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[patent_doc_number] => 20050215024
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[patent_title] => 'Methods for forming super-steep diffusion region profiles in MOS devices and resulting semiconductor topographies'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/069501 | Methods for forming super-steep diffusion region profiles in MOS devices and resulting semiconductor topographies | Feb 28, 2005 | Issued |