| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[patent_issue_date] => 2005-02-10
[patent_title] => 'Photomask, exposure control method and method of manufacturing a semiconductor device'
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[patent_app_number] => 10/874192
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/874192 | Photomask, exposure control method and method of manufacturing a semiconductor device | Jun 23, 2004 | Abandoned |
Array
(
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[patent_doc_number] => 20050064300
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[patent_kind] => A1
[patent_issue_date] => 2005-03-24
[patent_title] => 'Mask and method for manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 10/870442
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[firstpage_image] =>[orig_patent_app_number] => 10870442
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/870442 | Masks each having a central main pattern region and a peripheral phantom pattern region with light-transmitting features in both pattern regions having the shame shape and pitch and methods of manufacturing the same | Jun 17, 2004 | Issued |
Array
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[id] => 899505
[patent_doc_number] => 07338736
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-03-04
[patent_title] => 'Method of fabricating a phase shift mask'
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Array
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[patent_doc_number] => 07384713
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[patent_kind] => B2
[patent_issue_date] => 2008-06-10
[patent_title] => 'Exposure mask blank manufacturing method and exposure mask manufacturing method'
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[patent_app_number] => 10/853532
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[patent_app_date] => 2004-05-26
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Array
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[patent_issue_date] => 2008-06-10
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/846403 | Imaging and devices in lithography | May 13, 2004 | Issued |
Array
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[patent_issue_date] => 2004-11-18
[patent_title] => 'Exposure mask pattern formation method, exposure mask, and semiconductor device production method employing the exposure mask'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/843673 | Exposure mask pattern formation method, exposure mask, and semiconductor device production method employing the exposure mask | May 11, 2004 | Abandoned |
Array
(
[id] => 7411929
[patent_doc_number] => 20040227917
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[patent_kind] => A1
[patent_issue_date] => 2004-11-18
[patent_title] => 'Photomask for exposure to optical near-field, method of controlling optical near-field intensity distribution using the same, pattern preparing method and pattern preparing apparatus'
[patent_app_type] => new
[patent_app_number] => 10/842451
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/842451 | Photomask for uniform intensity exposure to an optical near-field | May 10, 2004 | Issued |
Array
(
[id] => 7427087
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[patent_issue_date] => 2004-10-21
[patent_title] => 'Exposure control for phase shifting photolithographic masks'
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Array
(
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[patent_issue_date] => 2004-11-11
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Array
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Array
(
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Array
(
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Array
(
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Array
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Array
(
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[patent_issue_date] => 2004-10-14
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Array
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Array
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Array
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Array
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[patent_issue_date] => 2009-10-20
[patent_title] => 'Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK)'
[patent_app_type] => utility
[patent_app_number] => 10/768515
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/768515 | Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) | Jan 29, 2004 | Issued |