Search

John S. Ruggles

Examiner (ID: 12881)

Most Active Art Unit
1721
Art Unit(s)
OPC, 1756, 1721, 1795
Total Applications
315
Issued Applications
206
Pending Applications
0
Abandoned Applications
109

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 7567285 [patent_doc_number] => 20110287348 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-11-24 [patent_title] => 'LASER-REFLECTIVE MASK AND METHOD FOR MANUFACTURING SAME' [patent_app_type] => utility [patent_app_number] => 13/147583 [patent_app_country] => US [patent_app_date] => 2010-07-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 6493 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0287/20110287348.pdf [firstpage_image] =>[orig_patent_app_number] => 13147583 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/147583
Laser-reflective mask and method for manufacturing same Jul 20, 2010 Issued
Array ( [id] => 6160935 [patent_doc_number] => 20110159412 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-30 [patent_title] => 'METHOD OF CORRECTING DEFECT IN EUV MASK' [patent_app_type] => utility [patent_app_number] => 12/837855 [patent_app_country] => US [patent_app_date] => 2010-07-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 4990 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0159/20110159412.pdf [firstpage_image] =>[orig_patent_app_number] => 12837855 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/837855
Method of correcting defect in EUV mask Jul 15, 2010 Issued
Array ( [id] => 6195941 [patent_doc_number] => 20110027699 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-02-03 [patent_title] => 'REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATION' [patent_app_type] => utility [patent_app_number] => 12/835212 [patent_app_country] => US [patent_app_date] => 2010-07-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 7322 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0027/20110027699.pdf [firstpage_image] =>[orig_patent_app_number] => 12835212 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/835212
REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATION Jul 12, 2010 Abandoned
Array ( [id] => 6111022 [patent_doc_number] => 20110189592 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-08-04 [patent_title] => 'EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/833925 [patent_app_country] => US [patent_app_date] => 2010-07-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2441 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0189/20110189592.pdf [firstpage_image] =>[orig_patent_app_number] => 12833925 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/833925
Extreme ultraviolet mask Jul 8, 2010 Issued
Array ( [id] => 6272656 [patent_doc_number] => 20100255409 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-10-07 [patent_title] => 'Attenuated phase-shift photomasks, method of fabricating the same and method of fabricating semiconductor using the same' [patent_app_type] => utility [patent_app_number] => 12/662019 [patent_app_country] => US [patent_app_date] => 2010-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 17 [patent_no_of_words] => 8556 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0255/20100255409.pdf [firstpage_image] =>[orig_patent_app_number] => 12662019 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/662019
Attenuated phase-shift photomasks, method of fabricating the same and method of fabricating semiconductor using the same Mar 28, 2010 Abandoned
Array ( [id] => 6294161 [patent_doc_number] => 20100239963 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-09-23 [patent_title] => 'EXPOSURE MASK, EXPOSURE METHOD, AND METHOD OF MANUFACTURING OPTICAL ELEMENT' [patent_app_type] => utility [patent_app_number] => 12/729398 [patent_app_country] => US [patent_app_date] => 2010-03-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 4066 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0239/20100239963.pdf [firstpage_image] =>[orig_patent_app_number] => 12729398 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/729398
EXPOSURE MASK, EXPOSURE METHOD, AND METHOD OF MANUFACTURING OPTICAL ELEMENT Mar 22, 2010 Abandoned
Array ( [id] => 9574915 [patent_doc_number] => 08765328 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-07-01 [patent_title] => 'Exposure mask and method for manufacturing same and method for manufacturing semiconductor device' [patent_app_type] => utility [patent_app_number] => 12/727652 [patent_app_country] => US [patent_app_date] => 2010-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 19 [patent_no_of_words] => 6223 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 337 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12727652 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/727652
Exposure mask and method for manufacturing same and method for manufacturing semiconductor device Mar 18, 2010 Issued
Array ( [id] => 8016735 [patent_doc_number] => 08137868 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-03-20 [patent_title] => 'Photomask blank, photomask, and methods of manufacturing the same' [patent_app_type] => utility [patent_app_number] => 12/725082 [patent_app_country] => US [patent_app_date] => 2010-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 11 [patent_no_of_words] => 9851 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 170 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/137/08137868.pdf [firstpage_image] =>[orig_patent_app_number] => 12725082 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/725082
Photomask blank, photomask, and methods of manufacturing the same Mar 15, 2010 Issued
Array ( [id] => 6557063 [patent_doc_number] => 20100233591 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-09-16 [patent_title] => 'PROCESS FOR PRODUCING PELLICLE, AND PELLICLE' [patent_app_type] => utility [patent_app_number] => 12/719539 [patent_app_country] => US [patent_app_date] => 2010-03-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4946 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0233/20100233591.pdf [firstpage_image] =>[orig_patent_app_number] => 12719539 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/719539
PROCESS FOR PRODUCING PELLICLE, AND PELLICLE Mar 7, 2010 Abandoned
Array ( [id] => 6165449 [patent_doc_number] => 20110195349 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-08-11 [patent_title] => 'CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT' [patent_app_type] => utility [patent_app_number] => 12/702787 [patent_app_country] => US [patent_app_date] => 2010-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 2255 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0195/20110195349.pdf [firstpage_image] =>[orig_patent_app_number] => 12702787 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/702787
Chromeless phase-shifting photomask with undercut rim-shifting element Feb 8, 2010 Issued
Array ( [id] => 7502817 [patent_doc_number] => 08034543 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-10-11 [patent_title] => 'Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask' [patent_app_type] => utility [patent_app_number] => 12/696067 [patent_app_country] => US [patent_app_date] => 2010-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 25 [patent_no_of_words] => 6503 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 141 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/034/08034543.pdf [firstpage_image] =>[orig_patent_app_number] => 12696067 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/696067
Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask Jan 28, 2010 Issued
Array ( [id] => 6397667 [patent_doc_number] => 20100178599 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-07-15 [patent_title] => 'Photomask Used in Fabrication of Semiconductor Device' [patent_app_type] => utility [patent_app_number] => 12/686464 [patent_app_country] => US [patent_app_date] => 2010-01-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 6693 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0178/20100178599.pdf [firstpage_image] =>[orig_patent_app_number] => 12686464 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/686464
Photomask used in fabrication of semiconductor device Jan 12, 2010 Issued
Array ( [id] => 8339913 [patent_doc_number] => 08241836 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-08-14 [patent_title] => 'Method of fabricating a line pattern in a photoresist layer by using a photomask having slanted unit patterns' [patent_app_type] => utility [patent_app_number] => 12/650838 [patent_app_country] => US [patent_app_date] => 2009-12-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 22 [patent_no_of_words] => 4087 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12650838 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/650838
Method of fabricating a line pattern in a photoresist layer by using a photomask having slanted unit patterns Dec 30, 2009 Issued
Array ( [id] => 6160927 [patent_doc_number] => 20110159410 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-30 [patent_title] => 'COST-EFFECTIVE METHOD FOR EXTREME ULTRAVIOLET (EUV) MASK PRODUCTION' [patent_app_type] => utility [patent_app_number] => 12/650985 [patent_app_country] => US [patent_app_date] => 2009-12-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 6203 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0159/20110159410.pdf [firstpage_image] =>[orig_patent_app_number] => 12650985 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/650985
Cost-effective method for extreme ultraviolet (EUV) mask production Dec 30, 2009 Issued
Array ( [id] => 6160929 [patent_doc_number] => 20110159411 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-06-30 [patent_title] => 'Phase-shift photomask and patterning method' [patent_app_type] => utility [patent_app_number] => 12/655460 [patent_app_country] => US [patent_app_date] => 2009-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 8264 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0159/20110159411.pdf [firstpage_image] =>[orig_patent_app_number] => 12655460 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/655460
Phase-shift photomask and patterning method Dec 29, 2009 Abandoned
Array ( [id] => 6639122 [patent_doc_number] => 20100227261 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-09-09 [patent_title] => 'Flare-measuring mask, flare-measuring method, and exposure method' [patent_app_type] => utility [patent_app_number] => 12/654438 [patent_app_country] => US [patent_app_date] => 2009-12-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 13995 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0227/20100227261.pdf [firstpage_image] =>[orig_patent_app_number] => 12654438 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/654438
Flare-measuring mask, flare-measuring method, and exposure method Dec 17, 2009 Issued
Array ( [id] => 6291896 [patent_doc_number] => 20100159369 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-06-24 [patent_title] => 'PHASE SHIFT MASK AND METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING INTEGRATED CIRCUIT' [patent_app_type] => utility [patent_app_number] => 12/639504 [patent_app_country] => US [patent_app_date] => 2009-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 5340 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0159/20100159369.pdf [firstpage_image] =>[orig_patent_app_number] => 12639504 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/639504
Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit Dec 15, 2009 Issued
Array ( [id] => 6342936 [patent_doc_number] => 20100248089 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-09-30 [patent_title] => 'METHOD FOR OPTICAL PROXIMITY CORRECTION' [patent_app_type] => utility [patent_app_number] => 12/639203 [patent_app_country] => US [patent_app_date] => 2009-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 2881 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0248/20100248089.pdf [firstpage_image] =>[orig_patent_app_number] => 12639203 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/639203
Method for optical proximity correction Dec 15, 2009 Issued
Array ( [id] => 6382368 [patent_doc_number] => 20100316940 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-16 [patent_title] => 'Photomask for Forming Contact Hole in Semiconductor Device' [patent_app_type] => utility [patent_app_number] => 12/637038 [patent_app_country] => US [patent_app_date] => 2009-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3046 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0316/20100316940.pdf [firstpage_image] =>[orig_patent_app_number] => 12637038 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/637038
Photomask for forming contact hole in semiconductor device Dec 13, 2009 Issued
Array ( [id] => 6374070 [patent_doc_number] => 20100081068 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-04-01 [patent_title] => 'SYSTEMS AND METHODS FOR DETECTING FOCUS VARIATION IN PHOTOLITHOGRAPH PROCESS USING TEST FEATURES PRINTED FROM PHOTOMASK TEST PATTERN IMAGES' [patent_app_type] => utility [patent_app_number] => 12/629115 [patent_app_country] => US [patent_app_date] => 2009-12-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 20 [patent_no_of_words] => 10033 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20100081068.pdf [firstpage_image] =>[orig_patent_app_number] => 12629115 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/629115
Photomask having a test pattern that includes separate features for different printed critical dimensions to correlate magnitude and direction of defocus Dec 1, 2009 Issued
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