
Joshua Joo
Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )
| Most Active Art Unit | 2445 |
| Art Unit(s) | 2445, 2454, 2154 |
| Total Applications | 1189 |
| Issued Applications | 852 |
| Pending Applications | 95 |
| Abandoned Applications | 264 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7502829
[patent_doc_number] => 08034547
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[patent_issue_date] => 2011-10-11
[patent_title] => 'Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method'
[patent_app_type] => utility
[patent_app_number] => 12/145151
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Array
(
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[patent_doc_number] => 20090004601
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[patent_issue_date] => 2009-01-01
[patent_title] => 'Chemically amplified positive resist composition'
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Array
(
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[patent_issue_date] => 2010-06-29
[patent_title] => 'Composition for coating over a photoresist pattern'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/141307 | Composition for coating over a photoresist pattern | Jun 17, 2008 | Issued |
Array
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[patent_doc_number] => 20080254388
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[patent_kind] => A1
[patent_issue_date] => 2008-10-16
[patent_title] => 'FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/138648 | Fluorinated polymer, negative photosensitive resin composition and partition walls | Jun 12, 2008 | Issued |
Array
(
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[patent_title] => 'RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME'
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Array
(
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[patent_title] => 'POLYMERIC COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESITS PATTERN'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/451971 | Polymeric compound, positive resist composition, and method of forming resist pattern | Jun 10, 2008 | Issued |
Array
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[patent_title] => 'Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/137145 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | Jun 10, 2008 | Issued |
Array
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[patent_doc_number] => 20080233514
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[patent_issue_date] => 2008-09-25
[patent_title] => 'POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE'
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[patent_app_number] => 12/136163
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/136163 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | Jun 9, 2008 | Issued |
Array
(
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Array
(
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Array
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Array
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Array
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Array
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Array
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Array
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