
John S. Ruggles
Examiner (ID: 14713)
| Most Active Art Unit | 1721 |
| Art Unit(s) | 1795, 1721, 1756, OPC |
| Total Applications | 315 |
| Issued Applications | 206 |
| Pending Applications | 0 |
| Abandoned Applications | 109 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7363436
[patent_doc_number] => 20040091792
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-05-13
[patent_title] => 'Phase edge phase shift mask and method for fabricating the same'
[patent_app_type] => new
[patent_app_number] => 10/608639
[patent_app_country] => US
[patent_app_date] => 2003-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 2413
[patent_no_of_claims] => 11
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[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0091/20040091792.pdf
[firstpage_image] =>[orig_patent_app_number] => 10608639
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/608639 | Phase edge phase shift mask and method for fabricating the same | Jun 29, 2003 | Abandoned |
Array
(
[id] => 418644
[patent_doc_number] => 07276315
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-10-02
[patent_title] => 'Methods for generating or designing sidelobe inhibitors for radiation patterning tools'
[patent_app_type] => utility
[patent_app_number] => 10/609097
[patent_app_country] => US
[patent_app_date] => 2003-06-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
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[patent_no_of_words] => 4116
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/276/07276315.pdf
[firstpage_image] =>[orig_patent_app_number] => 10609097
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/609097 | Methods for generating or designing sidelobe inhibitors for radiation patterning tools | Jun 26, 2003 | Issued |
Array
(
[id] => 7262922
[patent_doc_number] => 20040241555
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-02
[patent_title] => 'Method of forming photoresist pattern free from side-lobe phenomenon'
[patent_app_type] => new
[patent_app_number] => 10/447856
[patent_app_country] => US
[patent_app_date] => 2003-05-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 1989
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0241/20040241555.pdf
[firstpage_image] =>[orig_patent_app_number] => 10447856
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/447856 | Method of forming photoresist pattern free from side-lobe phenomenon | May 28, 2003 | Issued |
Array
(
[id] => 6804862
[patent_doc_number] => 20030232256
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-12-18
[patent_title] => 'Photolithographic mask and methods for the fabrication of the mask'
[patent_app_type] => new
[patent_app_number] => 10/442739
[patent_app_country] => US
[patent_app_date] => 2003-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 3447
[patent_no_of_claims] => 26
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0232/20030232256.pdf
[firstpage_image] =>[orig_patent_app_number] => 10442739
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/442739 | Photolithographic mask having a structure region covered by a thin protective coating of only a few atomic layers and methods for the fabrication of the mask including ALCVD to form the thin protective coating | May 20, 2003 | Issued |
Array
(
[id] => 7275418
[patent_doc_number] => 20040234869
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-25
[patent_title] => 'Image focus monitor for alternating phase shift masks'
[patent_app_type] => new
[patent_app_number] => 10/442432
[patent_app_country] => US
[patent_app_date] => 2003-05-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
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[patent_no_of_words] => 1861
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[pdf_file] => publications/A1/0234/20040234869.pdf
[firstpage_image] =>[orig_patent_app_number] => 10442432
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/442432 | Image focus monitor for alternating phase shift masks | May 19, 2003 | Issued |
Array
(
[id] => 768547
[patent_doc_number] => 07005219
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-28
[patent_title] => 'Defect repair method employing non-defective pattern overlay and photoexposure'
[patent_app_type] => utility
[patent_app_number] => 10/431859
[patent_app_country] => US
[patent_app_date] => 2003-05-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 3829
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[pdf_file] => patents/07/005/07005219.pdf
[firstpage_image] =>[orig_patent_app_number] => 10431859
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/431859 | Defect repair method employing non-defective pattern overlay and photoexposure | May 7, 2003 | Issued |
Array
(
[id] => 7317331
[patent_doc_number] => 20040224237
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-11
[patent_title] => 'Whole new mask repair method'
[patent_app_type] => new
[patent_app_number] => 10/431858
[patent_app_country] => US
[patent_app_date] => 2003-05-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 2551
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0224/20040224237.pdf
[firstpage_image] =>[orig_patent_app_number] => 10431858
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/431858 | Whole new mask repair method | May 7, 2003 | Abandoned |
Array
(
[id] => 7039200
[patent_doc_number] => 20050158634
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-07-21
[patent_title] => 'Photolithography mask comprising absorber/phase-shifter elements'
[patent_app_type] => utility
[patent_app_number] => 10/513612
[patent_app_country] => US
[patent_app_date] => 2003-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3675
[patent_no_of_claims] => 8
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[pdf_file] => publications/A1/0158/20050158634.pdf
[firstpage_image] =>[orig_patent_app_number] => 10513612
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/513612 | Photolithography mask comprising absorber/phase-shifter elements | May 5, 2003 | Abandoned |
Array
(
[id] => 7317330
[patent_doc_number] => 20040224236
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-11-11
[patent_title] => 'Variable mask field exposure'
[patent_app_type] => new
[patent_app_number] => 10/429376
[patent_app_country] => US
[patent_app_date] => 2003-05-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => publications/A1/0224/20040224236.pdf
[firstpage_image] =>[orig_patent_app_number] => 10429376
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/429376 | Variable mask field exposure | May 4, 2003 | Issued |
Array
(
[id] => 6632086
[patent_doc_number] => 20030211403
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-11-13
[patent_title] => 'Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask'
[patent_app_type] => new
[patent_app_number] => 10/423938
[patent_app_country] => US
[patent_app_date] => 2003-04-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[patent_no_of_words] => 6334
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[pdf_file] => publications/A1/0211/20030211403.pdf
[firstpage_image] =>[orig_patent_app_number] => 10423938
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/423938 | Photomask for near-field exposure and exposure apparatus including the photomask for making a pattern | Apr 27, 2003 | Issued |
Array
(
[id] => 7350970
[patent_doc_number] => 20040048168
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-03-11
[patent_title] => 'Chromeless photomask, method of manufacturing the same, and exposure apparatus comprising the chromeless photomask'
[patent_app_type] => new
[patent_app_number] => 10/407462
[patent_app_country] => US
[patent_app_date] => 2003-04-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[pdf_file] => publications/A1/0048/20040048168.pdf
[firstpage_image] =>[orig_patent_app_number] => 10407462
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/407462 | Chromeless photomask and exposure apparatus including the chromeless photomask | Apr 6, 2003 | Issued |
Array
(
[id] => 1009236
[patent_doc_number] => 06899997
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-05-31
[patent_title] => 'Process for modifying resist structures and resist films from the aqueous phase'
[patent_app_type] => utility
[patent_app_number] => 10/376883
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[pdf_file] => patents/06/899/06899997.pdf
[firstpage_image] =>[orig_patent_app_number] => 10376883
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/376883 | Process for modifying resist structures and resist films from the aqueous phase | Feb 27, 2003 | Issued |
Array
(
[id] => 813504
[patent_doc_number] => 07413831
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[patent_kind] => B2
[patent_issue_date] => 2008-08-19
[patent_title] => 'Reflective exposure mask, and method for producing and using the same'
[patent_app_type] => utility
[patent_app_number] => 10/503570
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[firstpage_image] =>[orig_patent_app_number] => 10503570
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/503570 | Reflective exposure mask, and method for producing and using the same | Feb 24, 2003 | Issued |
Array
(
[id] => 7074625
[patent_doc_number] => 20050147893
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[patent_issue_date] => 2005-07-07
[patent_title] => 'Exposure mask pattern forming method, exposure mask pattern, and semiconductor device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/503363
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[patent_app_date] => 2003-02-07
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[firstpage_image] =>[orig_patent_app_number] => 10503363
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/503363 | Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device | Feb 6, 2003 | Issued |
Array
(
[id] => 710042
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[patent_issue_date] => 2006-06-06
[patent_title] => 'Use of chromeless phase shift features to pattern large area line/space geometries'
[patent_app_type] => utility
[patent_app_number] => 10/305921
[patent_app_country] => US
[patent_app_date] => 2002-11-27
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[firstpage_image] =>[orig_patent_app_number] => 10305921
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/305921 | Use of chromeless phase shift features to pattern large area line/space geometries | Nov 26, 2002 | Issued |
Array
(
[id] => 856607
[patent_doc_number] => 07374865
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-05-20
[patent_title] => 'Methods to pattern contacts using chromeless phase shift masks'
[patent_app_type] => utility
[patent_app_number] => 10/304303
[patent_app_country] => US
[patent_app_date] => 2002-11-25
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[firstpage_image] =>[orig_patent_app_number] => 10304303
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/304303 | Methods to pattern contacts using chromeless phase shift masks | Nov 24, 2002 | Issued |
Array
(
[id] => 6683054
[patent_doc_number] => 20030118918
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-06-26
[patent_title] => 'Photomask, production method of semiconductor laser element, and semiconductor laser element'
[patent_app_type] => new
[patent_app_number] => 10/302392
[patent_app_country] => US
[patent_app_date] => 2002-11-22
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[firstpage_image] =>[orig_patent_app_number] => 10302392
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/302392 | Semiconductor laser element produced by aligning a photomask to pattern an electrode portion superposed on inner portions of upper surfaces of window regions at opposite end faces | Nov 21, 2002 | Issued |
Array
(
[id] => 7134141
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[patent_issue_date] => 2004-03-04
[patent_title] => 'Mask used in manufacturing highly-integrated circuit device, method of creating layout thereof, manufacturing method thereof, and manufacturing method for highly-integrated circuit device using the same'
[patent_app_type] => new
[patent_app_number] => 10/302529
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[firstpage_image] =>[orig_patent_app_number] => 10302529
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/302529 | Mask for manufacturing a highly-integrated circuit device | Nov 21, 2002 | Issued |
Array
(
[id] => 6765507
[patent_doc_number] => 20030099906
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[patent_issue_date] => 2003-05-29
[patent_title] => 'Process for the aromatization and cycloaliphatization of photoresists in the uv range'
[patent_app_type] => new
[patent_app_number] => 10/285052
[patent_app_country] => US
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[pdf_file] => publications/A1/0099/20030099906.pdf
[firstpage_image] =>[orig_patent_app_number] => 10285052
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/285052 | Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification | Oct 30, 2002 | Issued |
Array
(
[id] => 6761107
[patent_doc_number] => 20030124468
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[patent_issue_date] => 2003-07-03
[patent_title] => 'Process for silylating photoresists in the UV range'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/285050 | Process for silylating photoresists in the UV range | Oct 30, 2002 | Issued |