
John S. Ruggles
Examiner (ID: 14713)
| Most Active Art Unit | 1721 |
| Art Unit(s) | 1795, 1721, 1756, OPC |
| Total Applications | 315 |
| Issued Applications | 206 |
| Pending Applications | 0 |
| Abandoned Applications | 109 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 6663960
[patent_doc_number] => 20030203286
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-30
[patent_title] => 'High-transmittance halftone phase shift mask and manufacturing method of semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/282193
[patent_app_country] => US
[patent_app_date] => 2002-10-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_words_short_claim] => 120
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[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0203/20030203286.pdf
[firstpage_image] =>[orig_patent_app_number] => 10282193
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/282193 | High-transmittance halftone phase shift mask and manufacturing method of semiconductor device | Oct 28, 2002 | Abandoned |
Array
(
[id] => 7010580
[patent_doc_number] => 20050064296
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-24
[patent_title] => 'Method for transmission increase at a position on a photo mask repaired with ionic radiation by means of thermal desorption'
[patent_app_type] => utility
[patent_app_number] => 10/493490
[patent_app_country] => US
[patent_app_date] => 2002-10-18
[patent_effective_date] => 0000-00-00
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[patent_no_of_words] => 918
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[pdf_file] => publications/A1/0064/20050064296.pdf
[firstpage_image] =>[orig_patent_app_number] => 10493490
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/493490 | Method for transmission increase at a position on a photo mask repaired with ionic radiation by means of thermal desorption | Oct 17, 2002 | Abandoned |
Array
(
[id] => 6655056
[patent_doc_number] => 20030077524
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-04-24
[patent_title] => 'Method of repairing pattern of phase shift mask and phase shift mask repaired using the same'
[patent_app_type] => new
[patent_app_number] => 10/272008
[patent_app_country] => US
[patent_app_date] => 2002-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 3454
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[pdf_file] => publications/A1/0077/20030077524.pdf
[firstpage_image] =>[orig_patent_app_number] => 10272008
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/272008 | Method of repairing pattern of phase shift mask and phase shift mask repaired using the same | Oct 16, 2002 | Abandoned |
Array
(
[id] => 7232613
[patent_doc_number] => 20040256356
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-12-23
[patent_title] => 'Photolithographic mask'
[patent_app_type] => new
[patent_app_number] => 10/487911
[patent_app_country] => US
[patent_app_date] => 2004-08-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[patent_no_of_words] => 4125
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[pdf_file] => publications/A1/0256/20040256356.pdf
[firstpage_image] =>[orig_patent_app_number] => 10487911
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/487911 | Photolithographic mask having half tone main features and perpendicular half tone assist features | Jul 29, 2002 | Issued |
Array
(
[id] => 7396926
[patent_doc_number] => 20040018450
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2004-01-29
[patent_title] => 'Method for transferring patterns'
[patent_app_type] => new
[patent_app_number] => 10/201986
[patent_app_country] => US
[patent_app_date] => 2002-07-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[patent_no_of_words] => 2767
[patent_no_of_claims] => 19
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[pdf_file] => publications/A1/0018/20040018450.pdf
[firstpage_image] =>[orig_patent_app_number] => 10201986
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/201986 | Method for transferring patterns | Jul 24, 2002 | Abandoned |
Array
(
[id] => 777082
[patent_doc_number] => 06998215
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-14
[patent_title] => 'Negative resist process with simultaneous development and chemical consolidation of resist structures'
[patent_app_type] => utility
[patent_app_number] => 10/186652
[patent_app_country] => US
[patent_app_date] => 2002-07-01
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[patent_drawing_sheets_cnt] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/998/06998215.pdf
[firstpage_image] =>[orig_patent_app_number] => 10186652
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/186652 | Negative resist process with simultaneous development and chemical consolidation of resist structures | Jun 30, 2002 | Issued |
Array
(
[id] => 7617204
[patent_doc_number] => 06946236
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-09-20
[patent_title] => 'Negative resist process with simultaneous development and aromatization of resist structures'
[patent_app_type] => utility
[patent_app_number] => 10/186648
[patent_app_country] => US
[patent_app_date] => 2002-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/06/946/06946236.pdf
[firstpage_image] =>[orig_patent_app_number] => 10186648
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/186648 | Negative resist process with simultaneous development and aromatization of resist structures | Jun 30, 2002 | Issued |
Array
(
[id] => 698250
[patent_doc_number] => 07067234
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-06-27
[patent_title] => 'Chemical consolidation of photoresists in the UV range'
[patent_app_type] => utility
[patent_app_number] => 10/186651
[patent_app_country] => US
[patent_app_date] => 2002-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3939
[patent_no_of_claims] => 9
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[pdf_file] => patents/07/067/07067234.pdf
[firstpage_image] =>[orig_patent_app_number] => 10186651
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/186651 | Chemical consolidation of photoresists in the UV range | Jun 30, 2002 | Issued |
Array
(
[id] => 6677907
[patent_doc_number] => 20030228047
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-12-11
[patent_title] => 'Photomask transparent substrate protection during removal of opaque photomask defects'
[patent_app_type] => new
[patent_app_number] => 10/165008
[patent_app_country] => US
[patent_app_date] => 2002-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => publications/A1/0228/20030228047.pdf
[firstpage_image] =>[orig_patent_app_number] => 10165008
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/165008 | Photomask transparent substrate protection during removal of opaque photomask defects | Jun 6, 2002 | Abandoned |
Array
(
[id] => 6808959
[patent_doc_number] => 20030198898
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-23
[patent_title] => 'Method for manufacturing a semiconductor device'
[patent_app_type] => new
[patent_app_number] => 10/125227
[patent_app_country] => US
[patent_app_date] => 2002-04-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2602
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[pdf_file] => publications/A1/0198/20030198898.pdf
[firstpage_image] =>[orig_patent_app_number] => 10125227
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/125227 | Method for manufacturing a semiconductor device | Apr 16, 2002 | Abandoned |
Array
(
[id] => 6874358
[patent_doc_number] => 20030194655
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2003-10-16
[patent_title] => 'Method for fabricating resistors on a printed circuit board'
[patent_app_type] => new
[patent_app_number] => 10/119213
[patent_app_country] => US
[patent_app_date] => 2002-04-10
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[pdf_file] => publications/A1/0194/20030194655.pdf
[firstpage_image] =>[orig_patent_app_number] => 10119213
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/119213 | Method for fabricating resistors on a printed circuit board | Apr 9, 2002 | Abandoned |
Array
(
[id] => 709984
[patent_doc_number] => 07056624
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-06-06
[patent_title] => 'Methods of manufacturing phase shift masks having etched substrate shifters with sidewalls rounded at top and bottom corners'
[patent_app_type] => utility
[patent_app_number] => 10/399203
[patent_app_country] => US
[patent_app_date] => 2002-02-15
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[firstpage_image] =>[orig_patent_app_number] => 10399203
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/399203 | Methods of manufacturing phase shift masks having etched substrate shifters with sidewalls rounded at top and bottom corners | Feb 14, 2002 | Issued |
Array
(
[id] => 779082
[patent_doc_number] => 06994949
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2006-02-07
[patent_title] => 'Method for manufacturing multi-level interconnections with dual damascene process'
[patent_app_type] => utility
[patent_app_number] => 10/066849
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[pdf_file] => patents/06/994/06994949.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/066849 | Method for manufacturing multi-level interconnections with dual damascene process | Feb 3, 2002 | Issued |
Array
(
[id] => 1174340
[patent_doc_number] => 06746822
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[patent_title] => 'Use of surface coupling agent to improve adhesion'
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[firstpage_image] =>[orig_patent_app_number] => 10050484
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/050484 | Use of surface coupling agent to improve adhesion | Jan 15, 2002 | Issued |
Array
(
[id] => 1161822
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[patent_title] => 'Methods and systems for controlling resist residue defects at gate layer in a semiconductor device manufacturing process'
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[firstpage_image] =>[orig_patent_app_number] => 10050417
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/050417 | Methods and systems for controlling resist residue defects at gate layer in a semiconductor device manufacturing process | Jan 15, 2002 | Issued |
Array
(
[id] => 6658841
[patent_doc_number] => 20030134233
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[patent_issue_date] => 2003-07-17
[patent_title] => 'Method of forming a solder ball using a thermally stable resinous protective layer'
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[patent_app_number] => 10/051906
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[firstpage_image] =>[orig_patent_app_number] => 10051906
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/051906 | Method of forming a solder ball using a thermally stable resinous protective layer | Jan 15, 2002 | Issued |
Array
(
[id] => 960911
[patent_doc_number] => 06951623
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2005-10-04
[patent_title] => 'Radiation curable maskant and line sealer for protecting metal substrates'
[patent_app_type] => utility
[patent_app_number] => 10/016277
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/016277 | Radiation curable maskant and line sealer for protecting metal substrates | Nov 1, 2001 | Issued |
Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/055487 | Three dimensional printing using photo-activated building materials | Oct 28, 2001 | Issued |
Array
(
[id] => 5985606
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[firstpage_image] =>[orig_patent_app_number] => 10035400
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/035400 | Method of producing thin film circuit board | Oct 25, 2001 | Abandoned |
Array
(
[id] => 1059381
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[patent_title] => 'Exposure control for phase shifting photolithographic masks'
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[pdf_file] => patents/06/852/06852471.pdf
[firstpage_image] =>[orig_patent_app_number] => 09972428
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/972428 | Exposure control for phase shifting photolithographic masks | Oct 4, 2001 | Issued |