Search

Joshua Joo

Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )

Most Active Art Unit
2445
Art Unit(s)
2445, 2454, 2154
Total Applications
1189
Issued Applications
852
Pending Applications
95
Abandoned Applications
264

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4825526 [patent_doc_number] => 20080124653 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-05-29 [patent_title] => 'Positive resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 11/987333 [patent_app_country] => US [patent_app_date] => 2007-11-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16443 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0124/20080124653.pdf [firstpage_image] =>[orig_patent_app_number] => 11987333 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/987333
Positive resist compositions and patterning process Nov 28, 2007 Issued
Array ( [id] => 23183 [patent_doc_number] => 07794916 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-09-14 [patent_title] => 'Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition' [patent_app_type] => utility [patent_app_number] => 11/943908 [patent_app_country] => US [patent_app_date] => 2007-11-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 18241 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/794/07794916.pdf [firstpage_image] =>[orig_patent_app_number] => 11943908 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/943908
Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition Nov 20, 2007 Issued
Array ( [id] => 4825525 [patent_doc_number] => 20080124652 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-05-29 [patent_title] => 'Positive resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 11/984614 [patent_app_country] => US [patent_app_date] => 2007-11-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17442 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0124/20080124652.pdf [firstpage_image] =>[orig_patent_app_number] => 11984614 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/984614
Positive resist composition and patterning process Nov 19, 2007 Issued
Array ( [id] => 7597813 [patent_doc_number] => 07618764 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-11-17 [patent_title] => 'Positive resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 11/984608 [patent_app_country] => US [patent_app_date] => 2007-11-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20908 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/618/07618764.pdf [firstpage_image] =>[orig_patent_app_number] => 11984608 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/984608
Positive resist compositions and patterning process Nov 19, 2007 Issued
Array ( [id] => 5278458 [patent_doc_number] => 20090130590 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-05-21 [patent_title] => 'PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS' [patent_app_type] => utility [patent_app_number] => 11/942062 [patent_app_country] => US [patent_app_date] => 2007-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5889 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0130/20090130590.pdf [firstpage_image] =>[orig_patent_app_number] => 11942062 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/942062
Photoresist compositions and process for multiple exposures with multiple layer photoresist systems Nov 18, 2007 Issued
Array ( [id] => 6471027 [patent_doc_number] => 20100040977 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-02-18 [patent_title] => 'RADIATION-SENSITIVE RESIN COMPOSITION' [patent_app_type] => utility [patent_app_number] => 12/514212 [patent_app_country] => US [patent_app_date] => 2007-11-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11261 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0040/20100040977.pdf [firstpage_image] =>[orig_patent_app_number] => 12514212 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/514212
Radiation-sensitive resin composition Nov 8, 2007 Issued
Array ( [id] => 220836 [patent_doc_number] => 07608382 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-10-27 [patent_title] => 'Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers' [patent_app_type] => utility [patent_app_number] => 11/981617 [patent_app_country] => US [patent_app_date] => 2007-10-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 8124 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/608/07608382.pdf [firstpage_image] =>[orig_patent_app_number] => 11981617 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/981617
Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers Oct 30, 2007 Issued
Array ( [id] => 10517310 [patent_doc_number] => 09244355 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-01-26 [patent_title] => 'Compositions and processes for immersion lithography' [patent_app_type] => utility [patent_app_number] => 11/978910 [patent_app_country] => US [patent_app_date] => 2007-10-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10936 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11978910 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/978910
Compositions and processes for immersion lithography Oct 29, 2007 Issued
Array ( [id] => 263567 [patent_doc_number] => 07569325 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-08-04 [patent_title] => 'Monomer having sulfonyl group, polymer thereof and photoresist composition including the same' [patent_app_type] => utility [patent_app_number] => 11/923392 [patent_app_country] => US [patent_app_date] => 2007-10-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4503 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 12 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/569/07569325.pdf [firstpage_image] =>[orig_patent_app_number] => 11923392 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/923392
Monomer having sulfonyl group, polymer thereof and photoresist composition including the same Oct 23, 2007 Issued
Array ( [id] => 4785413 [patent_doc_number] => 20080138742 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-06-12 [patent_title] => 'PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION' [patent_app_type] => utility [patent_app_number] => 11/876945 [patent_app_country] => US [patent_app_date] => 2007-10-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 18888 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0138/20080138742.pdf [firstpage_image] =>[orig_patent_app_number] => 11876945 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/876945
Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition Oct 22, 2007 Issued
Array ( [id] => 326433 [patent_doc_number] => 07514204 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-04-07 [patent_title] => 'Resist composition and patterning process' [patent_app_type] => utility [patent_app_number] => 11/976279 [patent_app_country] => US [patent_app_date] => 2007-10-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20398 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/514/07514204.pdf [firstpage_image] =>[orig_patent_app_number] => 11976279 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/976279
Resist composition and patterning process Oct 22, 2007 Issued
Array ( [id] => 4682191 [patent_doc_number] => 20080248417 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-10-09 [patent_title] => 'Polyhydric phenol compound and chemically amplified resist composition containing the same' [patent_app_type] => utility [patent_app_number] => 11/976197 [patent_app_country] => US [patent_app_date] => 2007-10-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10635 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0248/20080248417.pdf [firstpage_image] =>[orig_patent_app_number] => 11976197 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/976197
Polyhydric phenol compound and chemically amplified resist composition containing the same Oct 21, 2007 Issued
Array ( [id] => 4915527 [patent_doc_number] => 20080096127 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-04-24 [patent_title] => 'Photoactive Compounds' [patent_app_type] => utility [patent_app_number] => 11/874276 [patent_app_country] => US [patent_app_date] => 2007-10-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16184 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0096/20080096127.pdf [firstpage_image] =>[orig_patent_app_number] => 11874276 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/874276
Photoactive Compounds Oct 17, 2007 Abandoned
Array ( [id] => 4886815 [patent_doc_number] => 20080261147 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-10-23 [patent_title] => 'Photoactive Compounds' [patent_app_type] => utility [patent_app_number] => 11/874278 [patent_app_country] => US [patent_app_date] => 2007-10-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 16188 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0261/20080261147.pdf [firstpage_image] =>[orig_patent_app_number] => 11874278 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/874278
Photoactive Compounds Oct 17, 2007 Abandoned
Array ( [id] => 348649 [patent_doc_number] => 07494762 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-02-24 [patent_title] => 'Positive resist composition for immersion lithography and method for forming resist pattern' [patent_app_type] => utility [patent_app_number] => 11/871399 [patent_app_country] => US [patent_app_date] => 2007-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 18483 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/494/07494762.pdf [firstpage_image] =>[orig_patent_app_number] => 11871399 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/871399
Positive resist composition for immersion lithography and method for forming resist pattern Oct 11, 2007 Issued
Array ( [id] => 4752375 [patent_doc_number] => 20080160448 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-07-03 [patent_title] => 'PHOTORESIST COMPOSITIONS AND METHODS OF FORMING A PATTERN USING THE SAME' [patent_app_type] => utility [patent_app_number] => 11/869933 [patent_app_country] => US [patent_app_date] => 2007-10-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 5911 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0160/20080160448.pdf [firstpage_image] =>[orig_patent_app_number] => 11869933 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/869933
Photoresist compositions and methods of forming a pattern using the same Oct 9, 2007 Issued
Array ( [id] => 299681 [patent_doc_number] => 07537880 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-05-26 [patent_title] => 'Polymer, resist composition, and patterning process' [patent_app_type] => utility [patent_app_number] => 11/905763 [patent_app_country] => US [patent_app_date] => 2007-10-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 22128 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 14 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/537/07537880.pdf [firstpage_image] =>[orig_patent_app_number] => 11905763 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/905763
Polymer, resist composition, and patterning process Oct 2, 2007 Issued
Array ( [id] => 121091 [patent_doc_number] => 07709177 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-05-04 [patent_title] => 'Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof' [patent_app_type] => utility [patent_app_number] => 11/906390 [patent_app_country] => US [patent_app_date] => 2007-10-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 23 [patent_no_of_words] => 8087 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 231 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/709/07709177.pdf [firstpage_image] =>[orig_patent_app_number] => 11906390 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/906390
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Oct 1, 2007 Issued
Array ( [id] => 91636 [patent_doc_number] => 07736833 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-06-15 [patent_title] => 'Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof' [patent_app_type] => utility [patent_app_number] => 11/906391 [patent_app_country] => US [patent_app_date] => 2007-10-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 23 [patent_no_of_words] => 8117 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/736/07736833.pdf [firstpage_image] =>[orig_patent_app_number] => 11906391 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/906391
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Oct 1, 2007 Issued
Array ( [id] => 4943964 [patent_doc_number] => 20080081289 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-04-03 [patent_title] => 'RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME' [patent_app_type] => utility [patent_app_number] => 11/862916 [patent_app_country] => US [patent_app_date] => 2007-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13718 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0081/20080081289.pdf [firstpage_image] =>[orig_patent_app_number] => 11862916 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/862916
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME Sep 26, 2007 Abandoned
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