
Joshua Joo
Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )
| Most Active Art Unit | 2445 |
| Art Unit(s) | 2445, 2454, 2154 |
| Total Applications | 1189 |
| Issued Applications | 852 |
| Pending Applications | 95 |
| Abandoned Applications | 264 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 9299582
[patent_doc_number] => 08647807
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-02-11
[patent_title] => 'Photosensitive resin composition, photosensitive dry film and method for forming pattern'
[patent_app_type] => utility
[patent_app_number] => 13/519495
[patent_app_country] => US
[patent_app_date] => 2010-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8262
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13519495
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/519495 | Photosensitive resin composition, photosensitive dry film and method for forming pattern | Dec 26, 2010 | Issued |
Array
(
[id] => 8502421
[patent_doc_number] => 20120301830
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-11-29
[patent_title] => 'PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHOD FOR FORMING PATTERN'
[patent_app_type] => utility
[patent_app_number] => 13/519418
[patent_app_country] => US
[patent_app_date] => 2010-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6955
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13519418
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/519418 | Photosensitive resin composition, photosensitive dry film and method for forming pattern | Dec 26, 2010 | Issued |
Array
(
[id] => 8405822
[patent_doc_number] => 20120237873
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-09-20
[patent_title] => 'POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM'
[patent_app_type] => utility
[patent_app_number] => 13/513270
[patent_app_country] => US
[patent_app_date] => 2010-12-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 18426
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13513270
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/513270 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM | Dec 19, 2010 | Abandoned |
Array
(
[id] => 11264615
[patent_doc_number] => 09488910
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2016-11-08
[patent_title] => 'Sulfonyl photoacid generators and photoresists comprising same'
[patent_app_type] => utility
[patent_app_number] => 12/968130
[patent_app_country] => US
[patent_app_date] => 2010-12-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5403
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 17
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12968130
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/968130 | Sulfonyl photoacid generators and photoresists comprising same | Dec 13, 2010 | Issued |
Array
(
[id] => 10528952
[patent_doc_number] => 09255079
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2016-02-09
[patent_title] => 'Photoacid generators and photoresists comprising same'
[patent_app_type] => utility
[patent_app_number] => 12/965368
[patent_app_country] => US
[patent_app_date] => 2010-12-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5376
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 29
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12965368
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/965368 | Photoacid generators and photoresists comprising same | Dec 9, 2010 | Issued |
Array
(
[id] => 6080607
[patent_doc_number] => 20110143103
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-06-16
[patent_title] => 'PHOTO-CURABLE RESIN COMPOSITION, PATTERN FORMING METHOD AND SUBSTRATE PROTECTING FILM, AND FILM-SHAPED ADHESIVE AND ADHESIVE SHEET USING SAID COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 12/963727
[patent_app_country] => US
[patent_app_date] => 2010-12-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 14890
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0143/20110143103.pdf
[firstpage_image] =>[orig_patent_app_number] => 12963727
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/963727 | Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition | Dec 8, 2010 | Issued |
Array
(
[id] => 8430074
[patent_doc_number] => 20120251949
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-10-04
[patent_title] => 'POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 13/514932
[patent_app_country] => US
[patent_app_date] => 2010-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15540
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13514932
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/514932 | Positive type photosensitive resin composition | Dec 6, 2010 | Issued |
Array
(
[id] => 6118785
[patent_doc_number] => 20110076458
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-03-31
[patent_title] => 'PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTERNS, AND ELECTRONIC EQUIPMENT'
[patent_app_type] => utility
[patent_app_number] => 12/961727
[patent_app_country] => US
[patent_app_date] => 2010-12-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 18490
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0076/20110076458.pdf
[firstpage_image] =>[orig_patent_app_number] => 12961727
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/961727 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | Dec 6, 2010 | Issued |
Array
(
[id] => 7488321
[patent_doc_number] => 20110236823
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-09-29
[patent_title] => 'NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS'
[patent_app_type] => utility
[patent_app_number] => 12/951933
[patent_app_country] => US
[patent_app_date] => 2010-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 8009
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0236/20110236823.pdf
[firstpage_image] =>[orig_patent_app_number] => 12951933
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/951933 | Polymers and photoresist compositions | Nov 21, 2010 | Issued |
Array
(
[id] => 9285926
[patent_doc_number] => 08642253
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-02-04
[patent_title] => 'Resist composition for negative tone development and pattern forming method using the same'
[patent_app_type] => utility
[patent_app_number] => 12/941386
[patent_app_country] => US
[patent_app_date] => 2010-11-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 11
[patent_no_of_words] => 29831
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 145
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12941386
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/941386 | Resist composition for negative tone development and pattern forming method using the same | Nov 7, 2010 | Issued |
Array
(
[id] => 5929245
[patent_doc_number] => 20110039204
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-02-17
[patent_title] => 'ESTER COMPOUNDS AND THEIR PREPARATION, POLYMERS, RESIST COMPOSITIONS AND PATTERNING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 12/912161
[patent_app_country] => US
[patent_app_date] => 2010-10-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 24505
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0039/20110039204.pdf
[firstpage_image] =>[orig_patent_app_number] => 12912161
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/912161 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Oct 25, 2010 | Issued |
Array
(
[id] => 6038760
[patent_doc_number] => 20110091809
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-04-21
[patent_title] => 'ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 12/905742
[patent_app_country] => US
[patent_app_date] => 2010-10-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 35974
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0091/20110091809.pdf
[firstpage_image] =>[orig_patent_app_number] => 12905742
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/905742 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | Oct 14, 2010 | Issued |
Array
(
[id] => 8464983
[patent_doc_number] => 20120270151
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-10-25
[patent_title] => 'RADIATION SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING AN INTERLAYER INSULATING FILM'
[patent_app_type] => utility
[patent_app_number] => 13/502211
[patent_app_country] => US
[patent_app_date] => 2010-10-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 14724
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13502211
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/502211 | Radiation sensitive resin composition and method of forming an interlayer insulating film | Oct 13, 2010 | Issued |
Array
(
[id] => 8240233
[patent_doc_number] => 20120148957
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-06-14
[patent_title] => 'PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM'
[patent_app_type] => utility
[patent_app_number] => 13/390847
[patent_app_country] => US
[patent_app_date] => 2010-10-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 41074
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13390847
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/390847 | Pattern forming method, chemical amplification resist composition and resist film | Oct 4, 2010 | Issued |
Array
(
[id] => 6095912
[patent_doc_number] => 20110003248
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-01-06
[patent_title] => 'Positive photosensitive resin composition'
[patent_app_type] => utility
[patent_app_number] => 12/884316
[patent_app_country] => US
[patent_app_date] => 2010-09-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7876
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0003/20110003248.pdf
[firstpage_image] =>[orig_patent_app_number] => 12884316
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/884316 | Positive photosensitive resin composition | Sep 16, 2010 | Issued |
Array
(
[id] => 6621050
[patent_doc_number] => 20100324245
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-23
[patent_title] => 'COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PRODUCING METHOD THEREOF, AND COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 12/872461
[patent_app_country] => US
[patent_app_date] => 2010-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10199
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0324/20100324245.pdf
[firstpage_image] =>[orig_patent_app_number] => 12872461
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/872461 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PRODUCING METHOD THEREOF, AND COMPOSITION | Aug 30, 2010 | Abandoned |
Array
(
[id] => 8543114
[patent_doc_number] => 08318401
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-11-27
[patent_title] => 'Positive typed photosensitive composition'
[patent_app_type] => utility
[patent_app_number] => 12/869002
[patent_app_country] => US
[patent_app_date] => 2010-08-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4821
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 43
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12869002
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/869002 | Positive typed photosensitive composition | Aug 25, 2010 | Issued |
Array
(
[id] => 5953079
[patent_doc_number] => 20110033804
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-02-10
[patent_title] => 'PHOTORESIST COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 12/852072
[patent_app_country] => US
[patent_app_date] => 2010-08-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12506
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0033/20110033804.pdf
[firstpage_image] =>[orig_patent_app_number] => 12852072
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/852072 | PHOTORESIST COMPOSITION | Aug 5, 2010 | Abandoned |
Array
(
[id] => 9323328
[patent_doc_number] => 08658346
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-02-25
[patent_title] => 'Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition'
[patent_app_type] => utility
[patent_app_number] => 12/850266
[patent_app_country] => US
[patent_app_date] => 2010-08-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 29
[patent_no_of_words] => 21076
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 207
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12850266
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/850266 | Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition | Aug 3, 2010 | Issued |
Array
(
[id] => 6149154
[patent_doc_number] => 20110020749
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-01-27
[patent_title] => 'CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN'
[patent_app_type] => utility
[patent_app_number] => 12/844557
[patent_app_country] => US
[patent_app_date] => 2010-07-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 17881
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0020/20110020749.pdf
[firstpage_image] =>[orig_patent_app_number] => 12844557
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/844557 | Chemically amplified resist composition and salt employed therein | Jul 26, 2010 | Issued |