Search

John S. Ruggles

Examiner (ID: 14713)

Most Active Art Unit
1721
Art Unit(s)
1795, 1721, 1756, OPC
Total Applications
315
Issued Applications
206
Pending Applications
0
Abandoned Applications
109

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 7031993 [patent_doc_number] => 20050030502 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-10 [patent_title] => 'Photomask, exposure control method and method of manufacturing a semiconductor device' [patent_app_type] => utility [patent_app_number] => 10/874192 [patent_app_country] => US [patent_app_date] => 2004-06-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 6994 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0030/20050030502.pdf [firstpage_image] =>[orig_patent_app_number] => 10874192 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/874192
Photomask, exposure control method and method of manufacturing a semiconductor device Jun 23, 2004 Abandoned
Array ( [id] => 7010584 [patent_doc_number] => 20050064300 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-24 [patent_title] => 'Mask and method for manufacturing the same' [patent_app_type] => utility [patent_app_number] => 10/870442 [patent_app_country] => US [patent_app_date] => 2004-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 3390 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0064/20050064300.pdf [firstpage_image] =>[orig_patent_app_number] => 10870442 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/870442
Masks each having a central main pattern region and a peripheral phantom pattern region with light-transmitting features in both pattern regions having the shame shape and pitch and methods of manufacturing the same Jun 17, 2004 Issued
Array ( [id] => 899505 [patent_doc_number] => 07338736 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-03-04 [patent_title] => 'Method of fabricating a phase shift mask' [patent_app_type] => utility [patent_app_number] => 10/859551 [patent_app_country] => US [patent_app_date] => 2004-06-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 13 [patent_no_of_words] => 3484 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 122 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/338/07338736.pdf [firstpage_image] =>[orig_patent_app_number] => 10859551 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/859551
Method of fabricating a phase shift mask Jun 2, 2004 Issued
Array ( [id] => 847013 [patent_doc_number] => 07384713 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-06-10 [patent_title] => 'Exposure mask blank manufacturing method and exposure mask manufacturing method' [patent_app_type] => utility [patent_app_number] => 10/853532 [patent_app_country] => US [patent_app_date] => 2004-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 6848 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 168 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/384/07384713.pdf [firstpage_image] =>[orig_patent_app_number] => 10853532 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/853532
Exposure mask blank manufacturing method and exposure mask manufacturing method May 25, 2004 Issued
Array ( [id] => 7601033 [patent_doc_number] => 07385676 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-06-10 [patent_title] => 'Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer' [patent_app_type] => utility [patent_app_number] => 10/852661 [patent_app_country] => US [patent_app_date] => 2004-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 6381 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 61 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/385/07385676.pdf [firstpage_image] =>[orig_patent_app_number] => 10852661 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/852661
Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer May 24, 2004 Issued
Array ( [id] => 585589 [patent_doc_number] => 07438997 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-10-21 [patent_title] => 'Imaging and devices in lithography' [patent_app_type] => utility [patent_app_number] => 10/846403 [patent_app_country] => US [patent_app_date] => 2004-05-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 47 [patent_no_of_words] => 8325 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/438/07438997.pdf [firstpage_image] =>[orig_patent_app_number] => 10846403 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/846403
Imaging and devices in lithography May 13, 2004 Issued
Array ( [id] => 7423888 [patent_doc_number] => 20040229472 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-11-18 [patent_title] => 'Exposure mask pattern formation method, exposure mask, and semiconductor device production method employing the exposure mask' [patent_app_type] => new [patent_app_number] => 10/843673 [patent_app_country] => US [patent_app_date] => 2004-05-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 7961 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 194 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0229/20040229472.pdf [firstpage_image] =>[orig_patent_app_number] => 10843673 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/843673
Exposure mask pattern formation method, exposure mask, and semiconductor device production method employing the exposure mask May 11, 2004 Abandoned
Array ( [id] => 7411929 [patent_doc_number] => 20040227917 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-11-18 [patent_title] => 'Photomask for exposure to optical near-field, method of controlling optical near-field intensity distribution using the same, pattern preparing method and pattern preparing apparatus' [patent_app_type] => new [patent_app_number] => 10/842451 [patent_app_country] => US [patent_app_date] => 2004-05-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 4993 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0227/20040227917.pdf [firstpage_image] =>[orig_patent_app_number] => 10842451 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/842451
Photomask for uniform intensity exposure to an optical near-field May 10, 2004 Issued
Array ( [id] => 7427087 [patent_doc_number] => 20040209193 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-10-21 [patent_title] => 'Exposure control for phase shifting photolithographic masks' [patent_app_type] => new [patent_app_number] => 10/841276 [patent_app_country] => US [patent_app_date] => 2004-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 4948 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0209/20040209193.pdf [firstpage_image] =>[orig_patent_app_number] => 10841276 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/841276
Exposure control for phase shifting photolithographic masks May 6, 2004 Issued
Array ( [id] => 7317337 [patent_doc_number] => 20040224243 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-11-11 [patent_title] => 'Mask, mask blank, and methods of producing these' [patent_app_type] => new [patent_app_number] => 10/834552 [patent_app_country] => US [patent_app_date] => 2004-04-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 21 [patent_figures_cnt] => 21 [patent_no_of_words] => 11329 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0224/20040224243.pdf [firstpage_image] =>[orig_patent_app_number] => 10834552 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/834552
Mask, mask blank, and methods of producing these Apr 28, 2004 Abandoned
Array ( [id] => 6966331 [patent_doc_number] => 20050233228 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-10-20 [patent_title] => 'Grayscale lithography methods and devices' [patent_app_type] => utility [patent_app_number] => 10/826663 [patent_app_country] => US [patent_app_date] => 2004-04-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 8548 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0233/20050233228.pdf [firstpage_image] =>[orig_patent_app_number] => 10826663 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/826663
Grayscale lithography methods and devices Apr 15, 2004 Abandoned
Array ( [id] => 7019181 [patent_doc_number] => 20050221200 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-10-06 [patent_title] => 'Photomask features with chromeless nonprinting phase shifting window' [patent_app_type] => utility [patent_app_number] => 10/815312 [patent_app_country] => US [patent_app_date] => 2004-04-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 7967 [patent_no_of_claims] => 69 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0221/20050221200.pdf [firstpage_image] =>[orig_patent_app_number] => 10815312 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/815312
Photomask features with chromeless nonprinting phase shifting window Mar 31, 2004 Abandoned
Array ( [id] => 386472 [patent_doc_number] => 07303841 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-12-04 [patent_title] => 'Repair of photolithography masks by sub-wavelength artificial grating technology' [patent_app_type] => utility [patent_app_number] => 10/810385 [patent_app_country] => US [patent_app_date] => 2004-03-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 14 [patent_no_of_words] => 2735 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/303/07303841.pdf [firstpage_image] =>[orig_patent_app_number] => 10810385 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/810385
Repair of photolithography masks by sub-wavelength artificial grating technology Mar 25, 2004 Issued
Array ( [id] => 7426920 [patent_doc_number] => 20040209172 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-10-21 [patent_title] => 'Defect correction method for a photomask' [patent_app_type] => new [patent_app_number] => 10/809593 [patent_app_country] => US [patent_app_date] => 2004-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2002 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0209/20040209172.pdf [firstpage_image] =>[orig_patent_app_number] => 10809593 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/809593
Defect correction method for a photomask Mar 24, 2004 Abandoned
Array ( [id] => 836799 [patent_doc_number] => 07393614 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-07-01 [patent_title] => 'Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer' [patent_app_type] => utility [patent_app_number] => 10/792693 [patent_app_country] => US [patent_app_date] => 2004-03-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 4935 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 210 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/393/07393614.pdf [firstpage_image] =>[orig_patent_app_number] => 10792693 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/792693
Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer Mar 4, 2004 Issued
Array ( [id] => 7182572 [patent_doc_number] => 20040202943 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-10-14 [patent_title] => 'Set of at least two masks for the projection of structure patterns and method for producing the masks' [patent_app_type] => new [patent_app_number] => 10/791763 [patent_app_country] => US [patent_app_date] => 2004-03-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 5591 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 195 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0202/20040202943.pdf [firstpage_image] =>[orig_patent_app_number] => 10791763 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/791763
Set of at least two masks for the projection of structure patterns Mar 3, 2004 Issued
Array ( [id] => 7464051 [patent_doc_number] => 20040166421 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-08-26 [patent_title] => 'Photomask for near-field exposure, near-field exposure method, and near-field exposure apparatus' [patent_app_type] => new [patent_app_number] => 10/779786 [patent_app_country] => US [patent_app_date] => 2004-02-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 6505 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0166/20040166421.pdf [firstpage_image] =>[orig_patent_app_number] => 10779786 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/779786
Near-field exposure apparatus and near-field exposure photomask Feb 17, 2004 Issued
Array ( [id] => 803125 [patent_doc_number] => 07422828 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2008-09-09 [patent_title] => 'Mask CD measurement monitor outside of the pellicle area' [patent_app_type] => utility [patent_app_number] => 10/774099 [patent_app_country] => US [patent_app_date] => 2004-02-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 2209 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/422/07422828.pdf [firstpage_image] =>[orig_patent_app_number] => 10774099 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/774099
Mask CD measurement monitor outside of the pellicle area Feb 5, 2004 Issued
Array ( [id] => 418645 [patent_doc_number] => 07276316 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-10-02 [patent_title] => 'Common second level frame exposure methods for making embedded attenuated phase shift masks' [patent_app_type] => utility [patent_app_number] => 10/708010 [patent_app_country] => US [patent_app_date] => 2004-02-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 2258 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 191 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/276/07276316.pdf [firstpage_image] =>[orig_patent_app_number] => 10708010 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/708010
Common second level frame exposure methods for making embedded attenuated phase shift masks Feb 1, 2004 Issued
Array ( [id] => 224720 [patent_doc_number] => 07604903 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2009-10-20 [patent_title] => 'Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK)' [patent_app_type] => utility [patent_app_number] => 10/768515 [patent_app_country] => US [patent_app_date] => 2004-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 13 [patent_no_of_words] => 4519 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/604/07604903.pdf [firstpage_image] =>[orig_patent_app_number] => 10768515 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/768515
Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) Jan 29, 2004 Issued
Menu