Search

Joshua Joo

Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )

Most Active Art Unit
2445
Art Unit(s)
2445, 2454, 2154
Total Applications
1189
Issued Applications
852
Pending Applications
95
Abandoned Applications
264

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 7502829 [patent_doc_number] => 08034547 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-10-11 [patent_title] => 'Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method' [patent_app_type] => utility [patent_app_number] => 12/145151 [patent_app_country] => US [patent_app_date] => 2008-06-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 11 [patent_no_of_words] => 29542 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/034/08034547.pdf [firstpage_image] =>[orig_patent_app_number] => 12145151 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/145151
Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method Jun 23, 2008 Issued
Array ( [id] => 5349240 [patent_doc_number] => 20090004601 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-01-01 [patent_title] => 'Chemically amplified positive resist composition' [patent_app_type] => utility [patent_app_number] => 12/213800 [patent_app_country] => US [patent_app_date] => 2008-06-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10254 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0004/20090004601.pdf [firstpage_image] =>[orig_patent_app_number] => 12213800 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/213800
Chemically amplified positive resist composition Jun 23, 2008 Issued
Array ( [id] => 81090 [patent_doc_number] => 07745077 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-06-29 [patent_title] => 'Composition for coating over a photoresist pattern' [patent_app_type] => utility [patent_app_number] => 12/141307 [patent_app_country] => US [patent_app_date] => 2008-06-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 8962 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/745/07745077.pdf [firstpage_image] =>[orig_patent_app_number] => 12141307 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/141307
Composition for coating over a photoresist pattern Jun 17, 2008 Issued
Array ( [id] => 4663481 [patent_doc_number] => 20080254388 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-10-16 [patent_title] => 'FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS' [patent_app_type] => utility [patent_app_number] => 12/138648 [patent_app_country] => US [patent_app_date] => 2008-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12578 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0254/20080254388.pdf [firstpage_image] =>[orig_patent_app_number] => 12138648 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/138648
Fluorinated polymer, negative photosensitive resin composition and partition walls Jun 12, 2008 Issued
Array ( [id] => 6416767 [patent_doc_number] => 20100167201 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-07-01 [patent_title] => 'RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME' [patent_app_type] => utility [patent_app_number] => 12/664117 [patent_app_country] => US [patent_app_date] => 2008-06-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 29764 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0167/20100167201.pdf [firstpage_image] =>[orig_patent_app_number] => 12664117 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/664117
Resist composition for negative tone development and pattern forming method using the same Jun 11, 2008 Issued
Array ( [id] => 6538571 [patent_doc_number] => 20100124718 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-05-20 [patent_title] => 'POLYMERIC COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESITS PATTERN' [patent_app_type] => utility [patent_app_number] => 12/451971 [patent_app_country] => US [patent_app_date] => 2008-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16048 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0124/20100124718.pdf [firstpage_image] =>[orig_patent_app_number] => 12451971 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/451971
Polymeric compound, positive resist composition, and method of forming resist pattern Jun 10, 2008 Issued
Array ( [id] => 4531802 [patent_doc_number] => 07887990 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-02-15 [patent_title] => 'Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same' [patent_app_type] => utility [patent_app_number] => 12/137145 [patent_app_country] => US [patent_app_date] => 2008-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14402 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 15 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/887/07887990.pdf [firstpage_image] =>[orig_patent_app_number] => 12137145 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/137145
Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same Jun 10, 2008 Issued
Array ( [id] => 4739861 [patent_doc_number] => 20080233514 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-09-25 [patent_title] => 'POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE' [patent_app_type] => utility [patent_app_number] => 12/136163 [patent_app_country] => US [patent_app_date] => 2008-06-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 4051 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0233/20080233514.pdf [firstpage_image] =>[orig_patent_app_number] => 12136163 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/136163
Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use Jun 9, 2008 Issued
Array ( [id] => 43166 [patent_doc_number] => 07776510 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-08-17 [patent_title] => 'Resist composition, method of forming resist pattern, compound and acid generator' [patent_app_type] => utility [patent_app_number] => 12/135680 [patent_app_country] => US [patent_app_date] => 2008-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 21342 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 11 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/776/07776510.pdf [firstpage_image] =>[orig_patent_app_number] => 12135680 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/135680
Resist composition, method of forming resist pattern, compound and acid generator Jun 8, 2008 Issued
Array ( [id] => 4949303 [patent_doc_number] => 20080305429 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-12-11 [patent_title] => 'RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/135578 [patent_app_country] => US [patent_app_date] => 2008-06-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23324 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0305/20080305429.pdf [firstpage_image] =>[orig_patent_app_number] => 12135578 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/135578
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE RESIST COMPOSITION Jun 8, 2008 Abandoned
Array ( [id] => 4949285 [patent_doc_number] => 20080305411 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-12-11 [patent_title] => 'PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS' [patent_app_type] => utility [patent_app_number] => 12/129975 [patent_app_country] => US [patent_app_date] => 2008-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20262 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0305/20080305411.pdf [firstpage_image] =>[orig_patent_app_number] => 12129975 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/129975
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREPARATION PROCESS May 29, 2008 Abandoned
Array ( [id] => 352465 [patent_doc_number] => 07491485 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-02-17 [patent_title] => 'Resist composition and method of forming resist pattern' [patent_app_type] => utility [patent_app_number] => 12/124013 [patent_app_country] => US [patent_app_date] => 2008-05-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17998 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/491/07491485.pdf [firstpage_image] =>[orig_patent_app_number] => 12124013 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/124013
Resist composition and method of forming resist pattern May 19, 2008 Issued
Array ( [id] => 4778693 [patent_doc_number] => 20080286691 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-11-20 [patent_title] => 'CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/121458 [patent_app_country] => US [patent_app_date] => 2008-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10588 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0286/20080286691.pdf [firstpage_image] =>[orig_patent_app_number] => 12121458 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/121458
Chemically amplified positive resist composition May 14, 2008 Issued
Array ( [id] => 6574893 [patent_doc_number] => 20100096663 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-04-22 [patent_title] => 'PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS' [patent_app_type] => utility [patent_app_number] => 12/451474 [patent_app_country] => US [patent_app_date] => 2008-05-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 18260 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0096/20100096663.pdf [firstpage_image] =>[orig_patent_app_number] => 12451474 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/451474
Photosensitive resin and process for producing microlens May 13, 2008 Issued
Array ( [id] => 4959997 [patent_doc_number] => 20080274422 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-11-06 [patent_title] => 'PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/110651 [patent_app_country] => US [patent_app_date] => 2008-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6871 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0274/20080274422.pdf [firstpage_image] =>[orig_patent_app_number] => 12110651 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/110651
Preparation process of chemically amplified resist composition Apr 27, 2008 Issued
Array ( [id] => 4710973 [patent_doc_number] => 20080299499 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-12-04 [patent_title] => 'EXPOSURE METHOD, METHOD OF MANUFACTURING PLATE FOR FLAT PANEL DISPLAY, AND EXPOSURE APPARATUS' [patent_app_type] => utility [patent_app_number] => 12/110008 [patent_app_country] => US [patent_app_date] => 2008-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 17 [patent_no_of_words] => 13727 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0299/20080299499.pdf [firstpage_image] =>[orig_patent_app_number] => 12110008 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/110008
EXPOSURE METHOD, METHOD OF MANUFACTURING PLATE FOR FLAT PANEL DISPLAY, AND EXPOSURE APPARATUS Apr 24, 2008 Abandoned
Array ( [id] => 196313 [patent_doc_number] => 07638253 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-12-29 [patent_title] => 'Photoresist composition and method of manufacturing a thin-film transistor substrate using the same' [patent_app_type] => utility [patent_app_number] => 12/082436 [patent_app_country] => US [patent_app_date] => 2008-04-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 10 [patent_no_of_words] => 7614 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/638/07638253.pdf [firstpage_image] =>[orig_patent_app_number] => 12082436 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/082436
Photoresist composition and method of manufacturing a thin-film transistor substrate using the same Apr 10, 2008 Issued
Array ( [id] => 6629698 [patent_doc_number] => 20100035182 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-02-11 [patent_title] => 'PHOTOSENSITIVE RESIN COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/450319 [patent_app_country] => US [patent_app_date] => 2008-04-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10207 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0035/20100035182.pdf [firstpage_image] =>[orig_patent_app_number] => 12450319 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/450319
PHOTOSENSITIVE RESIN COMPOSITION Apr 6, 2008 Abandoned
Array ( [id] => 6446005 [patent_doc_number] => 20100104973 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-04-29 [patent_title] => 'COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN' [patent_app_type] => utility [patent_app_number] => 12/450060 [patent_app_country] => US [patent_app_date] => 2008-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23413 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0104/20100104973.pdf [firstpage_image] =>[orig_patent_app_number] => 12450060 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/450060
Compound, acid generator, resist composition, and method of forming resist pattern Apr 3, 2008 Issued
Array ( [id] => 4682196 [patent_doc_number] => 20080248422 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-10-09 [patent_title] => 'RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR' [patent_app_type] => utility [patent_app_number] => 12/060695 [patent_app_country] => US [patent_app_date] => 2008-04-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 28860 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0248/20080248422.pdf [firstpage_image] =>[orig_patent_app_number] => 12060695 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/060695
Resist composition, method of forming resist pattern, compound and acid generator Mar 31, 2008 Issued
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