
Joshua Joo
Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )
| Most Active Art Unit | 2445 |
| Art Unit(s) | 2445, 2454, 2154 |
| Total Applications | 1189 |
| Issued Applications | 852 |
| Pending Applications | 95 |
| Abandoned Applications | 264 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4792015
[patent_doc_number] => 20080292989
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-11-27
[patent_title] => 'POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 12/036519
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[pdf_file] => publications/A1/0292/20080292989.pdf
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Array
(
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[patent_title] => 'NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME'
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[patent_app_number] => 12/036692
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Array
(
[id] => 4873072
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[patent_title] => 'PATTERNING PROCESS AND RESIST COMPOSITION'
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Array
(
[id] => 8114221
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[patent_kind] => B2
[patent_issue_date] => 2012-04-17
[patent_title] => 'Positive-type photosensitive resin composition'
[patent_app_type] => utility
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Array
(
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[patent_title] => 'Compositions for use in forming a pattern and methods of forming a pattern'
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Array
(
[id] => 16758114
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[patent_issue_date] => 2021-04-13
[patent_title] => Photoresists comprising novolak resin blends
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Array
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[firstpage_image] =>[orig_patent_app_number] => 12021149
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/021149 | Chemically amplified resist composition | Jan 27, 2008 | Issued |
Array
(
[id] => 310890
[patent_doc_number] => 07527913
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[patent_kind] => B2
[patent_issue_date] => 2009-05-05
[patent_title] => 'Photoacid generators, photoresist composition including the same and method of forming pattern using the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/011226 | Photoacid generators, photoresist composition including the same and method of forming pattern using the same | Jan 23, 2008 | Issued |
Array
(
[id] => 5271422
[patent_doc_number] => 20090075198
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[patent_kind] => A1
[patent_issue_date] => 2009-03-19
[patent_title] => 'Photosensitive Polyimide Resin Composition'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/226822 | Photosensitive polyimide resin composition | Jan 22, 2008 | Issued |
Array
(
[id] => 4482705
[patent_doc_number] => 07901871
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[patent_kind] => B2
[patent_issue_date] => 2011-03-08
[patent_title] => 'Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method'
[patent_app_type] => utility
[patent_app_number] => 11/971440
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/971440 | Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method | Jan 8, 2008 | Issued |
Array
(
[id] => 5580827
[patent_doc_number] => 20090176173
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[patent_title] => 'IONIC, ORGANIC PHOTOACID GENERATORS FOR DUV, MUV AND OPTICAL LITHOGRAPHY BASED ON PERACEPTOR-SUBSTITUTED AROMATIC ANIONS'
[patent_app_type] => utility
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Array
(
[id] => 5580829
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[patent_title] => 'PHOTOACID GENERATORS FOR EXTREME ULTRAVIOLET LITHOGRAPHY'
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Array
(
[id] => 295863
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Array
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Array
(
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Array
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Array
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Array
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Array
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Array
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[id] => 4938936
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[patent_issue_date] => 2008-03-27
[patent_title] => 'MASK PATTERN FOR SEMICONDUCTOR DEVICE FABRICATION, METHOD OF FORMING THE SAME, METHOD FOR PREPARING COATING, COMPOSITION FOR FINE PATTERN FORMATION, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
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