
John S. Ruggles
Examiner (ID: 14713)
| Most Active Art Unit | 1721 |
| Art Unit(s) | 1795, 1721, 1756, OPC |
| Total Applications | 315 |
| Issued Applications | 206 |
| Pending Applications | 0 |
| Abandoned Applications | 109 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7251766
[patent_doc_number] => 20050142454
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-06-30
[patent_title] => 'Hole pattern design method and photomask'
[patent_app_type] => utility
[patent_app_number] => 11/020131
[patent_app_country] => US
[patent_app_date] => 2004-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4681
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0142/20050142454.pdf
[firstpage_image] =>[orig_patent_app_number] => 11020131
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/020131 | Hole pattern design method and photomask | Dec 26, 2004 | Issued |
Array
(
[id] => 6983146
[patent_doc_number] => 20050153216
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-14
[patent_title] => 'Lithography mask and lithography system for direction-dependent exposure'
[patent_app_type] => utility
[patent_app_number] => 10/998300
[patent_app_country] => US
[patent_app_date] => 2004-11-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 2025
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[pdf_file] => publications/A1/0153/20050153216.pdf
[firstpage_image] =>[orig_patent_app_number] => 10998300
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/998300 | Lithography mask and lithography system for direction-dependent exposure | Nov 25, 2004 | Abandoned |
Array
(
[id] => 270311
[patent_doc_number] => 07563547
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-07-21
[patent_title] => 'Photomask and method of manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 10/982851
[patent_app_country] => US
[patent_app_date] => 2004-11-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 6819
[patent_no_of_claims] => 16
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[pdf_file] => patents/07/563/07563547.pdf
[firstpage_image] =>[orig_patent_app_number] => 10982851
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/982851 | Photomask and method of manufacturing the same | Nov 7, 2004 | Issued |
Array
(
[id] => 326413
[patent_doc_number] => 07514183
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-04-07
[patent_title] => 'Method for performing transmission tuning of a mask pattern to improve process latitude'
[patent_app_type] => utility
[patent_app_number] => 10/981762
[patent_app_country] => US
[patent_app_date] => 2004-11-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 32
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[patent_no_of_words] => 10054
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/514/07514183.pdf
[firstpage_image] =>[orig_patent_app_number] => 10981762
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/981762 | Method for performing transmission tuning of a mask pattern to improve process latitude | Nov 4, 2004 | Issued |
Array
(
[id] => 5807571
[patent_doc_number] => 20060093925
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-04
[patent_title] => 'Method for repairing opaque defects in photolithography masks'
[patent_app_type] => utility
[patent_app_number] => 10/982302
[patent_app_country] => US
[patent_app_date] => 2004-11-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 2179
[patent_no_of_claims] => 20
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[pdf_file] => publications/A1/0093/20060093925.pdf
[firstpage_image] =>[orig_patent_app_number] => 10982302
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/982302 | Method for repairing opaque defects in photolithography masks | Nov 3, 2004 | Issued |
Array
(
[id] => 6990733
[patent_doc_number] => 20050089770
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-04-28
[patent_title] => 'Printing irregularly-spaced contact holes using phase shift masks'
[patent_app_type] => utility
[patent_app_number] => 10/973001
[patent_app_country] => US
[patent_app_date] => 2004-10-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 27
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[patent_no_of_words] => 8306
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[pdf_file] => publications/A1/0089/20050089770.pdf
[firstpage_image] =>[orig_patent_app_number] => 10973001
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/973001 | Printing irregularly-spaced contact holes using phase shift masks | Oct 24, 2004 | Abandoned |
Array
(
[id] => 7103752
[patent_doc_number] => 20050106478
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-19
[patent_title] => 'Process for generating a hard mask for the patterning of a layer, and hard mask for the patterning of a layer'
[patent_app_type] => utility
[patent_app_number] => 10/970483
[patent_app_country] => US
[patent_app_date] => 2004-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 1650
[patent_no_of_claims] => 9
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0106/20050106478.pdf
[firstpage_image] =>[orig_patent_app_number] => 10970483
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/970483 | Process for generating a hard mask for the patterning of a layer | Oct 20, 2004 | Issued |
Array
(
[id] => 6905403
[patent_doc_number] => 20050100798
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-12
[patent_title] => 'Device and method for providing wavelength reduction with a photomask'
[patent_app_type] => utility
[patent_app_number] => 10/964842
[patent_app_country] => US
[patent_app_date] => 2004-10-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 3037
[patent_no_of_claims] => 32
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[pdf_file] => publications/A1/0100/20050100798.pdf
[firstpage_image] =>[orig_patent_app_number] => 10964842
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/964842 | Device and method for providing wavelength reduction with a photomask | Oct 12, 2004 | Abandoned |
Array
(
[id] => 5637326
[patent_doc_number] => 20060068299
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-30
[patent_title] => 'Multi wavelength multi layer printing'
[patent_app_type] => utility
[patent_app_number] => 10/953322
[patent_app_country] => US
[patent_app_date] => 2004-09-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 3238
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[pdf_file] => publications/A1/0068/20060068299.pdf
[firstpage_image] =>[orig_patent_app_number] => 10953322
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/953322 | Multi wavelength mask for multi layer printing on a process substrate | Sep 28, 2004 | Issued |
Array
(
[id] => 5908631
[patent_doc_number] => 20060124834
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-06-15
[patent_title] => 'Near-field light generating method, near-field exposure mask, and near-field exposure method and apparatus'
[patent_app_type] => utility
[patent_app_number] => 10/529892
[patent_app_country] => US
[patent_app_date] => 2004-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 5364
[patent_no_of_claims] => 13
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0124/20060124834.pdf
[firstpage_image] =>[orig_patent_app_number] => 10529892
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/529892 | Near-field light generating method and near-field optical head using a light blocking metal film having a fine opening whose size is not more than a wavelength of irradiated light, and near-field optical microscope having the optical head | Sep 23, 2004 | Issued |
Array
(
[id] => 6938913
[patent_doc_number] => 20050112476
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-26
[patent_title] => 'Phase-shift mask and fabrication thereof'
[patent_app_type] => utility
[patent_app_number] => 10/950051
[patent_app_country] => US
[patent_app_date] => 2004-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
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[patent_no_of_words] => 9290
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[pdf_file] => publications/A1/0112/20050112476.pdf
[firstpage_image] =>[orig_patent_app_number] => 10950051
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/950051 | Phase-shift mask and fabrication thereof | Sep 23, 2004 | Abandoned |
Array
(
[id] => 5642559
[patent_doc_number] => 20060281014
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-12-14
[patent_title] => 'Method and apparatus for protecting a reticle used in chip production from contamination'
[patent_app_type] => utility
[patent_app_number] => 10/572842
[patent_app_country] => US
[patent_app_date] => 2004-09-15
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[pdf_file] => publications/A1/0281/20060281014.pdf
[firstpage_image] =>[orig_patent_app_number] => 10572842
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/572842 | Method and apparatus for protecting a reticle used in chip production from contamination | Sep 14, 2004 | Abandoned |
Array
(
[id] => 5710336
[patent_doc_number] => 20060051681
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-09
[patent_title] => 'Method of repairing a photomask having an internal etch stop layer'
[patent_app_type] => utility
[patent_app_number] => 10/936071
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[firstpage_image] =>[orig_patent_app_number] => 10936071
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/936071 | Method of repairing a photomask having an internal etch stop layer | Sep 7, 2004 | Abandoned |
Array
(
[id] => 344918
[patent_doc_number] => 07498104
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-03-03
[patent_title] => 'Phase shift photomask'
[patent_app_type] => utility
[patent_app_number] => 10/711160
[patent_app_country] => US
[patent_app_date] => 2004-08-28
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[pdf_file] => patents/07/498/07498104.pdf
[firstpage_image] =>[orig_patent_app_number] => 10711160
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/711160 | Phase shift photomask | Aug 27, 2004 | Issued |
Array
(
[id] => 6938912
[patent_doc_number] => 20050112475
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-26
[patent_title] => 'Photomask, method of lithography, and method for manufacturing the photomask'
[patent_app_type] => utility
[patent_app_number] => 10/927320
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[pdf_file] => publications/A1/0112/20050112475.pdf
[firstpage_image] =>[orig_patent_app_number] => 10927320
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/927320 | Photomask having a monitoring pattern with an asymmetrical diffraction grating that includes semi-transparent probing-phase shifters | Aug 26, 2004 | Issued |
Array
(
[id] => 5590738
[patent_doc_number] => 20060040189
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-23
[patent_title] => 'Advanced oriented assist features for integrated circuit hole patterns'
[patent_app_type] => utility
[patent_app_number] => 10/923462
[patent_app_country] => US
[patent_app_date] => 2004-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[pdf_file] => publications/A1/0040/20060040189.pdf
[firstpage_image] =>[orig_patent_app_number] => 10923462
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/923462 | Method of optically transferring a pattern from a mask having advanced oriented assist features for integrated circuit hole patterns | Aug 19, 2004 | Issued |
Array
(
[id] => 5602109
[patent_doc_number] => 20060292454
[patent_country] => US
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[patent_issue_date] => 2006-12-28
[patent_title] => 'Method of producing phase shift masks'
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[patent_app_number] => 10/567760
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Array
(
[id] => 879235
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[patent_issue_date] => 2008-04-08
[patent_title] => 'Chromeless mask for contact holes'
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[patent_app_number] => 10/887640
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/887640 | Chromeless mask for contact holes | Jul 8, 2004 | Issued |
Array
(
[id] => 6990729
[patent_doc_number] => 20050089766
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[patent_kind] => A1
[patent_issue_date] => 2005-04-28
[patent_title] => 'Method for improving uniformity and alignment accuracy of contact hole array pattern'
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[patent_app_number] => 10/879571
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[firstpage_image] =>[orig_patent_app_number] => 10879571
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/879571 | Method for improving uniformity and alignment accuracy of contact hole array pattern | Jun 28, 2004 | Abandoned |
Array
(
[id] => 5747762
[patent_doc_number] => 20060110693
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[patent_title] => 'Exposure method and apparatus, exposure mask, and device manufacturing method'
[patent_app_type] => utility
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[firstpage_image] =>[orig_patent_app_number] => 10529907
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/529907 | Exposure method and apparatus, exposure mask, and device manufacturing method | Jun 23, 2004 | Abandoned |