
John L. Leguyader
Director (ID: 16292, Phone: (571)272-4650 , Office: P/2600 )
| Most Active Art Unit | |
| Art Unit(s) | |
| Total Applications | |
| Issued Applications | |
| Pending Applications | |
| Abandoned Applications |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
| 07/620752 | Process for promoting adhesion of a layer of photoresist on a substrate having a previous layer of photoresist | Dec 2, 1990 | Issued |
| 07/621192 | SINGLE PASS COMPENSATION FOR ELECTRON BEAM PROXIMITY EFFECT | Nov 28, 1990 | Abandoned |
| 07/617797 | Method and apparatus for creation of resist patterns by chemical development | Nov 25, 1990 | Issued |
| 07/616403 | METHOD OF PRODUCING LONGITUDINALLY FINE STRIPED TYPE HEAT SEAL CONNECTOR MEMBER | Nov 20, 1990 | Abandoned |
| 07/617243 | METHOD OF EXPOSING A PERIPHERAL PART OF WAFER | Nov 20, 1990 | Abandoned |
| 07/615937 | PHOTORESIST ADHESION PROMOTER | Nov 15, 1990 | Abandoned |
| 07/613196 | METHOD OF MAKING A MULTILAYER THIN FILM STRUCTURE | Nov 14, 1990 | Abandoned |
| 07/611912 | PHOTOMASK | Nov 12, 1990 | Abandoned |
| 07/611270 | Holes and spaces shrinkage | Nov 8, 1990 | Issued |
| 07/610569 | EXPOSURE CONDITION MEASUREMENT METHOD | Nov 7, 1990 | Abandoned |
| 07/610422 | FABRICATION METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND EXPOSURE APPARATUS USED THEREFOR | Nov 6, 1990 | Abandoned |
| 07/607711 | Selective metallization process | Oct 31, 1990 | Issued |
| 07/607154 | Method for aligning high density infrared detector arrays | Oct 30, 1990 | Issued |
| 07/606750 | Method for forming a fine pattern on a semiconductor having a step therein | Oct 30, 1990 | Issued |
| 07/606231 | PHOTOLITHOGRAPHIC METHOD USING NON-PHOTOACTIVE RESINS | Oct 30, 1990 | Abandoned |
| 07/604982 | Method for fabricating an integral three-dimensional object from layers of a photoformable composition | Oct 28, 1990 | Issued |
| 07/602676 | RANDOM SCREEN WATERLESS PRINTING PROCESS | Oct 23, 1990 | Abandoned |
| 07/601388 | Method for developing a waterless light-sensitive lithographic plate | Oct 22, 1990 | Issued |
| 07/599880 | PROCESS FOR FORMATION OF RESIST PATTERNS | Oct 18, 1990 | Abandoned |
| 07/599822 | FINE PATTERN FORMING METHOD | Oct 18, 1990 | Abandoned |