
John L. Leguyader
Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )
| Most Active Art Unit | 1805 |
| Art Unit(s) | 1804, 1633, 1621, 1805, 1809, 1635, 2899 |
| Total Applications | 501 |
| Issued Applications | 292 |
| Pending Applications | 54 |
| Abandoned Applications | 155 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 3923413
[patent_doc_number] => 05952160
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-14
[patent_title] => 'Method and system for controlling the relative size of images formed in light-sensitive media'
[patent_app_type] => 1
[patent_app_number] => 8/752113
[patent_app_country] => US
[patent_app_date] => 1996-11-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 15
[patent_no_of_words] => 5746
[patent_no_of_claims] => 25
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[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/952/05952160.pdf
[firstpage_image] =>[orig_patent_app_number] => 752113
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/752113 | Method and system for controlling the relative size of images formed in light-sensitive media | Nov 19, 1996 | Issued |
Array
(
[id] => 4064645
[patent_doc_number] => 05895740
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-04-20
[patent_title] => 'Method of forming contact holes of reduced dimensions by using in-situ formed polymeric sidewall spacers'
[patent_app_type] => 1
[patent_app_number] => 8/747273
[patent_app_country] => US
[patent_app_date] => 1996-11-13
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[pdf_file] => patents/05/895/05895740.pdf
[firstpage_image] =>[orig_patent_app_number] => 747273
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/747273 | Method of forming contact holes of reduced dimensions by using in-situ formed polymeric sidewall spacers | Nov 12, 1996 | Issued |
Array
(
[id] => 1369528
[patent_doc_number] => 06562544
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2003-05-13
[patent_title] => 'Method and apparatus for improving accuracy in photolithographic processing of substrates'
[patent_app_type] => B1
[patent_app_number] => 08/743628
[patent_app_country] => US
[patent_app_date] => 1996-11-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
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[pdf_file] => patents/06/562/06562544.pdf
[firstpage_image] =>[orig_patent_app_number] => 08743628
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/743628 | Method and apparatus for improving accuracy in photolithographic processing of substrates | Nov 3, 1996 | Issued |
Array
(
[id] => 3976765
[patent_doc_number] => 05948598
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-09-07
[patent_title] => 'Anti-reflective silicon nitride film using in-situ deposition'
[patent_app_type] => 1
[patent_app_number] => 8/742228
[patent_app_country] => US
[patent_app_date] => 1996-10-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 1996
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[pdf_file] => patents/05/948/05948598.pdf
[firstpage_image] =>[orig_patent_app_number] => 742228
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/742228 | Anti-reflective silicon nitride film using in-situ deposition | Oct 30, 1996 | Issued |
| 08/736966 | EXPOSURE APPARATUS AND METHOD | Oct 24, 1996 | Abandoned |
Array
(
[id] => 3695404
[patent_doc_number] => 05677109
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-10-14
[patent_title] => 'Method for E-beam writing'
[patent_app_type] => 1
[patent_app_number] => 8/736294
[patent_app_country] => US
[patent_app_date] => 1996-10-24
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/677/05677109.pdf
[firstpage_image] =>[orig_patent_app_number] => 736294
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/736294 | Method for E-beam writing | Oct 23, 1996 | Issued |
Array
(
[id] => 3625315
[patent_doc_number] => 05686223
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-11-11
[patent_title] => 'Method for reduced pitch lithography'
[patent_app_type] => 1
[patent_app_number] => 8/740014
[patent_app_country] => US
[patent_app_date] => 1996-10-23
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[pdf_file] => patents/05/686/05686223.pdf
[firstpage_image] =>[orig_patent_app_number] => 740014
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/740014 | Method for reduced pitch lithography | Oct 22, 1996 | Issued |
Array
(
[id] => 3963099
[patent_doc_number] => 05885754
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-03-23
[patent_title] => 'Method of forming a pattern'
[patent_app_type] => 1
[patent_app_number] => 8/736174
[patent_app_country] => US
[patent_app_date] => 1996-10-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 39
[patent_figures_cnt] => 65
[patent_no_of_words] => 18719
[patent_no_of_claims] => 16
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[patent_words_short_claim] => 185
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[pdf_file] => patents/05/885/05885754.pdf
[firstpage_image] =>[orig_patent_app_number] => 736174
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/736174 | Method of forming a pattern | Oct 22, 1996 | Issued |
| 08/734826 | SUB-MICRON PATTERNING USING OPTICAL LITHOGRAPHY | Oct 21, 1996 | Abandoned |
Array
(
[id] => 3790288
[patent_doc_number] => 05725996
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-10
[patent_title] => 'Energy sensitive composition and a process for device fabrication using this composition'
[patent_app_type] => 1
[patent_app_number] => 8/731865
[patent_app_country] => US
[patent_app_date] => 1996-10-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/05/725/05725996.pdf
[firstpage_image] =>[orig_patent_app_number] => 731865
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/731865 | Energy sensitive composition and a process for device fabrication using this composition | Oct 21, 1996 | Issued |
Array
(
[id] => 3726886
[patent_doc_number] => 05652084
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[patent_title] => 'Method for reduced pitch lithography'
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[patent_app_number] => 8/740145
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[firstpage_image] =>[orig_patent_app_number] => 740145
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/740145 | Method for reduced pitch lithography | Oct 21, 1996 | Issued |
Array
(
[id] => 4040116
[patent_doc_number] => 05874200
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[patent_kind] => NA
[patent_issue_date] => 1999-02-23
[patent_title] => 'Method for forming a pattern preventing water mark formation'
[patent_app_type] => 1
[patent_app_number] => 8/732592
[patent_app_country] => US
[patent_app_date] => 1996-10-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[firstpage_image] =>[orig_patent_app_number] => 732592
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/732592 | Method for forming a pattern preventing water mark formation | Oct 14, 1996 | Issued |
Array
(
[id] => 3772359
[patent_doc_number] => 05817446
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-10-06
[patent_title] => 'Method of forming airbridged metallization for integrated circuit fabrication'
[patent_app_type] => 1
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[firstpage_image] =>[orig_patent_app_number] => 732565
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/732565 | Method of forming airbridged metallization for integrated circuit fabrication | Oct 14, 1996 | Issued |
Array
(
[id] => 3658899
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[patent_kind] => NA
[patent_issue_date] => 1997-07-15
[patent_title] => 'Process for creating circuitry on the surface of a photoimageable dielectric'
[patent_app_type] => 1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/726546 | Process for creating circuitry on the surface of a photoimageable dielectric | Oct 6, 1996 | Issued |
Array
(
[id] => 3806291
[patent_doc_number] => 05811223
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[patent_issue_date] => 1998-09-22
[patent_title] => 'Method for inspecting process defects occurring in semiconductor devices'
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[pdf_file] => patents/05/811/05811223.pdf
[firstpage_image] =>[orig_patent_app_number] => 725177
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/725177 | Method for inspecting process defects occurring in semiconductor devices | Oct 2, 1996 | Issued |
Array
(
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[pdf_file] => patents/05/817/05817445.pdf
[firstpage_image] =>[orig_patent_app_number] => 725176
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Array
(
[id] => 3871241
[patent_doc_number] => 05824457
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[patent_issue_date] => 1998-10-20
[patent_title] => 'Use of WEE (wafer edge exposure) to prevent polyimide contamination'
[patent_app_type] => 1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/720639 | Use of WEE (wafer edge exposure) to prevent polyimide contamination | Oct 1, 1996 | Issued |
Array
(
[id] => 3780229
[patent_doc_number] => 05821034
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[patent_issue_date] => 1998-10-13
[patent_title] => 'Method for forming micro patterns of semiconductor devices'
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[patent_app_country] => US
[patent_app_date] => 1996-09-27
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[pdf_file] => patents/05/821/05821034.pdf
[firstpage_image] =>[orig_patent_app_number] => 720020
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/720020 | Method for forming micro patterns of semiconductor devices | Sep 26, 1996 | Issued |
Array
(
[id] => 4010304
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[patent_kind] => NA
[patent_issue_date] => 1999-03-09
[patent_title] => 'Method for planarizing a non planar layer'
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[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 719810
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/719810 | Method for planarizing a non planar layer | Sep 24, 1996 | Issued |
Array
(
[id] => 3886250
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[patent_issue_date] => 1998-11-10
[patent_title] => 'Method for fabricating word lines of a semiconductor device'
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[pdf_file] => patents/05/834/05834161.pdf
[firstpage_image] =>[orig_patent_app_number] => 715631
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/715631 | Method for fabricating word lines of a semiconductor device | Sep 17, 1996 | Issued |