Search

Joshua Joo

Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )

Most Active Art Unit
2445
Art Unit(s)
2445, 2454, 2154
Total Applications
1189
Issued Applications
852
Pending Applications
95
Abandoned Applications
264

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 8759768 [patent_doc_number] => 08420287 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-04-16 [patent_title] => 'Positive photosensitive resin composition' [patent_app_type] => utility [patent_app_number] => 12/834933 [patent_app_country] => US [patent_app_date] => 2010-07-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10682 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12834933 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/834933
Positive photosensitive resin composition Jul 12, 2010 Issued
Array ( [id] => 5992913 [patent_doc_number] => 20110014566 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-01-20 [patent_title] => 'SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/833457 [patent_app_country] => US [patent_app_date] => 2010-07-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15924 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0014/20110014566.pdf [firstpage_image] =>[orig_patent_app_number] => 12833457 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/833457
Salt and photoresist composition containing the same Jul 8, 2010 Issued
Array ( [id] => 5992914 [patent_doc_number] => 20110014567 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-01-20 [patent_title] => 'SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/833712 [patent_app_country] => US [patent_app_date] => 2010-07-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17735 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0014/20110014567.pdf [firstpage_image] =>[orig_patent_app_number] => 12833712 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/833712
Salt and photoresist composition containing the same Jul 8, 2010 Issued
Array ( [id] => 9086073 [patent_doc_number] => 08557499 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-10-15 [patent_title] => 'Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition' [patent_app_type] => utility [patent_app_number] => 12/832747 [patent_app_country] => US [patent_app_date] => 2010-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 32328 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 7 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12832747 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/832747
Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition Jul 7, 2010 Issued
Array ( [id] => 6134833 [patent_doc_number] => 20110008735 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-01-13 [patent_title] => 'SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 12/831621 [patent_app_country] => US [patent_app_date] => 2010-07-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 15076 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20110008735.pdf [firstpage_image] =>[orig_patent_app_number] => 12831621 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/831621
Sulfonium salt, resist composition, and patterning process Jul 6, 2010 Issued
Array ( [id] => 8920673 [patent_doc_number] => 08486604 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-07-16 [patent_title] => 'Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film' [patent_app_type] => utility [patent_app_number] => 12/826049 [patent_app_country] => US [patent_app_date] => 2010-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17770 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12826049 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/826049
Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film Jun 28, 2010 Issued
Array ( [id] => 6346387 [patent_doc_number] => 20100330507 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-30 [patent_title] => 'PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTERN FORMING METHOD, NEGATIVE DEVELOPING SOLUTION TO BE USED IN THE PATTERN FORMING METHOD AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT TO BE USED IN THE PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/825088 [patent_app_country] => US [patent_app_date] => 2010-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 29558 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0330/20100330507.pdf [firstpage_image] =>[orig_patent_app_number] => 12825088 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/825088
Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method Jun 27, 2010 Issued
Array ( [id] => 6509044 [patent_doc_number] => 20100261117 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-10-14 [patent_title] => 'POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 12/819490 [patent_app_country] => US [patent_app_date] => 2010-06-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 14275 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0261/20100261117.pdf [firstpage_image] =>[orig_patent_app_number] => 12819490 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/819490
Positive photosensitive composition and method of forming resist pattern Jun 20, 2010 Issued
Array ( [id] => 7997035 [patent_doc_number] => 08080365 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-12-20 [patent_title] => 'Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition' [patent_app_type] => utility [patent_app_number] => 12/815462 [patent_app_country] => US [patent_app_date] => 2010-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 8418 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 61 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/080/08080365.pdf [firstpage_image] =>[orig_patent_app_number] => 12815462 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/815462
Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition Jun 14, 2010 Issued
Array ( [id] => 6343262 [patent_doc_number] => 20100248147 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-09-30 [patent_title] => 'PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS' [patent_app_type] => utility [patent_app_number] => 12/813628 [patent_app_country] => US [patent_app_date] => 2010-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5911 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0248/20100248147.pdf [firstpage_image] =>[orig_patent_app_number] => 12813628 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/813628
PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS Jun 10, 2010 Abandoned
Array ( [id] => 7739904 [patent_doc_number] => 08105749 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-01-31 [patent_title] => 'Polymer compound, positive resist composition, and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 12/814356 [patent_app_country] => US [patent_app_date] => 2010-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16546 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 35 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/105/08105749.pdf [firstpage_image] =>[orig_patent_app_number] => 12814356 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/814356
Polymer compound, positive resist composition, and method of forming resist pattern Jun 10, 2010 Issued
Array ( [id] => 6382462 [patent_doc_number] => 20100316951 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-16 [patent_title] => 'SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/797459 [patent_app_country] => US [patent_app_date] => 2010-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10652 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0316/20100316951.pdf [firstpage_image] =>[orig_patent_app_number] => 12797459 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/797459
Salt and photoresist composition containing the same Jun 8, 2010 Issued
Array ( [id] => 6382474 [patent_doc_number] => 20100316952 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-16 [patent_title] => 'SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/797466 [patent_app_country] => US [patent_app_date] => 2010-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14073 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0316/20100316952.pdf [firstpage_image] =>[orig_patent_app_number] => 12797466 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/797466
Salt and photoresist composition containing the same Jun 8, 2010 Issued
Array ( [id] => 8446027 [patent_doc_number] => 08288076 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-10-16 [patent_title] => 'Chemically amplified resist composition and pattern forming process' [patent_app_type] => utility [patent_app_number] => 12/789747 [patent_app_country] => US [patent_app_date] => 2010-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14799 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12789747 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/789747
Chemically amplified resist composition and pattern forming process May 27, 2010 Issued
Array ( [id] => 6395353 [patent_doc_number] => 20100304298 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-02 [patent_title] => 'NEGATIVE PHOTOSENSITIVE MATERIAL, PHOTOSENSITIVE BOARD EMPLOYING THE NEGATIVE PHOTOSENSITIVE MATERIAL, AND NEGATIVE PATTERN FORMING METHOD' [patent_app_type] => utility [patent_app_number] => 12/788837 [patent_app_country] => US [patent_app_date] => 2010-05-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 8946 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0304/20100304298.pdf [firstpage_image] =>[orig_patent_app_number] => 12788837 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/788837
Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method May 26, 2010 Issued
Array ( [id] => 6395347 [patent_doc_number] => 20100304297 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-02 [patent_title] => 'PATTERNING PROCESS AND RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/787823 [patent_app_country] => US [patent_app_date] => 2010-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 18765 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0304/20100304297.pdf [firstpage_image] =>[orig_patent_app_number] => 12787823 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/787823
Patterning process and resist composition May 25, 2010 Issued
Array ( [id] => 6134826 [patent_doc_number] => 20110008728 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-01-13 [patent_title] => 'RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 12/788160 [patent_app_country] => US [patent_app_date] => 2010-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 59538 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20110008728.pdf [firstpage_image] =>[orig_patent_app_number] => 12788160 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/788160
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN May 25, 2010 Abandoned
Array ( [id] => 6395313 [patent_doc_number] => 20100304292 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-02 [patent_title] => 'SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/786726 [patent_app_country] => US [patent_app_date] => 2010-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12661 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0304/20100304292.pdf [firstpage_image] =>[orig_patent_app_number] => 12786726 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/786726
Salt and photoresist composition containing the same May 24, 2010 Issued
Array ( [id] => 9496232 [patent_doc_number] => 08735044 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-05-27 [patent_title] => 'Salt and photoresist composition containing the same' [patent_app_type] => utility [patent_app_number] => 12/786738 [patent_app_country] => US [patent_app_date] => 2010-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11880 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 8 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12786738 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/786738
Salt and photoresist composition containing the same May 24, 2010 Issued
Array ( [id] => 7702802 [patent_doc_number] => 08088556 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-01-03 [patent_title] => 'Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition' [patent_app_type] => utility [patent_app_number] => 12/783212 [patent_app_country] => US [patent_app_date] => 2010-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 8405 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 14 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/088/08088556.pdf [firstpage_image] =>[orig_patent_app_number] => 12783212 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/783212
Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition May 18, 2010 Issued
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