Search

John L. Leguyader

Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )

Most Active Art Unit
1805
Art Unit(s)
1804, 1633, 1621, 1805, 1809, 1635, 2899
Total Applications
501
Issued Applications
292
Pending Applications
54
Abandoned Applications
155

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4347828 [patent_doc_number] => 06291139 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-18 [patent_title] => 'Process for fabricating three-dimensional polymer layer structures' [patent_app_type] => 1 [patent_app_number] => 9/029505 [patent_app_country] => US [patent_app_date] => 1998-07-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1636 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/291/06291139.pdf [firstpage_image] =>[orig_patent_app_number] => 029505 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/029505
Process for fabricating three-dimensional polymer layer structures Jul 8, 1998 Issued
Array ( [id] => 4082295 [patent_doc_number] => 06162585 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-19 [patent_title] => 'Polyimide as a mask in vapor hydrogen fluoride etching' [patent_app_type] => 1 [patent_app_number] => 9/108713 [patent_app_country] => US [patent_app_date] => 1998-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 24 [patent_no_of_words] => 5504 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/162/06162585.pdf [firstpage_image] =>[orig_patent_app_number] => 108713 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/108713
Polyimide as a mask in vapor hydrogen fluoride etching Jun 30, 1998 Issued
Array ( [id] => 4180944 [patent_doc_number] => 06159663 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-12 [patent_title] => 'Method of creating a solderable metal layer on glass or ceramic' [patent_app_type] => 1 [patent_app_number] => 9/107475 [patent_app_country] => US [patent_app_date] => 1998-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 1635 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/159/06159663.pdf [firstpage_image] =>[orig_patent_app_number] => 107475 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/107475
Method of creating a solderable metal layer on glass or ceramic Jun 29, 1998 Issued
Array ( [id] => 4418580 [patent_doc_number] => 06177237 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-23 [patent_title] => 'High resolution anti-scatter x-ray grid and laser fabrication method' [patent_app_type] => 1 [patent_app_number] => 9/105788 [patent_app_country] => US [patent_app_date] => 1998-06-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 2840 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/177/06177237.pdf [firstpage_image] =>[orig_patent_app_number] => 105788 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/105788
High resolution anti-scatter x-ray grid and laser fabrication method Jun 25, 1998 Issued
Array ( [id] => 4352620 [patent_doc_number] => 06200734 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-03-13 [patent_title] => 'Method for fabricating semiconductor devices' [patent_app_type] => 1 [patent_app_number] => 9/094920 [patent_app_country] => US [patent_app_date] => 1998-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 2086 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 170 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/200/06200734.pdf [firstpage_image] =>[orig_patent_app_number] => 094920 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/094920
Method for fabricating semiconductor devices Jun 14, 1998 Issued
Array ( [id] => 4143718 [patent_doc_number] => 06063547 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-05-16 [patent_title] => 'Physical vapor deposition poly-p-phenylene sulfide film as a bottom anti-reflective coating on polysilicon' [patent_app_type] => 1 [patent_app_number] => 9/094464 [patent_app_country] => US [patent_app_date] => 1998-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 3201 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/063/06063547.pdf [firstpage_image] =>[orig_patent_app_number] => 094464 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/094464
Physical vapor deposition poly-p-phenylene sulfide film as a bottom anti-reflective coating on polysilicon Jun 10, 1998 Issued
Array ( [id] => 4152338 [patent_doc_number] => 06103457 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-08-15 [patent_title] => 'Method for reducing faceting on a photoresist layer during an etch process' [patent_app_type] => 1 [patent_app_number] => 9/086700 [patent_app_country] => US [patent_app_date] => 1998-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 11 [patent_no_of_words] => 4128 [patent_no_of_claims] => 42 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/103/06103457.pdf [firstpage_image] =>[orig_patent_app_number] => 086700 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/086700
Method for reducing faceting on a photoresist layer during an etch process May 27, 1998 Issued
Array ( [id] => 4363834 [patent_doc_number] => 06274293 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-14 [patent_title] => 'Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom' [patent_app_type] => 1 [patent_app_number] => 9/086790 [patent_app_country] => US [patent_app_date] => 1998-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 53 [patent_no_of_words] => 13907 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/274/06274293.pdf [firstpage_image] =>[orig_patent_app_number] => 086790 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/086790
Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom May 27, 1998 Issued
Array ( [id] => 4267679 [patent_doc_number] => 06245489 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-06-12 [patent_title] => 'Fluorinated hard mask for micropatterning of polymers' [patent_app_type] => 1 [patent_app_number] => 9/085691 [patent_app_country] => US [patent_app_date] => 1998-05-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 4651 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/245/06245489.pdf [firstpage_image] =>[orig_patent_app_number] => 085691 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/085691
Fluorinated hard mask for micropatterning of polymers May 26, 1998 Issued
Array ( [id] => 4415540 [patent_doc_number] => 06194127 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-27 [patent_title] => 'Resistive sheet patterning process and product thereof' [patent_app_type] => 1 [patent_app_number] => 9/085048 [patent_app_country] => US [patent_app_date] => 1998-05-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 4744 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 175 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/194/06194127.pdf [firstpage_image] =>[orig_patent_app_number] => 085048 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/085048
Resistive sheet patterning process and product thereof May 26, 1998 Issued
Array ( [id] => 4264429 [patent_doc_number] => 06306564 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-23 [patent_title] => 'Removal of resist or residue from semiconductors using supercritical carbon dioxide' [patent_app_type] => 1 [patent_app_number] => 9/085391 [patent_app_country] => US [patent_app_date] => 1998-05-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 2835 [patent_no_of_claims] => 57 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/306/06306564.pdf [firstpage_image] =>[orig_patent_app_number] => 085391 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/085391
Removal of resist or residue from semiconductors using supercritical carbon dioxide May 26, 1998 Issued
Array ( [id] => 4357481 [patent_doc_number] => 06168906 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-02 [patent_title] => 'Micromachined membrane with locally compliant and stiff regions and method of making same' [patent_app_type] => 1 [patent_app_number] => 9/084508 [patent_app_country] => US [patent_app_date] => 1998-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 21 [patent_no_of_words] => 2776 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 134 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/168/06168906.pdf [firstpage_image] =>[orig_patent_app_number] => 084508 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/084508
Micromachined membrane with locally compliant and stiff regions and method of making same May 25, 1998 Issued
Array ( [id] => 1593684 [patent_doc_number] => 06383719 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-07 [patent_title] => 'Process for enhanced lithographic imaging' [patent_app_type] => B1 [patent_app_number] => 09/081456 [patent_app_country] => US [patent_app_date] => 1998-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 36 [patent_no_of_words] => 4981 [patent_no_of_claims] => 75 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/383/06383719.pdf [firstpage_image] =>[orig_patent_app_number] => 09081456 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/081456
Process for enhanced lithographic imaging May 18, 1998 Issued
Array ( [id] => 7118395 [patent_doc_number] => 20010001702 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2001-05-24 [patent_title] => 'METHOD OF FABRICATING AN OPENING WITH DEEP ULTRA-VIOLET PHOTORESIST' [patent_app_type] => new-utility [patent_app_number] => 09/076243 [patent_app_country] => US [patent_app_date] => 1998-05-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 1379 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0001/20010001702.pdf [firstpage_image] =>[orig_patent_app_number] => 09076243 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/076243
Method of fabricating an opening with deep ultra-violet photoresist May 10, 1998 Issued
Array ( [id] => 4152311 [patent_doc_number] => 06103455 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-08-15 [patent_title] => 'Method to form a recess free deep contact' [patent_app_type] => 1 [patent_app_number] => 9/073947 [patent_app_country] => US [patent_app_date] => 1998-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 12 [patent_no_of_words] => 4159 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 218 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/103/06103455.pdf [firstpage_image] =>[orig_patent_app_number] => 073947 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/073947
Method to form a recess free deep contact May 6, 1998 Issued
Array ( [id] => 4189071 [patent_doc_number] => 06042999 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-03-28 [patent_title] => 'Robust dual damascene process' [patent_app_type] => 1 [patent_app_number] => 9/073952 [patent_app_country] => US [patent_app_date] => 1998-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 24 [patent_no_of_words] => 4114 [patent_no_of_claims] => 41 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 293 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/042/06042999.pdf [firstpage_image] =>[orig_patent_app_number] => 073952 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/073952
Robust dual damascene process May 6, 1998 Issued
Array ( [id] => 4233388 [patent_doc_number] => 06143474 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-11-07 [patent_title] => 'Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors, and capacitor plates' [patent_app_type] => 1 [patent_app_number] => 9/073950 [patent_app_country] => US [patent_app_date] => 1998-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 27 [patent_no_of_words] => 3605 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 282 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/143/06143474.pdf [firstpage_image] =>[orig_patent_app_number] => 073950 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/073950
Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors, and capacitor plates May 6, 1998 Issued
Array ( [id] => 4180917 [patent_doc_number] => 06159661 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-12 [patent_title] => 'Dual damascene process' [patent_app_type] => 1 [patent_app_number] => 9/073997 [patent_app_country] => US [patent_app_date] => 1998-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 17 [patent_no_of_words] => 3062 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 323 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/159/06159661.pdf [firstpage_image] =>[orig_patent_app_number] => 073997 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/073997
Dual damascene process May 6, 1998 Issued
Array ( [id] => 4082281 [patent_doc_number] => 06162584 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-19 [patent_title] => 'Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors and capacitor plates in an integrated circuit' [patent_app_type] => 1 [patent_app_number] => 9/073948 [patent_app_country] => US [patent_app_date] => 1998-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 18 [patent_no_of_words] => 2915 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 197 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/162/06162584.pdf [firstpage_image] =>[orig_patent_app_number] => 073948 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/073948
Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors and capacitor plates in an integrated circuit May 6, 1998 Issued
Array ( [id] => 4291655 [patent_doc_number] => 06183937 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-06 [patent_title] => 'Post photodevelopment isotropic radiation treatment method for forming patterned photoresist layer with attenuated linewidth' [patent_app_type] => 1 [patent_app_number] => 9/072997 [patent_app_country] => US [patent_app_date] => 1998-05-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 5865 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 109 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/183/06183937.pdf [firstpage_image] =>[orig_patent_app_number] => 072997 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/072997
Post photodevelopment isotropic radiation treatment method for forming patterned photoresist layer with attenuated linewidth May 5, 1998 Issued
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