
Jose G. Dees
Examiner (ID: 589)
| Most Active Art Unit | |
| Art Unit(s) | |
| Total Applications | |
| Issued Applications | |
| Pending Applications | |
| Abandoned Applications |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
| 06/789749 | Method of forming a variable width channel | Oct 20, 1985 | Issued |
| 06/788947 | Method of manufacture for print heads of ink jet printers | Oct 17, 1985 | Issued |
| 06/787254 | METHOD FOR MANUFACTURING AN OPTICAL FILTER | Oct 14, 1985 | Abandoned |
| 06/786413 | CIRCUIT WRITING PROCESS | Oct 9, 1985 | Abandoned |
| 06/779832 | Exposure of uniform fine pattern on photoresist | Sep 24, 1985 | Issued |
| 06/778738 | RADIATION IMAGE RECORDING AND REPRODUCING METHOD | Sep 22, 1985 | Abandoned |
| 06/777715 | PHOTOMASK MATERIAL | Sep 12, 1985 | Abandoned |
| 06/772469 | PHOTOLITHOGRAPHIC MASK | Sep 3, 1985 | Abandoned |
| 06/771089 | Pedestal-type microlens fabrication process | Aug 29, 1985 | Issued |
| 06/771386 | Anti-corrosion treatment for patterning of metallic layers | Aug 29, 1985 | Issued |
| 06/771315 | Manufacture of microsieves and the resulting microsieves | Aug 29, 1985 | Issued |
| 06/770700 | Method for manufacturing a damping layer for surface wave filters | Aug 28, 1985 | Issued |
| 06/768700 | Method of photoforming optical patterns for VLSI devices | Aug 22, 1985 | Issued |
| 06/766629 | Planarization process for organic filling of deep trenches | Aug 18, 1985 | Issued |
| 06/766760 | PROTECTIVE DEVICE FOR PHOTOGRAPHIC MASKS | Aug 15, 1985 | Abandoned |
| 06/766285 | Absorptive planarizing layer for optical lithography | Aug 15, 1985 | Issued |
| 06/764876 | METHOD OF MANUFACTURING A LIQUID CRYSTAL DISPLAY DEVICE | Aug 11, 1985 | Abandoned |
| 06/763812 | METHOD FOR MANUFACTURE OF PRINTED CIRCUIT BOARDS | Aug 7, 1985 | Abandoned |
| 06/762885 | PLANAR METAL INTERCONNECTION FOR A VLSI DEVICE | Aug 5, 1985 | Abandoned |
| 06/762034 | Method for producing ink jet recording head | Aug 1, 1985 | Issued |