
Johnese T. Johnson
Examiner (ID: 7600, Phone: (571)270-1097 , Office: P/2168 )
| Most Active Art Unit | 2166 |
| Art Unit(s) | 2166, 2169, 2168 |
| Total Applications | 364 |
| Issued Applications | 217 |
| Pending Applications | 6 |
| Abandoned Applications | 145 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 17615333
[patent_doc_number] => 20220157613
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-05-19
[patent_title] => Etching Solution And Method For Selectively Removing Silicon Nitride During Manufacture Of A Semiconductor Device
[patent_app_type] => utility
[patent_app_number] => 17/432992
[patent_app_country] => US
[patent_app_date] => 2020-03-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7683
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 185
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17432992
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/432992 | Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor device | Mar 9, 2020 | Issued |
Array
(
[id] => 17453141
[patent_doc_number] => 11267987
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-03-08
[patent_title] => Chemical mechanical polishing slurry composition and method of polishing metal layer
[patent_app_type] => utility
[patent_app_number] => 16/805864
[patent_app_country] => US
[patent_app_date] => 2020-03-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 9
[patent_no_of_words] => 5668
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16805864
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/805864 | Chemical mechanical polishing slurry composition and method of polishing metal layer | Mar 1, 2020 | Issued |
Array
(
[id] => 16330317
[patent_doc_number] => 20200301283
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-09-24
[patent_title] => SOLUTION, METHOD OF FORMING RESIST PATTERN, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
[patent_app_type] => utility
[patent_app_number] => 16/806838
[patent_app_country] => US
[patent_app_date] => 2020-03-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5534
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -14
[patent_words_short_claim] => 9
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16806838
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/806838 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | Mar 1, 2020 | Issued |
Array
(
[id] => 17067458
[patent_doc_number] => 20210269673
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-09-02
[patent_title] => POLISHING COMPOSITION CONTAINING ZIRCONIA PARTICLES AND AN OXIDIZER
[patent_app_type] => utility
[patent_app_number] => 16/805037
[patent_app_country] => US
[patent_app_date] => 2020-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4122
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -20
[patent_words_short_claim] => 15
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16805037
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/805037 | POLISHING COMPOSITION CONTAINING ZIRCONIA PARTICLES AND AN OXIDIZER | Feb 27, 2020 | Abandoned |
Array
(
[id] => 17210626
[patent_doc_number] => 11171002
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-11-09
[patent_title] => Alternating hardmasks for tight-pitch line formation
[patent_app_type] => utility
[patent_app_number] => 16/798823
[patent_app_country] => US
[patent_app_date] => 2020-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 22
[patent_no_of_words] => 6065
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 224
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16798823
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/798823 | Alternating hardmasks for tight-pitch line formation | Feb 23, 2020 | Issued |
Array
(
[id] => 17428885
[patent_doc_number] => 20220056593
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-02-24
[patent_title] => DRY ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ETCHING DEVICE
[patent_app_type] => utility
[patent_app_number] => 17/434898
[patent_app_country] => US
[patent_app_date] => 2020-02-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7456
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -9
[patent_words_short_claim] => 127
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17434898
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/434898 | Dry etching method, method for manufacturing semiconductor device, and etching device | Feb 18, 2020 | Issued |
Array
(
[id] => 17107374
[patent_doc_number] => 11127600
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-09-21
[patent_title] => Etching method
[patent_app_type] => utility
[patent_app_number] => 16/793344
[patent_app_country] => US
[patent_app_date] => 2020-02-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 4920
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16793344
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/793344 | Etching method | Feb 17, 2020 | Issued |
Array
(
[id] => 16000781
[patent_doc_number] => 20200176261
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-06-04
[patent_title] => METHOD OF DETERMINING PLASMA ABNORMALITY, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING APPARATUS
[patent_app_type] => utility
[patent_app_number] => 16/785229
[patent_app_country] => US
[patent_app_date] => 2020-02-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10688
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 74
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16785229
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/785229 | Method of determining plasma abnormality, method of manufacturing semiconductor device, and substrate processing apparatus | Feb 6, 2020 | Issued |
Array
(
[id] => 17025353
[patent_doc_number] => 20210249225
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-08-12
[patent_title] => Plasma Processing Methods Using Low Frequency Bias Pulses
[patent_app_type] => utility
[patent_app_number] => 16/785260
[patent_app_country] => US
[patent_app_date] => 2020-02-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8038
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16785260
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/785260 | Plasma processing methods using low frequency bias pulses | Feb 6, 2020 | Issued |
Array
(
[id] => 17010853
[patent_doc_number] => 20210242014
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2021-08-05
[patent_title] => WATER SOLUBLE ORGANIC-INORGANIC HYBRID MASK FORMULATIONS AND THEIR APPLICATIONS
[patent_app_type] => utility
[patent_app_number] => 16/777610
[patent_app_country] => US
[patent_app_date] => 2020-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8342
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 40
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16777610
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/777610 | Water soluble organic-inorganic hybrid mask formulations and their applications | Jan 29, 2020 | Issued |
Array
(
[id] => 15939009
[patent_doc_number] => 20200161138
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-05-21
[patent_title] => PLASMA ETCHING METHOD FOR SELECTIVELY ETCHING SILICON OXIDE WITH RESPECT TO SILICON NITRIDE
[patent_app_type] => utility
[patent_app_number] => 16/750530
[patent_app_country] => US
[patent_app_date] => 2020-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7961
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 135
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16750530
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/750530 | Plasma etching method for selectively etching silicon oxide with respect to silicon nitride | Jan 22, 2020 | Issued |
Array
(
[id] => 16226213
[patent_doc_number] => 20200251330
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-08-06
[patent_title] => PROCESS FOR DEPOSITION OF TITANIUM OXYNITRIDE FOR USE IN INTEGRATED CIRCUIT FABRICATION
[patent_app_type] => utility
[patent_app_number] => 16/742079
[patent_app_country] => US
[patent_app_date] => 2020-01-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9880
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -22
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16742079
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/742079 | Process for deposition of titanium oxynitride for use in integrated circuit fabrication | Jan 13, 2020 | Issued |
Array
(
[id] => 15896467
[patent_doc_number] => 20200147752
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-05-14
[patent_title] => PLATEN ROTATION METHOD
[patent_app_type] => utility
[patent_app_number] => 16/740809
[patent_app_country] => US
[patent_app_date] => 2020-01-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6807
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 71
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16740809
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/740809 | Platen rotation method | Jan 12, 2020 | Issued |
Array
(
[id] => 16928234
[patent_doc_number] => 11049723
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-06-29
[patent_title] => Substrate processing method and substrate processing apparatus
[patent_app_type] => utility
[patent_app_number] => 16/736964
[patent_app_country] => US
[patent_app_date] => 2020-01-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 13
[patent_no_of_words] => 11525
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 176
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16736964
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/736964 | Substrate processing method and substrate processing apparatus | Jan 7, 2020 | Issued |
Array
(
[id] => 15868031
[patent_doc_number] => 20200141419
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-05-07
[patent_title] => METAL SURFACE PREPARATION
[patent_app_type] => utility
[patent_app_number] => 16/735078
[patent_app_country] => US
[patent_app_date] => 2020-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2572
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 40
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16735078
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/735078 | Metal surface preparation | Jan 5, 2020 | Issued |
Array
(
[id] => 17716548
[patent_doc_number] => 11380546
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-07-05
[patent_title] => Deposition mask, deposition mask apparatus, manufacturing method of deposition mask, and manufacturing method of deposition mask apparatus
[patent_app_type] => utility
[patent_app_number] => 16/726431
[patent_app_country] => US
[patent_app_date] => 2019-12-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 31
[patent_no_of_words] => 14398
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 118
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16726431
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/726431 | Deposition mask, deposition mask apparatus, manufacturing method of deposition mask, and manufacturing method of deposition mask apparatus | Dec 23, 2019 | Issued |
Array
(
[id] => 15775739
[patent_doc_number] => 20200118887
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2020-04-16
[patent_title] => Replacement Gate Process for Semiconductor Devices
[patent_app_type] => utility
[patent_app_number] => 16/717542
[patent_app_country] => US
[patent_app_date] => 2019-12-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5388
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16717542
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/717542 | Replacement gate process for semiconductor devices | Dec 16, 2019 | Issued |
Array
(
[id] => 17399841
[patent_doc_number] => 20220041931
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2022-02-10
[patent_title] => Silicon Etching Liquid
[patent_app_type] => utility
[patent_app_number] => 17/414370
[patent_app_country] => US
[patent_app_date] => 2019-12-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4097
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -2
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17414370
[rel_patent_id] =>[rel_patent_doc_number] =>) 17/414370 | Silicon Etching Liquid | Dec 8, 2019 | Abandoned |
Array
(
[id] => 17859924
[patent_doc_number] => 11441071
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2022-09-13
[patent_title] => Etchant composition and methods for manufacturing metal pattern and array substrate using the same
[patent_app_type] => utility
[patent_app_number] => 16/702773
[patent_app_country] => US
[patent_app_date] => 2019-12-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 11
[patent_no_of_words] => 13906
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 43
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16702773
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/702773 | Etchant composition and methods for manufacturing metal pattern and array substrate using the same | Dec 3, 2019 | Issued |
Array
(
[id] => 16738883
[patent_doc_number] => 10964547
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-03-30
[patent_title] => Method of fabricating semiconductor structure
[patent_app_type] => utility
[patent_app_number] => 16/693389
[patent_app_country] => US
[patent_app_date] => 2019-11-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 26
[patent_no_of_words] => 10846
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 74
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16693389
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/693389 | Method of fabricating semiconductor structure | Nov 24, 2019 | Issued |