
John S. Ruggles
Examiner (ID: 12881)
| Most Active Art Unit | 1721 |
| Art Unit(s) | OPC, 1756, 1721, 1795 |
| Total Applications | 315 |
| Issued Applications | 206 |
| Pending Applications | 0 |
| Abandoned Applications | 109 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7567285
[patent_doc_number] => 20110287348
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-11-24
[patent_title] => 'LASER-REFLECTIVE MASK AND METHOD FOR MANUFACTURING SAME'
[patent_app_type] => utility
[patent_app_number] => 13/147583
[patent_app_country] => US
[patent_app_date] => 2010-07-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 6493
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[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0287/20110287348.pdf
[firstpage_image] =>[orig_patent_app_number] => 13147583
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/147583 | Laser-reflective mask and method for manufacturing same | Jul 20, 2010 | Issued |
Array
(
[id] => 6160935
[patent_doc_number] => 20110159412
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-06-30
[patent_title] => 'METHOD OF CORRECTING DEFECT IN EUV MASK'
[patent_app_type] => utility
[patent_app_number] => 12/837855
[patent_app_country] => US
[patent_app_date] => 2010-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 4990
[patent_no_of_claims] => 21
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[pdf_file] => publications/A1/0159/20110159412.pdf
[firstpage_image] =>[orig_patent_app_number] => 12837855
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/837855 | Method of correcting defect in EUV mask | Jul 15, 2010 | Issued |
Array
(
[id] => 6195941
[patent_doc_number] => 20110027699
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-02-03
[patent_title] => 'REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATION'
[patent_app_type] => utility
[patent_app_number] => 12/835212
[patent_app_country] => US
[patent_app_date] => 2010-07-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[patent_no_of_words] => 7322
[patent_no_of_claims] => 25
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[pdf_file] => publications/A1/0027/20110027699.pdf
[firstpage_image] =>[orig_patent_app_number] => 12835212
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/835212 | REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATION | Jul 12, 2010 | Abandoned |
Array
(
[id] => 6111022
[patent_doc_number] => 20110189592
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-08-04
[patent_title] => 'EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/833925
[patent_app_country] => US
[patent_app_date] => 2010-07-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 2441
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[pdf_file] => publications/A1/0189/20110189592.pdf
[firstpage_image] =>[orig_patent_app_number] => 12833925
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/833925 | Extreme ultraviolet mask | Jul 8, 2010 | Issued |
Array
(
[id] => 6272656
[patent_doc_number] => 20100255409
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-10-07
[patent_title] => 'Attenuated phase-shift photomasks, method of fabricating the same and method of fabricating semiconductor using the same'
[patent_app_type] => utility
[patent_app_number] => 12/662019
[patent_app_country] => US
[patent_app_date] => 2010-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
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[patent_no_of_words] => 8556
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[pdf_file] => publications/A1/0255/20100255409.pdf
[firstpage_image] =>[orig_patent_app_number] => 12662019
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/662019 | Attenuated phase-shift photomasks, method of fabricating the same and method of fabricating semiconductor using the same | Mar 28, 2010 | Abandoned |
Array
(
[id] => 6294161
[patent_doc_number] => 20100239963
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-09-23
[patent_title] => 'EXPOSURE MASK, EXPOSURE METHOD, AND METHOD OF MANUFACTURING OPTICAL ELEMENT'
[patent_app_type] => utility
[patent_app_number] => 12/729398
[patent_app_country] => US
[patent_app_date] => 2010-03-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[patent_no_of_words] => 4066
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[pdf_file] => publications/A1/0239/20100239963.pdf
[firstpage_image] =>[orig_patent_app_number] => 12729398
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/729398 | EXPOSURE MASK, EXPOSURE METHOD, AND METHOD OF MANUFACTURING OPTICAL ELEMENT | Mar 22, 2010 | Abandoned |
Array
(
[id] => 9574915
[patent_doc_number] => 08765328
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-07-01
[patent_title] => 'Exposure mask and method for manufacturing same and method for manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 12/727652
[patent_app_country] => US
[patent_app_date] => 2010-03-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
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[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12727652
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/727652 | Exposure mask and method for manufacturing same and method for manufacturing semiconductor device | Mar 18, 2010 | Issued |
Array
(
[id] => 8016735
[patent_doc_number] => 08137868
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-03-20
[patent_title] => 'Photomask blank, photomask, and methods of manufacturing the same'
[patent_app_type] => utility
[patent_app_number] => 12/725082
[patent_app_country] => US
[patent_app_date] => 2010-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 9851
[patent_no_of_claims] => 24
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[pdf_file] => patents/08/137/08137868.pdf
[firstpage_image] =>[orig_patent_app_number] => 12725082
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/725082 | Photomask blank, photomask, and methods of manufacturing the same | Mar 15, 2010 | Issued |
Array
(
[id] => 6557063
[patent_doc_number] => 20100233591
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-09-16
[patent_title] => 'PROCESS FOR PRODUCING PELLICLE, AND PELLICLE'
[patent_app_type] => utility
[patent_app_number] => 12/719539
[patent_app_country] => US
[patent_app_date] => 2010-03-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => publications/A1/0233/20100233591.pdf
[firstpage_image] =>[orig_patent_app_number] => 12719539
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/719539 | PROCESS FOR PRODUCING PELLICLE, AND PELLICLE | Mar 7, 2010 | Abandoned |
Array
(
[id] => 6165449
[patent_doc_number] => 20110195349
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-08-11
[patent_title] => 'CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT'
[patent_app_type] => utility
[patent_app_number] => 12/702787
[patent_app_country] => US
[patent_app_date] => 2010-02-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
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[patent_no_of_words] => 2255
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[pdf_file] => publications/A1/0195/20110195349.pdf
[firstpage_image] =>[orig_patent_app_number] => 12702787
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/702787 | Chromeless phase-shifting photomask with undercut rim-shifting element | Feb 8, 2010 | Issued |
Array
(
[id] => 7502817
[patent_doc_number] => 08034543
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-10-11
[patent_title] => 'Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask'
[patent_app_type] => utility
[patent_app_number] => 12/696067
[patent_app_country] => US
[patent_app_date] => 2010-01-29
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/08/034/08034543.pdf
[firstpage_image] =>[orig_patent_app_number] => 12696067
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/696067 | Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask | Jan 28, 2010 | Issued |
Array
(
[id] => 6397667
[patent_doc_number] => 20100178599
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[patent_kind] => A1
[patent_issue_date] => 2010-07-15
[patent_title] => 'Photomask Used in Fabrication of Semiconductor Device'
[patent_app_type] => utility
[patent_app_number] => 12/686464
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/686464 | Photomask used in fabrication of semiconductor device | Jan 12, 2010 | Issued |
Array
(
[id] => 8339913
[patent_doc_number] => 08241836
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-08-14
[patent_title] => 'Method of fabricating a line pattern in a photoresist layer by using a photomask having slanted unit patterns'
[patent_app_type] => utility
[patent_app_number] => 12/650838
[patent_app_country] => US
[patent_app_date] => 2009-12-31
[patent_effective_date] => 0000-00-00
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[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12650838
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/650838 | Method of fabricating a line pattern in a photoresist layer by using a photomask having slanted unit patterns | Dec 30, 2009 | Issued |
Array
(
[id] => 6160927
[patent_doc_number] => 20110159410
[patent_country] => US
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[patent_issue_date] => 2011-06-30
[patent_title] => 'COST-EFFECTIVE METHOD FOR EXTREME ULTRAVIOLET (EUV) MASK PRODUCTION'
[patent_app_type] => utility
[patent_app_number] => 12/650985
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 12650985
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/650985 | Cost-effective method for extreme ultraviolet (EUV) mask production | Dec 30, 2009 | Issued |
Array
(
[id] => 6160929
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[patent_title] => 'Phase-shift photomask and patterning method'
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[firstpage_image] =>[orig_patent_app_number] => 12655460
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/655460 | Phase-shift photomask and patterning method | Dec 29, 2009 | Abandoned |
Array
(
[id] => 6639122
[patent_doc_number] => 20100227261
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-09-09
[patent_title] => 'Flare-measuring mask, flare-measuring method, and exposure method'
[patent_app_type] => utility
[patent_app_number] => 12/654438
[patent_app_country] => US
[patent_app_date] => 2009-12-18
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/654438 | Flare-measuring mask, flare-measuring method, and exposure method | Dec 17, 2009 | Issued |
Array
(
[id] => 6291896
[patent_doc_number] => 20100159369
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[patent_issue_date] => 2010-06-24
[patent_title] => 'PHASE SHIFT MASK AND METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING INTEGRATED CIRCUIT'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/639504 | Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit | Dec 15, 2009 | Issued |
Array
(
[id] => 6342936
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[patent_title] => 'METHOD FOR OPTICAL PROXIMITY CORRECTION'
[patent_app_type] => utility
[patent_app_number] => 12/639203
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/639203 | Method for optical proximity correction | Dec 15, 2009 | Issued |
Array
(
[id] => 6382368
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[patent_issue_date] => 2010-12-16
[patent_title] => 'Photomask for Forming Contact Hole in Semiconductor Device'
[patent_app_type] => utility
[patent_app_number] => 12/637038
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[patent_app_date] => 2009-12-14
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[firstpage_image] =>[orig_patent_app_number] => 12637038
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/637038 | Photomask for forming contact hole in semiconductor device | Dec 13, 2009 | Issued |
Array
(
[id] => 6374070
[patent_doc_number] => 20100081068
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-04-01
[patent_title] => 'SYSTEMS AND METHODS FOR DETECTING FOCUS VARIATION IN PHOTOLITHOGRAPH PROCESS USING TEST FEATURES PRINTED FROM PHOTOMASK TEST PATTERN IMAGES'
[patent_app_type] => utility
[patent_app_number] => 12/629115
[patent_app_country] => US
[patent_app_date] => 2009-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
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[pdf_file] => publications/A1/0081/20100081068.pdf
[firstpage_image] =>[orig_patent_app_number] => 12629115
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/629115 | Photomask having a test pattern that includes separate features for different printed critical dimensions to correlate magnitude and direction of defocus | Dec 1, 2009 | Issued |