
John S. Ruggles
Examiner (ID: 14713)
| Most Active Art Unit | 1721 |
| Art Unit(s) | 1795, 1721, 1756, OPC |
| Total Applications | 315 |
| Issued Applications | 206 |
| Pending Applications | 0 |
| Abandoned Applications | 109 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 270310
[patent_doc_number] => 07563546
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-07-21
[patent_title] => 'Process for creating phase edge structures in a phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 10/707908
[patent_app_country] => US
[patent_app_date] => 2004-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 15
[patent_no_of_words] => 1720
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 170
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/563/07563546.pdf
[firstpage_image] =>[orig_patent_app_number] => 10707908
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/707908 | Process for creating phase edge structures in a phase shift mask | Jan 22, 2004 | Issued |
Array
(
[id] => 7177437
[patent_doc_number] => 20050123838
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-06-09
[patent_title] => 'Clear field annular type phase shifting mask'
[patent_app_type] => utility
[patent_app_number] => 10/730533
[patent_app_country] => US
[patent_app_date] => 2003-12-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 3212
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0123/20050123838.pdf
[firstpage_image] =>[orig_patent_app_number] => 10730533
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/730533 | Clear field annular type phase shifting mask | Dec 7, 2003 | Abandoned |
Array
(
[id] => 7033458
[patent_doc_number] => 20050031967
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-10
[patent_title] => 'Photomask, method for fabricating a pattern and method for manufacturing a semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/725570
[patent_app_country] => US
[patent_app_date] => 2003-12-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 7643
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0031/20050031967.pdf
[firstpage_image] =>[orig_patent_app_number] => 10725570
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/725570 | Photomask, method for fabricating a pattern and method for manufacturing a semiconductor device | Dec 2, 2003 | Abandoned |
Array
(
[id] => 7404306
[patent_doc_number] => 20040175631
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-09
[patent_title] => 'Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications'
[patent_app_type] => new
[patent_app_number] => 10/689547
[patent_app_country] => US
[patent_app_date] => 2003-10-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 30
[patent_figures_cnt] => 30
[patent_no_of_words] => 18554
[patent_no_of_claims] => 97
[patent_no_of_ind_claims] => 12
[patent_words_short_claim] => 16
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0175/20040175631.pdf
[firstpage_image] =>[orig_patent_app_number] => 10689547
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/689547 | Methods for additive repair of phase shift masks by selectively depositing nanometer-scale engineered structures on defective phase shifters | Oct 20, 2003 | Issued |
Array
(
[id] => 7287517
[patent_doc_number] => 20040109153
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-10
[patent_title] => 'Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same'
[patent_app_type] => new
[patent_app_number] => 10/677706
[patent_app_country] => US
[patent_app_date] => 2003-10-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4786
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 50
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0109/20040109153.pdf
[firstpage_image] =>[orig_patent_app_number] => 10677706
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/677706 | Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same | Oct 1, 2003 | Issued |
Array
(
[id] => 7323202
[patent_doc_number] => 20040137338
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-15
[patent_title] => 'Mask, exposure apparatus, and exposure method'
[patent_app_type] => new
[patent_app_number] => 10/663691
[patent_app_country] => US
[patent_app_date] => 2003-09-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 12804
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 36
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0137/20040137338.pdf
[firstpage_image] =>[orig_patent_app_number] => 10663691
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/663691 | Mask, exposure apparatus, and exposure method | Sep 16, 2003 | Abandoned |
Array
(
[id] => 928378
[patent_doc_number] => 07314688
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-01-01
[patent_title] => 'Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 10/658372
[patent_app_country] => US
[patent_app_date] => 2003-09-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 7611
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 247
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/314/07314688.pdf
[firstpage_image] =>[orig_patent_app_number] => 10658372
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/658372 | Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device | Sep 9, 2003 | Issued |
Array
(
[id] => 7373776
[patent_doc_number] => 20040219438
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-04
[patent_title] => 'Photomask structure and method of reducing lens aberration and pattern displacement'
[patent_app_type] => new
[patent_app_number] => 10/657789
[patent_app_country] => US
[patent_app_date] => 2003-09-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 1626
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 69
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0219/20040219438.pdf
[firstpage_image] =>[orig_patent_app_number] => 10657789
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/657789 | Photomask structure and method of reducing lens aberration and pattern displacement | Sep 7, 2003 | Abandoned |
Array
(
[id] => 7469453
[patent_doc_number] => 20040121245
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-06-24
[patent_title] => 'Exposure method, exposure mask, and exposure apparatus'
[patent_app_type] => new
[patent_app_number] => 10/654913
[patent_app_country] => US
[patent_app_date] => 2003-09-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 6504
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0121/20040121245.pdf
[firstpage_image] =>[orig_patent_app_number] => 10654913
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/654913 | Near-field exposure method | Sep 4, 2003 | Issued |
Array
(
[id] => 7675445
[patent_doc_number] => 20040126673
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-01
[patent_title] => 'Microlithography reticles including high-contrast reticle-identification codes, and apparatus and methods for identifying reticles based on such codes'
[patent_app_type] => new
[patent_app_number] => 10/651456
[patent_app_country] => US
[patent_app_date] => 2003-08-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 6744
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 113
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0126/20040126673.pdf
[firstpage_image] =>[orig_patent_app_number] => 10651456
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/651456 | Microlithography reticles including high-contrast reticle-identification codes, and apparatus and methods for identifying reticles based on such codes | Aug 28, 2003 | Abandoned |
Array
(
[id] => 7219008
[patent_doc_number] => 20040072083
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-04-15
[patent_title] => 'Photomask for manufacturing semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/648236
[patent_app_country] => US
[patent_app_date] => 2003-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3872
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 68
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0072/20040072083.pdf
[firstpage_image] =>[orig_patent_app_number] => 10648236
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/648236 | Photomask for manufacturing semiconductor device | Aug 26, 2003 | Abandoned |
Array
(
[id] => 7082995
[patent_doc_number] => 20050048375
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-03
[patent_title] => 'Method of making an attenuated phase-shifting mask from a mask blank'
[patent_app_type] => utility
[patent_app_number] => 10/649310
[patent_app_country] => US
[patent_app_date] => 2003-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 4835
[patent_no_of_claims] => 39
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0048/20050048375.pdf
[firstpage_image] =>[orig_patent_app_number] => 10649310
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/649310 | Method of making an attenuated phase-shifting mask from a mask blank | Aug 26, 2003 | Abandoned |
Array
(
[id] => 436686
[patent_doc_number] => 07262828
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-08-28
[patent_title] => 'Near-field photomask and near-field exposure apparatus including the photomask'
[patent_app_type] => utility
[patent_app_number] => 10/648317
[patent_app_country] => US
[patent_app_date] => 2003-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 21
[patent_no_of_words] => 9140
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/262/07262828.pdf
[firstpage_image] =>[orig_patent_app_number] => 10648317
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/648317 | Near-field photomask and near-field exposure apparatus including the photomask | Aug 26, 2003 | Issued |
Array
(
[id] => 7677836
[patent_doc_number] => 20040151990
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-08-05
[patent_title] => 'Photomask assembly incorporating a porous frame and method for making it'
[patent_app_type] => new
[patent_app_number] => 10/646356
[patent_app_country] => US
[patent_app_date] => 2003-08-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 8763
[patent_no_of_claims] => 55
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0151/20040151990.pdf
[firstpage_image] =>[orig_patent_app_number] => 10646356
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/646356 | Photomask assembly incorporating a porous frame | Aug 21, 2003 | Issued |
Array
(
[id] => 813505
[patent_doc_number] => 07413832
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-08-19
[patent_title] => 'Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask'
[patent_app_type] => utility
[patent_app_number] => 10/642657
[patent_app_country] => US
[patent_app_date] => 2003-08-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 9883
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 30
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/413/07413832.pdf
[firstpage_image] =>[orig_patent_app_number] => 10642657
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/642657 | Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask | Aug 18, 2003 | Issued |
Array
(
[id] => 7269735
[patent_doc_number] => 20040058253
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-25
[patent_title] => 'Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method'
[patent_app_type] => new
[patent_app_number] => 10/641114
[patent_app_country] => US
[patent_app_date] => 2003-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 5505
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 39
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20040058253.pdf
[firstpage_image] =>[orig_patent_app_number] => 10641114
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/641114 | Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method | Aug 14, 2003 | Abandoned |
Array
(
[id] => 7385395
[patent_doc_number] => 20040180268
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-09-16
[patent_title] => 'Method of manufacturing photomask'
[patent_app_type] => new
[patent_app_number] => 10/635510
[patent_app_country] => US
[patent_app_date] => 2003-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 5105
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0180/20040180268.pdf
[firstpage_image] =>[orig_patent_app_number] => 10635510
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/635510 | Method of manufacturing photomask | Aug 6, 2003 | Issued |
Array
(
[id] => 6905656
[patent_doc_number] => 20050101051
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-05-12
[patent_title] => 'Method of manufacturing an electroconductive film, and an apparatus including it'
[patent_app_type] => utility
[patent_app_number] => 10/624546
[patent_app_country] => US
[patent_app_date] => 2003-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 10360
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0101/20050101051.pdf
[firstpage_image] =>[orig_patent_app_number] => 10624546
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/624546 | Method of manufacturing an electroconductive film, and method of manufacturing an image forming apparatus including the electroconductive film | Jul 22, 2003 | Issued |
Array
(
[id] => 7088830
[patent_doc_number] => 20050008942
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-13
[patent_title] => '[PHOTOMASK WITH INTERNAL ASSISTANT PATTERN FORENHANCING RESOLUTION OF MULTI-DIMENSION PATTERN]'
[patent_app_type] => utility
[patent_app_number] => 10/604271
[patent_app_country] => US
[patent_app_date] => 2003-07-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2295
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0008/20050008942.pdf
[firstpage_image] =>[orig_patent_app_number] => 10604271
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/604271 | [PHOTOMASK WITH INTERNAL ASSISTANT PATTERN FORENHANCING RESOLUTION OF MULTI-DIMENSION PATTERN] | Jul 7, 2003 | Abandoned |
Array
(
[id] => 7334329
[patent_doc_number] => 20040131949
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-07-08
[patent_title] => 'Phase mask for forming diffraction grating, method of fabricating phase mask, and method of forming diffraction grating'
[patent_app_type] => new
[patent_app_number] => 10/614345
[patent_app_country] => US
[patent_app_date] => 2003-07-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 5646
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0131/20040131949.pdf
[firstpage_image] =>[orig_patent_app_number] => 10614345
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/614345 | Phase mask for forming diffraction grating, method of fabricating phase mask, and method of forming diffraction grating | Jul 7, 2003 | Abandoned |