| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 5514677
[patent_doc_number] => 20090214984
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-08-27
[patent_title] => 'METHODS FOR ENHANCING PHOTOLITHOGRAPHY PATTERNING'
[patent_app_type] => utility
[patent_app_number] => 12/392093
[patent_app_country] => US
[patent_app_date] => 2009-02-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 7903
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0214/20090214984.pdf
[firstpage_image] =>[orig_patent_app_number] => 12392093
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/392093 | Methods for enhancing photolithography patterning | Feb 23, 2009 | Issued |
Array
(
[id] => 5458345
[patent_doc_number] => 20090258497
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-10-15
[patent_title] => 'PHOTORESIST RESIN, AND METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/389296
[patent_app_country] => US
[patent_app_date] => 2009-02-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 6400
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0258/20090258497.pdf
[firstpage_image] =>[orig_patent_app_number] => 12389296
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/389296 | PHOTORESIST RESIN, AND METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME | Feb 18, 2009 | Abandoned |
Array
(
[id] => 5391558
[patent_doc_number] => 20090208871
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-08-20
[patent_title] => 'NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN'
[patent_app_type] => utility
[patent_app_number] => 12/371876
[patent_app_country] => US
[patent_app_date] => 2009-02-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 27634
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0208/20090208871.pdf
[firstpage_image] =>[orig_patent_app_number] => 12371876
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/371876 | Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern | Feb 15, 2009 | Issued |
Array
(
[id] => 7702783
[patent_doc_number] => 08088537
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-01-03
[patent_title] => 'Resist top coat composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 12/320183
[patent_app_country] => US
[patent_app_date] => 2009-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 22399
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/088/08088537.pdf
[firstpage_image] =>[orig_patent_app_number] => 12320183
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/320183 | Resist top coat composition and patterning process | Jan 20, 2009 | Issued |
Array
(
[id] => 9823317
[patent_doc_number] => 08932801
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-01-13
[patent_title] => 'Photosensitive polyimides'
[patent_app_type] => utility
[patent_app_number] => 12/354905
[patent_app_country] => US
[patent_app_date] => 2009-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3804
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 8
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12354905
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/354905 | Photosensitive polyimides | Jan 15, 2009 | Issued |
Array
(
[id] => 5354953
[patent_doc_number] => 20090186297
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-23
[patent_title] => 'POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 12/355418
[patent_app_country] => US
[patent_app_date] => 2009-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 20351
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0186/20090186297.pdf
[firstpage_image] =>[orig_patent_app_number] => 12355418
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/355418 | Positive resist compositions and patterning process | Jan 15, 2009 | Issued |
Array
(
[id] => 5354952
[patent_doc_number] => 20090186296
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-23
[patent_title] => 'POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 12/355072
[patent_app_country] => US
[patent_app_date] => 2009-01-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 19539
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0186/20090186296.pdf
[firstpage_image] =>[orig_patent_app_number] => 12355072
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/355072 | Positive resist compositions and patterning process | Jan 15, 2009 | Issued |
Array
(
[id] => 8114219
[patent_doc_number] => 08158327
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-04-17
[patent_title] => 'Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition'
[patent_app_type] => utility
[patent_app_number] => 12/321111
[patent_app_country] => US
[patent_app_date] => 2009-01-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 8860
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 33
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/158/08158327.pdf
[firstpage_image] =>[orig_patent_app_number] => 12321111
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/321111 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | Jan 14, 2009 | Issued |
Array
(
[id] => 6322533
[patent_doc_number] => 20100196808
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-08-05
[patent_title] => 'Positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device therewith'
[patent_app_type] => utility
[patent_app_number] => 12/311235
[patent_app_country] => US
[patent_app_date] => 2009-01-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7336
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0196/20100196808.pdf
[firstpage_image] =>[orig_patent_app_number] => 12311235
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/311235 | Positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device therewith | Jan 6, 2009 | Abandoned |
Array
(
[id] => 5354956
[patent_doc_number] => 20090186300
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-23
[patent_title] => 'RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING COPOLYMER'
[patent_app_type] => utility
[patent_app_number] => 12/348780
[patent_app_country] => US
[patent_app_date] => 2009-01-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 28488
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0186/20090186300.pdf
[firstpage_image] =>[orig_patent_app_number] => 12348780
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/348780 | RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING COPOLYMER | Jan 4, 2009 | Abandoned |
Array
(
[id] => 5385813
[patent_doc_number] => 20090227058
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-09-10
[patent_title] => 'PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/347202
[patent_app_country] => US
[patent_app_date] => 2008-12-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 8032
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0227/20090227058.pdf
[firstpage_image] =>[orig_patent_app_number] => 12347202
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/347202 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME | Dec 30, 2008 | Abandoned |
Array
(
[id] => 8294178
[patent_doc_number] => 08221961
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-07-17
[patent_title] => 'Method of manufacturing semiconductor devices'
[patent_app_type] => utility
[patent_app_number] => 12/346436
[patent_app_country] => US
[patent_app_date] => 2008-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 2146
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 140
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12346436
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/346436 | Method of manufacturing semiconductor devices | Dec 29, 2008 | Issued |
Array
(
[id] => 5435439
[patent_doc_number] => 20090170026
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-07-02
[patent_title] => 'POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED LAYER, PROTECTING LAYER, INSULATING LAYER AND SEMICONDUCTOR DEVICE AND DISPLAY THEREWITH'
[patent_app_type] => utility
[patent_app_number] => 12/343983
[patent_app_country] => US
[patent_app_date] => 2008-12-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8373
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0170/20090170026.pdf
[firstpage_image] =>[orig_patent_app_number] => 12343983
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/343983 | Positive-type photosensitive resin composition, cured film, protecting film, insulating film and semiconductor device and display device using these films | Dec 23, 2008 | Issued |
Array
(
[id] => 6291994
[patent_doc_number] => 20100159390
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-06-24
[patent_title] => 'RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS CONTAINING POLY(VINYL HYDROXYARYL CARBOXYLIC ACID ESTER)S'
[patent_app_type] => utility
[patent_app_number] => 12/339469
[patent_app_country] => US
[patent_app_date] => 2008-12-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13067
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0159/20100159390.pdf
[firstpage_image] =>[orig_patent_app_number] => 12339469
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/339469 | Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s | Dec 18, 2008 | Issued |
Array
(
[id] => 5545840
[patent_doc_number] => 20090155717
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-06-18
[patent_title] => 'Photosensitive Resin Composition with Good Stripper-Resistance for Color Filter and Color Filter Formed Using the Same'
[patent_app_type] => utility
[patent_app_number] => 12/337743
[patent_app_country] => US
[patent_app_date] => 2008-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5888
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0155/20090155717.pdf
[firstpage_image] =>[orig_patent_app_number] => 12337743
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/337743 | Photosensitive Resin Composition with Good Stripper-Resistance for Color Filter and Color Filter Formed Using the Same | Dec 17, 2008 | Abandoned |
Array
(
[id] => 5545843
[patent_doc_number] => 20090155720
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-06-18
[patent_title] => 'Photosensitive polymer, resist composition, and associated methods'
[patent_app_type] => utility
[patent_app_number] => 12/314888
[patent_app_country] => US
[patent_app_date] => 2008-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4282
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0155/20090155720.pdf
[firstpage_image] =>[orig_patent_app_number] => 12314888
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/314888 | Photosensitive polymer, resist composition, and associated methods | Dec 17, 2008 | Issued |
Array
(
[id] => 9989356
[patent_doc_number] => 09034556
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-05-19
[patent_title] => 'Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 12/338661
[patent_app_country] => US
[patent_app_date] => 2008-12-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 38695
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 13
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12338661
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/338661 | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern | Dec 17, 2008 | Issued |
Array
(
[id] => 5539083
[patent_doc_number] => 20090220888
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2009-09-03
[patent_title] => 'Dyed photoresists and methods and articles of manufacture comprising same'
[patent_app_type] => utility
[patent_app_number] => 12/316578
[patent_app_country] => US
[patent_app_date] => 2008-12-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8951
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0220/20090220888.pdf
[firstpage_image] =>[orig_patent_app_number] => 12316578
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/316578 | Dyed photoresists and methods and articles of manufacture comprising same | Dec 11, 2008 | Abandoned |
Array
(
[id] => 6395305
[patent_doc_number] => 20100304291
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-02
[patent_title] => 'PRODUCTION METHOD OF POLYHYDROXYIMIDE AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING POLYHYDROXYIMIDE OBTAINED BY THE PRODUCTION METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/747543
[patent_app_country] => US
[patent_app_date] => 2008-12-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 13816
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0304/20100304291.pdf
[firstpage_image] =>[orig_patent_app_number] => 12747543
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/747543 | PRODUCTION METHOD OF POLYHYDROXYIMIDE AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING POLYHYDROXYIMIDE OBTAINED BY THE PRODUCTION METHOD | Dec 11, 2008 | Abandoned |
Array
(
[id] => 8629624
[patent_doc_number] => 08361695
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-01-29
[patent_title] => 'Resist underlayer film forming composition and method for forming resist pattern'
[patent_app_type] => utility
[patent_app_number] => 12/747039
[patent_app_country] => US
[patent_app_date] => 2008-12-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 6599
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12747039
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/747039 | Resist underlayer film forming composition and method for forming resist pattern | Dec 8, 2008 | Issued |