
Joshua Joo
Examiner (ID: 15497, Phone: (571)272-3966 , Office: P/2445 )
| Most Active Art Unit | 2445 |
| Art Unit(s) | 2445, 2454, 2154 |
| Total Applications | 1189 |
| Issued Applications | 852 |
| Pending Applications | 95 |
| Abandoned Applications | 264 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 864088
[patent_doc_number] => 07368216
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-05-06
[patent_title] => 'Photosensitive resin composition and manufacturing method of semiconductor device using the same'
[patent_app_type] => utility
[patent_app_number] => 11/655905
[patent_app_country] => US
[patent_app_date] => 2007-01-22
[patent_effective_date] => 0000-00-00
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/368/07368216.pdf
[firstpage_image] =>[orig_patent_app_number] => 11655905
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/655905 | Photosensitive resin composition and manufacturing method of semiconductor device using the same | Jan 21, 2007 | Issued |
Array
(
[id] => 5004866
[patent_doc_number] => 20070202436
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-08-30
[patent_title] => 'Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns'
[patent_app_type] => utility
[patent_app_number] => 11/655171
[patent_app_country] => US
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[pdf_file] => publications/A1/0202/20070202436.pdf
[firstpage_image] =>[orig_patent_app_number] => 11655171
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/655171 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | Jan 18, 2007 | Issued |
Array
(
[id] => 5219626
[patent_doc_number] => 20070160937
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-12
[patent_title] => 'Photocurable resin composition and a method for forming a pattern'
[patent_app_type] => utility
[patent_app_number] => 11/622542
[patent_app_country] => US
[patent_app_date] => 2007-01-12
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11622542
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/622542 | Photocurable resin composition and a method for forming a pattern | Jan 11, 2007 | Issued |
Array
(
[id] => 5069335
[patent_doc_number] => 20070190436
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-08-16
[patent_title] => 'RESIST COMPOSITION'
[patent_app_type] => utility
[patent_app_number] => 11/621895
[patent_app_country] => US
[patent_app_date] => 2007-01-10
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11621895
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/621895 | Resist composition | Jan 9, 2007 | Issued |
Array
(
[id] => 5069354
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[patent_issue_date] => 2007-08-16
[patent_title] => 'POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD USING SAME'
[patent_app_type] => utility
[patent_app_number] => 11/621437
[patent_app_country] => US
[patent_app_date] => 2007-01-09
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[firstpage_image] =>[orig_patent_app_number] => 11621437
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/621437 | Positive type resist composition and resist pattern formation method using same | Jan 8, 2007 | Issued |
Array
(
[id] => 5188335
[patent_doc_number] => 20070166643
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-07-19
[patent_title] => 'Photosensitive resin composition and manufacturing method of semiconductor device using the same'
[patent_app_type] => utility
[patent_app_number] => 11/645554
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 11645554
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/645554 | Photosensitive resin composition and manufacturing method of semiconductor device using the same | Dec 26, 2006 | Abandoned |
Array
(
[id] => 5101120
[patent_doc_number] => 20070184382
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-08-09
[patent_title] => 'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'
[patent_app_type] => utility
[patent_app_number] => 11/644955
[patent_app_country] => US
[patent_app_date] => 2006-12-26
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 11644955
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/644955 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | Dec 25, 2006 | Issued |
Array
(
[id] => 5034579
[patent_doc_number] => 20070099118
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-03
[patent_title] => 'Planographic printing plate precursor'
[patent_app_type] => utility
[patent_app_number] => 11/642528
[patent_app_country] => US
[patent_app_date] => 2006-12-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 19647
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[firstpage_image] =>[orig_patent_app_number] => 11642528
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/642528 | Planorgraphic printing plate precursor | Dec 20, 2006 | Issued |
Array
(
[id] => 5034578
[patent_doc_number] => 20070099117
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-05-03
[patent_title] => 'Sulfonamide compound, polymer compound, resist material and pattern formation method'
[patent_app_type] => utility
[patent_app_number] => 11/641654
[patent_app_country] => US
[patent_app_date] => 2006-12-20
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[firstpage_image] =>[orig_patent_app_number] => 11641654
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/641654 | Sulfonamide compound, polymer compound, resist material and pattern formation method | Dec 19, 2006 | Issued |
Array
(
[id] => 4879649
[patent_doc_number] => 20080153032
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-06-26
[patent_title] => 'Photoactive Compounds'
[patent_app_type] => utility
[patent_app_number] => 11/613403
[patent_app_country] => US
[patent_app_date] => 2006-12-20
[patent_effective_date] => 0000-00-00
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[pdf_file] => publications/A1/0153/20080153032.pdf
[firstpage_image] =>[orig_patent_app_number] => 11613403
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/613403 | Photoactive compounds | Dec 19, 2006 | Issued |
Array
(
[id] => 852834
[patent_doc_number] => 07378215
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-05-27
[patent_title] => 'Positive photoresist composition'
[patent_app_type] => utility
[patent_app_number] => 11/637103
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[pdf_file] => patents/07/378/07378215.pdf
[firstpage_image] =>[orig_patent_app_number] => 11637103
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/637103 | Positive photoresist composition | Dec 11, 2006 | Issued |
Array
(
[id] => 6322632
[patent_doc_number] => 20100196823
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[patent_title] => 'POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN'
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[firstpage_image] =>[orig_patent_app_number] => 12160957
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/160957 | Positive resist composition for immersion exposure and method of forming resist pattern | Dec 7, 2006 | Issued |
Array
(
[id] => 5490322
[patent_doc_number] => 20090291393
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[patent_issue_date] => 2009-11-26
[patent_title] => 'POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/095208 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME | Dec 4, 2006 | Abandoned |
Array
(
[id] => 6505548
[patent_doc_number] => 20100216070
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[patent_kind] => A1
[patent_issue_date] => 2010-08-26
[patent_title] => 'Photosensitive Polyimides and Methods of Making the Same'
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Array
(
[id] => 5171690
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[patent_kind] => A1
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[patent_title] => 'Photosensitive polymer composition, method of forming relief patterns, and electronic equipment'
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Array
(
[id] => 8257411
[patent_doc_number] => 08206888
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[patent_title] => 'Radiation-sensitive resin composition'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/094820 | Radiation-sensitive resin composition | Nov 20, 2006 | Issued |
Array
(
[id] => 5432232
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[patent_title] => 'Positive Photosensitive Resin Composition, and Semiconductor Device and Display Therewith'
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Array
(
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/162080 | Positive resist composition for immersion exposure and method of forming resist pattern | Nov 15, 2006 | Issued |
| 11/598263 | RADIATION CURABLE RESIN COMPOSITION | Nov 12, 2006 | Abandoned |
Array
(
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