| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 17580652
[patent_doc_number] => 20220137507
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-05-05
[patent_title] => COMPOUND, ACID GENERATOR, COMPOSITION, CURED PRODUCT, CURED PRODUCT MANUFACTURING METHOD, AND PATTERN COATING MANUFACTURING METHOD
[patent_app_type] => utility
[patent_app_number] => 17/425308
[patent_app_country] => US
[patent_app_date] => 2020-01-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10041
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -19
[patent_words_short_claim] => 401
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17425308
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/425308 | COMPOUND, ACID GENERATOR, COMPOSITION, CURED PRODUCT, CURED PRODUCT MANUFACTURING METHOD, AND PATTERN COATING MANUFACTURING METHOD | Jan 21, 2020 | Abandoned |
Array
(
[id] => 17521714
[patent_doc_number] => 20220107563
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-04-07
[patent_title] => WATER-DEVELOPABLE PHOTOSENSITIVE RESIN PRINTING ORIGINAL PLATE
[patent_app_type] => utility
[patent_app_number] => 17/428449
[patent_app_country] => US
[patent_app_date] => 2020-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7282
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -7
[patent_words_short_claim] => 103
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17428449
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/428449 | Water-developable photosensitive resin printing original plate | Jan 20, 2020 | Issued |
Array
(
[id] => 16208434
[patent_doc_number] => 20200241424
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-07-30
[patent_title] => PROCESS LIQUID AND METHOD OF PROCESSING SUBSTRATE
[patent_app_type] => utility
[patent_app_number] => 16/748041
[patent_app_country] => US
[patent_app_date] => 2020-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4655
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -19
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16748041
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/748041 | Process liquid and method of processing substrate | Jan 20, 2020 | Issued |
Array
(
[id] => 18188946
[patent_doc_number] => 11579528
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2023-02-14
[patent_title] => Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
[patent_app_type] => utility
[patent_app_number] => 16/748285
[patent_app_country] => US
[patent_app_date] => 2020-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 20083
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16748285
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/748285 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Jan 20, 2020 | Issued |
Array
(
[id] => 17876952
[patent_doc_number] => 11448962
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-09-20
[patent_title] => Resist composition and patterning process
[patent_app_type] => utility
[patent_app_number] => 16/743177
[patent_app_country] => US
[patent_app_date] => 2020-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15088
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 309
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16743177
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/743177 | Resist composition and patterning process | Jan 14, 2020 | Issued |
Array
(
[id] => 17549771
[patent_doc_number] => 20220121113
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-04-21
[patent_title] => OXIME ESTER PHOTOINITIATORS HAVING A SPECIAL AROYL CHROMOPHORE
[patent_app_type] => utility
[patent_app_number] => 17/424585
[patent_app_country] => US
[patent_app_date] => 2020-01-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 26175
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -19
[patent_words_short_claim] => 3803
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17424585
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/424585 | OXIME ESTER PHOTOINITIATORS HAVING A SPECIAL AROYL CHROMOPHORE | Dec 31, 2019 | Abandoned |
Array
(
[id] => 16737234
[patent_doc_number] => 10962880
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-03-30
[patent_title] => Radiation-sensitive compositions and patterning and metallization processes
[patent_app_type] => utility
[patent_app_number] => 16/715178
[patent_app_country] => US
[patent_app_date] => 2019-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 27
[patent_no_of_words] => 5787
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 172
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16715178
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/715178 | Radiation-sensitive compositions and patterning and metallization processes | Dec 15, 2019 | Issued |
Array
(
[id] => 18093209
[patent_doc_number] => 20220411550
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-12-29
[patent_title] => CROSSLINKABLE ELECTROACTIVE FLUOROPOLYMERS COMPRISING PHOTOACTIVE GROUPS
[patent_app_type] => utility
[patent_app_number] => 17/414721
[patent_app_country] => US
[patent_app_date] => 2019-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11173
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -26
[patent_words_short_claim] => 174
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17414721
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/414721 | CROSSLINKABLE ELECTROACTIVE FLUOROPOLYMERS COMPRISING PHOTOACTIVE GROUPS | Dec 15, 2019 | Abandoned |
Array
(
[id] => 17939982
[patent_doc_number] => 11474432
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-10-18
[patent_title] => Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound
[patent_app_type] => utility
[patent_app_number] => 16/715685
[patent_app_country] => US
[patent_app_date] => 2019-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 29262
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 199
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16715685
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/715685 | Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound | Dec 15, 2019 | Issued |
Array
(
[id] => 17445813
[patent_doc_number] => 20220066318
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-03-03
[patent_title] => LITHOGRAPHIC PRINTING PLATE PRECURSOR
[patent_app_type] => utility
[patent_app_number] => 17/312517
[patent_app_country] => US
[patent_app_date] => 2019-12-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10670
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -19
[patent_words_short_claim] => 37
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17312517
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/312517 | LITHOGRAPHIC PRINTING PLATE PRECURSOR | Dec 8, 2019 | Abandoned |
Array
(
[id] => 17343741
[patent_doc_number] => 20220010072
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-01-13
[patent_title] => FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
[patent_app_type] => utility
[patent_app_number] => 17/295830
[patent_app_country] => US
[patent_app_date] => 2019-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 19936
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17295830
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/295830 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | Nov 20, 2019 | Abandoned |
Array
(
[id] => 17316480
[patent_doc_number] => 20210405529
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-12-30
[patent_title] => FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
[patent_app_type] => utility
[patent_app_number] => 17/295725
[patent_app_country] => US
[patent_app_date] => 2019-11-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17989
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -23
[patent_words_short_claim] => 41
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17295725
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/295725 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | Nov 20, 2019 | Abandoned |
Array
(
[id] => 16016863
[patent_doc_number] => 20200183275
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-06-11
[patent_title] => RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
[patent_app_type] => utility
[patent_app_number] => 16/686712
[patent_app_country] => US
[patent_app_date] => 2019-11-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 35364
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -3
[patent_words_short_claim] => 219
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16686712
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/686712 | Resist composition and method of forming resist pattern | Nov 17, 2019 | Issued |
Array
(
[id] => 15996995
[patent_doc_number] => 20200174368
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-06-04
[patent_title] => POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
[patent_app_type] => utility
[patent_app_number] => 16/664989
[patent_app_country] => US
[patent_app_date] => 2019-10-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8146
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -8
[patent_words_short_claim] => 46
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16664989
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/664989 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | Oct 27, 2019 | Abandoned |
Array
(
[id] => 15869801
[patent_doc_number] => 20200142304
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-05-07
[patent_title] => POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
[patent_app_type] => utility
[patent_app_number] => 16/664994
[patent_app_country] => US
[patent_app_date] => 2019-10-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8219
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -10
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16664994
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/664994 | Positive-type photosensitive resin composition and cured film prepared therefrom | Oct 27, 2019 | Issued |
Array
(
[id] => 19259319
[patent_doc_number] => 12019373
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2024-06-25
[patent_title] => Photosensitive resin composition, film, and electronic device
[patent_app_type] => utility
[patent_app_number] => 17/297528
[patent_app_country] => US
[patent_app_date] => 2019-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9008
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 1009
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17297528
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/297528 | Photosensitive resin composition, film, and electronic device | Oct 23, 2019 | Issued |
Array
(
[id] => 18997457
[patent_doc_number] => 11914295
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2024-02-27
[patent_title] => Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process
[patent_app_type] => utility
[patent_app_number] => 16/660992
[patent_app_country] => US
[patent_app_date] => 2019-10-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 17671
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 201
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16660992
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/660992 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Oct 22, 2019 | Issued |
Array
(
[id] => 17605491
[patent_doc_number] => 11333974
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-05-17
[patent_title] => Onium salt, chemically amplified resist composition, and patterning process
[patent_app_type] => utility
[patent_app_number] => 16/660081
[patent_app_country] => US
[patent_app_date] => 2019-10-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 17678
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 185
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16660081
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/660081 | Onium salt, chemically amplified resist composition, and patterning process | Oct 21, 2019 | Issued |
Array
(
[id] => 17345333
[patent_doc_number] => 20220011664
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-01-13
[patent_title] => PHOTOSENSITIVE, INORGANIC LIGAND-CAPPED INORGANIC NANOCRYSTALS
[patent_app_type] => utility
[patent_app_number] => 17/283457
[patent_app_country] => US
[patent_app_date] => 2019-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15332
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17283457
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/283457 | Photosensitive, inorganic ligand-capped inorganic nanocrystals | Oct 10, 2019 | Issued |
Array
(
[id] => 17252498
[patent_doc_number] => 11187982
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-11-30
[patent_title] => Photosensitive resin composition, photosensitive dry film, and pattern forming process
[patent_app_type] => utility
[patent_app_number] => 16/597128
[patent_app_country] => US
[patent_app_date] => 2019-10-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9784
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16597128
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/597128 | Photosensitive resin composition, photosensitive dry film, and pattern forming process | Oct 8, 2019 | Issued |