 06309801 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-30 [patent_title] => 'Method of manufacturing an electronic device comprising two layers of organic-containing material' [patent_app_type] => 1 [patent_app_number] => 9/325673 [patent_app_country] => US [patent_app_date] => 1999-06-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 23 [patent_no_of_words] => 6689 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 379 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/309/06309801.pdf [firstpage_image] =>[orig_patent_app_number] => 325673 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/325673
Method of manufacturing an electronic device comprising two layers of organic-containing material Jun 2, 1999 Issued
Array ( [id] => 4403550 [patent_doc_number] => 06232043 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-15 [patent_title] => 'Rule to determine CMP polish time' [patent_app_type] => 1 [patent_app_number] => 9/318471 [patent_app_country] => US [patent_app_date] => 1999-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1716 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 194 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/232/06232043.pdf [firstpage_image] =>[orig_patent_app_number] => 318471 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/318471
Rule to determine CMP polish time May 24, 1999 Issued
Array ( [id] => 4189441 [patent_doc_number] => 06130013 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-10-10 [patent_title] => 'Birefringent interlayer for attenuating standing wave photoexposure of a photoresist layer formed over a reflective layer' [patent_app_type] => 1 [patent_app_number] => 9/317646 [patent_app_country] => US [patent_app_date] => 1999-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 5827 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/130/06130013.pdf [firstpage_image] =>[orig_patent_app_number] => 317646 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/317646
Birefringent interlayer for attenuating standing wave photoexposure of a photoresist layer formed over a reflective layer May 23, 1999 Issued
Array ( [id] => 6877547 [patent_doc_number] => 20010003033 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-06-07 [patent_title] => 'METHOD AND APPARATUS FOR REDUCING NON-UNIFORMITY AREA EFFECTS IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES' [patent_app_type] => new-utility [patent_app_number] => 09/302392 [patent_app_country] => US [patent_app_date] => 1999-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1881 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 47 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20010003033.pdf [firstpage_image] =>[orig_patent_app_number] => 09302392 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/302392
Method and apparatus for reducing non-uniformity area effects in the manufacture of semiconductor devices Apr 29, 1999 Issued
Array ( [id] => 4264306 [patent_doc_number] => 06306558 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-23 [patent_title] => 'Method of forming small contact holes using alternative phase shift masks and negative photoresist' [patent_app_type] => 1 [patent_app_number] => 9/301221 [patent_app_country] => US [patent_app_date] => 1999-04-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 12 [patent_no_of_words] => 3414 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 542 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/306/06306558.pdf [firstpage_image] =>[orig_patent_app_number] => 301221 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/301221
Method of forming small contact holes using alternative phase shift masks and negative photoresist Apr 28, 1999 Issued
Array ( [id] => 6887752 [patent_doc_number] => 20010008746 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-07-19 [patent_title] => 'METHOD FOR FABRICATING SEMICONDUCTOR DEVICE' [patent_app_type] => new-utility [patent_app_number] => 09/300895 [patent_app_country] => US [patent_app_date] => 1999-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3734 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20010008746.pdf [firstpage_image] =>[orig_patent_app_number] => 09300895 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/300895
Method for fabricating semiconductor device Apr 27, 1999 Issued
09/299152 EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD OF CONTROLLING SUBSTRATE STAGE AND METHOD OF CONTROLLING MASK STAGE Apr 25, 1999 Abandoned
Array ( [id] => 4256512 [patent_doc_number] => 06258515 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-10 [patent_title] => 'Pattern forming method' [patent_app_type] => 1 [patent_app_number] => 9/293534 [patent_app_country] => US [patent_app_date] => 1999-04-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 17 [patent_no_of_words] => 7068 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 220 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/258/06258515.pdf [firstpage_image] =>[orig_patent_app_number] => 293534 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/293534
Pattern forming method Apr 14, 1999 Issued
Array ( [id] => 4272695 [patent_doc_number] => 06280908 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-28 [patent_title] => 'Post-development resist hardening by vapor silylation' [patent_app_type] => 1 [patent_app_number] => 9/292727 [patent_app_country] => US [patent_app_date] => 1999-04-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 3325 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/280/06280908.pdf [firstpage_image] =>[orig_patent_app_number] => 292727 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/292727
Post-development resist hardening by vapor silylation Apr 14, 1999 Issued
Array ( [id] => 4356387 [patent_doc_number] => 06255041 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-03 [patent_title] => 'Method for formation of patterned resist layer' [patent_app_type] => 1 [patent_app_number] => 9/291114 [patent_app_country] => US [patent_app_date] => 1999-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5334 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 240 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/255/06255041.pdf [firstpage_image] =>[orig_patent_app_number] => 291114 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/291114
Method for formation of patterned resist layer Apr 13, 1999 Issued
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