Search

Joshua Joo

Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )

Most Active Art Unit
2445
Art Unit(s)
2445, 2454, 2154
Total Applications
1189
Issued Applications
852
Pending Applications
95
Abandoned Applications
264

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 9496217 [patent_doc_number] => 08735029 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-05-27 [patent_title] => 'Positive photosensitive resin composition, and display device and organic light emitting device using the same' [patent_app_type] => utility [patent_app_number] => 13/603491 [patent_app_country] => US [patent_app_date] => 2012-09-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 9059 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 42 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13603491 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/603491
Positive photosensitive resin composition, and display device and organic light emitting device using the same Sep 4, 2012 Issued
Array ( [id] => 8841408 [patent_doc_number] => 20130137036 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-05-30 [patent_title] => 'Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film' [patent_app_type] => utility [patent_app_number] => 13/590330 [patent_app_country] => US [patent_app_date] => 2012-08-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15309 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13590330 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/590330
Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film Aug 20, 2012 Issued
Array ( [id] => 9607939 [patent_doc_number] => 08785103 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-07-22 [patent_title] => 'Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film' [patent_app_type] => utility [patent_app_number] => 13/590440 [patent_app_country] => US [patent_app_date] => 2012-08-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 11206 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13590440 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/590440
Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film Aug 20, 2012 Issued
Array ( [id] => 8502418 [patent_doc_number] => 20120301826 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-11-29 [patent_title] => 'POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOTORESIST COMPOSITIONS COMPRISING THE SAME' [patent_app_type] => utility [patent_app_number] => 13/568911 [patent_app_country] => US [patent_app_date] => 2012-08-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 6741 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13568911 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/568911
Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same Aug 6, 2012 Issued
Array ( [id] => 8670905 [patent_doc_number] => 20130045443 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-02-21 [patent_title] => 'POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 13/567356 [patent_app_country] => US [patent_app_date] => 2012-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 52572 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13567356 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/567356
POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Aug 5, 2012 Abandoned
Array ( [id] => 8637466 [patent_doc_number] => 20130029269 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-01-31 [patent_title] => 'POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/557900 [patent_app_country] => US [patent_app_date] => 2012-07-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 18296 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13557900 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/557900
Positive resist composition and patterning process Jul 24, 2012 Issued
Array ( [id] => 10897817 [patent_doc_number] => 08921029 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-12-30 [patent_title] => 'Resist composition and method for producing resist pattern' [patent_app_type] => utility [patent_app_number] => 13/551807 [patent_app_country] => US [patent_app_date] => 2012-07-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 21707 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13551807 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/551807
Resist composition and method for producing resist pattern Jul 17, 2012 Issued
Array ( [id] => 9545915 [patent_doc_number] => 20140170562 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-06-19 [patent_title] => 'Positive Photosensitive Resin Composition' [patent_app_type] => utility [patent_app_number] => 14/236971 [patent_app_country] => US [patent_app_date] => 2012-07-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9408 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14236971 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/236971
Positive photosensitive resin composition Jul 16, 2012 Issued
Array ( [id] => 9691530 [patent_doc_number] => 08822123 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-09-02 [patent_title] => 'Polymeric materials and methods for making the polymeric materials' [patent_app_type] => utility [patent_app_number] => 13/549131 [patent_app_country] => US [patent_app_date] => 2012-07-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4026 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13549131 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/549131
Polymeric materials and methods for making the polymeric materials Jul 12, 2012 Issued
Array ( [id] => 13650647 [patent_doc_number] => 09851636 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-12-26 [patent_title] => Materials and methods for improved photoresist performance [patent_app_type] => utility [patent_app_number] => 13/542160 [patent_app_country] => US [patent_app_date] => 2012-07-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 7 [patent_no_of_words] => 3593 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13542160 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/542160
Materials and methods for improved photoresist performance Jul 4, 2012 Issued
Array ( [id] => 8648976 [patent_doc_number] => 20130034706 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-02-07 [patent_title] => 'PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE' [patent_app_type] => utility [patent_app_number] => 13/540123 [patent_app_country] => US [patent_app_date] => 2012-07-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 44063 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13540123 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/540123
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE Jul 1, 2012 Abandoned
Array ( [id] => 12045966 [patent_doc_number] => 09823563 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-11-21 [patent_title] => 'Alcohol compound and method for producing same, method for producing lactone compound, (meth)acrylate ester and method for producing same, polymer and method for producing same, and resist composition and method for producing substrate using same' [patent_app_type] => utility [patent_app_number] => 14/125727 [patent_app_country] => US [patent_app_date] => 2012-06-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 19909 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14125727 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/125727
Alcohol compound and method for producing same, method for producing lactone compound, (meth)acrylate ester and method for producing same, polymer and method for producing same, and resist composition and method for producing substrate using same Jun 13, 2012 Issued
Array ( [id] => 8428120 [patent_doc_number] => 20120249995 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-10-04 [patent_title] => 'RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD' [patent_app_type] => utility [patent_app_number] => 13/494746 [patent_app_country] => US [patent_app_date] => 2012-06-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9563 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13494746 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/494746
RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD Jun 11, 2012 Abandoned
Array ( [id] => 8566228 [patent_doc_number] => 20120328799 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-12-27 [patent_title] => 'POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME' [patent_app_type] => utility [patent_app_number] => 13/491608 [patent_app_country] => US [patent_app_date] => 2012-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 9756 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13491608 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/491608
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME Jun 7, 2012 Abandoned
Array ( [id] => 8416978 [patent_doc_number] => 20120244478 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-09-27 [patent_title] => 'RESIST PATTERN FORMATION METHOD' [patent_app_type] => utility [patent_app_number] => 13/489683 [patent_app_country] => US [patent_app_date] => 2012-06-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 20242 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13489683 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/489683
RESIST PATTERN FORMATION METHOD Jun 5, 2012 Abandoned
Array ( [id] => 8509520 [patent_doc_number] => 20120308928 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-12-06 [patent_title] => 'RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND METHOD OF PRODUCING THE SAME' [patent_app_type] => utility [patent_app_number] => 13/477516 [patent_app_country] => US [patent_app_date] => 2012-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 43314 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13477516 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/477516
Resist composition, method of forming resist pattern, polymeric compound and method of producing the same May 21, 2012 Issued
Array ( [id] => 8509512 [patent_doc_number] => 20120308920 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-12-06 [patent_title] => 'SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 13/476629 [patent_app_country] => US [patent_app_date] => 2012-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17637 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13476629 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/476629
Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process May 20, 2012 Issued
Array ( [id] => 10876009 [patent_doc_number] => 08900793 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-12-02 [patent_title] => 'Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition' [patent_app_type] => utility [patent_app_number] => 13/476700 [patent_app_country] => US [patent_app_date] => 2012-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12507 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 14 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13476700 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/476700
Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition May 20, 2012 Issued
Array ( [id] => 9710523 [patent_doc_number] => 08835091 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-09-16 [patent_title] => 'Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition' [patent_app_type] => utility [patent_app_number] => 13/474795 [patent_app_country] => US [patent_app_date] => 2012-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 9509 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 128 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13474795 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/474795
Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition May 17, 2012 Issued
Array ( [id] => 11507375 [patent_doc_number] => 09598520 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-03-21 [patent_title] => 'Radiation-sensitive resin composition, polymer and method for forming a resist pattern' [patent_app_type] => utility [patent_app_number] => 13/473957 [patent_app_country] => US [patent_app_date] => 2012-05-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 21805 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 65 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13473957 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/473957
Radiation-sensitive resin composition, polymer and method for forming a resist pattern May 16, 2012 Issued
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