Search

John S Y Chu

Examiner (ID: 110, Phone: (571)272-1329 , Office: P/1722 )

Most Active Art Unit
1752
Art Unit(s)
1752, 1506, 1722, 1737, 1113, 1795
Total Applications
2656
Issued Applications
2086
Pending Applications
143
Abandoned Applications
451

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 20094744 [patent_doc_number] => 20250224680 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-07-10 [patent_title] => ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING [patent_app_type] => utility [patent_app_number] => 19/081518 [patent_app_country] => US [patent_app_date] => 2025-03-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14548 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -21 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 19081518 [rel_patent_id] =>[rel_patent_doc_number] =>)
19/081518
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING Mar 16, 2025 Pending
Array ( [id] => 20061178 [patent_doc_number] => 20250199400 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-06-19 [patent_title] => SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF AND METHOD OF FORMING PATTERNS USING THE COMPOSITION [patent_app_type] => utility [patent_app_number] => 19/070505 [patent_app_country] => US [patent_app_date] => 2025-03-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3170 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 19070505 [rel_patent_id] =>[rel_patent_doc_number] =>)
19/070505
SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF AND METHOD OF FORMING PATTERNS USING THE COMPOSITION Mar 3, 2025 Pending
Array ( [id] => 20403268 [patent_doc_number] => 12493241 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2025-12-09 [patent_title] => Photoacid generators, photoresist compositions, and pattern formation methods [patent_app_type] => utility [patent_app_number] => 18/908129 [patent_app_country] => US [patent_app_date] => 2024-10-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9415 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18908129 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/908129
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS Oct 6, 2024 Issued
Array ( [id] => 19571843 [patent_doc_number] => 20240376135 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-11-14 [patent_title] => TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION [patent_app_type] => utility [patent_app_number] => 18/779539 [patent_app_country] => US [patent_app_date] => 2024-07-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9389 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -23 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18779539 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/779539
TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION Jul 21, 2024 Pending
Array ( [id] => 19481483 [patent_doc_number] => 20240329525 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-10-03 [patent_title] => PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS [patent_app_type] => utility [patent_app_number] => 18/742227 [patent_app_country] => US [patent_app_date] => 2024-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 87212 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -20 [patent_words_short_claim] => 257 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18742227 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/742227
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS Jun 12, 2024 Pending
Array ( [id] => 20145317 [patent_doc_number] => 12379659 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2025-08-05 [patent_title] => Photoresist composition and method of manufacturing a semiconductor device [patent_app_type] => utility [patent_app_number] => 18/609833 [patent_app_country] => US [patent_app_date] => 2024-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 5254 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 31 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18609833 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/609833
Photoresist composition and method of manufacturing a semiconductor device Mar 18, 2024 Issued
Array ( [id] => 20094738 [patent_doc_number] => 20250224674 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-07-10 [patent_title] => PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF [patent_app_type] => utility [patent_app_number] => 18/590304 [patent_app_country] => US [patent_app_date] => 2024-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5171 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -14 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18590304 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/590304
PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF Feb 27, 2024 Pending
Array ( [id] => 19267125 [patent_doc_number] => 20240210827 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-06-27 [patent_title] => PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS [patent_app_type] => utility [patent_app_number] => 18/396056 [patent_app_country] => US [patent_app_date] => 2023-12-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 87200 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -25 [patent_words_short_claim] => 1090 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18396056 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/396056
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS Dec 25, 2023 Abandoned
Array ( [id] => 19023064 [patent_doc_number] => 20240079235 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-03-07 [patent_title] => SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING [patent_app_type] => utility [patent_app_number] => 18/500593 [patent_app_country] => US [patent_app_date] => 2023-11-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14521 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18500593 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/500593
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING Nov 1, 2023 Pending
Array ( [id] => 19810805 [patent_doc_number] => 12242193 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2025-03-04 [patent_title] => Coating compositions for use with an overcoated photoresist [patent_app_type] => utility [patent_app_number] => 18/464695 [patent_app_country] => US [patent_app_date] => 2023-09-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7938 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18464695 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/464695
Coating compositions for use with an overcoated photoresist Sep 10, 2023 Issued
Array ( [id] => 18810348 [patent_doc_number] => 20230384683 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2023-11-30 [patent_title] => PHOTORESIST WITH POLAR-ACID-LABILE-GROUP [patent_app_type] => utility [patent_app_number] => 18/447441 [patent_app_country] => US [patent_app_date] => 2023-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4259 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18447441 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/447441
Photoresist with polar-acid-labile-group Aug 9, 2023 Issued
Array ( [id] => 18810335 [patent_doc_number] => 20230384670 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2023-11-30 [patent_title] => PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN [patent_app_type] => utility [patent_app_number] => 18/232225 [patent_app_country] => US [patent_app_date] => 2023-08-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9838 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 61 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18232225 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/232225
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN Aug 8, 2023 Pending
Array ( [id] => 18810338 [patent_doc_number] => 20230384673 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2023-11-30 [patent_title] => PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE [patent_app_type] => utility [patent_app_number] => 18/232220 [patent_app_country] => US [patent_app_date] => 2023-08-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10457 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 236 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18232220 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/232220
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE Aug 8, 2023 Pending
Array ( [id] => 19551798 [patent_doc_number] => 12135502 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2024-11-05 [patent_title] => Resin, photoresist composition, and method of manufacturing semiconductor device [patent_app_type] => utility [patent_app_number] => 18/231444 [patent_app_country] => US [patent_app_date] => 2023-08-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 77 [patent_no_of_words] => 13024 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18231444 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/231444
Resin, photoresist composition, and method of manufacturing semiconductor device Aug 7, 2023 Issued
Array ( [id] => 20109741 [patent_doc_number] => 12360456 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2025-07-15 [patent_title] => EUV metallic resist performance enhancement via additives [patent_app_type] => utility [patent_app_number] => 18/365302 [patent_app_country] => US [patent_app_date] => 2023-08-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 19 [patent_no_of_words] => 1858 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18365302 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/365302
EUV metallic resist performance enhancement via additives Aug 3, 2023 Issued
Array ( [id] => 19327284 [patent_doc_number] => 12044966 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2024-07-23 [patent_title] => Photoresist for semiconductor fabrication [patent_app_type] => utility [patent_app_number] => 18/355641 [patent_app_country] => US [patent_app_date] => 2023-07-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 6931 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18355641 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/355641
Photoresist for semiconductor fabrication Jul 19, 2023 Issued
Array ( [id] => 18741311 [patent_doc_number] => 20230350292 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2023-11-02 [patent_title] => PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM USING SAME, PRINTED WIRING BOARD, AND PRINTED WIRING BOARD MANUFACTURING METHOD [patent_app_type] => utility [patent_app_number] => 18/220308 [patent_app_country] => US [patent_app_date] => 2023-07-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16337 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18220308 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/220308
Photosensitive resin composition, dry film using same, printed wiring board, and printed wiring board manufacturing method Jul 10, 2023 Issued
Array ( [id] => 18727482 [patent_doc_number] => 20230341772 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2023-10-26 [patent_title] => RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN [patent_app_type] => utility [patent_app_number] => 18/215863 [patent_app_country] => US [patent_app_date] => 2023-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17759 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -13 [patent_words_short_claim] => 654 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18215863 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/215863
Radiation-sensitive resin composition and method for forming resist pattern Jun 28, 2023 Issued
Array ( [id] => 18710849 [patent_doc_number] => 20230333478 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2023-10-19 [patent_title] => PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND KIT [patent_app_type] => utility [patent_app_number] => 18/214200 [patent_app_country] => US [patent_app_date] => 2023-06-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 42188 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -3 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18214200 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/214200
PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND KIT Jun 25, 2023 Pending
Array ( [id] => 19963066 [patent_doc_number] => 12332565 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2025-06-17 [patent_title] => Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process [patent_app_type] => utility [patent_app_number] => 18/340442 [patent_app_country] => US [patent_app_date] => 2023-06-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 13988 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 157 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18340442 [rel_patent_id] =>[rel_patent_doc_number] =>)
18/340442
Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process Jun 22, 2023 Issued
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